JPS5226171A - Mask creation method - Google Patents

Mask creation method

Info

Publication number
JPS5226171A
JPS5226171A JP10247175A JP10247175A JPS5226171A JP S5226171 A JPS5226171 A JP S5226171A JP 10247175 A JP10247175 A JP 10247175A JP 10247175 A JP10247175 A JP 10247175A JP S5226171 A JPS5226171 A JP S5226171A
Authority
JP
Japan
Prior art keywords
creation method
mask creation
mask
duplicaiton
exposing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10247175A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5322427B2 (enExample
Inventor
Susumu Fujimori
Mamoru Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP10247175A priority Critical patent/JPS5226171A/ja
Publication of JPS5226171A publication Critical patent/JPS5226171A/ja
Publication of JPS5322427B2 publication Critical patent/JPS5322427B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10247175A 1975-08-22 1975-08-22 Mask creation method Granted JPS5226171A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10247175A JPS5226171A (en) 1975-08-22 1975-08-22 Mask creation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10247175A JPS5226171A (en) 1975-08-22 1975-08-22 Mask creation method

Publications (2)

Publication Number Publication Date
JPS5226171A true JPS5226171A (en) 1977-02-26
JPS5322427B2 JPS5322427B2 (enExample) 1978-07-08

Family

ID=14328353

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10247175A Granted JPS5226171A (en) 1975-08-22 1975-08-22 Mask creation method

Country Status (1)

Country Link
JP (1) JPS5226171A (enExample)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004504714A (ja) * 2000-07-17 2004-02-12 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 転写リソグラフィ・プロセスのための自動液体ディスペンス方法およびシステム
JP2005153091A (ja) * 2003-11-27 2005-06-16 Hitachi Ltd 転写方法及び転写装置
JP2006203194A (ja) * 2005-01-07 2006-08-03 Asml Netherlands Bv インプリント・リソグラフィ
JP2008177082A (ja) * 2007-01-19 2008-07-31 Mitsubishi Electric Corp 接点開閉器
US7636475B2 (en) 2004-12-23 2009-12-22 Asml Netherlands B.V. Imprint lithography
JP2011029641A (ja) * 1999-10-29 2011-02-10 Board Of Regents The Univ Of Texas System インプリントリソグラフィ
US8100684B2 (en) 2005-12-21 2012-01-24 Asml Netherlands B.V. Imprint lithography
US9341944B2 (en) 2004-12-30 2016-05-17 Asml Netherlands B.V. Imprint lithography

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6517977B2 (en) * 2001-03-28 2003-02-11 Motorola, Inc. Lithographic template and method of formation and use

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011029641A (ja) * 1999-10-29 2011-02-10 Board Of Regents The Univ Of Texas System インプリントリソグラフィ
JP2004504714A (ja) * 2000-07-17 2004-02-12 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 転写リソグラフィ・プロセスのための自動液体ディスペンス方法およびシステム
JP2011176321A (ja) * 2000-07-17 2011-09-08 Board Of Regents The Univ Of Texas System 転写リソグラフィ・プロセスのための自動液体ディスペンス方法およびシステム
JP2005153091A (ja) * 2003-11-27 2005-06-16 Hitachi Ltd 転写方法及び転写装置
US8131078B2 (en) 2004-12-23 2012-03-06 Asml Netherlands B.V. Imprint lithography
US7676088B2 (en) 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US7636475B2 (en) 2004-12-23 2009-12-22 Asml Netherlands B.V. Imprint lithography
JP2012049569A (ja) * 2004-12-23 2012-03-08 Asml Netherlands Bv インプリント・リソグラフィ
JP2012227555A (ja) * 2004-12-23 2012-11-15 Asml Netherlands Bv インプリント・リソグラフィ
US9341944B2 (en) 2004-12-30 2016-05-17 Asml Netherlands B.V. Imprint lithography
JP2006203194A (ja) * 2005-01-07 2006-08-03 Asml Netherlands Bv インプリント・リソグラフィ
US8100684B2 (en) 2005-12-21 2012-01-24 Asml Netherlands B.V. Imprint lithography
US8753557B2 (en) 2005-12-21 2014-06-17 Asml Netherlands B.V. Imprint lithography
US9610727B2 (en) 2005-12-21 2017-04-04 Asml Netherlands B.V. Imprint lithography
JP2008177082A (ja) * 2007-01-19 2008-07-31 Mitsubishi Electric Corp 接点開閉器

Also Published As

Publication number Publication date
JPS5322427B2 (enExample) 1978-07-08

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