ATE263680T1 - Ir- und uv-strahlungsempfindliche zusammensetzung und offsetdruckplatte - Google Patents
Ir- und uv-strahlungsempfindliche zusammensetzung und offsetdruckplatteInfo
- Publication number
- ATE263680T1 ATE263680T1 AT99201445T AT99201445T ATE263680T1 AT E263680 T1 ATE263680 T1 AT E263680T1 AT 99201445 T AT99201445 T AT 99201445T AT 99201445 T AT99201445 T AT 99201445T AT E263680 T1 ATE263680 T1 AT E263680T1
- Authority
- AT
- Austria
- Prior art keywords
- sensitive composition
- printing plate
- offset printing
- radiation sensitive
- diazo
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
- B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT98MI001023A IT1299220B1 (it) | 1998-05-12 | 1998-05-12 | Composizione sensibile sia a radiazioni ir che a radiazioni uv e lastra litografica |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE263680T1 true ATE263680T1 (de) | 2004-04-15 |
Family
ID=11379998
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT99201445T ATE263680T1 (de) | 1998-05-12 | 1999-05-10 | Ir- und uv-strahlungsempfindliche zusammensetzung und offsetdruckplatte |
Country Status (12)
Country | Link |
---|---|
US (1) | US6376150B1 (de) |
EP (1) | EP0956948B1 (de) |
JP (1) | JP2000029214A (de) |
KR (1) | KR19990088227A (de) |
CN (1) | CN1185547C (de) |
AT (1) | ATE263680T1 (de) |
CA (1) | CA2271834A1 (de) |
DE (1) | DE69916162T2 (de) |
ES (1) | ES2216435T3 (de) |
HK (1) | HK1023310A1 (de) |
IT (1) | IT1299220B1 (de) |
ZA (1) | ZA993248B (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4132547B2 (ja) * | 2000-03-01 | 2008-08-13 | 富士フイルム株式会社 | 画像形成材料及びそれを用いた平版印刷版原版 |
US6458511B1 (en) * | 2000-06-07 | 2002-10-01 | Kodak Polychrome Graphics Llc | Thermally imageable positive-working lithographic printing plate precursor and method for imaging |
US6436601B1 (en) * | 2001-06-25 | 2002-08-20 | Citiplate, Inc. | Thermally sensitive coating compositions containing mixed diazo novolaks useful for lithographic elements |
US7097956B2 (en) * | 2003-01-27 | 2006-08-29 | Eastman Kodak Company | Imageable element containing silicate-coated polymer particle |
US6790582B1 (en) * | 2003-04-01 | 2004-09-14 | Clariant Finance Bvi Limited | Photoresist compositions |
US7205084B2 (en) * | 2003-12-18 | 2007-04-17 | Agfa-Gevaert | Heat-sensitive lithographic printing plate precursor |
US7338745B2 (en) * | 2006-01-23 | 2008-03-04 | Eastman Kodak Company | Multilayer imageable element with improved chemical resistance |
CN101611350B (zh) * | 2007-02-13 | 2012-08-08 | 东丽株式会社 | 正型感光性树脂组合物 |
JP4790682B2 (ja) * | 2007-09-28 | 2011-10-12 | 富士フイルム株式会社 | 平版印刷版原版 |
CN102207677B (zh) * | 2010-03-29 | 2012-10-24 | 品青企业股份有限公司 | 辐射敏感组成物 |
US9547238B2 (en) | 2012-10-16 | 2017-01-17 | Eugen Pavel | Photoresist with rare-earth sensitizers |
CN107797384B (zh) * | 2016-09-07 | 2020-10-09 | 上海飞凯电子材料有限公司 | 一种感光树脂、正性光刻胶及应用 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3100077A1 (de) * | 1981-01-03 | 1982-08-05 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters |
US5753406A (en) * | 1988-10-18 | 1998-05-19 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive resin composition |
DE4426820A1 (de) * | 1993-07-29 | 1995-02-02 | Fuji Photo Film Co Ltd | Bilderzeugungsmaterial und Bilderzeugungsverfahren |
EP0672954B1 (de) | 1994-03-14 | 1999-09-15 | Kodak Polychrome Graphics LLC | Strahlungsempfindliche Zusammensetzung, enthaltend ein Resolharz, ein Novolakharz, einen Infrarotabsorber und ein Triazin, und seine Verwendung in lithographischen Druckplatten |
GB9426206D0 (en) * | 1994-12-23 | 1995-02-22 | Horsell Plc | Lithographic plate |
US5491046A (en) * | 1995-02-10 | 1996-02-13 | Eastman Kodak Company | Method of imaging a lithographic printing plate |
EP0737895B1 (de) * | 1995-04-10 | 1999-09-08 | Shipley Company LLC | Gemische von photoaktiven Zusammensetzungen enthaltendes Fotoresist |
US5641608A (en) * | 1995-10-23 | 1997-06-24 | Macdermid, Incorporated | Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates |
CN1078132C (zh) | 1996-04-23 | 2002-01-23 | 霍西尔绘图工业有限公司 | 热敏组合物及用其制造平版印刷版型的方法 |
JP3814961B2 (ja) | 1996-08-06 | 2006-08-30 | 三菱化学株式会社 | ポジ型感光性印刷版 |
EP0833204A1 (de) | 1996-09-30 | 1998-04-01 | Eastman Kodak Company | Infrarotempfindliche, Diazonaphthochinon enthaltende Bildaufzeichnungszusammensetzung und Element |
US5705322A (en) * | 1996-09-30 | 1998-01-06 | Eastman Kodak Company | Method of providing an image using a negative-working infrared photosensitive element |
US5705308A (en) * | 1996-09-30 | 1998-01-06 | Eastman Kodak Company | Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element |
DE69801363T2 (de) | 1997-07-05 | 2002-05-23 | Kodak Polychrome Graphics Llc | Bilderzeugungsverfahren |
US6060217A (en) * | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
-
1998
- 1998-05-12 IT IT98MI001023A patent/IT1299220B1/it active IP Right Grant
-
1999
- 1999-05-10 AT AT99201445T patent/ATE263680T1/de not_active IP Right Cessation
- 1999-05-10 EP EP99201445A patent/EP0956948B1/de not_active Expired - Lifetime
- 1999-05-10 DE DE69916162T patent/DE69916162T2/de not_active Expired - Fee Related
- 1999-05-10 ES ES99201445T patent/ES2216435T3/es not_active Expired - Lifetime
- 1999-05-11 ZA ZA9903248A patent/ZA993248B/xx unknown
- 1999-05-11 CA CA002271834A patent/CA2271834A1/en not_active Abandoned
- 1999-05-11 US US09/309,586 patent/US6376150B1/en not_active Expired - Fee Related
- 1999-05-12 CN CNB991076931A patent/CN1185547C/zh not_active Expired - Fee Related
- 1999-05-12 KR KR1019990016957A patent/KR19990088227A/ko not_active Application Discontinuation
- 1999-05-12 JP JP11131407A patent/JP2000029214A/ja active Pending
-
2000
- 2000-04-26 HK HK00102455A patent/HK1023310A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
ES2216435T3 (es) | 2004-10-16 |
HK1023310A1 (en) | 2000-09-08 |
EP0956948B1 (de) | 2004-04-07 |
JP2000029214A (ja) | 2000-01-28 |
US6376150B1 (en) | 2002-04-23 |
ITMI981023A1 (it) | 1999-11-12 |
EP0956948A1 (de) | 1999-11-17 |
CN1241731A (zh) | 2000-01-19 |
DE69916162T2 (de) | 2005-04-14 |
DE69916162D1 (de) | 2004-05-13 |
IT1299220B1 (it) | 2000-02-29 |
ZA993248B (en) | 1999-11-11 |
CA2271834A1 (en) | 1999-11-12 |
CN1185547C (zh) | 2005-01-19 |
KR19990088227A (ko) | 1999-12-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |