JPH1131639A - 半導体製造装置 - Google Patents

半導体製造装置

Info

Publication number
JPH1131639A
JPH1131639A JP9185454A JP18545497A JPH1131639A JP H1131639 A JPH1131639 A JP H1131639A JP 9185454 A JP9185454 A JP 9185454A JP 18545497 A JP18545497 A JP 18545497A JP H1131639 A JPH1131639 A JP H1131639A
Authority
JP
Japan
Prior art keywords
wafer
dummy
boat
plate
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9185454A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1131639A5 (enExample
Inventor
Kazuto Ikeda
和人 池田
Harunobu Sakuma
春信 佐久間
Hisashi Yoshida
久志 吉田
Yukinori Yuya
幸則 油谷
Tomoshi Taniyama
智志 谷山
Kazuhiro Nakagome
和広 中込
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Denki Electric Inc
Original Assignee
Kokusai Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Co Ltd filed Critical Kokusai Electric Co Ltd
Priority to JP9185454A priority Critical patent/JPH1131639A/ja
Publication of JPH1131639A publication Critical patent/JPH1131639A/ja
Publication of JPH1131639A5 publication Critical patent/JPH1131639A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
JP9185454A 1997-07-10 1997-07-10 半導体製造装置 Pending JPH1131639A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9185454A JPH1131639A (ja) 1997-07-10 1997-07-10 半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9185454A JPH1131639A (ja) 1997-07-10 1997-07-10 半導体製造装置

Publications (2)

Publication Number Publication Date
JPH1131639A true JPH1131639A (ja) 1999-02-02
JPH1131639A5 JPH1131639A5 (enExample) 2005-02-24

Family

ID=16171085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9185454A Pending JPH1131639A (ja) 1997-07-10 1997-07-10 半導体製造装置

Country Status (1)

Country Link
JP (1) JPH1131639A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003060968A1 (fr) * 2001-12-27 2003-07-24 Tokyo Electron Limited Nacelle pour traitement thermique et equipement de traitement thermique vertical
JPWO2004006316A1 (ja) * 2002-07-05 2005-11-10 東京エレクトロン株式会社 基板処理装置のクリーニング方法および基板処理装置
CN103377906A (zh) * 2012-04-17 2013-10-30 上海华虹Nec电子有限公司 氮氧化硅薄膜的制造方法
JP2014045168A (ja) * 2012-07-30 2014-03-13 Tokyo Electron Ltd 不純物拡散方法
CN107208306A (zh) * 2015-02-03 2017-09-26 胜高股份有限公司 单晶提拉装置的清洗方法及其清洗用具和单晶的制造方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003060968A1 (fr) * 2001-12-27 2003-07-24 Tokyo Electron Limited Nacelle pour traitement thermique et equipement de traitement thermique vertical
US6966771B2 (en) 2001-12-27 2005-11-22 Tokyo Electron Limited Boat for heat treatment and vertical heat treatment equipment
CN1320604C (zh) * 2001-12-27 2007-06-06 东京毅力科创株式会社 热处理用舟式容器和立式热处理装置
JPWO2004006316A1 (ja) * 2002-07-05 2005-11-10 東京エレクトロン株式会社 基板処理装置のクリーニング方法および基板処理装置
CN103377906A (zh) * 2012-04-17 2013-10-30 上海华虹Nec电子有限公司 氮氧化硅薄膜的制造方法
JP2014045168A (ja) * 2012-07-30 2014-03-13 Tokyo Electron Ltd 不純物拡散方法
CN107208306A (zh) * 2015-02-03 2017-09-26 胜高股份有限公司 单晶提拉装置的清洗方法及其清洗用具和单晶的制造方法

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