JPH1168114A - 半導体装置およびその作製方法 - Google Patents
半導体装置およびその作製方法Info
- Publication number
- JPH1168114A JPH1168114A JP24606697A JP24606697A JPH1168114A JP H1168114 A JPH1168114 A JP H1168114A JP 24606697 A JP24606697 A JP 24606697A JP 24606697 A JP24606697 A JP 24606697A JP H1168114 A JPH1168114 A JP H1168114A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- semiconductor device
- impurity element
- channel formation
- formation region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Thin Film Transistor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24606697A JPH1168114A (ja) | 1997-08-26 | 1997-08-26 | 半導体装置およびその作製方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24606697A JPH1168114A (ja) | 1997-08-26 | 1997-08-26 | 半導体装置およびその作製方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH1168114A true JPH1168114A (ja) | 1999-03-09 |
| JPH1168114A5 JPH1168114A5 (cg-RX-API-DMAC7.html) | 2005-06-09 |
Family
ID=17142966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24606697A Withdrawn JPH1168114A (ja) | 1997-08-26 | 1997-08-26 | 半導体装置およびその作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1168114A (cg-RX-API-DMAC7.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100620888B1 (ko) * | 2004-01-29 | 2006-09-13 | 네오폴리((주)) | 비정질 반도체 박막의 결정화 방법을 이용한 박막 트랜지스터의 제조방법 |
| JP2008182124A (ja) * | 2007-01-25 | 2008-08-07 | Semiconductor Energy Lab Co Ltd | 表示装置 |
-
1997
- 1997-08-26 JP JP24606697A patent/JPH1168114A/ja not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100620888B1 (ko) * | 2004-01-29 | 2006-09-13 | 네오폴리((주)) | 비정질 반도체 박막의 결정화 방법을 이용한 박막 트랜지스터의 제조방법 |
| JP2008182124A (ja) * | 2007-01-25 | 2008-08-07 | Semiconductor Energy Lab Co Ltd | 表示装置 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Effective date: 20040826 Free format text: JAPANESE INTERMEDIATE CODE: A523 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20040826 |
|
| A977 | Report on retrieval |
Effective date: 20060623 Free format text: JAPANESE INTERMEDIATE CODE: A971007 |
|
| A131 | Notification of reasons for refusal |
Effective date: 20060711 Free format text: JAPANESE INTERMEDIATE CODE: A131 |
|
| A521 | Written amendment |
Effective date: 20060911 Free format text: JAPANESE INTERMEDIATE CODE: A523 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20080122 |
|
| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20080218 |