JPH11233434A - 露光条件決定方法、露光方法、露光装置、及びデバイスの製造方法 - Google Patents

露光条件決定方法、露光方法、露光装置、及びデバイスの製造方法

Info

Publication number
JPH11233434A
JPH11233434A JP10051564A JP5156498A JPH11233434A JP H11233434 A JPH11233434 A JP H11233434A JP 10051564 A JP10051564 A JP 10051564A JP 5156498 A JP5156498 A JP 5156498A JP H11233434 A JPH11233434 A JP H11233434A
Authority
JP
Japan
Prior art keywords
exposure
pattern
exposure condition
wafer
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10051564A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11233434A5 (enExample
Inventor
Yuji Imai
裕二 今井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10051564A priority Critical patent/JPH11233434A/ja
Publication of JPH11233434A publication Critical patent/JPH11233434A/ja
Publication of JPH11233434A5 publication Critical patent/JPH11233434A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10051564A 1998-02-17 1998-02-17 露光条件決定方法、露光方法、露光装置、及びデバイスの製造方法 Pending JPH11233434A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10051564A JPH11233434A (ja) 1998-02-17 1998-02-17 露光条件決定方法、露光方法、露光装置、及びデバイスの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10051564A JPH11233434A (ja) 1998-02-17 1998-02-17 露光条件決定方法、露光方法、露光装置、及びデバイスの製造方法

Publications (2)

Publication Number Publication Date
JPH11233434A true JPH11233434A (ja) 1999-08-27
JPH11233434A5 JPH11233434A5 (enExample) 2005-08-25

Family

ID=12890475

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10051564A Pending JPH11233434A (ja) 1998-02-17 1998-02-17 露光条件決定方法、露光方法、露光装置、及びデバイスの製造方法

Country Status (1)

Country Link
JP (1) JPH11233434A (enExample)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002029870A1 (en) * 2000-10-05 2002-04-11 Nikon Corporation Method of determining exposure conditions, exposure method, device producing method and recording medium
WO2002091440A1 (en) * 2001-05-07 2002-11-14 Nikon Corporation Optical characteristic measuring method, exposure method, and device manufacturing method
JP2005510058A (ja) * 2001-11-14 2005-04-14 ケーエルエー−テンカー・コーポレーション プロセスに敏感なリソグラフィフィーチャ製造の方法および装置
JP2006523039A (ja) * 2003-04-10 2006-10-05 アクセント オプティカル テクノロジーズ，インク． パラメータ変動性分析による焦点の中心の決定
JP2007010312A (ja) * 2005-03-30 2007-01-18 Fujifilm Holdings Corp 投影ヘッドピント位置測定方法および露光方法
JP2007173435A (ja) * 2005-12-21 2007-07-05 Seiko Epson Corp 最適フォーカス位置検出方法及び半導体装置の製造方法
US7440104B2 (en) 2004-11-10 2008-10-21 Kabushiki Kaisha Toshiba Exposure system, test mask for monitoring polarization, and method for monitoring polarization
JPWO2007043535A1 (ja) * 2005-10-07 2009-04-16 株式会社ニコン 光学特性計測方法、露光方法及びデバイス製造方法、並びに検査装置及び計測方法
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002029870A1 (en) * 2000-10-05 2002-04-11 Nikon Corporation Method of determining exposure conditions, exposure method, device producing method and recording medium
US6706456B2 (en) 2000-10-05 2004-03-16 Nikon Corporation Method of determining exposure conditions, exposure method, device manufacturing method, and storage medium
WO2002091440A1 (en) * 2001-05-07 2002-11-14 Nikon Corporation Optical characteristic measuring method, exposure method, and device manufacturing method
JP2005510058A (ja) * 2001-11-14 2005-04-14 ケーエルエー−テンカー・コーポレーション プロセスに敏感なリソグラフィフィーチャ製造の方法および装置
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
JP2006523039A (ja) * 2003-04-10 2006-10-05 アクセント オプティカル テクノロジーズ，インク． パラメータ変動性分析による焦点の中心の決定
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US7440104B2 (en) 2004-11-10 2008-10-21 Kabushiki Kaisha Toshiba Exposure system, test mask for monitoring polarization, and method for monitoring polarization
JP2007010312A (ja) * 2005-03-30 2007-01-18 Fujifilm Holdings Corp 投影ヘッドピント位置測定方法および露光方法
KR101229808B1 (ko) * 2005-03-30 2013-02-15 후지필름 가부시키가이샤 투영 헤드 포커스 위치 측정 방법 및 노광 방법
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JPWO2007043535A1 (ja) * 2005-10-07 2009-04-16 株式会社ニコン 光学特性計測方法、露光方法及びデバイス製造方法、並びに検査装置及び計測方法
JP2007173435A (ja) * 2005-12-21 2007-07-05 Seiko Epson Corp 最適フォーカス位置検出方法及び半導体装置の製造方法
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

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