JPH11186149A5 - - Google Patents

Info

Publication number
JPH11186149A5
JPH11186149A5 JP1997363989A JP36398997A JPH11186149A5 JP H11186149 A5 JPH11186149 A5 JP H11186149A5 JP 1997363989 A JP1997363989 A JP 1997363989A JP 36398997 A JP36398997 A JP 36398997A JP H11186149 A5 JPH11186149 A5 JP H11186149A5
Authority
JP
Japan
Prior art keywords
exposure
sensitive substrate
divided area
divided
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997363989A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11186149A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9363989A priority Critical patent/JPH11186149A/ja
Priority claimed from JP9363989A external-priority patent/JPH11186149A/ja
Publication of JPH11186149A publication Critical patent/JPH11186149A/ja
Publication of JPH11186149A5 publication Critical patent/JPH11186149A5/ja
Pending legal-status Critical Current

Links

JP9363989A 1997-12-17 1997-12-17 露光方法、露光装置、及びデバイスの製造方法 Pending JPH11186149A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9363989A JPH11186149A (ja) 1997-12-17 1997-12-17 露光方法、露光装置、及びデバイスの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9363989A JPH11186149A (ja) 1997-12-17 1997-12-17 露光方法、露光装置、及びデバイスの製造方法

Publications (2)

Publication Number Publication Date
JPH11186149A JPH11186149A (ja) 1999-07-09
JPH11186149A5 true JPH11186149A5 (enExample) 2005-07-28

Family

ID=18480706

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9363989A Pending JPH11186149A (ja) 1997-12-17 1997-12-17 露光方法、露光装置、及びデバイスの製造方法

Country Status (1)

Country Link
JP (1) JPH11186149A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001272929A (ja) * 2000-03-24 2001-10-05 Toshiba Corp 平面表示装置用アレイ基板の製造方法
JP2004022945A (ja) * 2002-06-19 2004-01-22 Canon Inc 露光装置及び方法
US7830493B2 (en) * 2005-10-04 2010-11-09 Asml Netherlands B.V. System and method for compensating for radiation induced thermal distortions in a substrate or projection system
JP2010266687A (ja) * 2009-05-14 2010-11-25 Nikon Corp 露光方法、露光装置、及びデバイス製造方法
CN112382578B (zh) * 2020-11-13 2023-09-29 长江存储科技有限责任公司 晶圆键合的控制方法、控制装置、处理器和键合系统

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