JPH10232185A5 - - Google Patents

Info

Publication number
JPH10232185A5
JPH10232185A5 JP1997350375A JP35037597A JPH10232185A5 JP H10232185 A5 JPH10232185 A5 JP H10232185A5 JP 1997350375 A JP1997350375 A JP 1997350375A JP 35037597 A JP35037597 A JP 35037597A JP H10232185 A5 JPH10232185 A5 JP H10232185A5
Authority
JP
Japan
Prior art keywords
line
aberration
pattern
optical system
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997350375A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10232185A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9350375A priority Critical patent/JPH10232185A/ja
Priority claimed from JP9350375A external-priority patent/JPH10232185A/ja
Publication of JPH10232185A publication Critical patent/JPH10232185A/ja
Publication of JPH10232185A5 publication Critical patent/JPH10232185A5/ja
Pending legal-status Critical Current

Links

JP9350375A 1996-12-19 1997-12-19 投影光学系の収差測定方法 Pending JPH10232185A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9350375A JPH10232185A (ja) 1996-12-19 1997-12-19 投影光学系の収差測定方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP33970496 1996-12-19
JP8-339704 1996-12-19
JP9350375A JPH10232185A (ja) 1996-12-19 1997-12-19 投影光学系の収差測定方法

Publications (2)

Publication Number Publication Date
JPH10232185A JPH10232185A (ja) 1998-09-02
JPH10232185A5 true JPH10232185A5 (enExample) 2005-09-08

Family

ID=26576502

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9350375A Pending JPH10232185A (ja) 1996-12-19 1997-12-19 投影光学系の収差測定方法

Country Status (1)

Country Link
JP (1) JPH10232185A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000180302A (ja) 1998-12-15 2000-06-30 Nec Corp コマ収差自動計測用マークと計測方法
JP4497569B2 (ja) * 1998-12-17 2010-07-07 キヤノン株式会社 投影光学系のコマ収差の評価方法
JP3267272B2 (ja) * 1999-01-26 2002-03-18 日本電気株式会社 投影光学系の収差量の測定方法
JP3339051B2 (ja) 1999-04-19 2002-10-28 日本電気株式会社 投影光学系の球面収差測定方法
JP2003077814A (ja) * 2001-09-05 2003-03-14 Nikon Corp 荷電粒子線露光装置の結像性能の計測方法及びその計測装置、荷電粒子線露光装置
EP2131244A3 (en) * 2008-06-02 2012-04-11 ASML Netherlands BV Lithographic apparatus and method for measuring a pattern property

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