JPS5130890B2 - - Google Patents

Info

Publication number
JPS5130890B2
JPS5130890B2 JP48084222A JP8422273A JPS5130890B2 JP S5130890 B2 JPS5130890 B2 JP S5130890B2 JP 48084222 A JP48084222 A JP 48084222A JP 8422273 A JP8422273 A JP 8422273A JP S5130890 B2 JPS5130890 B2 JP S5130890B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP48084222A
Other languages
Japanese (ja)
Other versions
JPS4953629A (cg-RX-API-DMAC10.html
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4953629A publication Critical patent/JPS4953629A/ja
Publication of JPS5130890B2 publication Critical patent/JPS5130890B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H10P14/6689—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • H10P14/6536—
    • H10P14/6342—
    • H10P14/6922—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Paints Or Removers (AREA)
  • Formation Of Insulating Films (AREA)
  • Laminated Bodies (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Silicon Polymers (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP48084222A 1972-07-31 1973-07-27 Expired JPS5130890B2 (cg-RX-API-DMAC10.html)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR7227581A FR2193864B1 (cg-RX-API-DMAC10.html) 1972-07-31 1972-07-31
FR7316286A FR2228828B2 (cg-RX-API-DMAC10.html) 1972-07-31 1973-05-07

Publications (2)

Publication Number Publication Date
JPS4953629A JPS4953629A (cg-RX-API-DMAC10.html) 1974-05-24
JPS5130890B2 true JPS5130890B2 (cg-RX-API-DMAC10.html) 1976-09-03

Family

ID=26217249

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48084222A Expired JPS5130890B2 (cg-RX-API-DMAC10.html) 1972-07-31 1973-07-27

Country Status (13)

Country Link
US (1) US3911169A (cg-RX-API-DMAC10.html)
JP (1) JPS5130890B2 (cg-RX-API-DMAC10.html)
BE (1) BE802994A (cg-RX-API-DMAC10.html)
CA (1) CA1016017A (cg-RX-API-DMAC10.html)
CH (1) CH588306A5 (cg-RX-API-DMAC10.html)
DE (1) DE2338839A1 (cg-RX-API-DMAC10.html)
ES (1) ES417423A1 (cg-RX-API-DMAC10.html)
FR (2) FR2193864B1 (cg-RX-API-DMAC10.html)
GB (1) GB1440979A (cg-RX-API-DMAC10.html)
IL (1) IL42845A (cg-RX-API-DMAC10.html)
IT (1) IT991478B (cg-RX-API-DMAC10.html)
NL (1) NL7310238A (cg-RX-API-DMAC10.html)
SE (1) SE383689B (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54158883U (cg-RX-API-DMAC10.html) * 1978-04-28 1979-11-06

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4103045A (en) * 1972-07-31 1978-07-25 Rhone-Poulenc, S.A. Process for improving the adhesion of coatings made of photoresistant polymers to surfaces of inorganic oxides
JPS53292B2 (cg-RX-API-DMAC10.html) * 1974-02-01 1978-01-07
DE2441315A1 (de) * 1974-08-29 1976-03-11 Hoechst Ag Mit o-naphthochinondiazidverbindung vorsensibilisierte druckplatte
US3951659A (en) * 1974-12-09 1976-04-20 The United States Of America As Represented By The Secretary Of The Navy Method for resist coating of a glass substrate
JPS5217815A (en) * 1975-07-30 1977-02-10 Fuji Photo Film Co Ltd Substrate and material using the same
US4075367A (en) * 1976-03-18 1978-02-21 Ncr Corporation Semiconductor processing of silicon nitride
US4173683A (en) * 1977-06-13 1979-11-06 Rca Corporation Chemically treating the overcoat of a semiconductor device
US4164422A (en) * 1977-09-19 1979-08-14 Napp Systems (Usa), Inc. Water developable, photopolymer printing plates having ink-repulsive non-image areas
US4581315A (en) * 1979-06-25 1986-04-08 University Patents, Inc. Photoresistive compositions
US4439514A (en) * 1979-06-25 1984-03-27 University Patents, Inc. Photoresistive compositions
US4615962A (en) * 1979-06-25 1986-10-07 University Patents, Inc. Diacetylenes having liquid crystal phases
US4330604A (en) * 1980-08-04 1982-05-18 Hughes Aircraft Company Fabrication of holograms on plastic substrates
JPS5768834A (en) * 1980-10-17 1982-04-27 Matsushita Electric Ind Co Ltd Photographic etching method
US4352839A (en) * 1981-05-26 1982-10-05 General Electric Company Method of forming a layer of polymethyl methacrylate on a surface of silicon dioxide
US4524126A (en) * 1981-06-30 1985-06-18 International Business Machines Corporation Adhesion of a photoresist to a substrate
DE3305923C2 (de) * 1983-02-21 1986-10-30 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Vorbacken von mit Positiv-Fotolack auf der Basis von Naphtoquinondiazid und Phenolformaldehydharz beschichteten Substraten
US4497890A (en) * 1983-04-08 1985-02-05 Motorola, Inc. Process for improving adhesion of resist to gold
EP0204631A3 (en) * 1985-06-04 1987-05-20 Fairchild Semiconductor Corporation Semiconductor structures having polysiloxane leveling film
JPH0618885B2 (ja) * 1986-02-12 1994-03-16 東燃株式会社 ポリシロキサザンおよびその製法
US5166104A (en) * 1986-02-12 1992-11-24 Toa Nenryo Kogyo Kabushiki Kaisha Polysiloxazanes, silicon oxynitride fibers and processes for producing same
JPS62297367A (ja) * 1986-06-17 1987-12-24 Shin Etsu Chem Co Ltd プライマ−組成物
JPS6377052A (ja) * 1986-09-18 1988-04-07 インタ−ナショナル・ビジネス・マシ−ンズ・コ−ポレ−ション レジスト組成物
US4770974A (en) * 1986-09-18 1988-09-13 International Business Machines Corporation Microlithographic resist containing poly(1,1-dialkylsilazane)
JPH0258062A (ja) * 1988-08-24 1990-02-27 Mitsubishi Electric Corp 半導体装置の製造方法
US4976817A (en) * 1988-12-09 1990-12-11 Morton International, Inc. Wet lamination process and apparatus
JPH0791528B2 (ja) * 1991-06-12 1995-10-04 信越化学工業株式会社 シリコーンゴム用プライマー組成物
US5262273A (en) * 1992-02-25 1993-11-16 International Business Machines Corporation Photosensitive reactive ion etch barrier
US5270151A (en) * 1992-03-17 1993-12-14 International Business Machines Corporation Spin on oxygen reactive ion etch barrier
US5215861A (en) * 1992-03-17 1993-06-01 International Business Machines Corporation Thermographic reversible photoresist
US5920037A (en) 1997-05-12 1999-07-06 International Business Machines Corporation Conductive bonding design for metal backed circuits
US6613184B1 (en) 1997-05-12 2003-09-02 International Business Machines Corporation Stable interfaces between electrically conductive adhesives and metals
US6534724B1 (en) * 1997-05-28 2003-03-18 International Business Machines Corporation Enhanced design and process for a conductive adhesive
JP5291275B2 (ja) * 2000-07-27 2013-09-18 有限会社コンタミネーション・コントロール・サービス コーティング膜が施された部材及びコーティング膜の製造方法
US6455443B1 (en) * 2001-02-21 2002-09-24 International Business Machines Corporation Method of fabricating low-dielectric constant interlevel dielectric films for BEOL interconnects with enhanced adhesion and low-defect density
US6534184B2 (en) * 2001-02-26 2003-03-18 Kion Corporation Polysilazane/polysiloxane block copolymers
SG162730A1 (en) * 2005-05-31 2010-07-29 Toho Titanium Co Ltd Aminosilane compounds, catalyst components and catalysts for olefin polymerization, and process for production of olefin polymers with the same
JP5136791B2 (ja) * 2008-11-21 2013-02-06 信越化学工業株式会社 シアノアクリレート系瞬間接着剤用プライマー組成物
KR102139092B1 (ko) * 2012-09-24 2020-07-29 닛산 가가쿠 가부시키가이샤 헤테로원자를 갖는 환상유기기함유 실리콘함유 레지스트 하층막 형성조성물

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3549368A (en) * 1968-07-02 1970-12-22 Ibm Process for improving photoresist adhesion
US3726943A (en) * 1971-08-12 1973-04-10 Union Carbide Corp Ethylenically unsaturated monomer polymerization with silyl acyl peroxides and acyl peroxy polysiloxanes

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54158883U (cg-RX-API-DMAC10.html) * 1978-04-28 1979-11-06

Also Published As

Publication number Publication date
NL7310238A (cg-RX-API-DMAC10.html) 1974-02-04
DE2338839A1 (de) 1974-02-21
US3911169A (en) 1975-10-07
CA1016017A (en) 1977-08-23
FR2228828B2 (cg-RX-API-DMAC10.html) 1975-11-21
ES417423A1 (es) 1976-06-16
IL42845A0 (en) 1973-10-25
JPS4953629A (cg-RX-API-DMAC10.html) 1974-05-24
BE802994A (fr) 1974-01-30
CH588306A5 (cg-RX-API-DMAC10.html) 1977-05-31
GB1440979A (en) 1976-06-30
FR2193864B1 (cg-RX-API-DMAC10.html) 1974-12-27
IL42845A (en) 1975-12-31
SE383689B (sv) 1976-03-29
FR2193864A1 (cg-RX-API-DMAC10.html) 1974-02-22
IT991478B (it) 1975-07-30
FR2228828A2 (cg-RX-API-DMAC10.html) 1974-12-06

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