JPH11204406A5 - - Google Patents
Info
- Publication number
- JPH11204406A5 JPH11204406A5 JP1998005845A JP584598A JPH11204406A5 JP H11204406 A5 JPH11204406 A5 JP H11204406A5 JP 1998005845 A JP1998005845 A JP 1998005845A JP 584598 A JP584598 A JP 584598A JP H11204406 A5 JPH11204406 A5 JP H11204406A5
- Authority
- JP
- Japan
- Prior art keywords
- detection means
- stage
- detecting
- driving
- interferometer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10005845A JPH11204406A (ja) | 1998-01-14 | 1998-01-14 | 位置決め装置、位置決め方法および露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10005845A JPH11204406A (ja) | 1998-01-14 | 1998-01-14 | 位置決め装置、位置決め方法および露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11204406A JPH11204406A (ja) | 1999-07-30 |
| JPH11204406A5 true JPH11204406A5 (enExample) | 2005-08-18 |
Family
ID=11622359
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10005845A Withdrawn JPH11204406A (ja) | 1998-01-14 | 1998-01-14 | 位置決め装置、位置決め方法および露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11204406A (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7161654B2 (en) * | 2004-12-02 | 2007-01-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP2006203113A (ja) * | 2005-01-24 | 2006-08-03 | Nikon Corp | ステージ装置、ステージ制御方法、露光装置及び方法、並びにデバイス製造方法 |
| KR100690882B1 (ko) | 2005-03-21 | 2007-03-09 | 삼성전자주식회사 | 반도체 소자 제조용 노광 장비, 진동 감지 및 위치 측정방법, 반도체 소자 제조 방법 |
| JP5034917B2 (ja) * | 2007-12-10 | 2012-09-26 | 株式会社ニコン | ステージ装置、露光装置、およびステージ装置の制御方法 |
| CN103809384B (zh) * | 2012-11-12 | 2016-03-09 | 上海微电子装备有限公司 | 工件台与掩模台公用的平衡质量系统及光刻机 |
-
1998
- 1998-01-14 JP JP10005845A patent/JPH11204406A/ja not_active Withdrawn
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