JPS52115661A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS52115661A JPS52115661A JP3283076A JP3283076A JPS52115661A JP S52115661 A JPS52115661 A JP S52115661A JP 3283076 A JP3283076 A JP 3283076A JP 3283076 A JP3283076 A JP 3283076A JP S52115661 A JPS52115661 A JP S52115661A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- production
- easy
- bsg
- psg
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Formation Of Insulating Films (AREA)
Abstract
PURPOSE: To obtain a semiconductor device having a protecting film which is easy to melt at high temperature and permits easy formation of fine patterns by forming a PSG-BSG mixed film.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3283076A JPS52115661A (en) | 1976-03-24 | 1976-03-24 | Production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3283076A JPS52115661A (en) | 1976-03-24 | 1976-03-24 | Production of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52115661A true JPS52115661A (en) | 1977-09-28 |
Family
ID=12369734
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3283076A Pending JPS52115661A (en) | 1976-03-24 | 1976-03-24 | Production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52115661A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61135127A (en) * | 1984-12-05 | 1986-06-23 | Fujitsu Ltd | Manufacture of semiconductor device |
-
1976
- 1976-03-24 JP JP3283076A patent/JPS52115661A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61135127A (en) * | 1984-12-05 | 1986-06-23 | Fujitsu Ltd | Manufacture of semiconductor device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS52153384A (en) | Preparation of semiconductor device | |
JPS5320767A (en) | X-ray mask supporting underlayer and its production | |
JPS52136590A (en) | Production of semiconductor device | |
JPS5247673A (en) | Process for production of silicon crystal film | |
JPS52115661A (en) | Production of semiconductor device | |
JPS5276277A (en) | Producing long and narrow crystal | |
JPS5271978A (en) | Production of semiconductor device | |
JPS5267271A (en) | Formation of through-hole onto semiconductor substrate | |
JPS5230182A (en) | Process for producing semiconductor device | |
JPS5434752A (en) | Manufacture of semiconductor device | |
JPS51111478A (en) | A method of producing semiconductor crystal | |
JPS5315074A (en) | Mask alignment method | |
JPS53120376A (en) | Production of semiconductor device | |
JPS534477A (en) | Production of semiconductor device | |
JPS53136493A (en) | Manufacture for semiconductor device | |
JPS5390763A (en) | Semiconductor element and mask for producing semiconductor element | |
JPS52114504A (en) | Device for zone melting with hot wire | |
JPS53116782A (en) | Production of semiconductor device | |
JPS5391635A (en) | Forming method for magnetic film pattern | |
JPS5366188A (en) | Production of semiconductor device | |
JPS53124993A (en) | Production of semiconductor device | |
JPS5427372A (en) | Manufacture of semiconductor device | |
JPS545659A (en) | Manufacture of semiconductor device | |
JPS5347779A (en) | Production of semiconductor device | |
JPS52139371A (en) | Production of semiconductor integrated circuit device |