JPH11200016A - 真空内ガス供給装置 - Google Patents
真空内ガス供給装置Info
- Publication number
- JPH11200016A JPH11200016A JP1790298A JP1790298A JPH11200016A JP H11200016 A JPH11200016 A JP H11200016A JP 1790298 A JP1790298 A JP 1790298A JP 1790298 A JP1790298 A JP 1790298A JP H11200016 A JPH11200016 A JP H11200016A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- width direction
- flow rate
- supply
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009792 diffusion process Methods 0.000 claims abstract description 24
- 238000009826 distribution Methods 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 4
- 238000001771 vacuum deposition Methods 0.000 abstract description 2
- 230000001105 regulatory effect Effects 0.000 abstract 2
- 239000007789 gas Substances 0.000 description 75
- 239000010408 film Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 230000005291 magnetic effect Effects 0.000 description 8
- 238000007740 vapor deposition Methods 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- 230000008021 deposition Effects 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 230000005294 ferromagnetic effect Effects 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1790298A JPH11200016A (ja) | 1998-01-13 | 1998-01-13 | 真空内ガス供給装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1790298A JPH11200016A (ja) | 1998-01-13 | 1998-01-13 | 真空内ガス供給装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11200016A true JPH11200016A (ja) | 1999-07-27 |
| JPH11200016A5 JPH11200016A5 (enExample) | 2005-08-04 |
Family
ID=11956685
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1790298A Pending JPH11200016A (ja) | 1998-01-13 | 1998-01-13 | 真空内ガス供給装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11200016A (enExample) |
-
1998
- 1998-01-13 JP JP1790298A patent/JPH11200016A/ja active Pending
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041217 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050114 |
|
| RD04 | Notification of resignation of power of attorney |
Effective date: 20050225 Free format text: JAPANESE INTERMEDIATE CODE: A7424 |
|
| A977 | Report on retrieval |
Effective date: 20050804 Free format text: JAPANESE INTERMEDIATE CODE: A971007 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20050819 |
|
| A521 | Written amendment |
Effective date: 20051017 Free format text: JAPANESE INTERMEDIATE CODE: A523 |
|
| A02 | Decision of refusal |
Effective date: 20060301 Free format text: JAPANESE INTERMEDIATE CODE: A02 |