JPS52143759A - Impurity diffusion method for semiconductor wafers - Google Patents

Impurity diffusion method for semiconductor wafers

Info

Publication number
JPS52143759A
JPS52143759A JP6003776A JP6003776A JPS52143759A JP S52143759 A JPS52143759 A JP S52143759A JP 6003776 A JP6003776 A JP 6003776A JP 6003776 A JP6003776 A JP 6003776A JP S52143759 A JPS52143759 A JP S52143759A
Authority
JP
Japan
Prior art keywords
impurity diffusion
semiconductor wafers
diffusion method
eliminate
cvd method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6003776A
Other languages
Japanese (ja)
Inventor
Manabu Matsuzawa
Takeshi Uryu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6003776A priority Critical patent/JPS52143759A/en
Publication of JPS52143759A publication Critical patent/JPS52143759A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To eliminate so-called diffusion leakage by opening holes in the double films formed by thermal oxidation and CVD method and performing impurity diffusion therethrough.
COPYRIGHT: (C)1977,JPO&Japio
JP6003776A 1976-05-26 1976-05-26 Impurity diffusion method for semiconductor wafers Pending JPS52143759A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6003776A JPS52143759A (en) 1976-05-26 1976-05-26 Impurity diffusion method for semiconductor wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6003776A JPS52143759A (en) 1976-05-26 1976-05-26 Impurity diffusion method for semiconductor wafers

Publications (1)

Publication Number Publication Date
JPS52143759A true JPS52143759A (en) 1977-11-30

Family

ID=13130463

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6003776A Pending JPS52143759A (en) 1976-05-26 1976-05-26 Impurity diffusion method for semiconductor wafers

Country Status (1)

Country Link
JP (1) JPS52143759A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6042869A (en) * 1983-06-27 1985-03-07 アルカテル・エヌ・ブイ Method of producing semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6042869A (en) * 1983-06-27 1985-03-07 アルカテル・エヌ・ブイ Method of producing semiconductor device

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