JPH11286475A5 - - Google Patents

Info

Publication number
JPH11286475A5
JPH11286475A5 JP1998376253A JP37625398A JPH11286475A5 JP H11286475 A5 JPH11286475 A5 JP H11286475A5 JP 1998376253 A JP1998376253 A JP 1998376253A JP 37625398 A JP37625398 A JP 37625398A JP H11286475 A5 JPH11286475 A5 JP H11286475A5
Authority
JP
Japan
Prior art keywords
photoprecursor
nitrobenzyl
photolabile
nitrobenzyl group
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1998376253A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11286475A (ja
Filing date
Publication date
Priority claimed from GBGB9727186.0A external-priority patent/GB9727186D0/en
Application filed filed Critical
Publication of JPH11286475A publication Critical patent/JPH11286475A/ja
Publication of JPH11286475A5 publication Critical patent/JPH11286475A5/ja
Withdrawn legal-status Critical Current

Links

JP10376253A 1997-12-24 1998-12-24 画像形成系に適用可能な光活性材料 Withdrawn JPH11286475A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB9727186.0 1997-12-24
GBGB9727186.0A GB9727186D0 (en) 1997-12-24 1997-12-24 Photoactive materials applicable to imaging systems

Publications (2)

Publication Number Publication Date
JPH11286475A JPH11286475A (ja) 1999-10-19
JPH11286475A5 true JPH11286475A5 (https=) 2006-02-16

Family

ID=10824126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10376253A Withdrawn JPH11286475A (ja) 1997-12-24 1998-12-24 画像形成系に適用可能な光活性材料

Country Status (4)

Country Link
US (2) US6171756B1 (https=)
EP (1) EP0926555A1 (https=)
JP (1) JPH11286475A (https=)
GB (2) GB9727186D0 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0601031D0 (en) * 2006-01-18 2006-03-01 Novartis Ag Organic compounds
US7838198B2 (en) * 2007-12-13 2010-11-23 International Business Machines Corporation Photoresist compositions and method for multiple exposures with multiple layer resist systems
US7838200B2 (en) * 2007-12-13 2010-11-23 International Business Machines Corporation Photoresist compositions and method for multiple exposures with multiple layer resist systems
US20110172421A1 (en) * 2008-10-02 2011-07-14 Showa Denko K.K. N-(alpha-AROMATIC GROUP-SUBSTITUTED-2-NITRO-4,5-DIALKOXYBENZYLOXYCARBONYL)AMINE COMPOUND AND PROCESS FOR PRODUCING THE SAME
MX342195B (es) 2011-09-13 2016-09-20 Lasergen Inc Nucleótidos de terminación de rápida fotodescomposición 5-metoxi, 3' -oh no bloqueados y métodos para secuenciación de ácido nucleico.
WO2014068599A2 (en) * 2012-11-02 2014-05-08 Hetero Research Foundation Process for pralatrexate
US10617759B2 (en) 2016-03-01 2020-04-14 Trustees Of Boston University Light-stimulated release of cargo from oligonucleotides
CN117683545B (zh) * 2023-12-07 2026-03-06 西京学院 一种基于光可聚合单体和负性向列型液晶体系的反式电控调光膜及其制备方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5219700A (en) * 1988-10-03 1993-06-15 Mitsubishi Kasei Corporation Photosensitive composition containing 1,2-naphthoquinone-2-diazido-4-sulfonic acid ester, alkali-soluble resin, halomethyloxadiazole compound and a dye
JPH04362642A (ja) * 1991-06-10 1992-12-15 Konica Corp 感光性組成物
EP0555749B1 (en) * 1992-02-14 1999-05-19 Shipley Company Inc. Radiation sensitive compositions and processes
JP2654339B2 (ja) * 1992-11-24 1997-09-17 インターナショナル・ビジネス・マシーンズ・コーポレイション 感光性レジスト組成物及び基板上にレジスト像を形成する方法
US5691100A (en) * 1992-12-25 1997-11-25 Hoechst Japan Limited Pattern forming material including photoacid and photobase generators for large exposure latitude
JPH0753499A (ja) * 1993-08-11 1995-02-28 Aibaitsu Kk ビス‐［［（２‐ニトロ‐４，５‐ジメトキシベンジル）オキシ］カルボニル］‐イソホロンジアミンおよびその利用方法
CA2171472C (en) * 1994-07-11 2002-02-26 Konica Corporation Presensitized lithographic printing plate and method for preparing lithographic printing plate
US5449834A (en) * 1994-07-13 1995-09-12 Ppg Industries, Inc. Method of synthesizing 2,6-dinitro benzyl compounds
US5600035A (en) * 1994-07-13 1997-02-04 Ppg Industries, Inc. Positive photoactive compounds based on 2,6-dinitro benzyl groups and 2,5-dinitro benzyl groups
JP3157692B2 (ja) * 1995-02-14 2001-04-16 日東電工株式会社 耐熱性フォトレジスト組成物およびネガ型パターン形成方法
JPH09127696A (ja) * 1995-11-07 1997-05-16 Hitachi Ltd ポジ型レジスト及びレリーフ構造体の製造方法
JPH09263635A (ja) * 1996-03-27 1997-10-07 Sannopuko Kk 硬化性樹脂組成物
JPH09268228A (ja) * 1996-04-01 1997-10-14 Dow Corning Asia Ltd 紫外線硬化性組成物およびこれを用いた硬化物パターンの形成方法
JP3705657B2 (ja) * 1996-09-05 2005-10-12 信越化学工業株式会社 Ｎ，ｎ−ジアルキルカルバミン酸２−ニトロベンジルエステル類の製造方法

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