JPS50125806A - - Google Patents

Info

Publication number
JPS50125806A
JPS50125806A JP3326474A JP3326474A JPS50125806A JP S50125806 A JPS50125806 A JP S50125806A JP 3326474 A JP3326474 A JP 3326474A JP 3326474 A JP3326474 A JP 3326474A JP S50125806 A JPS50125806 A JP S50125806A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3326474A
Other languages
Japanese (ja)
Other versions
JPS5723253B2 (de
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3326474A priority Critical patent/JPS5723253B2/ja
Priority to DE19752512933 priority patent/DE2512933C2/de
Publication of JPS50125806A publication Critical patent/JPS50125806A/ja
Priority to US05/756,653 priority patent/US4123279A/en
Publication of JPS5723253B2 publication Critical patent/JPS5723253B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP3326474A 1974-03-25 1974-03-25 Expired JPS5723253B2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP3326474A JPS5723253B2 (de) 1974-03-25 1974-03-25
DE19752512933 DE2512933C2 (de) 1974-03-25 1975-03-24 Lichtempfindliche Flachdruckplatte
US05/756,653 US4123279A (en) 1974-03-25 1977-01-04 Light-sensitive o-quinonediazide containing planographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3326474A JPS5723253B2 (de) 1974-03-25 1974-03-25

Publications (2)

Publication Number Publication Date
JPS50125806A true JPS50125806A (de) 1975-10-03
JPS5723253B2 JPS5723253B2 (de) 1982-05-18

Family

ID=12381649

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3326474A Expired JPS5723253B2 (de) 1974-03-25 1974-03-25

Country Status (2)

Country Link
JP (1) JPS5723253B2 (de)
DE (1) DE2512933C2 (de)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
JPS5557841A (en) * 1978-10-20 1980-04-30 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS55129341A (en) * 1979-03-29 1980-10-07 Daicel Chem Ind Ltd Photosensitive covering composition
JPS56140342A (en) * 1980-04-02 1981-11-02 Tokyo Ohka Kogyo Co Ltd Image forming composition and formation of resist image
JPS57157238A (en) * 1981-02-26 1982-09-28 Hoechst Ag Photosensitive mixture and copying material containing it
JPS5997146A (ja) * 1982-11-26 1984-06-04 Asahi Shinbunsha:Kk 感光性平版印刷版
JPS61193145A (ja) * 1985-02-21 1986-08-27 Japan Synthetic Rubber Co Ltd ネガ型レジスト
JPS62136636A (ja) * 1985-12-10 1987-06-19 Nec Corp ネガレジスト
JPH02185556A (ja) * 1989-01-11 1990-07-19 Japan Synthetic Rubber Co Ltd 集積回路製造用感放射線性樹脂組成物
JPH02306245A (ja) * 1990-05-01 1990-12-19 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
EP0410606A2 (de) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Polysiloxane und positiv arbeitende Resistmasse
US5407780A (en) * 1989-12-27 1995-04-18 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde
EP0762208A2 (de) 1995-09-08 1997-03-12 Konica Corporation Lichtempfindliche Zusammensetzung, vorsensibilisierte Platten und Bilderzeugungsverfahren unter Verwendung dieser Platten
US7217499B2 (en) 2003-12-26 2007-05-15 Okamoto Chemical Industry Co., Ltd. Aluminum support for lithographic printing plate and base plate for lithographic printing plate
EP2042340A2 (de) 2007-09-27 2009-04-01 Fujifilm Corporation Mittel zum Schutz der Oberfläche einer lithografischen Druckplatte und Plattenherstellungsverfahren für Lithografiedruckplatten
EP2042338A2 (de) 2007-09-26 2009-04-01 Fujifilm Corporation Feuchtwasserzusammensetzung für Lithographiedruck und Offset-Druckverfahren für wärmehärtende Tinte
EP2042339A2 (de) 2007-09-26 2009-04-01 Fujifilm Corporation Feuchtwasserzusammensetzung für Lithographiedruck und Offset-Druckverfahren für wärmehärtende Tinte
EP2090430A2 (de) 2008-02-15 2009-08-19 Okamoto Chemical Industry Co., Ltd Lichtempfindliche Zusammensetzung und Lithographiedruckplatte damit
EP2098377A2 (de) 2008-03-07 2009-09-09 FUJIFILM Corporation Farbwerklösungszusammensetzung für lithografischen Druck und Offset-Rotationsdruckverfahren mit heiß trocknender Farbe
EP2233311A1 (de) 2009-03-25 2010-09-29 Fujifilm Corporation Farbwerklösungszusammensetzung für lithografischen Druck und Offset-Rotationsdruckverfahren mit heiß trocknender Farbe
EP2543518A2 (de) 2011-07-05 2013-01-09 Fujifilm Corporation Feuchtwasserzusammensetzung für Lithographiedruck

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5280022A (en) * 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
DE2616992A1 (de) * 1976-04-17 1977-11-03 Agfa Gevaert Ag Lichtempfindliches material zur herstellung von druckformen und aetzresistagen
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS5986046A (ja) * 1982-11-10 1984-05-18 Fuji Photo Film Co Ltd 感光性組成物
JPS5988734A (ja) * 1982-11-12 1984-05-22 Fuji Photo Film Co Ltd 感光性組成物
JPH0654390B2 (ja) * 1986-07-18 1994-07-20 東京応化工業株式会社 高耐熱性ポジ型ホトレジスト組成物
JPH02254450A (ja) * 1989-03-29 1990-10-15 Toshiba Corp レジスト
TW202504B (de) * 1990-02-23 1993-03-21 Sumitomo Chemical Co
DE4013575C2 (de) * 1990-04-27 1994-08-11 Basf Ag Verfahren zur Herstellung negativer Reliefkopien

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2146167A1 (de) * 1970-09-16 1972-03-23 Konismroku Photo Industry Co , Ltd, Tokio Lichtempfindliche Masse
JPS4863802A (de) * 1971-12-13 1973-09-05

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1113759A (en) * 1965-12-17 1968-05-15 Fuji Photo Film Co Ltd Lithographic printing plates
US3666473A (en) * 1970-10-06 1972-05-30 Ibm Positive photoresists for projection exposure

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2146167A1 (de) * 1970-09-16 1972-03-23 Konismroku Photo Industry Co , Ltd, Tokio Lichtempfindliche Masse
JPS4863802A (de) * 1971-12-13 1973-09-05

Cited By (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition
JPS6260701B2 (de) * 1978-06-16 1987-12-17 Fuji Photo Film Co Ltd
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
JPS5557841A (en) * 1978-10-20 1980-04-30 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS5654621B2 (de) * 1978-10-20 1981-12-26
JPS55129341A (en) * 1979-03-29 1980-10-07 Daicel Chem Ind Ltd Photosensitive covering composition
JPH0128370B2 (de) * 1980-04-02 1989-06-02 Tokyo Ohka Kogyo Co Ltd
JPS56140342A (en) * 1980-04-02 1981-11-02 Tokyo Ohka Kogyo Co Ltd Image forming composition and formation of resist image
JPS57157238A (en) * 1981-02-26 1982-09-28 Hoechst Ag Photosensitive mixture and copying material containing it
JPH0223859B2 (de) * 1981-02-26 1990-05-25 Hoechst Ag
JPS5997146A (ja) * 1982-11-26 1984-06-04 Asahi Shinbunsha:Kk 感光性平版印刷版
JPS6261946B2 (de) * 1982-11-26 1987-12-24 Asahi Shinbunsha Kk
JPS61193145A (ja) * 1985-02-21 1986-08-27 Japan Synthetic Rubber Co Ltd ネガ型レジスト
JPH0549096B2 (de) * 1985-02-21 1993-07-23 Japan Synthetic Rubber Co Ltd
JPS62136636A (ja) * 1985-12-10 1987-06-19 Nec Corp ネガレジスト
JPH0472221B2 (de) * 1985-12-10 1992-11-17 Nippon Electric Co
JPH02185556A (ja) * 1989-01-11 1990-07-19 Japan Synthetic Rubber Co Ltd 集積回路製造用感放射線性樹脂組成物
EP0410606A2 (de) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Polysiloxane und positiv arbeitende Resistmasse
US5407780A (en) * 1989-12-27 1995-04-18 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde
JPH02306245A (ja) * 1990-05-01 1990-12-19 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
EP0762208A2 (de) 1995-09-08 1997-03-12 Konica Corporation Lichtempfindliche Zusammensetzung, vorsensibilisierte Platten und Bilderzeugungsverfahren unter Verwendung dieser Platten
US7217499B2 (en) 2003-12-26 2007-05-15 Okamoto Chemical Industry Co., Ltd. Aluminum support for lithographic printing plate and base plate for lithographic printing plate
EP2042338A2 (de) 2007-09-26 2009-04-01 Fujifilm Corporation Feuchtwasserzusammensetzung für Lithographiedruck und Offset-Druckverfahren für wärmehärtende Tinte
EP2042339A2 (de) 2007-09-26 2009-04-01 Fujifilm Corporation Feuchtwasserzusammensetzung für Lithographiedruck und Offset-Druckverfahren für wärmehärtende Tinte
EP2042340A2 (de) 2007-09-27 2009-04-01 Fujifilm Corporation Mittel zum Schutz der Oberfläche einer lithografischen Druckplatte und Plattenherstellungsverfahren für Lithografiedruckplatten
EP2090430A2 (de) 2008-02-15 2009-08-19 Okamoto Chemical Industry Co., Ltd Lichtempfindliche Zusammensetzung und Lithographiedruckplatte damit
EP2098377A2 (de) 2008-03-07 2009-09-09 FUJIFILM Corporation Farbwerklösungszusammensetzung für lithografischen Druck und Offset-Rotationsdruckverfahren mit heiß trocknender Farbe
EP2233311A1 (de) 2009-03-25 2010-09-29 Fujifilm Corporation Farbwerklösungszusammensetzung für lithografischen Druck und Offset-Rotationsdruckverfahren mit heiß trocknender Farbe
EP2543518A2 (de) 2011-07-05 2013-01-09 Fujifilm Corporation Feuchtwasserzusammensetzung für Lithographiedruck

Also Published As

Publication number Publication date
DE2512933A1 (de) 1975-10-02
DE2512933C2 (de) 1983-11-10
JPS5723253B2 (de) 1982-05-18

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