JPH11111707A5 - - Google Patents

Info

Publication number
JPH11111707A5
JPH11111707A5 JP1997290395A JP29039597A JPH11111707A5 JP H11111707 A5 JPH11111707 A5 JP H11111707A5 JP 1997290395 A JP1997290395 A JP 1997290395A JP 29039597 A JP29039597 A JP 29039597A JP H11111707 A5 JPH11111707 A5 JP H11111707A5
Authority
JP
Japan
Prior art keywords
susceptor
vapor phase
phase growth
growth apparatus
radial direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997290395A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11111707A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP29039597A priority Critical patent/JPH11111707A/ja
Priority claimed from JP29039597A external-priority patent/JPH11111707A/ja
Publication of JPH11111707A publication Critical patent/JPH11111707A/ja
Publication of JPH11111707A5 publication Critical patent/JPH11111707A5/ja
Pending legal-status Critical Current

Links

JP29039597A 1997-10-07 1997-10-07 気相成長装置 Pending JPH11111707A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29039597A JPH11111707A (ja) 1997-10-07 1997-10-07 気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29039597A JPH11111707A (ja) 1997-10-07 1997-10-07 気相成長装置

Publications (2)

Publication Number Publication Date
JPH11111707A JPH11111707A (ja) 1999-04-23
JPH11111707A5 true JPH11111707A5 (enExample) 2004-09-16

Family

ID=17755464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29039597A Pending JPH11111707A (ja) 1997-10-07 1997-10-07 気相成長装置

Country Status (1)

Country Link
JP (1) JPH11111707A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050284371A1 (en) * 2004-06-29 2005-12-29 Mcfadden Robert S Deposition apparatus for providing uniform low-k dielectric
WO2007018157A1 (ja) * 2005-08-05 2007-02-15 Tokyo Electron Limited 基板処理装置およびそれに用いる基板載置台
KR20100129566A (ko) * 2009-06-01 2010-12-09 주식회사 유진테크 기판지지유닛 및 이를 포함하는 기판처리장치
DE102015113956B4 (de) * 2015-08-24 2024-03-07 Meyer Burger (Germany) Gmbh Substratträger
US10622243B2 (en) 2016-10-28 2020-04-14 Lam Research Corporation Planar substrate edge contact with open volume equalization pathways and side containment
CN106948002B (zh) * 2017-03-15 2019-07-09 南京国盛电子有限公司 电磁感应加热外延炉的双面基座结构
TWI786408B (zh) * 2020-05-28 2022-12-11 環球晶圓股份有限公司 晶圓承載台及晶圓鑲埋結構的形成方法

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