JPS52153669A - Photo mask of semiconductor integrated circuit - Google Patents
Photo mask of semiconductor integrated circuitInfo
- Publication number
- JPS52153669A JPS52153669A JP7076076A JP7076076A JPS52153669A JP S52153669 A JPS52153669 A JP S52153669A JP 7076076 A JP7076076 A JP 7076076A JP 7076076 A JP7076076 A JP 7076076A JP S52153669 A JPS52153669 A JP S52153669A
- Authority
- JP
- Japan
- Prior art keywords
- photo mask
- integrated circuit
- semiconductor integrated
- transparent plate
- regions corresponding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7076076A JPS52153669A (en) | 1976-06-16 | 1976-06-16 | Photo mask of semiconductor integrated circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7076076A JPS52153669A (en) | 1976-06-16 | 1976-06-16 | Photo mask of semiconductor integrated circuit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52153669A true JPS52153669A (en) | 1977-12-20 |
| JPS5344798B2 JPS5344798B2 (cg-RX-API-DMAC10.html) | 1978-12-01 |
Family
ID=13440775
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7076076A Granted JPS52153669A (en) | 1976-06-16 | 1976-06-16 | Photo mask of semiconductor integrated circuit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52153669A (cg-RX-API-DMAC10.html) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5376397A (en) * | 1976-12-18 | 1978-07-06 | Agency Of Ind Science & Technol | Photo mask for manufacturing magnetic bubble element |
| JPS53112673A (en) * | 1977-03-12 | 1978-10-02 | Sanyo Electric Co Ltd | Mask alignment method in semiconductor device manufacturing process and photo mask used for its execution |
| JPH05142760A (ja) * | 1991-11-25 | 1993-06-11 | Sharp Corp | フオトマスク |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49127703A (cg-RX-API-DMAC10.html) * | 1973-04-18 | 1974-12-06 |
-
1976
- 1976-06-16 JP JP7076076A patent/JPS52153669A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49127703A (cg-RX-API-DMAC10.html) * | 1973-04-18 | 1974-12-06 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5376397A (en) * | 1976-12-18 | 1978-07-06 | Agency Of Ind Science & Technol | Photo mask for manufacturing magnetic bubble element |
| JPS53112673A (en) * | 1977-03-12 | 1978-10-02 | Sanyo Electric Co Ltd | Mask alignment method in semiconductor device manufacturing process and photo mask used for its execution |
| JPH05142760A (ja) * | 1991-11-25 | 1993-06-11 | Sharp Corp | フオトマスク |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5344798B2 (cg-RX-API-DMAC10.html) | 1978-12-01 |
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