JPS521869B2 - - Google Patents

Info

Publication number
JPS521869B2
JPS521869B2 JP47069360A JP6936072A JPS521869B2 JP S521869 B2 JPS521869 B2 JP S521869B2 JP 47069360 A JP47069360 A JP 47069360A JP 6936072 A JP6936072 A JP 6936072A JP S521869 B2 JPS521869 B2 JP S521869B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP47069360A
Other languages
Japanese (ja)
Other versions
JPS4928267A (xx
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47069360A priority Critical patent/JPS521869B2/ja
Priority to GB3122073A priority patent/GB1442177A/en
Priority to US00377524A priority patent/US3833811A/en
Priority to FR7325225A priority patent/FR2192374B1/fr
Priority to DE2335304A priority patent/DE2335304B2/de
Publication of JPS4928267A publication Critical patent/JPS4928267A/ja
Publication of JPS521869B2 publication Critical patent/JPS521869B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
JP47069360A 1972-07-11 1972-07-11 Expired JPS521869B2 (xx)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP47069360A JPS521869B2 (xx) 1972-07-11 1972-07-11
GB3122073A GB1442177A (en) 1972-07-11 1973-06-29 Scanning electron microscope apparatus
US00377524A US3833811A (en) 1972-07-11 1973-07-09 Scanning electron microscope with improved means for focusing
FR7325225A FR2192374B1 (xx) 1972-07-11 1973-07-10
DE2335304A DE2335304B2 (de) 1972-07-11 1973-07-11 Rasterelektronenmikroskop

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47069360A JPS521869B2 (xx) 1972-07-11 1972-07-11

Publications (2)

Publication Number Publication Date
JPS4928267A JPS4928267A (xx) 1974-03-13
JPS521869B2 true JPS521869B2 (xx) 1977-01-18

Family

ID=13400299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47069360A Expired JPS521869B2 (xx) 1972-07-11 1972-07-11

Country Status (5)

Country Link
US (1) US3833811A (xx)
JP (1) JPS521869B2 (xx)
DE (1) DE2335304B2 (xx)
FR (1) FR2192374B1 (xx)
GB (1) GB1442177A (xx)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3917946A (en) * 1972-04-12 1975-11-04 Philips Corp Electron-optical device for the recording of selected diffraction patterns
JPS49118493A (xx) * 1973-03-12 1974-11-12
DE2542356C2 (de) * 1975-09-19 1977-10-20 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Fokussierung der Objektivlinse eines Korpuskular-Durchstrahlungs-Rastermikroskops und Einrichtung zur selbsttätigen Durchführung des Verfahrens, sowie Anwendung
NL7804039A (nl) * 1978-04-17 1979-10-19 Philips Nv Elektronenmikroskoop met stigmator.
JPS5613649A (en) * 1979-07-12 1981-02-10 Akashi Seisakusho Co Ltd Correcting method and device for astigmatism in scanning type electron microscope and the like
NL7906632A (nl) * 1979-09-05 1981-03-09 Philips Nv Automatische bundelcorrektie in stem.
NL8304217A (nl) * 1983-12-07 1985-07-01 Philips Nv Automatisch instelbare electronenmicroscoop.
JPS61168852A (ja) * 1985-01-23 1986-07-30 Hitachi Ltd 透過形電子顕微鏡の焦点合せ装置
SE446954B (sv) * 1985-03-12 1986-10-20 Uponor Ab Sett vid extrudering av ett dubbelveggigt plastror samt extruderingsverktyg for utovning av settet
JPS61233950A (ja) * 1985-04-10 1986-10-18 Hitachi Ltd 電子顕微鏡
JPH073774B2 (ja) * 1986-10-08 1995-01-18 株式会社日立製作所 電子顕微鏡
DE3720560C1 (de) * 1987-06-22 1988-09-15 Bekum Maschf Gmbh Coextrusionskopf
US4975578A (en) * 1989-04-17 1990-12-04 The Research Foundation Of State University Of Ny Method and apparatus for determining distribution of mass density
JPH05343019A (ja) * 1992-06-03 1993-12-24 Hitachi Ltd 荷電粒子線装置およびその観察方法
US5650621A (en) * 1993-06-21 1997-07-22 Hitachi, Ltd. Electron microscope
JP4896626B2 (ja) * 2006-08-22 2012-03-14 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP4920370B2 (ja) * 2006-10-30 2012-04-18 株式会社日立製作所 透過型電子顕微鏡の情報伝達限界測定法およびこの測定法が適用された透過型電子顕微鏡
CN102169790B (zh) * 2011-03-29 2012-07-04 北京航空航天大学 电子显微镜的第一聚光镜
CN102184828B (zh) * 2011-03-29 2013-02-06 北京航空航天大学 电子显微镜的第二聚光镜
EP3163597A1 (en) * 2015-11-02 2017-05-03 FEI Company Charged particle microscope with vibration detection/correction

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2627589A (en) * 1950-10-30 1953-02-03 Rca Corp Focusing of electron optical apparatus
GB990239A (en) * 1961-08-17 1965-04-28 Christopher William Baisley Gr Improvements in measuring systems for electron diffraction patterns
US3225192A (en) * 1962-12-28 1965-12-21 Hitachi Ltd Apparatus for producing electron microscope and diffraction images separately and simultaneously on the image plane
GB1058037A (en) * 1964-11-03 1967-02-08 Jeol Ltd Electron beam apparatus
US3502870A (en) * 1967-07-05 1970-03-24 Hitachi Ltd Apparatus for simultaneously displaying a plurality of images of an object being analyzed in an electron beam device
US3576438A (en) * 1969-04-28 1971-04-27 Bell Telephone Labor Inc Focus monitor for electron microscope including an auxiliary electron gun and focusing lens
US3626184A (en) * 1970-03-05 1971-12-07 Atomic Energy Commission Detector system for a scanning electron microscope

Also Published As

Publication number Publication date
FR2192374B1 (xx) 1977-05-13
GB1442177A (en) 1976-07-07
DE2335304B2 (de) 1975-07-10
JPS4928267A (xx) 1974-03-13
US3833811A (en) 1974-09-03
DE2335304A1 (de) 1974-01-31
FR2192374A1 (xx) 1974-02-08

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