JPS5227356A - Manufacturing process of silicon epitaxial wafer - Google Patents

Manufacturing process of silicon epitaxial wafer

Info

Publication number
JPS5227356A
JPS5227356A JP10370875A JP10370875A JPS5227356A JP S5227356 A JPS5227356 A JP S5227356A JP 10370875 A JP10370875 A JP 10370875A JP 10370875 A JP10370875 A JP 10370875A JP S5227356 A JPS5227356 A JP S5227356A
Authority
JP
Japan
Prior art keywords
manufacturing process
epitaxial wafer
silicon epitaxial
wafer
resistivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10370875A
Other languages
English (en)
Inventor
Minoru Yokozawa
Hiroyuki Nagao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP10370875A priority Critical patent/JPS5227356A/ja
Publication of JPS5227356A publication Critical patent/JPS5227356A/ja
Pending legal-status Critical Current

Links

JP10370875A 1975-08-27 1975-08-27 Manufacturing process of silicon epitaxial wafer Pending JPS5227356A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10370875A JPS5227356A (en) 1975-08-27 1975-08-27 Manufacturing process of silicon epitaxial wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10370875A JPS5227356A (en) 1975-08-27 1975-08-27 Manufacturing process of silicon epitaxial wafer

Publications (1)

Publication Number Publication Date
JPS5227356A true JPS5227356A (en) 1977-03-01

Family

ID=14361223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10370875A Pending JPS5227356A (en) 1975-08-27 1975-08-27 Manufacturing process of silicon epitaxial wafer

Country Status (1)

Country Link
JP (1) JPS5227356A (ja)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55165606A (en) * 1979-06-11 1980-12-24 Matsushita Electric Ind Co Ltd Magnetic roll and manufacture thereof
JPS5640207A (en) * 1979-09-10 1981-04-16 Tdk Corp Magnetizing distribution control method for rare earth cobalt magnet
JPS56118302A (en) * 1980-02-15 1981-09-17 Statni Vyzkumny Ustav Material Method of manufacturing anisotropic permanent magnet
JPS5791231U (ja) * 1980-11-25 1982-06-04
JPS58127421A (ja) * 1982-01-25 1983-07-29 Tsuneo Ikegami 増幅素子並列運転回路
JPS59119702A (ja) * 1982-12-27 1984-07-11 Toshiba Corp 焼結磁石の製造方法
JPS60160115A (ja) * 1984-01-30 1985-08-21 Toyo Electric Mfg Co Ltd 埋込み層を有する半導体基板の製作方法
JPH02139908A (ja) * 1988-11-18 1990-05-29 Shin Etsu Chem Co Ltd 極異方性希土類磁石の製造方法
JPH02103770U (ja) * 1981-05-21 1990-08-17
JPH03145718A (ja) * 1989-10-31 1991-06-20 Matsushita Electric Ind Co Ltd 気相エピタキシャル成長方法
JPH06112512A (ja) * 1992-09-24 1994-04-22 Rohm Co Ltd 半導体デバイス
JP2013504217A (ja) * 2009-09-03 2013-02-04 ビシャイ‐シリコニックス 半導体デバイス形成方法

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55165606A (en) * 1979-06-11 1980-12-24 Matsushita Electric Ind Co Ltd Magnetic roll and manufacture thereof
JPS598044B2 (ja) * 1979-09-10 1984-02-22 ティーディーケイ株式会社 希土類コバルト磁石の磁化分布制御方法
JPS5640207A (en) * 1979-09-10 1981-04-16 Tdk Corp Magnetizing distribution control method for rare earth cobalt magnet
JPS56118302A (en) * 1980-02-15 1981-09-17 Statni Vyzkumny Ustav Material Method of manufacturing anisotropic permanent magnet
JPS5791231U (ja) * 1980-11-25 1982-06-04
JPH02103770U (ja) * 1981-05-21 1990-08-17
JPS58127421A (ja) * 1982-01-25 1983-07-29 Tsuneo Ikegami 増幅素子並列運転回路
JPS59119702A (ja) * 1982-12-27 1984-07-11 Toshiba Corp 焼結磁石の製造方法
JPS60160115A (ja) * 1984-01-30 1985-08-21 Toyo Electric Mfg Co Ltd 埋込み層を有する半導体基板の製作方法
JPH02139908A (ja) * 1988-11-18 1990-05-29 Shin Etsu Chem Co Ltd 極異方性希土類磁石の製造方法
JPH0552045B2 (ja) * 1988-11-18 1993-08-04 Shinetsu Chem Ind Co
JPH03145718A (ja) * 1989-10-31 1991-06-20 Matsushita Electric Ind Co Ltd 気相エピタキシャル成長方法
JPH06112512A (ja) * 1992-09-24 1994-04-22 Rohm Co Ltd 半導体デバイス
JP2013504217A (ja) * 2009-09-03 2013-02-04 ビシャイ‐シリコニックス 半導体デバイス形成方法
US10546750B2 (en) 2009-09-03 2020-01-28 Vishay-Siliconix System and method for substrate wafer back side and edge cross section seals

Similar Documents

Publication Publication Date Title
JPS5227356A (en) Manufacturing process of silicon epitaxial wafer
JPS55165674A (en) Semiconductor device
JPS5363993A (en) Production of semiconductor device
JPS5331964A (en) Production of semiconductor substrates
JPS6446937A (en) Manufacture of semiconductor device
JPS5299085A (en) Production of semiconductor device
JPS5269571A (en) Thermal oxidation method for semiconductor wafer
JPS52131462A (en) Manufacture of semiconductor device
JPS5458381A (en) Manufacture for semiconductor device
JPS51113461A (en) A method for manufacturing semiconductor devices
JPS5244169A (en) Process for production of semiconductor device
JPS51145267A (en) Manufacture of semiconductor device
JPS526080A (en) Production method of semiconductor wafer
JPS52147980A (en) Manufacture of semiconductor device
JPS5245290A (en) Integrated circuit of semiconductor and method for its fabrication
JPS5384554A (en) Manufacture for semiconductor device
JPS5365086A (en) Production of semiconductor device
JPS52154344A (en) Impurity diffusion method
JPS5380184A (en) Manufacture of semiconductor device
JPS53101977A (en) Diffusion method of inpurity to semiconductor substrate
JPS5384690A (en) Field effect transistor
JPS5230379A (en) Process of semiconductor device
JPS5335375A (en) Heating method
JPS5372482A (en) Manufacture for semiconductor device
JPS52129288A (en) Production of semiconductor integrated citrcuit