JPS5346621B2
(ja)
*
|
1974-10-21 |
1978-12-15 |
|
|
US4161038A
(en)
*
|
1977-09-20 |
1979-07-10 |
Westinghouse Electric Corp. |
Complementary metal-ferroelectric semiconductor transistor structure and a matrix of such transistor structure for performing a comparison
|
JPS6045368B2
(ja)
*
|
1977-12-08 |
1985-10-09 |
セイコーエプソン株式会社 |
半導体ガスセンサ
|
US4873664A
(en)
*
|
1987-02-12 |
1989-10-10 |
Ramtron Corporation |
Self restoring ferroelectric memory
|
CA1340340C
(en)
|
1987-06-02 |
1999-01-26 |
Joseph T. Evans, Jr. |
Non-volatile memory circuit using ferroelectric capacitor storage element
|
US5046043A
(en)
*
|
1987-10-08 |
1991-09-03 |
National Semiconductor Corporation |
Ferroelectric capacitor and memory cell including barrier and isolation layers
|
US5434811A
(en)
*
|
1987-11-19 |
1995-07-18 |
National Semiconductor Corporation |
Non-destructive read ferroelectric based memory circuit
|
KR940006708B1
(ko)
*
|
1989-01-26 |
1994-07-25 |
세이꼬 엡슨 가부시끼가이샤 |
반도체 장치의 제조 방법
|
KR950000156B1
(ko)
*
|
1989-02-08 |
1995-01-10 |
세이꼬 엡슨 가부시끼가이샤 |
반도체 장치
|
KR930002470B1
(ko)
*
|
1989-03-28 |
1993-04-02 |
가부시키가이샤 도시바 |
전기적인 독출/기록동작이 가능한 불휘발성 반도체기억장치 및 그 정보독출방법
|
JP2573384B2
(ja)
*
|
1990-01-24 |
1997-01-22 |
株式会社東芝 |
半導体記憶装置とその製造方法
|
US5146299A
(en)
*
|
1990-03-02 |
1992-09-08 |
Westinghouse Electric Corp. |
Ferroelectric thin film material, method of deposition, and devices using same
|
JP3169599B2
(ja)
*
|
1990-08-03 |
2001-05-28 |
株式会社日立製作所 |
半導体装置、その駆動方法、その読み出し方法
|
JP2834603B2
(ja)
*
|
1991-08-16 |
1998-12-09 |
ローム株式会社 |
強誘電体デバイス
|
EP0540993A1
(en)
*
|
1991-11-06 |
1993-05-12 |
Ramtron International Corporation |
Structure and fabrication of high transconductance MOS field effect transistor using a buffer layer/ferroelectric/buffer layer stack as the gate dielectric
|
US5307305A
(en)
*
|
1991-12-04 |
1994-04-26 |
Rohm Co., Ltd. |
Semiconductor device having field effect transistor using ferroelectric film as gate insulation film
|
FR2688090B1
(fr)
*
|
1992-02-27 |
1994-04-08 |
Commissariat A Energie Atomique |
Cellule memoire non volatile du type metal-ferroelectrique semi-conducteur.
|
JP3118063B2
(ja)
*
|
1992-03-23 |
2000-12-18 |
ローム株式会社 |
不揮発性記憶素子およびこれを利用した不揮発性記憶装置、ならびに不揮発性記憶素子の製造方法
|
US5563081A
(en)
*
|
1992-03-23 |
1996-10-08 |
Rohm Co., Inc. |
Method for making a nonvolatile memory device utilizing a field effect transistor having a ferroelectric gate film
|
JPH0731705B2
(ja)
*
|
1992-08-24 |
1995-04-10 |
東京工業大学長 |
自己学習型積和演算回路素子及び回路
|
US5523964A
(en)
*
|
1994-04-07 |
1996-06-04 |
Symetrix Corporation |
Ferroelectric non-volatile memory unit
|
JP2942088B2
(ja)
*
|
1993-03-19 |
1999-08-30 |
ローム株式会社 |
半導体装置の動作方法、および半導体装置
|
US5666305A
(en)
*
|
1993-03-29 |
1997-09-09 |
Olympus Optical Co., Ltd. |
Method of driving ferroelectric gate transistor memory cell
|
JPH0745794A
(ja)
*
|
1993-07-26 |
1995-02-14 |
Olympus Optical Co Ltd |
強誘電体メモリの駆動方法
|
US5504699A
(en)
*
|
1994-04-08 |
1996-04-02 |
Goller; Stuart E. |
Nonvolatile magnetic analog memory
|
US5541870A
(en)
*
|
1994-10-28 |
1996-07-30 |
Symetrix Corporation |
Ferroelectric memory and non-volatile memory cell for same
|
US5808676A
(en)
*
|
1995-01-03 |
1998-09-15 |
Xerox Corporation |
Pixel cells having integrated analog memories and arrays thereof
|
US5686745A
(en)
*
|
1995-06-19 |
1997-11-11 |
University Of Houston |
Three-terminal non-volatile ferroelectric/superconductor thin film field effect transistor
|
US5757042A
(en)
*
|
1996-06-14 |
1998-05-26 |
Radiant Technologies, Inc. |
High density ferroelectric memory with increased channel modulation and double word ferroelectric memory cell for constructing the same
|
US5731608A
(en)
*
|
1997-03-07 |
1998-03-24 |
Sharp Microelectronics Technology, Inc. |
One transistor ferroelectric memory cell and method of making the same
|
US5962884A
(en)
*
|
1997-03-07 |
1999-10-05 |
Sharp Laboratories Of America, Inc. |
Single transistor ferroelectric memory cell with asymmetrical ferroelectric polarization and method of making the same
|
US6048738A
(en)
*
|
1997-03-07 |
2000-04-11 |
Sharp Laboratories Of America, Inc. |
Method of making ferroelectric memory cell for VLSI RAM array
|
US5932904A
(en)
*
|
1997-03-07 |
1999-08-03 |
Sharp Laboratories Of America, Inc. |
Two transistor ferroelectric memory cell
|
US6018171A
(en)
*
|
1997-03-07 |
2000-01-25 |
Sharp Laboratories Of America, Inc. |
Shallow junction ferroelectric memory cell having a laterally extending p-n junction and method of making the same
|
US5942776A
(en)
*
|
1997-03-07 |
1999-08-24 |
Sharp Laboratories Of America, Inc. |
Shallow junction ferroelectric memory cell and method of making the same
|
US6067244A
(en)
*
|
1997-10-14 |
2000-05-23 |
Yale University |
Ferroelectric dynamic random access memory
|
US5907762A
(en)
*
|
1997-12-04 |
1999-05-25 |
Sharp Microelectronics Technology, Inc. |
Method of manufacture of single transistor ferroelectric memory cell using chemical-mechanical polishing
|
US6242771B1
(en)
|
1998-01-02 |
2001-06-05 |
Sharp Laboratories Of America, Inc. |
Chemical vapor deposition of PB5GE3O11 thin film for ferroelectric applications
|
JPH11251586A
(ja)
*
|
1998-03-03 |
1999-09-17 |
Fuji Electric Co Ltd |
電界効果トランジスタ
|
US6525357B1
(en)
|
1999-10-20 |
2003-02-25 |
Agilent Technologies, Inc. |
Barrier layers ferroelectric memory devices
|
EP1307919A4
(en)
*
|
2000-07-12 |
2009-04-15 |
California Inst Of Techn |
ELECTRICAL PASSIVATION OF SILIC-SIZED SURFACES USING ORGANIC LAYERS
|
WO2002082510A1
(en)
*
|
2000-08-24 |
2002-10-17 |
Cova Technologies Incorporated |
Single transistor rare earth manganite ferroelectric nonvolatile memory cell
|
US20020164850A1
(en)
|
2001-03-02 |
2002-11-07 |
Gnadinger Alfred P. |
Single transistor rare earth manganite ferroelectric nonvolatile memory cell
|
US7066088B2
(en)
*
|
2002-07-31 |
2006-06-27 |
Day International, Inc. |
Variable cut-off offset press system and method of operation
|
US6825517B2
(en)
*
|
2002-08-28 |
2004-11-30 |
Cova Technologies, Inc. |
Ferroelectric transistor with enhanced data retention
|
US6888736B2
(en)
|
2002-09-19 |
2005-05-03 |
Cova Technologies, Inc. |
Ferroelectric transistor for storing two data bits
|
US6714435B1
(en)
*
|
2002-09-19 |
2004-03-30 |
Cova Technologies, Inc. |
Ferroelectric transistor for storing two data bits
|
US6744087B2
(en)
|
2002-09-27 |
2004-06-01 |
International Business Machines Corporation |
Non-volatile memory using ferroelectric gate field-effect transistors
|
US6894916B2
(en)
|
2002-09-27 |
2005-05-17 |
International Business Machines Corporation |
Memory array employing single three-terminal non-volatile storage elements
|
DE10336397B4
(de)
*
|
2003-08-06 |
2006-12-14 |
Forschungszentrum Jülich GmbH |
Vorrichtung zum Speichern digitaler Daten
|
US7297602B2
(en)
*
|
2003-09-09 |
2007-11-20 |
Sharp Laboratories Of America, Inc. |
Conductive metal oxide gate ferroelectric memory transistor
|
US7378286B2
(en)
*
|
2004-08-20 |
2008-05-27 |
Sharp Laboratories Of America, Inc. |
Semiconductive metal oxide thin film ferroelectric memory transistor
|
WO2007149003A1
(en)
*
|
2006-06-09 |
2007-12-27 |
Juri Heinrich Krieger |
Method for nondestructively reading information in ferroelectric memory elements
|
US10267773B2
(en)
|
2014-03-13 |
2019-04-23 |
Konica Minolta, Inc |
Phasing adder, ultrasound probe, acoustic sensor and ultrasound diagnosis apparatus
|
JP6375648B2
(ja)
|
2014-03-13 |
2018-08-22 |
コニカミノルタ株式会社 |
音響センサー、及び、超音波探触子
|
CN115548128B
(zh)
*
|
2022-12-05 |
2023-04-14 |
浙江大学杭州国际科创中心 |
一种铁电半导体器件、制备方法以及实现多铁电相的方法
|