JPH11168064A - ステージ駆動方法、ステージ装置、及び露光装置 - Google Patents

ステージ駆動方法、ステージ装置、及び露光装置

Info

Publication number
JPH11168064A
JPH11168064A JP10267565A JP26756598A JPH11168064A JP H11168064 A JPH11168064 A JP H11168064A JP 10267565 A JP10267565 A JP 10267565A JP 26756598 A JP26756598 A JP 26756598A JP H11168064 A JPH11168064 A JP H11168064A
Authority
JP
Japan
Prior art keywords
stage
stator
surface plate
braking
movable table
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10267565A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11168064A5 (enExample
Inventor
Hideaki Hara
英明 原
Naohiko Iwata
直彦 岩田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10267565A priority Critical patent/JPH11168064A/ja
Publication of JPH11168064A publication Critical patent/JPH11168064A/ja
Publication of JPH11168064A5 publication Critical patent/JPH11168064A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Auxiliary Devices For Machine Tools (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Machine Tool Units (AREA)
JP10267565A 1997-09-22 1998-09-22 ステージ駆動方法、ステージ装置、及び露光装置 Pending JPH11168064A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10267565A JPH11168064A (ja) 1997-09-22 1998-09-22 ステージ駆動方法、ステージ装置、及び露光装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-256681 1997-09-22
JP25668197 1997-09-22
JP10267565A JPH11168064A (ja) 1997-09-22 1998-09-22 ステージ駆動方法、ステージ装置、及び露光装置

Publications (2)

Publication Number Publication Date
JPH11168064A true JPH11168064A (ja) 1999-06-22
JPH11168064A5 JPH11168064A5 (enExample) 2005-10-27

Family

ID=26542844

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10267565A Pending JPH11168064A (ja) 1997-09-22 1998-09-22 ステージ駆動方法、ステージ装置、及び露光装置

Country Status (1)

Country Link
JP (1) JPH11168064A (enExample)

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6486941B1 (en) 2000-04-24 2002-11-26 Nikon Corporation Guideless stage
JP2002343706A (ja) * 2001-05-18 2002-11-29 Nikon Corp ステージ装置及びステージの駆動方法、露光装置及び露光方法、並びにデバイス及びその製造方法
JP2003059797A (ja) * 2001-08-09 2003-02-28 Canon Inc 移動装置、ステージ装置及び露光装置
US6538348B2 (en) 2000-02-21 2003-03-25 Sharp Kabushiki Kaisha Stage device capable of moving an object to be positioned precisely to a target position
US6844694B2 (en) 2001-08-10 2005-01-18 Nikon Corporation Stage assembly and exposure apparatus including the same
JP2006075958A (ja) * 2004-09-10 2006-03-23 Toshiba Mach Co Ltd 駆動システムおよび加工システム
US7202937B2 (en) 1999-12-21 2007-04-10 Asml Netherlands B.V. Balanced positioning system for use in lithographic apparatus
CN100464401C (zh) * 2004-05-20 2009-02-25 住友重机械工业株式会社 载物台装置
JP2010109376A (ja) * 2005-06-08 2010-05-13 Asml Netherlands Bv リソグラフィ装置及び基板ステージ補償を利用したデバイス製造方法
JP2010120003A (ja) * 2008-11-20 2010-06-03 Top Engineering Co Ltd 反力相殺装置、それの質量体設定方法、それを用いた反力相殺方法及びそれを備えたディスペンサー
JP2010253663A (ja) * 2009-04-28 2010-11-11 Sumitomo Heavy Ind Ltd 反力処理機構
JP2011003587A (ja) * 2009-06-16 2011-01-06 Sumitomo Heavy Ind Ltd 反力処理機構、その反力処理機構を備えたステージ装置、及びそのステージ装置を備えた半導体検査装置
KR101258407B1 (ko) 2011-12-06 2013-04-26 주식회사 져스텍 반발력 보상 선형 구동 시스템
KR101287387B1 (ko) * 2012-01-13 2013-07-19 주식회사 져스텍 코일 스프링의 서지 현상 방지 구조가 적용된 반발력 보상 선형 구동 시스템
KR101869013B1 (ko) * 2017-02-01 2018-06-20 이노6 주식회사 이동 가능한 테이블 시스템
JP2018124068A (ja) * 2017-01-30 2018-08-09 大銀微系統股▲分▼有限公司 反力相殺装置
CN109756085A (zh) * 2017-11-06 2019-05-14 浙江鼎炬电子科技股份有限公司 一种磁石装载装置及其工作方法
JP2019136856A (ja) * 2018-02-15 2019-08-22 株式会社ナガセインテグレックス 工作機械
KR20200068732A (ko) * 2017-10-19 2020-06-15 셉톤 테크놀로지스, 인코포레이티드 2차원들로 라이다 시스템을 스캐닝하기 위한 방법들 및 장치들
EP4336260A2 (en) 2022-09-12 2024-03-13 Canon Kabushiki Kaisha Stage apparatus, pattern forming apparatus, and method for manufacturing article
US12313784B2 (en) 2019-12-30 2025-05-27 Cepton Technologies, Inc. Half and quarter lissajous scan patterns for LiDAR

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7202937B2 (en) 1999-12-21 2007-04-10 Asml Netherlands B.V. Balanced positioning system for use in lithographic apparatus
US6538348B2 (en) 2000-02-21 2003-03-25 Sharp Kabushiki Kaisha Stage device capable of moving an object to be positioned precisely to a target position
EP1128216B1 (en) * 2000-02-21 2008-11-26 Sharp Kabushiki Kaisha Precision stage device
US6486941B1 (en) 2000-04-24 2002-11-26 Nikon Corporation Guideless stage
JP2002343706A (ja) * 2001-05-18 2002-11-29 Nikon Corp ステージ装置及びステージの駆動方法、露光装置及び露光方法、並びにデバイス及びその製造方法
JP2003059797A (ja) * 2001-08-09 2003-02-28 Canon Inc 移動装置、ステージ装置及び露光装置
US6844694B2 (en) 2001-08-10 2005-01-18 Nikon Corporation Stage assembly and exposure apparatus including the same
CN100464401C (zh) * 2004-05-20 2009-02-25 住友重机械工业株式会社 载物台装置
JP2006075958A (ja) * 2004-09-10 2006-03-23 Toshiba Mach Co Ltd 駆動システムおよび加工システム
JP2010109376A (ja) * 2005-06-08 2010-05-13 Asml Netherlands Bv リソグラフィ装置及び基板ステージ補償を利用したデバイス製造方法
JP2010120003A (ja) * 2008-11-20 2010-06-03 Top Engineering Co Ltd 反力相殺装置、それの質量体設定方法、それを用いた反力相殺方法及びそれを備えたディスペンサー
TWI485028B (zh) * 2009-04-28 2015-05-21 Sumitomo Heavy Industries Reaction force handling mechanism
JP2010253663A (ja) * 2009-04-28 2010-11-11 Sumitomo Heavy Ind Ltd 反力処理機構
KR101162108B1 (ko) 2009-04-28 2012-07-03 스미도모쥬기가이고교 가부시키가이샤 반력 처리 기구
JP2011003587A (ja) * 2009-06-16 2011-01-06 Sumitomo Heavy Ind Ltd 反力処理機構、その反力処理機構を備えたステージ装置、及びそのステージ装置を備えた半導体検査装置
KR101258407B1 (ko) 2011-12-06 2013-04-26 주식회사 져스텍 반발력 보상 선형 구동 시스템
KR101287387B1 (ko) * 2012-01-13 2013-07-19 주식회사 져스텍 코일 스프링의 서지 현상 방지 구조가 적용된 반발력 보상 선형 구동 시스템
JP2018124068A (ja) * 2017-01-30 2018-08-09 大銀微系統股▲分▼有限公司 反力相殺装置
KR101869013B1 (ko) * 2017-02-01 2018-06-20 이노6 주식회사 이동 가능한 테이블 시스템
KR20200068732A (ko) * 2017-10-19 2020-06-15 셉톤 테크놀로지스, 인코포레이티드 2차원들로 라이다 시스템을 스캐닝하기 위한 방법들 및 장치들
US10921431B2 (en) 2017-10-19 2021-02-16 Cepton Technologies Inc. Apparatuses for scanning a lidar system in two dimensions
US11835656B2 (en) 2017-10-19 2023-12-05 Cepton Technologies, Inc. Methods for scanning a LiDAR system in two dimensions
CN109756085A (zh) * 2017-11-06 2019-05-14 浙江鼎炬电子科技股份有限公司 一种磁石装载装置及其工作方法
CN109756085B (zh) * 2017-11-06 2023-12-19 浙江鼎炬电子科技股份有限公司 一种磁石装载装置及其工作方法
JP2019136856A (ja) * 2018-02-15 2019-08-22 株式会社ナガセインテグレックス 工作機械
US12313784B2 (en) 2019-12-30 2025-05-27 Cepton Technologies, Inc. Half and quarter lissajous scan patterns for LiDAR
EP4336260A2 (en) 2022-09-12 2024-03-13 Canon Kabushiki Kaisha Stage apparatus, pattern forming apparatus, and method for manufacturing article

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