JPH11176733A5 - - Google Patents

Info

Publication number
JPH11176733A5
JPH11176733A5 JP1997345562A JP34556297A JPH11176733A5 JP H11176733 A5 JPH11176733 A5 JP H11176733A5 JP 1997345562 A JP1997345562 A JP 1997345562A JP 34556297 A JP34556297 A JP 34556297A JP H11176733 A5 JPH11176733 A5 JP H11176733A5
Authority
JP
Japan
Prior art keywords
optical system
projection optical
mark
pattern
error
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997345562A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11176733A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9345562A priority Critical patent/JPH11176733A/ja
Priority claimed from JP9345562A external-priority patent/JPH11176733A/ja
Publication of JPH11176733A publication Critical patent/JPH11176733A/ja
Publication of JPH11176733A5 publication Critical patent/JPH11176733A5/ja
Pending legal-status Critical Current

Links

JP9345562A 1997-12-15 1997-12-15 露光方法および装置 Pending JPH11176733A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9345562A JPH11176733A (ja) 1997-12-15 1997-12-15 露光方法および装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9345562A JPH11176733A (ja) 1997-12-15 1997-12-15 露光方法および装置

Publications (2)

Publication Number Publication Date
JPH11176733A JPH11176733A (ja) 1999-07-02
JPH11176733A5 true JPH11176733A5 (enExample) 2005-07-28

Family

ID=18377437

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9345562A Pending JPH11176733A (ja) 1997-12-15 1997-12-15 露光方法および装置

Country Status (1)

Country Link
JP (1) JPH11176733A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1462471A (zh) * 2000-09-21 2003-12-17 株式会社尼康 成像特性的测量方法和曝光方法
JP5055141B2 (ja) * 2008-01-10 2012-10-24 キヤノン株式会社 評価方法、調整方法、露光装置、およびプログラム

Similar Documents

Publication Publication Date Title
JPH1012544A5 (enExample)
JPH11162832A5 (enExample)
EP0964307A3 (en) Projection exposure apparatus and method
JPH0650714B2 (ja) 露光方法
KR960026109A (ko) 위치 맞춤 장치 및 방법
KR970077116A (ko) 노광 방법 및 노광 장치
JPH10223525A5 (enExample)
KR980005329A (ko) 투영노광장치
KR960011564A (ko) 노광조건 및/또는 투영광학계의 수차측정방법
JPH09320945A5 (enExample)
JPH11176733A5 (enExample)
JPH118194A5 (enExample)
JP2000066075A5 (ja) 光学系、露光装置、露光方法、素子製造方法、及び前記光学系の製造方法
US6831766B2 (en) Projection exposure apparatus using wavefront detection
US6757049B2 (en) Apparatus and method for exposure
JPH11150053A5 (enExample)
JPH09330862A5 (enExample)
JPH09306818A5 (enExample)
JPS62114222A (ja) 露光装置
JPH10232185A5 (enExample)
JPH09260252A5 (enExample)
EP0867776A3 (en) Exposure method, exposure apparatus and method for making an exposure apparatus
JPH10209031A5 (enExample)
JP2005243710A5 (enExample)
JPH10209008A5 (enExample)