JPS50139720A - - Google Patents

Info

Publication number
JPS50139720A
JPS50139720A JP4694974A JP4694974A JPS50139720A JP S50139720 A JPS50139720 A JP S50139720A JP 4694974 A JP4694974 A JP 4694974A JP 4694974 A JP4694974 A JP 4694974A JP S50139720 A JPS50139720 A JP S50139720A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4694974A
Other versions
JPS5821257B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP49046949A priority Critical patent/JPS5821257B2/ja
Priority to CA225,825A priority patent/CA1027258A/en
Priority to FR7512968A priority patent/FR2269109B1/fr
Priority to US05/571,817 priority patent/US4008084A/en
Priority to DE2518451A priority patent/DE2518451C2/de
Priority to GB17392/75A priority patent/GB1496958A/en
Publication of JPS50139720A publication Critical patent/JPS50139720A/ja
Publication of JPS5821257B2 publication Critical patent/JPS5821257B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/922—Static electricity metal bleed-off metallic stock
    • Y10S428/9335—Product by special process
    • Y10S428/938—Vapor deposition or gas diffusion
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12736—Al-base component
    • Y10T428/12743—Next to refractory [Group IVB, VB, or VIB] metal-base component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12736—Al-base component
    • Y10T428/1275—Next to Group VIII or IB metal-base component

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP49046949A 1974-04-25 1974-04-25 キンゾクガゾウケイセイザイリヨウ Expired JPS5821257B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP49046949A JPS5821257B2 (ja) 1974-04-25 1974-04-25 キンゾクガゾウケイセイザイリヨウ
CA225,825A CA1027258A (en) 1974-04-25 1975-04-24 Metallic image forming material
FR7512968A FR2269109B1 (ja) 1974-04-25 1975-04-25
US05/571,817 US4008084A (en) 1974-04-25 1975-04-25 Metallic image forming material
DE2518451A DE2518451C2 (de) 1974-04-25 1975-04-25 Aufzeichnungsmaterial zur Erzeugung von Metallbildern
GB17392/75A GB1496958A (en) 1974-04-25 1975-04-25 Photoresist elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49046949A JPS5821257B2 (ja) 1974-04-25 1974-04-25 キンゾクガゾウケイセイザイリヨウ

Publications (2)

Publication Number Publication Date
JPS50139720A true JPS50139720A (ja) 1975-11-08
JPS5821257B2 JPS5821257B2 (ja) 1983-04-28

Family

ID=12761536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49046949A Expired JPS5821257B2 (ja) 1974-04-25 1974-04-25 キンゾクガゾウケイセイザイリヨウ

Country Status (6)

Country Link
US (1) US4008084A (ja)
JP (1) JPS5821257B2 (ja)
CA (1) CA1027258A (ja)
DE (1) DE2518451C2 (ja)
FR (1) FR2269109B1 (ja)
GB (1) GB1496958A (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5479027A (en) * 1977-12-05 1979-06-23 Kimoto Kk Dry picture forming material
JPS5878149A (ja) * 1981-11-04 1983-05-11 Konishiroku Photo Ind Co Ltd 金属画像形成材料
JPS5883843A (ja) * 1981-11-14 1983-05-19 Konishiroku Photo Ind Co Ltd 金属画像形成材料
JPS5883846A (ja) * 1981-11-14 1983-05-19 Konishiroku Photo Ind Co Ltd 金属画像形成材料
JPS60140236A (ja) * 1983-12-27 1985-07-25 Toppan Printing Co Ltd 画像形成材料
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5850342B2 (ja) * 1975-05-12 1983-11-10 富士写真フイルム株式会社 キンゾクガゾウケイセイザイリヨウ
JPS5299101A (en) * 1976-02-16 1977-08-19 Fuji Photo Film Co Ltd Liquid of treating metalic image forming material
JPS5944615B2 (ja) * 1976-02-16 1984-10-31 富士写真フイルム株式会社 感光性樹脂組成物及びそれを用いた金属画像形成材料
US4205989A (en) * 1976-04-14 1980-06-03 Kimoto & Co., Ltd. Dry system image producing element
JPS52126220A (en) * 1976-04-14 1977-10-22 Kimoto Kk Dry image forming material and method of forming image
GB1570967A (en) * 1976-04-16 1980-07-09 Fuji Photo Film Co Ltd Peel-apart type light-sensitive materials
GB1566802A (en) * 1976-06-02 1980-05-08 Agfa Gevaert Photosensitive imaging material
JPS6020735B2 (ja) * 1976-06-28 1985-05-23 富士写真フイルム株式会社 剥離現像可能な感光材料を用いる画像形成方法
US4138262A (en) * 1976-09-20 1979-02-06 Energy Conversion Devices, Inc. Imaging film comprising bismuth image-forming layer
GB1588417A (en) * 1977-03-15 1981-04-23 Agfa Gevaert Photoresist materials
US4104072A (en) * 1977-05-19 1978-08-01 Polychrome Corporation Water developable lithographic printing plate having dual photosensitive layering
DE2826122A1 (de) * 1977-06-14 1978-12-21 Fuji Photo Film Co Ltd Aufzeichnungsmaterial
JPS6049301B2 (ja) * 1977-12-06 1985-11-01 富士写真フイルム株式会社 画像形成方法
US4187105A (en) * 1978-05-23 1980-02-05 Horizons Research Incorporated Photosensitive image forming composition containing at least one substituted bis-diaryl vinylidene compound and/or at least one substituted bis-diaryl imine compound
US4284711A (en) * 1979-08-21 1981-08-18 Birlain Noris Armando Presensitized planographic printing plates with cobalt adhesive layer
JPS56122130A (en) * 1980-02-28 1981-09-25 Sharp Corp Method for forming pattern of thin film transistor
US4407871A (en) * 1980-03-25 1983-10-04 Ex-Cell-O Corporation Vacuum metallized dielectric substrates and method of making same
US4431711A (en) * 1980-03-25 1984-02-14 Ex-Cell-O Corporation Vacuum metallizing a dielectric substrate with indium and products thereof
US4314022A (en) * 1980-05-05 1982-02-02 Minnesota Mining And Manufacturing Company Photoresist developers and process
US4472494A (en) * 1980-09-15 1984-09-18 Napp Systems (Usa), Inc. Bilayer photosensitive imaging article
US4609613A (en) * 1980-12-29 1986-09-02 Permanent Images, Inc. Permanent reproductions and formation method therefor
US4364995A (en) * 1981-02-04 1982-12-21 Minnesota Mining And Manufacturing Company Metal/metal oxide coatings
JPS57148740A (en) * 1981-03-10 1982-09-14 Toyobo Co Ltd Image duplicating material
US4456677A (en) * 1981-08-19 1984-06-26 The United Stated Of America As Represented By The Secretary Of The Army Composite resist structures for submicron processing in electron/ion lithography
JPS5858546A (ja) * 1981-10-02 1983-04-07 Kimoto & Co Ltd 製版用感光性マスク材料
EP0082588A3 (en) * 1981-11-02 1983-10-26 Konica Corporation Photolithographic elements for the production of metal images
US4455364A (en) * 1981-11-14 1984-06-19 Konishiroku Photo Industry Co., Ltd. Process for forming metallic image, composite material for the same
US5188923A (en) * 1981-12-31 1993-02-23 International Business Machines Corporation Optical storage media with discontinuous thin metallic films
JPS58210144A (ja) * 1982-06-01 1983-12-07 Fuji Photo Film Co Ltd 平版印刷版支持体用アルミニウム合金
IE55632B1 (en) * 1983-05-09 1990-12-05 Vickers Plc Improvements in or relating to radiation sensitive plates
US4567129A (en) * 1984-07-27 1986-01-28 E. I. Du Pont De Nemours And Company Process for image formation utilizing chemically soluble pigments
US5215857A (en) * 1985-08-07 1993-06-01 Japan Synthetic Rubber Co., Ltd. 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent
US5238774A (en) * 1985-08-07 1993-08-24 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
US5045150A (en) * 1986-09-11 1991-09-03 National Semiconductor Corp. Plasma etching using a bilayer mask
US5128230A (en) * 1986-12-23 1992-07-07 Shipley Company Inc. Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate
US5139824A (en) * 1990-08-28 1992-08-18 Liburdi Engineering Limited Method of coating complex substrates
US5378502A (en) * 1992-09-09 1995-01-03 U.S. Philips Corporation Method of chemically modifying a surface in accordance with a pattern
US5744283A (en) * 1994-04-12 1998-04-28 U.S. Philips Corporation Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material
DE69508019T2 (de) * 1994-04-12 1999-09-16 Koninkl Philips Electronics Nv Verfahren zum photolithographischen metallisieren zumindest der innenseiten von löchern die in zusammenhang mit einem auf einer aus elektrisch isolierendem material bestehende platte befindlichen muster aufgebracht sind
EP1747578A1 (en) * 2004-05-18 2007-01-31 Mecharonics Co., Ltd. Method for forming organic light-emitting layer
AT10114U1 (de) * 2008-04-14 2008-09-15 Lenzing Plastics Gmbh Dampfdiffusionsoffene, wasserdichte und reflektierende folie
CN102265341A (zh) * 2008-11-03 2011-11-30 布莱阿姆青年大学 含有镁金属层的数据存储介质
JP5250582B2 (ja) * 2010-04-22 2013-07-31 有限会社 ナプラ 充填用基材及びそれを用いた充填方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3488194A (en) * 1966-06-09 1970-01-06 Eastman Kodak Co Photosensitive metal plate
US3873316A (en) * 1970-06-11 1975-03-25 Kalle Ag Process for the production of a light-sensitive copying material having a copper-containing support, and copying material so produced
US3865595A (en) * 1972-11-09 1975-02-11 Howson Algraphy Ltd Lithographic printing plates
BE792433A (fr) * 1971-12-08 1973-03-30 Energy Conversion Devices Inc Matiere pour la formation d'images et procede de production d'une imag

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5479027A (en) * 1977-12-05 1979-06-23 Kimoto Kk Dry picture forming material
JPS5620533B2 (ja) * 1977-12-05 1981-05-14
JPS5878149A (ja) * 1981-11-04 1983-05-11 Konishiroku Photo Ind Co Ltd 金属画像形成材料
JPH0336217B2 (ja) * 1981-11-04 1991-05-30 Konishiroku Photo Ind
JPH0145897B2 (ja) * 1981-11-14 1989-10-05 Konishiroku Photo Ind
JPS5883846A (ja) * 1981-11-14 1983-05-19 Konishiroku Photo Ind Co Ltd 金属画像形成材料
JPH0145896B2 (ja) * 1981-11-14 1989-10-05 Konishiroku Photo Ind
JPS5883843A (ja) * 1981-11-14 1983-05-19 Konishiroku Photo Ind Co Ltd 金属画像形成材料
JPS60140236A (ja) * 1983-12-27 1985-07-25 Toppan Printing Co Ltd 画像形成材料
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
US5494784A (en) * 1985-08-07 1996-02-27 Japan Synthetic Rubber Co., Ltd. Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent
US5925492A (en) * 1985-08-07 1999-07-20 Jsr Corporation Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent
US6228554B1 (en) 1985-08-07 2001-05-08 Jsr Corporation Radiation-sensitive resin composition
US6270939B1 (en) 1985-08-07 2001-08-07 Jsr Corporation Radiation-sensitive resin composition

Also Published As

Publication number Publication date
DE2518451C2 (de) 1985-05-09
DE2518451A1 (de) 1975-11-13
FR2269109B1 (ja) 1982-03-05
US4008084A (en) 1977-02-15
GB1496958A (en) 1978-01-05
JPS5821257B2 (ja) 1983-04-28
CA1027258A (en) 1978-02-28
FR2269109A1 (ja) 1975-11-21

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