JPH11204406A5 - - Google Patents

Info

Publication number
JPH11204406A5
JPH11204406A5 JP1998005845A JP584598A JPH11204406A5 JP H11204406 A5 JPH11204406 A5 JP H11204406A5 JP 1998005845 A JP1998005845 A JP 1998005845A JP 584598 A JP584598 A JP 584598A JP H11204406 A5 JPH11204406 A5 JP H11204406A5
Authority
JP
Japan
Prior art keywords
detection means
stage
detecting
driving
interferometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1998005845A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11204406A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10005845A priority Critical patent/JPH11204406A/ja
Priority claimed from JP10005845A external-priority patent/JPH11204406A/ja
Publication of JPH11204406A publication Critical patent/JPH11204406A/ja
Publication of JPH11204406A5 publication Critical patent/JPH11204406A5/ja
Withdrawn legal-status Critical Current

Links

JP10005845A 1998-01-14 1998-01-14 位置決め装置、位置決め方法および露光装置 Withdrawn JPH11204406A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10005845A JPH11204406A (ja) 1998-01-14 1998-01-14 位置決め装置、位置決め方法および露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10005845A JPH11204406A (ja) 1998-01-14 1998-01-14 位置決め装置、位置決め方法および露光装置

Publications (2)

Publication Number Publication Date
JPH11204406A JPH11204406A (ja) 1999-07-30
JPH11204406A5 true JPH11204406A5 (enExample) 2005-08-18

Family

ID=11622359

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10005845A Withdrawn JPH11204406A (ja) 1998-01-14 1998-01-14 位置決め装置、位置決め方法および露光装置

Country Status (1)

Country Link
JP (1) JPH11204406A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7161654B2 (en) * 2004-12-02 2007-01-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006203113A (ja) * 2005-01-24 2006-08-03 Nikon Corp ステージ装置、ステージ制御方法、露光装置及び方法、並びにデバイス製造方法
KR100690882B1 (ko) 2005-03-21 2007-03-09 삼성전자주식회사 반도체 소자 제조용 노광 장비, 진동 감지 및 위치 측정방법, 반도체 소자 제조 방법
JP5034917B2 (ja) * 2007-12-10 2012-09-26 株式会社ニコン ステージ装置、露光装置、およびステージ装置の制御方法
CN103809384B (zh) * 2012-11-12 2016-03-09 上海微电子装备有限公司 工件台与掩模台公用的平衡质量系统及光刻机

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