JPH11123791A5 - - Google Patents

Info

Publication number
JPH11123791A5
JPH11123791A5 JP1997292780A JP29278097A JPH11123791A5 JP H11123791 A5 JPH11123791 A5 JP H11123791A5 JP 1997292780 A JP1997292780 A JP 1997292780A JP 29278097 A JP29278097 A JP 29278097A JP H11123791 A5 JPH11123791 A5 JP H11123791A5
Authority
JP
Japan
Prior art keywords
layer
coated substrate
multilayer
substrate
outermost layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997292780A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11123791A (ja
JP3959803B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP29278097A priority Critical patent/JP3959803B2/ja
Priority claimed from JP29278097A external-priority patent/JP3959803B2/ja
Priority to US09/529,990 priority patent/US6753064B1/en
Priority to EP98940581A priority patent/EP1025988A1/en
Priority to PCT/JP1998/003817 priority patent/WO1999021711A1/ja
Publication of JPH11123791A publication Critical patent/JPH11123791A/ja
Publication of JPH11123791A5 publication Critical patent/JPH11123791A5/ja
Application granted granted Critical
Publication of JP3959803B2 publication Critical patent/JP3959803B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP29278097A 1997-10-24 1997-10-24 ゾルゲル法による最外層に複数の凸部を有する多層被覆基板の製造方法 Expired - Fee Related JP3959803B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP29278097A JP3959803B2 (ja) 1997-10-24 1997-10-24 ゾルゲル法による最外層に複数の凸部を有する多層被覆基板の製造方法
US09/529,990 US6753064B1 (en) 1997-10-24 1998-08-27 Multi-layered coated substrate and method of production thereof
EP98940581A EP1025988A1 (en) 1997-10-24 1998-08-27 Multi-layered coated substrate and method of production thereof
PCT/JP1998/003817 WO1999021711A1 (en) 1997-10-24 1998-08-27 Multi-layered coated substrate and method of production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29278097A JP3959803B2 (ja) 1997-10-24 1997-10-24 ゾルゲル法による最外層に複数の凸部を有する多層被覆基板の製造方法

Publications (3)

Publication Number Publication Date
JPH11123791A JPH11123791A (ja) 1999-05-11
JPH11123791A5 true JPH11123791A5 (enExample) 2005-05-19
JP3959803B2 JP3959803B2 (ja) 2007-08-15

Family

ID=17786246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29278097A Expired - Fee Related JP3959803B2 (ja) 1997-10-24 1997-10-24 ゾルゲル法による最外層に複数の凸部を有する多層被覆基板の製造方法

Country Status (4)

Country Link
US (1) US6753064B1 (enExample)
EP (1) EP1025988A1 (enExample)
JP (1) JP3959803B2 (enExample)
WO (1) WO1999021711A1 (enExample)

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Publication number Priority date Publication date Assignee Title
US6754044B1 (en) * 1998-05-19 2004-06-22 David A. Janes Swage mounting using surface protrusions
DE19860511A1 (de) * 1998-12-28 2000-07-13 Fraunhofer Ges Forschung Verfahren zur Herstellung eines mikrostrukturierten SiO¶2¶/TiO¶2¶-Schichtsystems
JP2002372603A (ja) * 2001-06-15 2002-12-26 Nikon Corp 光通信用光学部品及びその製造方法
JP3845611B2 (ja) * 2002-09-30 2006-11-15 株式会社東芝 光記録媒体
JP2004152466A (ja) * 2002-10-07 2004-05-27 Sharp Corp 磁気記録媒体およびそれを用いた磁気記録装置
JP4093943B2 (ja) * 2003-09-30 2008-06-04 三洋電機株式会社 発光素子およびその製造方法
JP2005181979A (ja) * 2003-11-28 2005-07-07 Nippon Sheet Glass Co Ltd 多層構造体およびその製造方法
DE102004055395A1 (de) * 2004-11-17 2006-06-22 Seereal Technologies Gmbh Formstabile Flachoptik und Verfahren zur Herstellung
KR100717851B1 (ko) * 2004-12-14 2007-05-14 엘지전자 주식회사 미세가공 기술을 이용한 마이크로렌즈 배열 시트 및 그제조방법
US8264942B2 (en) * 2005-10-26 2012-09-11 Hewlett-Packard Development Company, L.P. Optical disc embossed features
FR2893610B1 (fr) * 2005-11-23 2008-07-18 Saint Gobain Procede de structuration de surface d'un produit verrier, produit verrier a surface structuree et utilisations
WO2008118211A2 (en) 2006-11-03 2008-10-02 Trustees Of Tufts College Biopolymer photonic crystals and method of manufacturing the same
US8574461B2 (en) 2006-11-03 2013-11-05 Tufts University Electroactive biopolymer optical and electro-optical devices and method of manufacturing the same
EP2650112B1 (en) * 2006-11-03 2016-08-24 Trustees Of Tufts College Nanopatterned biopolymer optical device and method of manufacturing the same
CA2704768A1 (en) 2006-11-03 2008-10-23 Trustees Of Tufts College Biopolymer sensor and method of manufacturing the same
US20100110552A1 (en) * 2007-02-23 2010-05-06 Nippon Sheet Glass Company, Limited Antireflection structural body
FR2914630B3 (fr) 2007-04-04 2009-02-06 Saint Gobain Procede de structuration de surface d'un produit a couche sol-gel, produit a couche sol-gel structuree
JP4999556B2 (ja) * 2007-05-31 2012-08-15 リコー光学株式会社 表面に微細凹凸形状をもつ光学素子の製造方法
US7830592B1 (en) * 2007-11-30 2010-11-09 Sipix Imaging, Inc. Display devices having micro-reflectors
US8237892B1 (en) 2007-11-30 2012-08-07 Sipix Imaging, Inc. Display device with a brightness enhancement structure
WO2009114361A1 (en) * 2008-03-11 2009-09-17 Sipix Imaging, Inc. Luminance enhancement structure for reflective display devices
US8437069B2 (en) * 2008-03-11 2013-05-07 Sipix Imaging, Inc. Luminance enhancement structure for reflective display devices
US9128235B2 (en) * 2008-08-11 2015-09-08 Greenlux Finland Oy Optical light diffuser component having a substrate with optical structures and optical coatings and a method for manufacturing the same
US8441414B2 (en) * 2008-12-05 2013-05-14 Sipix Imaging, Inc. Luminance enhancement structure with Moiré reducing design
US9025234B2 (en) * 2009-01-22 2015-05-05 E Ink California, Llc Luminance enhancement structure with varying pitches
US8120836B2 (en) * 2009-03-09 2012-02-21 Sipix Imaging, Inc. Luminance enhancement structure for reflective display devices
US8714780B2 (en) * 2009-04-22 2014-05-06 Sipix Imaging, Inc. Display devices with grooved luminance enhancement film
US8797633B1 (en) 2009-07-23 2014-08-05 Sipix Imaging, Inc. Display device assembly and manufacture thereof
WO2011026101A2 (en) 2009-08-31 2011-03-03 Trustees Of Tufts College Silk transistor devices
CN105496423A (zh) 2010-03-17 2016-04-20 伊利诺伊大学评议会 基于生物可吸收基质的可植入生物医学装置
JP6231489B2 (ja) 2011-12-01 2017-11-15 ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ プログラム可能な変化を被るように設計された遷移デバイス
CN103293573A (zh) * 2013-05-27 2013-09-11 北京京东方光电科技有限公司 一种增光片、背光源以及液晶显示器
US10925543B2 (en) 2015-11-11 2021-02-23 The Board Of Trustees Of The University Of Illinois Bioresorbable silicon electronics for transient implants
CN110076945B (zh) * 2019-04-30 2020-02-07 北京航空航天大学 一种减阻柔弹性薄膜的制备方法和应用
CN110850600A (zh) * 2019-12-24 2020-02-28 宁波舜宇奥来技术有限公司 用于光学镜头的匀光结构
CN119535653A (zh) * 2024-12-23 2025-02-28 安特永(苏州)光电科技有限公司 微透镜制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04211202A (ja) * 1990-03-19 1992-08-03 Canon Inc 反射型回折格子および該回折格子を用いた装置
JPH0447541A (ja) 1990-06-14 1992-02-17 Nippon Sheet Glass Co Ltd 微細パターン付き基板の製造方法
US5212596A (en) * 1992-05-18 1993-05-18 Battelle Memorial Institute Nonreflective articles
JPH10206603A (ja) * 1997-01-20 1998-08-07 Dainippon Printing Co Ltd 反射防止フィルム及びその製造方法

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