Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Hitachi Ltd
Original Assignee
Hitachi Ltd
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Filing date
Publication date
Application filed by Hitachi LtdfiledCriticalHitachi Ltd
Priority to JP10590375ApriorityCriticalpatent/JPS5230160A/en
Publication of JPS5230160ApublicationCriticalpatent/JPS5230160A/en
PURPOSE: To scatter out impurities within spread film formed in surface os semiconductor material and perform scattering process by the impurities for uniform scattering layer.
COPYRIGHT: (C)1977,JPO&Japio
JP10590375A1975-09-031975-09-03Impurity scattering method to semiconductor base plate
PendingJPS5230160A
(en)