JP3929556B2 - 感放射線性着色組成物 - Google Patents

感放射線性着色組成物 Download PDF

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Publication number
JP3929556B2
JP3929556B2 JP19879197A JP19879197A JP3929556B2 JP 3929556 B2 JP3929556 B2 JP 3929556B2 JP 19879197 A JP19879197 A JP 19879197A JP 19879197 A JP19879197 A JP 19879197A JP 3929556 B2 JP3929556 B2 JP 3929556B2
Authority
JP
Japan
Prior art keywords
group
radiation
pigment
acid
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP19879197A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1138613A5 (enExample
JPH1138613A (ja
Inventor
信雄 鈴木
務 沖田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Electronic Materials Co Ltd
Fujifilm Corp
Original Assignee
Fujifilm Electronic Materials Co Ltd
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Electronic Materials Co Ltd, Fujifilm Corp filed Critical Fujifilm Electronic Materials Co Ltd
Priority to JP19879197A priority Critical patent/JP3929556B2/ja
Priority to KR1019980029871A priority patent/KR100535902B1/ko
Publication of JPH1138613A publication Critical patent/JPH1138613A/ja
Publication of JPH1138613A5 publication Critical patent/JPH1138613A5/ja
Application granted granted Critical
Publication of JP3929556B2 publication Critical patent/JP3929556B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0041—Optical brightening agents, organic pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
JP19879197A 1997-07-24 1997-07-24 感放射線性着色組成物 Expired - Fee Related JP3929556B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP19879197A JP3929556B2 (ja) 1997-07-24 1997-07-24 感放射線性着色組成物
KR1019980029871A KR100535902B1 (ko) 1997-07-24 1998-07-24 감방사선성착색조성물

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19879197A JP3929556B2 (ja) 1997-07-24 1997-07-24 感放射線性着色組成物

Publications (3)

Publication Number Publication Date
JPH1138613A JPH1138613A (ja) 1999-02-12
JPH1138613A5 JPH1138613A5 (enExample) 2005-06-30
JP3929556B2 true JP3929556B2 (ja) 2007-06-13

Family

ID=16396976

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19879197A Expired - Fee Related JP3929556B2 (ja) 1997-07-24 1997-07-24 感放射線性着色組成物

Country Status (2)

Country Link
JP (1) JP3929556B2 (enExample)
KR (1) KR100535902B1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6280890B1 (en) * 1999-08-27 2001-08-28 Toyo Ink Mfg. Co., Ltd. Color filter and color liquid crystal display device
US6859243B2 (en) * 1999-12-09 2005-02-22 Toray Industries, Inc. Color filter and liquid crystal display device
JP4130102B2 (ja) * 2001-09-18 2008-08-06 富士フイルム株式会社 感放射線性着色組成物
JP2006276640A (ja) * 2005-03-30 2006-10-12 Taiyo Ink Mfg Ltd 感光性ペースト及びそれを用いて得られる焼成物パターン
JP2006301101A (ja) * 2005-04-18 2006-11-02 Fujifilm Electronic Materials Co Ltd 遮光・反射防止積層膜及びその形成方法、並びにそれを有する固体撮像素子及びその製造方法
EP1975702B1 (en) * 2007-03-29 2013-07-24 FUJIFILM Corporation Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device
JP5355069B2 (ja) * 2007-12-28 2013-11-27 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
WO2021039020A1 (ja) * 2019-08-28 2021-03-04 昭和電工株式会社 感光性樹脂組成物、及び有機ｅｌ素子隔壁

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3807378A1 (de) * 1988-03-07 1989-09-21 Hoechst Ag Durch 4,6-bis-trichlormethyl-s-triazin-2-ylgruppen substituierte aromatische verbindungen, verfahren zu ihrer herstellung und ihre verwendung in lichtempfindlichen gemischen
EP0359430B1 (en) * 1988-09-07 1995-05-10 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a monomeric moiety
DE3912652A1 (de) * 1989-04-18 1990-10-25 Hoechst Ag Lichtempfindliche bis-trichlormethyl-s-triazine, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
JPH05281747A (ja) * 1992-04-03 1993-10-29 Fuji Photo Film Co Ltd 感光性転写シート
JP3471425B2 (ja) * 1994-05-30 2003-12-02 三菱化学株式会社 カラーフィルター用重合組成物
JP3507219B2 (ja) * 1995-09-21 2004-03-15 東洋合成工業株式会社 ネガ型レジスト組成物及びパターン形成方法

Also Published As

Publication number Publication date
KR100535902B1 (ko) 2006-09-13
JPH1138613A (ja) 1999-02-12
KR19990014161A (ko) 1999-02-25

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