JPH11111595A5 - - Google Patents

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Publication number
JPH11111595A5
JPH11111595A5 JP1997269081A JP26908197A JPH11111595A5 JP H11111595 A5 JPH11111595 A5 JP H11111595A5 JP 1997269081 A JP1997269081 A JP 1997269081A JP 26908197 A JP26908197 A JP 26908197A JP H11111595 A5 JPH11111595 A5 JP H11111595A5
Authority
JP
Japan
Prior art keywords
pattern
exposure
data
area
density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997269081A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11111595A (ja
JP3827422B2 (ja
Filing date
Publication date
Priority claimed from JP26908197A external-priority patent/JP3827422B2/ja
Priority to JP26908197A priority Critical patent/JP3827422B2/ja
Application filed filed Critical
Priority to US09/055,990 priority patent/US6087052A/en
Priority to KR1019980014442A priority patent/KR100276571B1/ko
Priority to DE19818840A priority patent/DE19818840B4/de
Publication of JPH11111595A publication Critical patent/JPH11111595A/ja
Priority to US09/520,756 priority patent/US6350992B1/en
Publication of JPH11111595A5 publication Critical patent/JPH11111595A5/ja
Publication of JP3827422B2 publication Critical patent/JP3827422B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP26908197A 1997-10-01 1997-10-01 荷電粒子ビーム露光方法及び荷電粒子ビーム露光装置 Expired - Fee Related JP3827422B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP26908197A JP3827422B2 (ja) 1997-10-01 1997-10-01 荷電粒子ビーム露光方法及び荷電粒子ビーム露光装置
US09/055,990 US6087052A (en) 1997-10-01 1998-04-07 Charged particle beam exposure method utilizing subfield proximity corrections
KR1019980014442A KR100276571B1 (ko) 1997-10-01 1998-04-23 하전 입자 빔 노광 방법 및 하전 입자 빔 노광 장치
DE19818840A DE19818840B4 (de) 1997-10-01 1998-04-28 Ladungsteilchenstrahlbelichtungsverfahren und Ladungsteilchenstrahlbelichtungsvorrichtung
US09/520,756 US6350992B1 (en) 1997-10-01 2000-03-07 Charged particle beam exposure method and charged particle beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26908197A JP3827422B2 (ja) 1997-10-01 1997-10-01 荷電粒子ビーム露光方法及び荷電粒子ビーム露光装置

Related Child Applications (4)

Application Number Title Priority Date Filing Date
JP2005306129A Division JP2006041561A (ja) 2005-10-20 2005-10-20 荷電粒子ビーム露光方法及び荷電粒子ビーム露光装置
JP2005306128A Division JP2006041560A (ja) 2005-10-20 2005-10-20 荷電粒子ビーム露光方法及び荷電粒子ビーム露光装置
JP2005306127A Division JP4295262B2 (ja) 2005-10-20 2005-10-20 荷電粒子ビーム露光方法
JP2005306130A Division JP4295263B2 (ja) 2005-10-20 2005-10-20 荷電粒子ビーム露光方法及び荷電粒子ビーム露光装置

Publications (3)

Publication Number Publication Date
JPH11111595A JPH11111595A (ja) 1999-04-23
JPH11111595A5 true JPH11111595A5 (https=) 2005-06-16
JP3827422B2 JP3827422B2 (ja) 2006-09-27

Family

ID=17467412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26908197A Expired - Fee Related JP3827422B2 (ja) 1997-10-01 1997-10-01 荷電粒子ビーム露光方法及び荷電粒子ビーム露光装置

Country Status (1)

Country Link
JP (1) JP3827422B2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001168017A (ja) * 1999-12-13 2001-06-22 Canon Inc 荷電粒子線露光装置、荷電粒子線露光方法及び制御データの決定方法、該方法を適用したデバイスの製造方法。
US6946668B1 (en) 2000-03-21 2005-09-20 Hitachi, Ltd. Electron beam lithography device and drawing method using electron beams
JP2007220748A (ja) * 2006-02-14 2007-08-30 Fujitsu Ltd 露光データ作成方法、露光データ作成装置、露光データ検証方法、露光データ検証装置、及びプログラム
JP5001563B2 (ja) * 2006-03-08 2012-08-15 株式会社ニューフレアテクノロジー 荷電粒子線描画データの作成方法

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