JPH113856A - 投影露光方法及び投影露光装置 - Google Patents

投影露光方法及び投影露光装置

Info

Publication number
JPH113856A
JPH113856A JP9171043A JP17104397A JPH113856A JP H113856 A JPH113856 A JP H113856A JP 9171043 A JP9171043 A JP 9171043A JP 17104397 A JP17104397 A JP 17104397A JP H113856 A JPH113856 A JP H113856A
Authority
JP
Japan
Prior art keywords
projection exposure
exposure apparatus
projection
vertical
magnification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9171043A
Other languages
English (en)
Japanese (ja)
Other versions
JPH113856A5 (enrdf_load_stackoverflow
Inventor
Hideo Haneda
英夫 羽田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP9171043A priority Critical patent/JPH113856A/ja
Publication of JPH113856A publication Critical patent/JPH113856A/ja
Publication of JPH113856A5 publication Critical patent/JPH113856A5/ja
Withdrawn legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP9171043A 1997-06-11 1997-06-11 投影露光方法及び投影露光装置 Withdrawn JPH113856A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9171043A JPH113856A (ja) 1997-06-11 1997-06-11 投影露光方法及び投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9171043A JPH113856A (ja) 1997-06-11 1997-06-11 投影露光方法及び投影露光装置

Publications (2)

Publication Number Publication Date
JPH113856A true JPH113856A (ja) 1999-01-06
JPH113856A5 JPH113856A5 (enrdf_load_stackoverflow) 2005-04-14

Family

ID=15916038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9171043A Withdrawn JPH113856A (ja) 1997-06-11 1997-06-11 投影露光方法及び投影露光装置

Country Status (1)

Country Link
JP (1) JPH113856A (enrdf_load_stackoverflow)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005286064A (ja) * 2004-03-29 2005-10-13 Advantest Corp 荷電粒子ビーム露光装置、荷電粒子ビーム露光装置の基準用基板、荷電粒子ビーム露光装置の補正方法、及び電子装置の製造方法
JP2009124139A (ja) * 2007-11-09 2009-06-04 Asml Netherlands Bv デバイス製造方法およびリソグラフィ装置、ならびに、コンピュータプログラム製品
US8009271B2 (en) 2004-12-16 2011-08-30 Nikon Corporation Projection optical system, exposure apparatus, exposure system, and exposure method
JP2013511843A (ja) * 2009-11-20 2013-04-04 コーニング インコーポレイテッド リソグラフィック結像システムの倍率制御
TWI400576B (zh) * 2005-04-08 2013-07-01 Ushio Electric Inc Exposure device
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
JP2005286064A (ja) * 2004-03-29 2005-10-13 Advantest Corp 荷電粒子ビーム露光装置、荷電粒子ビーム露光装置の基準用基板、荷電粒子ビーム露光装置の補正方法、及び電子装置の製造方法
US8009271B2 (en) 2004-12-16 2011-08-30 Nikon Corporation Projection optical system, exposure apparatus, exposure system, and exposure method
TWI400576B (zh) * 2005-04-08 2013-07-01 Ushio Electric Inc Exposure device
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US8218130B2 (en) 2007-11-09 2012-07-10 Asml Netherlands B.V. Device manufacturing method and lithographic apparatus,and computer program product
JP2009124139A (ja) * 2007-11-09 2009-06-04 Asml Netherlands Bv デバイス製造方法およびリソグラフィ装置、ならびに、コンピュータプログラム製品
JP2015180945A (ja) * 2009-11-20 2015-10-15 コーニング インコーポレイテッド リソグラフィック結像システムの倍率制御
JP2013511843A (ja) * 2009-11-20 2013-04-04 コーニング インコーポレイテッド リソグラフィック結像システムの倍率制御

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