JPS51126384A - A method of forming a thin film by sputtering - Google Patents
A method of forming a thin film by sputteringInfo
- Publication number
- JPS51126384A JPS51126384A JP50051756A JP5175675A JPS51126384A JP S51126384 A JPS51126384 A JP S51126384A JP 50051756 A JP50051756 A JP 50051756A JP 5175675 A JP5175675 A JP 5175675A JP S51126384 A JPS51126384 A JP S51126384A
- Authority
- JP
- Japan
- Prior art keywords
- sputtering
- thin film
- forming
- potical
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004544 sputter deposition Methods 0.000 title abstract 2
- 239000010409 thin film Substances 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052814 silicon oxide Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50051756A JPS51126384A (en) | 1975-04-28 | 1975-04-28 | A method of forming a thin film by sputtering |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50051756A JPS51126384A (en) | 1975-04-28 | 1975-04-28 | A method of forming a thin film by sputtering |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51126384A true JPS51126384A (en) | 1976-11-04 |
| JPS5515550B2 JPS5515550B2 (cs) | 1980-04-24 |
Family
ID=12895770
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50051756A Granted JPS51126384A (en) | 1975-04-28 | 1975-04-28 | A method of forming a thin film by sputtering |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS51126384A (cs) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56137919A (en) * | 1980-03-31 | 1981-10-28 | Toyoda Gosei Co Ltd | Molding in synthetic resin having hairline pattern |
| JPS61132902A (ja) * | 1984-11-30 | 1986-06-20 | Osaka Tokushu Gokin Kk | 紫外線及び赤外線透過阻止用透明材料 |
| JPS63206462A (ja) * | 1987-02-24 | 1988-08-25 | Kawatetsu Kogyo Kk | 導電性又は超伝導性薄膜の製造方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4832733A (cs) * | 1971-09-01 | 1973-05-02 | ||
| JPS51107289A (en) * | 1975-03-18 | 1976-09-22 | Kogyo Gijutsuin | Hishotai oyobi ketsushotaikitaihyomenno kodokairyoho |
| JPS51115289A (en) * | 1975-02-22 | 1976-10-09 | Agency Of Ind Science & Technol | Case-hardening a single crystal |
-
1975
- 1975-04-28 JP JP50051756A patent/JPS51126384A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4832733A (cs) * | 1971-09-01 | 1973-05-02 | ||
| JPS51115289A (en) * | 1975-02-22 | 1976-10-09 | Agency Of Ind Science & Technol | Case-hardening a single crystal |
| JPS51107289A (en) * | 1975-03-18 | 1976-09-22 | Kogyo Gijutsuin | Hishotai oyobi ketsushotaikitaihyomenno kodokairyoho |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56137919A (en) * | 1980-03-31 | 1981-10-28 | Toyoda Gosei Co Ltd | Molding in synthetic resin having hairline pattern |
| JPS61132902A (ja) * | 1984-11-30 | 1986-06-20 | Osaka Tokushu Gokin Kk | 紫外線及び赤外線透過阻止用透明材料 |
| JPS63206462A (ja) * | 1987-02-24 | 1988-08-25 | Kawatetsu Kogyo Kk | 導電性又は超伝導性薄膜の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5515550B2 (cs) | 1980-04-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS523583A (en) | Crystal film forming process | |
| JPS51126384A (en) | A method of forming a thin film by sputtering | |
| JPS51127680A (en) | Manufacturing process of semiconductor device | |
| JPS5233490A (en) | Manufacturing process of semiconductor device | |
| JPS5331964A (en) | Production of semiconductor substrates | |
| JPS5461478A (en) | Chromium plate | |
| JPS5245868A (en) | Process for production of plate-from silicone | |
| JPS529897A (en) | Manufacturing method of thin oxide semiconductor film | |
| JPS5267271A (en) | Formation of through-hole onto semiconductor substrate | |
| JPS5273713A (en) | Production of magnetoresistive thin film head | |
| JPS543473A (en) | Manufacture of semiconductor device | |
| JPS5214371A (en) | Flattening method of concave-convex surface | |
| JPS5227362A (en) | Formation method of passivation film | |
| JPS5261475A (en) | Production of silicon crystal film | |
| JPS5219297A (en) | Method of manufacturing a metal film resistor | |
| JPS5275454A (en) | Display device | |
| JPS54101661A (en) | Ingot for single crystal substrate | |
| JPS5271980A (en) | Formation of metal wiring | |
| JPS5244175A (en) | Method of flat etching of silicon substrate | |
| JPS5258896A (en) | Production of dielectric thin film | |
| JPS52119204A (en) | Magnetic disc production | |
| JPS5432993A (en) | Manufacture of electric-field luminous device | |
| JPS51121199A (en) | Method of manufacture of a magnetic thin film of oxide | |
| JPS51133788A (en) | Method of forming transparent conductive film | |
| JPS52117559A (en) | Mask formation method |