JPH11505374A - マクロセル・アレイのための静電気放電保護 - Google Patents
マクロセル・アレイのための静電気放電保護Info
- Publication number
- JPH11505374A JPH11505374A JP8534680A JP53468096A JPH11505374A JP H11505374 A JPH11505374 A JP H11505374A JP 8534680 A JP8534680 A JP 8534680A JP 53468096 A JP53468096 A JP 53468096A JP H11505374 A JPH11505374 A JP H11505374A
- Authority
- JP
- Japan
- Prior art keywords
- circuit
- scr
- terminal
- zener diode
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000003491 array Methods 0.000 title description 4
- 239000000758 substrate Substances 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 description 5
- 239000002184 metal Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000001052 transient effect Effects 0.000 description 2
- 101000668165 Homo sapiens RNA-binding motif, single-stranded-interacting protein 1 Proteins 0.000 description 1
- 102100039692 RNA-binding motif, single-stranded-interacting protein 1 Human genes 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0259—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using bipolar transistors as protective elements
- H01L27/0262—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using bipolar transistors as protective elements including a PNP transistor and a NPN transistor, wherein each of said transistors has its base coupled to the collector of the other transistor, e.g. silicon controlled rectifier [SCR] devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/74—Thyristor-type devices, e.g. having four-zone regenerative action
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0255—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using diodes as protective elements
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.静電気放電(ESD)の保護を有する回路であって、 電気的に互いに接続される複数の個々の回路セル(circuit cells)であって 、この各回路セルは入力/出力接続部(I/Oパッド)を有し、 該回路セルのまわりに延びる導電性の一対のバス線と、 該バス線へ該回路セルを電気的に接続する手段と、 間隔をおいて離した関係で該バス線間に接続される複数のESD保護回路と、 を備える回路。 2.該ESD保護回路は、該回路セルの一つのパッドへ近接した関係で該バス線 に該ESD保護回路の一つが接続されていて、間隔を置いた関係で該バス線に沿 って配置されている、請求項1に記載の回路。 3.該ESD保護回路は、該ESD保護回路の少なくとも1個が該回路セル一つ のI/Oパッドの構造部内にある該バス線へ接続されていて、該バス線の沿って 間隔を置いた関係で配置されている、請求項2に記載の回路。 4.該回路セルの入力および出力へESD保護を提供するために、ある回路セル のI/Oパッドへ接続される少なくとも1個のインターフェイス保護回路を、更 に備える請求項2に記載の回路。 5.少なくとも一対の電源パッドを基板上に含み、該電源パッドの各々が別個の バス線へ電気的に接続されている、請求項2に記載の回路。 6.該バス線に沿って間隔を置いて離れた関係で位置決めされ該基板上に複数対 の電源パッドを含み、各対の一方の電源パッドが該バス線の一つに電気的に接続 され、各対の他方の電源パッドが電気的に他方のバス線に接続される、請求項5 に記載の回路。 7.該ESD保護回路は、 シリコン制御整流器(SCR)と、 前記SCRと並列に電気的に接続され、該SCRをそれのオン状態へ誘発する ための電気的なトリガ手段と、 該SCRのクランプ電圧を制御するために該SCRと直列に電気的に接続され る第1のツェナダイオードと、 を備える請求項1に記載の回路。 8.該電気的なトリガ手段は、該SCRと並列に電気的に接続される第2のツェ ナダイオードを更に備える、請求項7に記載の回路。 9.該SCRは、第2の端子へ電気的に結合されるアノードと、第1の端子に電 気的に結合されるカソードとを有する、請求項8に記載の回路。 10.該第1のツェナダイオードは、該SCRのカソードと該第1の端子の間に 電気的に結合される、請求項9に記載の回路。 11.該第1のツェナダイオードは、該SCRのカソードへ電気的に結合される カソードと該第1の端子に電気的に結合されるアノードとを有する、請求項10 に記載の回路。 12.該第2のツェナダイオードと該第1の端子との間に直列して電気的に結合 される抵抗を更に備え、 該第2のツェナダイオードは、該SCRのアノードと該第2の端子とへ電気的 に結合されるカソードと該SCRのゲートへ電気的に結合されるアノードとを有 する、請求項11に記載の回路。 13.該第1のツェナダイオードは、該SCRのアノードと該第2の端子との間 に電気的に結合され、 該第1のツェナダイオードは、該SCRのアノードへ電気的に結合されるアノ ードと該第2の端子へ電気的に結合されるカソードとを有し、 該第2のツェナダイオードは、該第2の端子へ電気的に結合されるカソードと 該第1の端子へ電気的に結合されるアノードとを有し、 該第2のツェナダイオードのアノードと該第1の端子との間に直列して電気的 に結合される抵抗と、 該第2のツェナダイオードと該第2の端子との間に直列して電気的に接続され る第2の抵抗と、を備える請求項9に記載の回路。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/439,929 US5548135A (en) | 1995-05-12 | 1995-05-12 | Electrostatic discharge protection for an array of macro cells |
US08/439,929 | 1995-05-12 | ||
US439,929 | 1995-05-12 | ||
PCT/IB1996/000587 WO1996036988A2 (en) | 1995-05-12 | 1996-05-13 | Electrostatic discharge protection for an array of macro cells |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11505374A true JPH11505374A (ja) | 1999-05-18 |
JP3183892B2 JP3183892B2 (ja) | 2001-07-09 |
Family
ID=23746722
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53468096A Expired - Fee Related JP3183892B2 (ja) | 1995-05-12 | 1996-05-13 | マクロセル・アレイのための静電気放電保護 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5548135A (ja) |
EP (1) | EP0826243B1 (ja) |
JP (1) | JP3183892B2 (ja) |
KR (1) | KR100301549B1 (ja) |
DE (1) | DE69635018T2 (ja) |
WO (1) | WO1996036988A2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005017999A1 (ja) * | 2003-08-19 | 2005-02-24 | Sony Corporation | 半導体装置およびその製造方法 |
US6927956B1 (en) | 1999-07-28 | 2005-08-09 | Rohm Co., Ltd. | Semiconductor integrated circuit device with enhanced resistance to electrostatic breakdown |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0702402B1 (en) * | 1994-09-13 | 2003-01-15 | STMicroelectronics S.r.l. | Manufacturing method for integrated circuits and semiconductor wafer so obtained |
US5861660A (en) * | 1995-08-21 | 1999-01-19 | Stmicroelectronics, Inc. | Integrated-circuit die suitable for wafer-level testing and method for forming the same |
US5808947A (en) * | 1995-08-21 | 1998-09-15 | Sgs-Thomson Microelectronics, Inc. | Integrated circuit that supports and method for wafer-level testing |
US6477687B1 (en) * | 1998-06-01 | 2002-11-05 | Nvidia U.S. Investment Company | Method of embedding RAMS and other macrocells in the core of an integrated circuit chip |
US6242814B1 (en) * | 1998-07-31 | 2001-06-05 | Lsi Logic Corporation | Universal I/O pad structure for in-line or staggered wire bonding or arrayed flip-chip assembly |
US6947273B2 (en) * | 2001-01-29 | 2005-09-20 | Primarion, Inc. | Power, ground, and routing scheme for a microprocessor power regulator |
EP1321984A3 (en) * | 2001-08-24 | 2004-01-14 | STMicroelectronics Limited | Semiconductor input/output circuit arrangement |
FR2831328A1 (fr) | 2001-10-23 | 2003-04-25 | St Microelectronics Sa | Protection d'un circuit integre contre des decharges electrostatiques et autres surtensions |
US7782398B2 (en) * | 2002-09-04 | 2010-08-24 | Chan Thomas M | Display processor integrated circuit with on-chip programmable logic for implementing custom enhancement functions |
US7202908B2 (en) * | 2002-09-04 | 2007-04-10 | Darien K. Wallace | Deinterlacer using both low angle and high angle spatial interpolation |
US7480010B2 (en) * | 2002-09-04 | 2009-01-20 | Denace Enterprise Co., L.L.C. | Customizable ASIC with substantially non-customizable portion that supplies pixel data to a mask-programmable portion in multiple color space formats |
US7291930B2 (en) * | 2005-02-23 | 2007-11-06 | Faraday Technology Corp. | Input and output circuit of an integrated circuit chip |
JP2008130994A (ja) * | 2006-11-24 | 2008-06-05 | Toshiba Corp | 静電保護回路 |
JP2008147376A (ja) * | 2006-12-08 | 2008-06-26 | Toshiba Corp | 半導体装置 |
US8247845B2 (en) * | 2008-01-28 | 2012-08-21 | Infineon Technologies Ag | Electrostatic discharge (ESD) protection circuit placement in semiconductor devices |
US7838959B2 (en) * | 2008-01-29 | 2010-11-23 | Infineon Technologies Ag | Radio frequency (RF) circuit placement in semiconductor devices |
EP2789012B1 (en) * | 2011-12-08 | 2020-02-05 | Sofics BVBA | A high holding voltage, mixed-voltage domain electrostatic discharge clamp |
US8680573B2 (en) | 2012-04-25 | 2014-03-25 | International Business Machines Corporation | Diode-triggered silicon controlled rectifier with an integrated diode |
US8946766B2 (en) | 2013-02-27 | 2015-02-03 | International Business Machines Corporation | Bi-directional silicon controlled rectifier structure |
FR3054722B1 (fr) * | 2016-07-26 | 2018-08-17 | Stmicroelectronics (Rousset) Sas | Structure de protection d'un circuit integre contre les decharges electrostatiques |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3904931A (en) * | 1973-08-03 | 1975-09-09 | Rca Corp | Overvoltage protection circuit |
JPS6070742A (ja) * | 1983-09-27 | 1985-04-22 | Toshiba Corp | マスタ・スライス型半導体装置 |
JPS61218143A (ja) * | 1985-03-25 | 1986-09-27 | Hitachi Ltd | 半導体集積回路装置 |
GB8621839D0 (en) * | 1986-09-10 | 1986-10-15 | British Aerospace | Electrostatic discharge protection circuit |
US5043782A (en) * | 1990-05-08 | 1991-08-27 | David Sarnoff Research Center, Inc. | Low voltage triggered snap-back device |
US5237395A (en) * | 1991-05-28 | 1993-08-17 | Western Digital Corporation | Power rail ESD protection circuit |
US5535084A (en) * | 1992-07-24 | 1996-07-09 | Kawasaki Steel Corporation | Semiconductor integrated circuit having protection circuits |
JP3351440B2 (ja) * | 1992-07-24 | 2002-11-25 | 川崎マイクロエレクトロニクス株式会社 | 半導体集積回路 |
US5336908A (en) * | 1992-08-26 | 1994-08-09 | Micron Semiconductor, Inc. | Input EDS protection circuit |
JP2884938B2 (ja) * | 1992-09-07 | 1999-04-19 | 日本電気株式会社 | 半導体装置 |
US5361185A (en) * | 1993-02-19 | 1994-11-01 | Advanced Micro Devices, Inc. | Distributed VCC/VSS ESD clamp structure |
US5311391A (en) * | 1993-05-04 | 1994-05-10 | Hewlett-Packard Company | Electrostatic discharge protection circuit with dynamic triggering |
US5343053A (en) * | 1993-05-21 | 1994-08-30 | David Sarnoff Research Center Inc. | SCR electrostatic discharge protection for integrated circuits |
-
1995
- 1995-05-12 US US08/439,929 patent/US5548135A/en not_active Expired - Lifetime
-
1996
- 1996-05-13 WO PCT/IB1996/000587 patent/WO1996036988A2/en active IP Right Grant
- 1996-05-13 JP JP53468096A patent/JP3183892B2/ja not_active Expired - Fee Related
- 1996-05-13 KR KR1019970708186A patent/KR100301549B1/ko not_active IP Right Cessation
- 1996-05-13 EP EP96916261A patent/EP0826243B1/en not_active Expired - Lifetime
- 1996-05-13 DE DE69635018T patent/DE69635018T2/de not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6927956B1 (en) | 1999-07-28 | 2005-08-09 | Rohm Co., Ltd. | Semiconductor integrated circuit device with enhanced resistance to electrostatic breakdown |
US6972938B2 (en) | 1999-07-28 | 2005-12-06 | Rohm Co., Ltd. | Semiconductor integrated circuit device with enhanced resistance to electrostatic breakdown |
US7154720B2 (en) | 1999-07-28 | 2006-12-26 | Rohm Co., Ltd. | Semiconductor integrated circuit device with enhanced resistance to electrostatic breakdown |
WO2005017999A1 (ja) * | 2003-08-19 | 2005-02-24 | Sony Corporation | 半導体装置およびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP3183892B2 (ja) | 2001-07-09 |
EP0826243A2 (en) | 1998-03-04 |
WO1996036988A3 (en) | 1997-01-16 |
DE69635018T2 (de) | 2006-06-01 |
EP0826243A4 (en) | 2000-07-19 |
WO1996036988A2 (en) | 1996-11-21 |
US5548135A (en) | 1996-08-20 |
EP0826243B1 (en) | 2005-08-03 |
KR100301549B1 (ko) | 2001-09-22 |
KR19990014842A (ko) | 1999-02-25 |
DE69635018D1 (de) | 2005-09-08 |
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