JPH1138613A5 - - Google Patents

Info

Publication number
JPH1138613A5
JPH1138613A5 JP1997198791A JP19879197A JPH1138613A5 JP H1138613 A5 JPH1138613 A5 JP H1138613A5 JP 1997198791 A JP1997198791 A JP 1997198791A JP 19879197 A JP19879197 A JP 19879197A JP H1138613 A5 JPH1138613 A5 JP H1138613A5
Authority
JP
Japan
Prior art keywords
group
radiation
carbon atoms
hydrogen atom
coloring composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997198791A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1138613A (ja
JP3929556B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP19879197A priority Critical patent/JP3929556B2/ja
Priority claimed from JP19879197A external-priority patent/JP3929556B2/ja
Priority to KR1019980029871A priority patent/KR100535902B1/ko
Publication of JPH1138613A publication Critical patent/JPH1138613A/ja
Publication of JPH1138613A5 publication Critical patent/JPH1138613A5/ja
Application granted granted Critical
Publication of JP3929556B2 publication Critical patent/JP3929556B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP19879197A 1997-07-24 1997-07-24 感放射線性着色組成物 Expired - Fee Related JP3929556B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP19879197A JP3929556B2 (ja) 1997-07-24 1997-07-24 感放射線性着色組成物
KR1019980029871A KR100535902B1 (ko) 1997-07-24 1998-07-24 감방사선성착색조성물

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19879197A JP3929556B2 (ja) 1997-07-24 1997-07-24 感放射線性着色組成物

Publications (3)

Publication Number Publication Date
JPH1138613A JPH1138613A (ja) 1999-02-12
JPH1138613A5 true JPH1138613A5 (enExample) 2005-06-30
JP3929556B2 JP3929556B2 (ja) 2007-06-13

Family

ID=16396976

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19879197A Expired - Fee Related JP3929556B2 (ja) 1997-07-24 1997-07-24 感放射線性着色組成物

Country Status (2)

Country Link
JP (1) JP3929556B2 (enExample)
KR (1) KR100535902B1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100728520B1 (ko) * 1999-08-27 2007-06-14 도요 잉키 세이조 가부시끼가이샤 컬러필터 및 컬러 액정 디스플레이 디바이스
TW460714B (en) * 1999-12-09 2001-10-21 Toray Industries Color filter and liquid crystal display device
JP4130102B2 (ja) * 2001-09-18 2008-08-06 富士フイルム株式会社 感放射線性着色組成物
JP2006276640A (ja) * 2005-03-30 2006-10-12 Taiyo Ink Mfg Ltd 感光性ペースト及びそれを用いて得られる焼成物パターン
JP2006301101A (ja) * 2005-04-18 2006-11-02 Fujifilm Electronic Materials Co Ltd 遮光・反射防止積層膜及びその形成方法、並びにそれを有する固体撮像素子及びその製造方法
EP1975702B1 (en) * 2007-03-29 2013-07-24 FUJIFILM Corporation Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device
JP5355069B2 (ja) 2007-12-28 2013-11-27 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
JP7687951B2 (ja) * 2019-08-28 2025-06-03 日本ポリテック株式会社 感光性樹脂組成物、及び有機ｅｌ素子隔壁

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3807378A1 (de) * 1988-03-07 1989-09-21 Hoechst Ag Durch 4,6-bis-trichlormethyl-s-triazin-2-ylgruppen substituierte aromatische verbindungen, verfahren zu ihrer herstellung und ihre verwendung in lichtempfindlichen gemischen
DE68922556T2 (de) * 1988-09-07 1996-01-18 Minnesota Mining & Mfg Eine Monomergruppe enthaltende Halogenmethyl-1,3,5-Triazine.
DE3912652A1 (de) * 1989-04-18 1990-10-25 Hoechst Ag Lichtempfindliche bis-trichlormethyl-s-triazine, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
JPH05281747A (ja) * 1992-04-03 1993-10-29 Fuji Photo Film Co Ltd 感光性転写シート
JP3471425B2 (ja) * 1994-05-30 2003-12-02 三菱化学株式会社 カラーフィルター用重合組成物
JP3507219B2 (ja) * 1995-09-21 2004-03-15 東洋合成工業株式会社 ネガ型レジスト組成物及びパターン形成方法

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