JPH11186149A - 露光方法、露光装置、及びデバイスの製造方法 - Google Patents

露光方法、露光装置、及びデバイスの製造方法

Info

Publication number
JPH11186149A
JPH11186149A JP9363989A JP36398997A JPH11186149A JP H11186149 A JPH11186149 A JP H11186149A JP 9363989 A JP9363989 A JP 9363989A JP 36398997 A JP36398997 A JP 36398997A JP H11186149 A JPH11186149 A JP H11186149A
Authority
JP
Japan
Prior art keywords
exposure
sensitive substrate
wafer
area
thermal expansion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9363989A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11186149A5 (enExample
Inventor
Kazuya Ota
和哉 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9363989A priority Critical patent/JPH11186149A/ja
Publication of JPH11186149A publication Critical patent/JPH11186149A/ja
Publication of JPH11186149A5 publication Critical patent/JPH11186149A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9363989A 1997-12-17 1997-12-17 露光方法、露光装置、及びデバイスの製造方法 Pending JPH11186149A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9363989A JPH11186149A (ja) 1997-12-17 1997-12-17 露光方法、露光装置、及びデバイスの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9363989A JPH11186149A (ja) 1997-12-17 1997-12-17 露光方法、露光装置、及びデバイスの製造方法

Publications (2)

Publication Number Publication Date
JPH11186149A true JPH11186149A (ja) 1999-07-09
JPH11186149A5 JPH11186149A5 (enExample) 2005-07-28

Family

ID=18480706

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9363989A Pending JPH11186149A (ja) 1997-12-17 1997-12-17 露光方法、露光装置、及びデバイスの製造方法

Country Status (1)

Country Link
JP (1) JPH11186149A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001272929A (ja) * 2000-03-24 2001-10-05 Toshiba Corp 平面表示装置用アレイ基板の製造方法
WO2004001820A1 (en) * 2002-06-19 2003-12-31 Canon Kabushiki Kaisha Exposure apparatus and method
JP2007116148A (ja) * 2005-10-04 2007-05-10 Asml Netherlands Bv 放射で誘発された熱歪みを補償するシステムおよび方法
JP2010266687A (ja) * 2009-05-14 2010-11-25 Nikon Corp 露光方法、露光装置、及びデバイス製造方法
CN112382578A (zh) * 2020-11-13 2021-02-19 长江存储科技有限责任公司 晶圆键合的控制方法、控制装置、处理器和键合系统

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001272929A (ja) * 2000-03-24 2001-10-05 Toshiba Corp 平面表示装置用アレイ基板の製造方法
WO2004001820A1 (en) * 2002-06-19 2003-12-31 Canon Kabushiki Kaisha Exposure apparatus and method
US7060994B2 (en) 2002-06-19 2006-06-13 Canon Kabushiki Kaisha Exposure apparatus and method
JP2007116148A (ja) * 2005-10-04 2007-05-10 Asml Netherlands Bv 放射で誘発された熱歪みを補償するシステムおよび方法
JP2010266687A (ja) * 2009-05-14 2010-11-25 Nikon Corp 露光方法、露光装置、及びデバイス製造方法
CN112382578A (zh) * 2020-11-13 2021-02-19 长江存储科技有限责任公司 晶圆键合的控制方法、控制装置、处理器和键合系统
CN112382578B (zh) * 2020-11-13 2023-09-29 长江存储科技有限责任公司 晶圆键合的控制方法、控制装置、处理器和键合系统

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