JPH11204406A - 位置決め装置、位置決め方法および露光装置 - Google Patents

位置決め装置、位置決め方法および露光装置

Info

Publication number
JPH11204406A
JPH11204406A JP10005845A JP584598A JPH11204406A JP H11204406 A JPH11204406 A JP H11204406A JP 10005845 A JP10005845 A JP 10005845A JP 584598 A JP584598 A JP 584598A JP H11204406 A JPH11204406 A JP H11204406A
Authority
JP
Japan
Prior art keywords
stage
positioning
vibration
wafer stage
driving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10005845A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11204406A5 (enExample
Inventor
Masato Takahashi
正人 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10005845A priority Critical patent/JPH11204406A/ja
Publication of JPH11204406A publication Critical patent/JPH11204406A/ja
Publication of JPH11204406A5 publication Critical patent/JPH11204406A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10005845A 1998-01-14 1998-01-14 位置決め装置、位置決め方法および露光装置 Withdrawn JPH11204406A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10005845A JPH11204406A (ja) 1998-01-14 1998-01-14 位置決め装置、位置決め方法および露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10005845A JPH11204406A (ja) 1998-01-14 1998-01-14 位置決め装置、位置決め方法および露光装置

Publications (2)

Publication Number Publication Date
JPH11204406A true JPH11204406A (ja) 1999-07-30
JPH11204406A5 JPH11204406A5 (enExample) 2005-08-18

Family

ID=11622359

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10005845A Withdrawn JPH11204406A (ja) 1998-01-14 1998-01-14 位置決め装置、位置決め方法および露光装置

Country Status (1)

Country Link
JP (1) JPH11204406A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006203113A (ja) * 2005-01-24 2006-08-03 Nikon Corp ステージ装置、ステージ制御方法、露光装置及び方法、並びにデバイス製造方法
KR100690882B1 (ko) 2005-03-21 2007-03-09 삼성전자주식회사 반도체 소자 제조용 노광 장비, 진동 감지 및 위치 측정방법, 반도체 소자 제조 방법
JP2009141283A (ja) * 2007-12-10 2009-06-25 Nikon Corp ステージ装置、露光装置、およびステージ装置の制御方法
JP2009188421A (ja) * 2004-12-02 2009-08-20 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
WO2014071780A1 (zh) * 2012-11-12 2014-05-15 上海微电子装备有限公司 工件台与掩模台公用的平衡质量系统及光刻机

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009188421A (ja) * 2004-12-02 2009-08-20 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2006203113A (ja) * 2005-01-24 2006-08-03 Nikon Corp ステージ装置、ステージ制御方法、露光装置及び方法、並びにデバイス製造方法
KR100690882B1 (ko) 2005-03-21 2007-03-09 삼성전자주식회사 반도체 소자 제조용 노광 장비, 진동 감지 및 위치 측정방법, 반도체 소자 제조 방법
JP2009141283A (ja) * 2007-12-10 2009-06-25 Nikon Corp ステージ装置、露光装置、およびステージ装置の制御方法
WO2014071780A1 (zh) * 2012-11-12 2014-05-15 上海微电子装备有限公司 工件台与掩模台公用的平衡质量系统及光刻机

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