JPH113856A5 - - Google Patents

Info

Publication number
JPH113856A5
JPH113856A5 JP1997171043A JP17104397A JPH113856A5 JP H113856 A5 JPH113856 A5 JP H113856A5 JP 1997171043 A JP1997171043 A JP 1997171043A JP 17104397 A JP17104397 A JP 17104397A JP H113856 A5 JPH113856 A5 JP H113856A5
Authority
JP
Japan
Prior art keywords
projection
correction mechanism
projection exposure
aspect ratio
magnification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1997171043A
Other languages
English (en)
Japanese (ja)
Other versions
JPH113856A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9171043A priority Critical patent/JPH113856A/ja
Priority claimed from JP9171043A external-priority patent/JPH113856A/ja
Publication of JPH113856A publication Critical patent/JPH113856A/ja
Publication of JPH113856A5 publication Critical patent/JPH113856A5/ja
Withdrawn legal-status Critical Current

Links

JP9171043A 1997-06-11 1997-06-11 投影露光方法及び投影露光装置 Withdrawn JPH113856A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9171043A JPH113856A (ja) 1997-06-11 1997-06-11 投影露光方法及び投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9171043A JPH113856A (ja) 1997-06-11 1997-06-11 投影露光方法及び投影露光装置

Publications (2)

Publication Number Publication Date
JPH113856A JPH113856A (ja) 1999-01-06
JPH113856A5 true JPH113856A5 (enrdf_load_stackoverflow) 2005-04-14

Family

ID=15916038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9171043A Withdrawn JPH113856A (ja) 1997-06-11 1997-06-11 投影露光方法及び投影露光装置

Country Status (1)

Country Link
JP (1) JPH113856A (enrdf_load_stackoverflow)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101547077B1 (ko) 2003-04-09 2015-08-25 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI573175B (zh) 2003-10-28 2017-03-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
TWI389174B (zh) 2004-02-06 2013-03-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
JP2005286064A (ja) * 2004-03-29 2005-10-13 Advantest Corp 荷電粒子ビーム露光装置、荷電粒子ビーム露光装置の基準用基板、荷電粒子ビーム露光装置の補正方法、及び電子装置の製造方法
US8009271B2 (en) 2004-12-16 2011-08-30 Nikon Corporation Projection optical system, exposure apparatus, exposure system, and exposure method
JP4419900B2 (ja) * 2005-04-08 2010-02-24 ウシオ電機株式会社 露光装置
KR20180128526A (ko) 2005-05-12 2018-12-03 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 디바이스 제조 방법
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
NL1036108A1 (nl) * 2007-11-09 2009-05-12 Asml Netherlands Bv Device Manufacturing Method and Lithographic Apparatus, and Computer Program Product.
US8922750B2 (en) * 2009-11-20 2014-12-30 Corning Incorporated Magnification control for lithographic imaging system

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