JPH10326820A - Substrate transporting device - Google Patents

Substrate transporting device

Info

Publication number
JPH10326820A
JPH10326820A JP9133759A JP13375997A JPH10326820A JP H10326820 A JPH10326820 A JP H10326820A JP 9133759 A JP9133759 A JP 9133759A JP 13375997 A JP13375997 A JP 13375997A JP H10326820 A JPH10326820 A JP H10326820A
Authority
JP
Japan
Prior art keywords
substrate
support
supporting
arm
pair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9133759A
Other languages
Japanese (ja)
Other versions
JP3711189B2 (en
Inventor
Takeshi Taniguchi
竹志 谷口
Eiji Okuno
英治 奥野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP13375997A priority Critical patent/JP3711189B2/en
Priority to KR1019980018707A priority patent/KR100332546B1/en
Publication of JPH10326820A publication Critical patent/JPH10326820A/en
Application granted granted Critical
Publication of JP3711189B2 publication Critical patent/JP3711189B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706Mechanical details, e.g. roller, belt
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PROBLEM TO BE SOLVED: To raise functionality of substrate transportation device, wherein a substrate is supported with a pair of supporting shafts for transportation. SOLUTION: A guide plate 12 which extends in a direction of allocation of a processing part (X-axis direction) is provided, and a movable member 16 which is movable along the guide plate 12 is provided. The movable member 16 is provided with a pair of fixed rails 24 extending in the X-axis direction, and it is movably attached with a pair of movable pieces 25, while being reciprocally driven by an air cylinder 26. Each movable piece 25 is provided with an arm 22 extending in a Y-axis direction, and the arm 22 is attached with a supporting claw 32. Then, with the pair of arms 22, a substrate W is supported along two facing sides of the substrate W via the supporting claw 32.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、液晶表示器用ガラ
ス角形基板、プラズマディスプレイ用ガラス角形基板、
半導体ウエハ等の基板に対して所定の処理を施す基板処
理装置に適用される基板搬送装置に関するものである。
The present invention relates to a glass square substrate for a liquid crystal display, a glass square substrate for a plasma display,
The present invention relates to a substrate transfer device applied to a substrate processing apparatus that performs a predetermined process on a substrate such as a semiconductor wafer.

【0002】[0002]

【従来の技術】従来から、液晶表示器用ガラス角形基板
等の基板に対して所定の処理を施す基板処理装置とし
て、例えば、図15に示すように複数の処理部を一列に
並べて配置した装置が一般に知られている。
2. Description of the Related Art Conventionally, as a substrate processing apparatus for performing a predetermined processing on a substrate such as a glass square substrate for a liquid crystal display, for example, an apparatus having a plurality of processing units arranged in a line as shown in FIG. Generally known.

【0003】この装置には、上流側(同図で左側)から
順に、基板の投入部101、投入された基板に例えばレ
ジストなどの処理液を塗布する処理液塗布部102、塗
布された処理液を乾燥させる減圧乾燥部103、基板裏
面に付着した処理液を洗い落とす洗浄部104及び加熱
乾燥のための図外のホットプレート等が並べて配置され
ており、投入部101に投入された角形基板Wを順次下
流側の処理部へ搬送しながら所定の処理を施すように構
成されている。
[0003] This apparatus includes, in order from the upstream side (left side in the figure), a substrate input section 101, a processing liquid application section 102 for applying a processing liquid such as a resist to the input substrate, and a coated processing liquid. A drying unit 103 for drying the substrate, a cleaning unit 104 for washing off the processing liquid adhering to the back surface of the substrate, and a hot plate (not shown) for heating and drying are arranged side by side. It is configured to perform predetermined processing while sequentially transporting the processing to a downstream processing unit.

【0004】基板Wの搬送は、同図に示すように投入部
101及び処理液塗布部102等の各処理部(以下、処
理部等という)の間にそれぞれ設けられた搬送装置10
5によって行われるようになっている。
As shown in FIG. 1, the transfer of substrates W is performed by transfer devices 10 provided between processing units (hereinafter referred to as processing units and the like) such as a charging unit 101 and a processing liquid coating unit 102, respectively.
5 is performed.

【0005】各搬送装置105には、隣設された処理部
等にわたって移動可能な可動部材106が設けられ、基
板Wを支持するための一対の水平なアーム107がこの
可動部材106に設けられている。
[0005] Each transfer device 105 is provided with a movable member 106 which can move over an adjacent processing section or the like. A pair of horizontal arms 107 for supporting the substrate W are provided on the movable member 106. I have.

【0006】両アーム107は、基板Wよりも若干広い
間隔で可動部材106にその軸回りに回転可能に支持さ
れている。また、各アーム107には、図示を省略する
がそれぞれ支持爪が具備されており、アーム107の回
転に応じてこの支持爪が両アーム107の間に介在する
位置(支持位置)と、両アーム107の外側に退避する
位置(退避位置)とに変位するようになっている。そし
て、支持爪が支持位置に保持されることにより、基板W
の両端部(搬送方向に相対向する2辺に沿った端部)を
支持した状態で、両アーム107で基板Wを保持するよ
うになっている。
The arms 107 are supported by the movable member 106 at a slightly wider interval than the substrate W so as to be rotatable around its axis. Although not shown, each arm 107 is provided with a support claw. The support claw is interposed between the arms 107 in accordance with the rotation of the arm 107 (support position), and both arms are supported. It is configured to be displaced to a position (retreat position) that retreats outside the 107. Then, the support claws are held at the support position, so that the substrate W
The substrate W is held by the arms 107 while both ends (ends along two sides opposed to each other in the transport direction) are supported.

【0007】各処理部等と搬送装置105との間の基板
Wの受渡しは、例えば、次のようにして行われる。ま
ず、各処理部等から搬送装置105への基板Wの受渡し
の際には、両アーム107の支持爪が退避位置に保持さ
れた状態で可動部材106が処理部の上方に配置され、
この状態で、処理部のステージ108(基板の支持台)
が上昇することにより、基板Wが両アーム107の間を
介してその上方へと持ち上げられる。そして、各支持爪
107が支持位置に変位させられた後、ステージ108
が下降することによって基板Wが支持爪を介して両アー
ム107に支持される。これによって各処理部から搬送
装置105へと基板Wが受け渡される。
The transfer of the substrate W between each processing section and the like and the transfer device 105 is performed, for example, as follows. First, when the substrate W is transferred from each processing unit or the like to the transfer device 105, the movable member 106 is arranged above the processing unit with the support claws of both arms 107 held at the retracted position,
In this state, the processing unit stage 108 (substrate support)
Is raised, the substrate W is lifted upward between the arms 107. After each supporting claw 107 is displaced to the supporting position, the stage 108
Is lowered, the substrate W is supported by the arms 107 via the support claws. Thus, the substrate W is delivered from each processing unit to the transfer device 105.

【0008】そして、これと逆の動作が行われることに
よって、上記搬送装置105から各処理部等へと基板W
の受渡しが行われるようになっている。
[0008] Then, by performing the reverse operation, the substrate W is transferred from the transfer device 105 to each processing section or the like.
Is to be delivered.

【0009】[0009]

【発明が解決しようとする課題】ところが、上記従来の
基板処理装置では、上述のようにアーム107の間隔が
基板Wに対応した値に固定されて、基板の相対向する2
辺に沿ってその両端部を支持する構成であるため、以下
のような種々の問題がある。
However, in the above-described conventional substrate processing apparatus, the distance between the arms 107 is fixed to a value corresponding to the substrate W as described above.
Since the configuration is such that both ends are supported along the side, there are various problems as described below.

【0010】すなわち、近年では、液晶表示器等の市場
ニーズの拡大により、生産する基板のサイズが多様化し
ており、基板の生産形態も従来のようなワンサイズの大
量生産から複数サイズの少量生産へと移行しているが、
アーム107の間隔が固定されている上記のような搬送
装置105では、サイズの異なる基板の生産に柔軟に対
応することができず、これを解決する必要がある。
That is, in recent years, the size of substrates to be produced has been diversified due to the expansion of market needs for liquid crystal displays and the like. , But
The above-described transfer device 105 in which the interval between the arms 107 is fixed cannot flexibly cope with the production of substrates having different sizes, and this needs to be solved.

【0011】また、上記従来のような基板処理装置で
は、各処理部等の間に搬送装置105の待機スペースを
設け、基板処理中は、このスペースに搬送装置105を
待機させるものが多く、従って、大型の基板を生産する
装置では、アーム107の間隔が広くなる分、搬送装置
105の待機スペースも大きくなり、これが基板処理装
置の大型化を招く原因の一つとなっている。
In the conventional substrate processing apparatus described above, a standby space for the transfer device 105 is provided between the processing sections and the like, and the transfer device 105 is often set in this space during substrate processing. In an apparatus for producing a large-sized substrate, the space between the arms 107 is increased, so that the standby space of the transfer device 105 is increased, which is one of the causes of the increase in the size of the substrate processing apparatus.

【0012】さらに、上記従来の装置では、基板の両端
部を支持するため、基板が撓み易く、そのため、大型の
基板や薄型の基板等を搬送する場合に割れが生じ易いと
いう問題がある。特に、基板Wをステージ108上に吸
着して保持する場合には、各処理部等から基板Wへの受
け渡しの際に、上述のようにステージ108が下降して
も基板Wが容易にステージから剥がれず、これによって
基板が大きく撓んで割れてしまうことも考えられる。
Furthermore, in the above-mentioned conventional apparatus, since the substrate is supported at both ends, the substrate is apt to bend, so that there is a problem that a large substrate or a thin substrate is likely to be broken when being transported. In particular, when the substrate W is suctioned and held on the stage 108, the substrate W can be easily moved from the stage even when the stage 108 is lowered as described above when the processing unit or the like transfers the substrate W to the substrate W. It is also conceivable that the substrate does not peel off, which causes the substrate to be largely bent and cracked.

【0013】本発明の第1の目的は、上述のような点に
鑑み、サイズの異なる基板の生産に対応することができ
る基板搬送装置を提供することにある。
A first object of the present invention is to provide a substrate transfer apparatus capable of coping with the production of substrates having different sizes in view of the above points.

【0014】また、本発明の第2の目的は、待機位置に
おける占有スペースを小さくできて、基板処理装置をコ
ンパクトにすることができる基板搬送装置を提供するこ
とにある。
It is a second object of the present invention to provide a substrate transfer apparatus capable of reducing the space occupied at the standby position and making the substrate processing apparatus compact.

【0015】さらに、本発明の第3の目的は、大型の基
板や薄型の基板等を搬送する際に、基板が割れることを
防止できる基板搬送装置を提供することにある。
It is a third object of the present invention to provide a substrate transfer apparatus capable of preventing a substrate from being broken when a large or thin substrate is transferred.

【0016】[0016]

【課題を解決するための手段】上記課題を解決するため
に、本発明は、基板を水平に支持して搬送する基板搬送
装置において、基板を支持する一対の支持部材と、これ
ら支持部材の間隔を変更する間隔可変手段と、両支持部
材を一体に移動させる移動手段とを備えているものであ
る(請求項1)。
SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention relates to a substrate transport apparatus for horizontally supporting and transporting a substrate, comprising: a pair of support members for supporting the substrate; And variable means for moving both support members together (claim 1).

【0017】この装置によれば、基板を支持部材により
支持し、この状態で、支持部材が移動手段により移動さ
せられることにより基板が搬送される。このような基板
の搬送に際しては、間隔可変手段により基板の大きさに
応じて支持部材の間隔を変更することによって、サイズ
の異なる複数種類の基板の搬送が可能となる。また、基
板搬送装置が待機位置にあるときに、一対の支持部材同
士の間隔を小さくすることによって、待機位置における
基板搬送装置の占有スペースを小さくすることができ
る。さらに、基板のサイズに応じて支持部材の間隔を調
整することで、基板の大きさや材質に応じた最適な箇所
を支持することが可能となる。
According to this apparatus, the substrate is supported by the supporting member, and in this state, the substrate is transported by moving the supporting member by the moving means. In transferring such a substrate, a plurality of types of substrates having different sizes can be transferred by changing the interval between the support members according to the size of the substrate by the interval varying unit. Further, when the substrate transfer device is at the standby position, the space occupied by the substrate transfer device at the standby position can be reduced by reducing the interval between the pair of support members. Further, by adjusting the interval between the support members according to the size of the substrate, it is possible to support an optimum location according to the size and material of the substrate.

【0018】特に、上記のような装置において、基板よ
りも小さい支持部によって基板をその下方から保持する
基板保持手段に対して基板を授受する場合には、前記支
持部材と前記基板保持手段とを上下方向に相対的に変位
させる変位手段をさらに設けるようにすればよい(請求
項2)。
In particular, in the above-described apparatus, when the substrate is transferred to and from the substrate holding means for holding the substrate from below by a support portion smaller than the substrate, the support member and the substrate holding means are connected to each other. What is necessary is just to provide the displacement means which relatively displaces up and down direction (claim 2).

【0019】このようにすれば、支持部材の間隔を、基
板保持手段に保持された基板よりも大きくして当該基板
の下方に配置し、支持部材の間隔を当該基板の間隔より
も狭くした後、支持部材を基板保持手段に対して相対的
に上方に移動させることにより基板保持手段から基板を
取上げることができる。また、これと逆の動作を行わせ
ることにより支持部材から基板保持手段へと基板を受け
渡すことができる。
According to this structure, the distance between the supporting members is set to be larger than the substrate held by the substrate holding means and is disposed below the substrate, and after the distance between the supporting members is narrower than the distance between the substrates. By moving the support member upward relative to the substrate holding means, the substrate can be picked up from the substrate holding means. Further, by performing the reverse operation, the substrate can be transferred from the support member to the substrate holding means.

【0020】また、上記請求項1又は2記載の装置にお
いて、四角形の基板の対向する2辺に沿って基板を支持
するように支持部材を構成するようにすれば(請求項
3)、四角形の基板を確実に支持して搬送することがで
きる。
Further, in the apparatus according to the first or second aspect, if the supporting member is configured to support the substrate along two opposing sides of the rectangular substrate (claim 3), The substrate can be reliably supported and transported.

【0021】また、上記課題を解決するために、本発明
は、基板よりも小さい支持部によって基板をその下方か
ら保持する基板保持手段から基板を取上げて搬送する装
置において、基板を前記基板保持手段から取上げる取上
げ機構と、取上げた基板を移送する移送手段とを備え、
前記取上げ機構は、基板を水平に支持する一対の支持部
材と、これら支持部材の間隔を変更する間隔可変手段
と、前記基板保持手段と支持部材とを上下方向に相対的
に変位させる変位手段とを有する一方、前記移送手段
は、前記支持部材により支持された基板を受け取る受取
部材と、この受取部材を移動させる移動手段とを備えて
いるものである(請求項4)。
According to another aspect of the present invention, there is provided an apparatus for picking up and transporting a substrate from a substrate holding means for holding the substrate from below by a supporting portion smaller than the substrate. And a transfer mechanism for transferring the picked-up substrate,
The pick-up mechanism includes a pair of support members that horizontally support the substrate, an interval variable unit that changes an interval between these support members, and a displacement unit that relatively displaces the substrate holding unit and the support member in the vertical direction. The transfer means includes a receiving member for receiving the substrate supported by the support member, and a moving means for moving the receiving member (claim 4).

【0022】この装置によれば、基板保持手段によって
保持されている基板は、先ず、取外し機構により基板保
持手段から取上げられた後、移送手段によって次工程へ
と搬送される。この際、支持部材の間隔を基板保持手段
に保持された基板よりも大きくして当該基板の下方に配
置した後、支持部材の間隔を当該基板の間隔よりも狭く
して支持部材を基板保持手段に対して相対的に上方に移
動させることによって基板支持部材上の基板を取上げ機
構によって取上げることができる。
According to this apparatus, the substrate held by the substrate holding means is first picked up from the substrate holding means by the removing mechanism, and then transported to the next step by the transfer means. At this time, the distance between the support members is set to be larger than the substrate held by the substrate holding means, and the support members are arranged below the substrate. The substrate on the substrate supporting member can be picked up by the picking-up mechanism by moving the board relatively upward with respect to.

【0023】特に、請求項2乃至4記載のいずれかの装
置において、前記支持部として基板を吸着保持する吸着
面を前記基板保持手段が有する場合には、基板保持手段
に保持されている基板を取上げる際に、支持部材の間隔
を基板の間隔よりも大きくした状態で両支持部材を基板
の下方に配置した後、各支持部材を基板保持手段に対し
て相対的に上方に移動させながら支持部材の間隔を漸減
させることにより、前記支持部材により基板を支持する
とともにその支持位置を基板の周縁部から中心部分に向
かって変位させるように前記支持部材、間隔可変手段及
び変位手段を構成するようにすれば、基板保持手段に吸
着保持されている基板の撓みを抑えながら吸着面から基
板を剥ぎ取ることが可能となる。
In particular, in the apparatus according to any one of claims 2 to 4, when the substrate holding means has a suction surface for sucking and holding the substrate as the support portion, the substrate held by the substrate holding means is used. At the time of picking up, after both support members are arranged below the substrate with the distance between the support members being larger than the distance between the substrates, the support members are moved while moving each support member relatively upward with respect to the substrate holding means. The support member, the interval variable means and the displacement means are configured to support the substrate by the support member and to displace the support position from the peripheral portion of the substrate toward the central portion by gradually reducing the interval of the substrate. This makes it possible to peel off the substrate from the suction surface while suppressing the bending of the substrate suction-held by the substrate holding means.

【0024】[0024]

【発明の実施の形態】本発明の実施の形態について図面
を用いて説明する。
Embodiments of the present invention will be described with reference to the drawings.

【0025】図1は、本発明に係る基板搬送装置の第1
の実施の形態を示す斜視図である。この基板搬送装置1
は、従来技術で説明したような基板処理装置、つまり複
数の処理部等を一列に並設した基板処理装置に適用され
る搬送装置である。
FIG. 1 shows a first embodiment of the substrate transfer apparatus according to the present invention.
It is a perspective view which shows embodiment. This substrate transfer device 1
Is a transfer apparatus applied to a substrate processing apparatus as described in the related art, that is, a substrate processing apparatus in which a plurality of processing units and the like are arranged in a line.

【0026】基板搬送装置1は、同図に示すような角形
基板W(以下、単に基板Wという)を支持するための可
動部材16を有しており、この可動部材16を処理部等
の並設方向(X軸方向という)に移動させるように構成
されている。
The substrate transfer apparatus 1 has a movable member 16 for supporting a rectangular substrate W (hereinafter simply referred to as a substrate W) as shown in FIG. It is configured to move in the setting direction (referred to as X-axis direction).

【0027】すなわち、基板搬送装置1は、X軸方向に
延びる一対の固定レール13と、サーボモータ15によ
り回転駆動されるボールねじ軸14とを備えたガイド板
12を各処理部等の配設箇所の側部上方に有しており、
上記固定レール13に可動部材16のフレーム20が移
動可能に装着されるとともに、このフレーム20に設け
られたナット部分(図示せず)が上記ボールねじ軸13
に螺合している。そして、サーボモータ15の作動によ
るボールねじ軸14の正逆回転に応じて上記可動部材1
6が固定レール13に沿ってX軸方向に移動するように
なっている。つまり、これらフレーム20、固定レール
13及びボールねじ軸14等により、後記アーム22を
移動させる本願の移動手段が構成されている。
That is, the substrate transfer apparatus 1 includes a guide plate 12 provided with a pair of fixed rails 13 extending in the X-axis direction and a ball screw shaft 14 driven to rotate by a servomotor 15 in each processing section. It has it above the side of the place,
A frame 20 of the movable member 16 is movably mounted on the fixed rail 13, and a nut portion (not shown) provided on the frame 20 is connected to the ball screw shaft 13.
Is screwed into. The movable member 1 is moved according to the forward / reverse rotation of the ball screw shaft 14 by the operation of the servo motor 15.
6 moves in the X-axis direction along the fixed rail 13. That is, the frame 20, the fixed rail 13, the ball screw shaft 14, and the like constitute a moving unit of the present application for moving the arm 22 described later.

【0028】可動部材16のフレーム20は、同図に示
すようにガイド板12と略平行な鉛直面部20aと、そ
の上端に連設される水平な上面部20bとからなる逆L
字型に形成されており、上記鉛直面部20aを介してガ
イド板12の固定レール13に装着されている。
As shown in the figure, the frame 20 of the movable member 16 has a vertical surface portion 20a substantially parallel to the guide plate 12 and a horizontal upper surface portion 20b connected to the upper end thereof.
The guide plate 12 is mounted on the fixed rail 13 of the guide plate 12 via the vertical surface portion 20a.

【0029】フレーム20の上面部20bには、水平面
上でX軸方向と直交する方向(Y軸方向という)に突出
する基板支持用の一対の軸状のアーム22(支持部材)
が設けられている。そして、これらのアーム22が、基
板サイズよりも若干広い間隔となる離間位置と、この離
間位置よりも充分に間隔が狭くなる接近位置とに変位可
能に支持されている。
On the upper surface 20b of the frame 20, a pair of shaft-like arms 22 (support members) for supporting the substrate, which protrude on a horizontal plane in a direction orthogonal to the X-axis direction (referred to as Y-axis direction).
Is provided. The arms 22 are supported so as to be displaceable between a separated position where the interval is slightly wider than the substrate size and an approach position where the interval is sufficiently narrower than the separated position.

【0030】すなわち、フレーム20の上面部20aに
は、X軸方向に延びる一対の固定レール24が設けら
れ、これら固定レール24に跨って一対の可動片25が
装着されているとともに、これら可動片25に上記アー
ム22がそれぞれ支持されている。また、上面部20a
に固定された一対のエアシリンダ26のロッド先端がこ
れら可動片25にそれぞれ接続されている。そして、こ
れらエアシリンダ26の作動に応じて各可動片25が固
定レール24に沿って移動させられ、各エアシリンダ2
6のロッド突出駆動状態で各可動片25が互いに離間す
る位置(図中実線で示す位置)に、各エアシリンダ26
のロッド引込み駆動状態で各可動片25が互いに接近す
る位置(図中二点鎖線で示す位置)にそれぞれ配置さ
れ、これに応じて両アーム22が離間位置と接近位置と
に変位させられるようになっている。つまり、これら固
定レール24及び可動片25等により本願の間隔可変手
段が構成されている。
That is, a pair of fixed rails 24 extending in the X-axis direction are provided on the upper surface portion 20a of the frame 20, and a pair of movable pieces 25 are mounted across the fixed rails 24. Each of the arms 22 is supported by 25. Also, the upper surface portion 20a
The ends of the rods of a pair of air cylinders 26 fixed to the movable pieces 25 are connected to these movable pieces 25, respectively. Each movable piece 25 is moved along the fixed rail 24 in response to the operation of these air cylinders 26, and each air cylinder 2 is moved.
In the position where the movable pieces 25 are separated from each other in the rod projecting drive state of FIG.
In the rod retracting drive state, the movable pieces 25 are respectively arranged at positions approaching each other (positions shown by two-dot chain lines in the drawing), and the two arms 22 are displaced between the separated position and the approach position accordingly. Has become. That is, the fixed rail 24, the movable piece 25, and the like constitute the interval varying means of the present application.

【0031】各アーム22には、基板Wを支持する複数
の支持爪32が軸方向に一定の間隔で装着されており、
図示の例では、3つの支持爪32が等間隔で各アーム2
2にそれぞれ装着されている。各アーム22に装着され
る支持爪32は、図2に示すように、左右対称(同図で
左右対称)なL字型の形状とされ、基板Wを支持する支
持部33aと、その外側に設けられる垂直な当り面33
bとを有している。
A plurality of support claws 32 for supporting the substrate W are mounted on each arm 22 at regular intervals in the axial direction.
In the illustrated example, three support claws 32 are provided at equal intervals on each arm 2.
2 respectively. As shown in FIG. 2, the support claws 32 attached to each arm 22 have an L-shape that is bilaterally symmetric (ie, bilaterally symmetric in the figure). Vertical contact surface 33 provided
b.

【0032】各アーム22は、それぞれその基端部が可
動片25に設けられた支持ブロック28にベアリングを
介して回転可能に支持されているとともに、可動片25
に固定されたエアシリンダ30のロッド先端にリンク2
9を介して連結されており、各エアシリンダ30の作動
に応じて回転させられるようになっている。
Each arm 22 has a base end rotatably supported by a support block 28 provided on the movable piece 25 via a bearing.
Link 2 at the rod end of the air cylinder 30 fixed to
9 and is rotated in accordance with the operation of each air cylinder 30.

【0033】そして、各エアシリンダ30のロッド引込
み駆動状態において、図2の実線に示すように支持部3
3aをアーム22の間に介在させる位置に支持爪32を
保持する一方(以下、この位置を支持位置という)、各
エアシリンダ30のロッド突出駆動状態において、同図
の一点鎖線に示すように支持部33をアーム22の外側
に退避させるように支持爪32を保持する(以下、この
位置を退避位置という)ようになっている。
When the air cylinders 30 are driven to retract the rods, as shown by the solid line in FIG.
While the support claw 32 is held at a position where the 3a is interposed between the arms 22 (hereinafter, this position is referred to as a support position), in a rod protruding drive state of each air cylinder 30, the support is carried out as shown by a dashed line in FIG. The support claw 32 is held so as to retract the portion 33 to the outside of the arm 22 (hereinafter, this position is referred to as a retracted position).

【0034】以上のように構成された基板搬送装置1に
よれば、例えば、以下に説明するようにして基板を搬送
することができる。なお、以下の説明では、隣設された
2つの処理部の間で基板Wを搬送し、各処理部に設けら
れた昇降可能なステージ(基板の支持台;基板保持手
段)との間で基板Wの受渡しを行う例について説明す
る。ここで、ステージは基板Wよりもやや小さく形成さ
れ、基板Wの略中央部で基板Wを下方から水平に支持す
るように構成されているものとする。
According to the substrate transfer apparatus 1 configured as described above, for example, a substrate can be transferred as described below. In the following description, the substrate W is transported between two adjacent processing units, and the substrate W is moved between a vertically movable stage (substrate support; substrate holding means) provided in each processing unit. An example in which W is delivered will be described. Here, it is assumed that the stage is formed slightly smaller than the substrate W, and is configured to horizontally support the substrate W from below at a substantially central portion of the substrate W.

【0035】まず、図3(a)に示すように、処理部E
aから基板Wを受け取るべくサーボモータ15の作動に
応じて可動部材16を処理部Eaの上方に配置する。こ
の際、各アーム22は離間位置に保持し、また、各支持
爪32は退避位置に保持しておく。
First, as shown in FIG.
The movable member 16 is disposed above the processing unit Ea in accordance with the operation of the servo motor 15 so as to receive the substrate W from a. At this time, each arm 22 is held at the separated position, and each support claw 32 is held at the retracted position.

【0036】可動部材16を処理部Eaの上方に配置し
たら、処理部Eaのステージ34を上昇させて、ステー
ジ上に支持されている基板Wを両アーム22の間を介し
て可動部材16の上方に持ち上げる。そして、アーム2
2を回転させて各支持爪32を支持位置に変位させた後
(図3(b))、ステージ34を下降させて基板WのX
軸方向に対向する2辺に沿って端縁部を各支持爪32に
よって支持させる。これによりステージ34の基板Wを
可動部材16により受け取る(図3(c))。
When the movable member 16 is arranged above the processing section Ea, the stage 34 of the processing section Ea is raised, and the substrate W supported on the stage is moved above the movable member 16 via the two arms 22. To lift. And arm 2
2 is rotated to displace each support claw 32 to the support position (FIG. 3B), and then the stage 34 is lowered to move the X of the substrate W.
An edge portion is supported by each support claw 32 along two sides facing each other in the axial direction. Thus, the substrate W on the stage 34 is received by the movable member 16 (FIG. 3C).

【0037】基板Wを受け取ったら、次いでサーボモー
タ15の作動に応じて可動部材16を隣の処理部Ebの
上方へと移動させる。なお、搬送中は、上記のように支
持爪32に当り面33bが設けられているため、例え
ば、可動部材16の加速時、あるいは減速時であっても
基板Wの端部がこの当り面33bに当接することで、基
板WがX軸方向に大きくずれてアーム22から脱落等す
ることが防止される。
When the substrate W is received, the movable member 16 is moved above the adjacent processing unit Eb in accordance with the operation of the servo motor 15. During the transfer, since the contact surface 33b is provided on the support claw 32 as described above, for example, even when the movable member 16 is accelerated or decelerated, the end of the substrate W is kept at the contact surface 33b. , The substrate W is prevented from being largely displaced in the X-axis direction and falling off the arm 22.

【0038】可動部材16を処理部Ebの上方に配置し
たら、上記処理部Eaから可動部材16への基板Wの受
渡し動作と逆の動作を行わわせることにより、処理部E
bのステージ34へと基板Wを受渡すようにする。
When the movable member 16 is arranged above the processing section Eb, the operation reverse to the transfer operation of the substrate W from the processing section Ea to the movable member 16 is performed.
The substrate W is delivered to the stage 34b.

【0039】こうして処理部Eaから処理部Ebへと基
板Wを搬送した後は、図3(d)に示すように、エアシ
リンダ26の作動に応じて各アーム22を離間位置から
接近位置へと変位させ、例えば、各処理部Ea,Ebの
間の所定の待機スペース(同図に示す位置)へと可動部
材16を移動させる。そして、次回の搬送時までこの待
機スペースにおいて可動部材16を待機させるようにす
る。
After the substrate W is transferred from the processing unit Ea to the processing unit Eb, the arms 22 are moved from the separated position to the approach position according to the operation of the air cylinder 26 as shown in FIG. For example, the movable member 16 is moved to a predetermined standby space (the position shown in the drawing) between the processing units Ea and Eb. Then, the movable member 16 is made to wait in this standby space until the next transport.

【0040】このように上記基板搬送装置1によれば、
X軸方向、つまり基板Wの搬送方向に一対のアーム22
を設け、これらアーム22により搬送方向に対向する2
辺に沿って基板端縁部を支持して搬送するようにしなが
らも、アーム22が離間位置と接近位置とに変位可能と
されているので、待機時には、上述のようにアーム22
を接近位置に保持して可動部材16のX軸方向の占有ス
ペースを小さくして待機させることができる。そのた
め、大型の基板を製造する装置に適用する場合であって
も、待機スペースのX軸方向への拡大を抑えることがで
き、従来のこの種の搬送装置のように、処理基板の大型
化に伴い待機スペースがX軸方向に大きくなって製造装
置の大型化を助長するといった事態を効果的に回避する
ことができる。
As described above, according to the substrate transfer device 1,
A pair of arms 22 are arranged in the X-axis direction,
2 which are opposed in the transport direction by these arms 22
Since the arm 22 can be displaced between the separated position and the approach position while supporting and transporting the substrate edge along the side, during standby, the arm 22 is moved as described above.
Can be held at the approaching position to reduce the space occupied by the movable member 16 in the X-axis direction and make the movable member 16 stand by. Therefore, even when the present invention is applied to an apparatus for manufacturing a large-sized substrate, it is possible to suppress the expansion of the standby space in the X-axis direction. Accordingly, it is possible to effectively avoid a situation in which the standby space increases in the X-axis direction and the size of the manufacturing apparatus is increased.

【0041】なお、上記の例では、アーム22の間隔
を、基板Wを支持する離間位置と、待機時の接近位置と
の2つの間隔に変位させるようにしているが、例えば、
アーム22の間隔を、上記離間位置と接近位置との間の
一乃至複数の間隔で保持できるように構成してもよい。
この場合、例えば、ソレノイド駆動により作動して可動
片25の移動を阻止する一乃至複数のストッパ部材を各
可動片25の移動方向に設け、エアシリンダ26のロッ
ト突出駆動状態時に、このストッパ部材を選択的に作動
させるようにすればよい。このようにすれば、アーム2
2の間隔を種々変更できるため、X軸方向にサイズの異
なる複数種類の基板Wを搬送することが可能となり、こ
れにより基板搬送装置1の機能性をより高めるができ
る。
In the above example, the interval between the arms 22 is displaced to two intervals, that is, the separated position for supporting the substrate W and the approach position during standby.
The distance between the arms 22 may be maintained at one or more intervals between the separated position and the approach position.
In this case, for example, one or a plurality of stopper members which are operated by solenoid driving to prevent the movement of the movable piece 25 are provided in the moving direction of each movable piece 25, and when the air cylinder 26 is driven to protrude the lot, this stopper member is What is necessary is just to make it operate selectively. In this way, arm 2
2 can be changed variously, so that it is possible to transport a plurality of types of substrates W having different sizes in the X-axis direction, thereby further improving the functionality of the substrate transport apparatus 1.

【0042】次に、本発明の第2の実施の形態について
図面を用いて説明する。
Next, a second embodiment of the present invention will be described with reference to the drawings.

【0043】図4は、第2の実施の形態に係る基板搬送
装置を示す斜視図である。この基板搬送装置2は、基本
的には上記第1の実施の形態の基板搬送装置1と共通の
構成となっているが、主にアーム22の間隔を変化させ
る機構として以下に説明するような機構が採用されてい
る点で上記基板搬送装置1と構成が相違している。な
お、以下の説明では、上記基板搬送装置1と共通する部
分については同一の符号を付してその説明を省略し、相
違点についてのみ説明する。
FIG. 4 is a perspective view showing a substrate transfer apparatus according to the second embodiment. The substrate transfer device 2 has basically the same configuration as the substrate transfer device 1 of the first embodiment, but is mainly described as a mechanism for changing the interval between the arms 22 as described below. The configuration is different from that of the substrate transfer apparatus 1 in that a mechanism is employed. In the following description, the same parts as those of the substrate transfer apparatus 1 are denoted by the same reference numerals, and the description thereof will be omitted. Only the differences will be described.

【0044】この基板搬送装置2では、同図に示すよう
に可動部材16のフレーム20がガイド板12と略平行
な平板とされ、これにX軸方向に延びる固定レール38
と、プーリ43a、43b及び伝動ベルト41を介して
サーボモータ40により回転駆動されるボールねじ軸4
2とが設けられ、上記固定レール38に一対の可動ブロ
ック36が移動可能に装着されるとともに、これら各可
動ブロック36に設けられたナット部分37が上記ボー
ルねじ軸42にそれぞれ螺合している。ボールねじ軸4
2には軸方向中心を境にその両側にそれぞれ反対方向の
ねじが形成されており(ねじ部42a,42bとい
う)、一方の可動ブロック36がねじ部42aに、他方
の可動ブロック36がねじ部42bにそれぞれ螺合して
いる。
In the substrate transfer apparatus 2, the frame 20 of the movable member 16 is a flat plate substantially parallel to the guide plate 12, as shown in FIG.
And a ball screw shaft 4 rotationally driven by a servomotor 40 via pulleys 43a and 43b and a transmission belt 41.
2, a pair of movable blocks 36 are movably mounted on the fixed rail 38, and nut portions 37 provided on each of the movable blocks 36 are screwed to the ball screw shafts 42, respectively. . Ball screw shaft 4
2 is formed with screws in opposite directions on both sides of the center of the axial direction (referred to as screw portions 42a and 42b). One movable block 36 is a screw portion 42a, and the other movable block 36 is a screw portion. 42b.

【0045】そして、各可動ブロック36の上部はフレ
ーム20及びガイド板12よりも上方に突出しており、
この突出部分に各アーム22が突設されている。
The upper part of each movable block 36 projects above the frame 20 and the guide plate 12, and
Each arm 22 protrudes from the protruding portion.

【0046】すなわち、サーボモータ40の作動により
ボールねじ軸14が正逆回転すると、これに応じて可動
ブロック36が固定レール38に沿って互いに反対方向
に均等に移動し、これによりアーム22の間隔が変化さ
せられるようになっている。
That is, when the ball screw shaft 14 rotates forward and backward by the operation of the servo motor 40, the movable blocks 36 are moved uniformly in opposite directions along the fixed rails 38 in accordance with the forward and reverse movements. Can be changed.

【0047】なお、第2の実施の形態の基板搬送装置2
では、上記基板搬送装置1のように各アーム22を回転
させるための機構は設けられておらず、また、アーム2
2には、上記支持爪32に代えて柱状の支持体44が装
着されている。
The substrate transfer device 2 according to the second embodiment
Is not provided with a mechanism for rotating each arm 22 unlike the substrate transfer apparatus 1 described above.
The column 2 is provided with a columnar support 44 instead of the support claw 32.

【0048】以上のように構成された基板搬送装置2に
よれば、上記のような処理部Ea,Eb間での基板Wの
搬送を、例えば、以下のようにして行わせることができ
る。
According to the substrate transfer apparatus 2 configured as described above, the transfer of the substrate W between the processing units Ea and Eb as described above can be performed, for example, as follows.

【0049】まず、図5(a)に示すように、処理部E
aから基板Wを受け取るべく可動部材16を処理部Ea
の上方に配置する。この際、各アーム22は少なくとも
基板Wの幅(X軸方向の寸法)よりも広い間隔に保持し
ておく。
First, as shown in FIG.
The movable member 16 is moved to the processing section Ea to receive the substrate W from
Above. At this time, the arms 22 are held at intervals wider than at least the width of the substrate W (dimension in the X-axis direction).

【0050】可動部材16を処理部Eaの上方に配置し
たら、処理部Eaのステージ34を上昇させて、ステー
ジ上に支持されている基板Wを両アーム22の間を介し
て可動部材16の上方に持ち上げる。そして、アーム2
2の間隔を基板Wの幅よりも狭くした後(図5
(b))、ステージ34を下降させることにより基板W
の端縁部を各支持体44によって支持する。これにより
ステージ34の基板Wを可動部材16によって受け取る
(図5(c))。
When the movable member 16 is disposed above the processing section Ea, the stage 34 of the processing section Ea is raised to move the substrate W supported on the stage above the movable member 16 via the two arms 22. To lift. And arm 2
2 is smaller than the width of the substrate W (FIG. 5).
(B)) By lowering the stage 34, the substrate W
Is supported by each support 44. Thus, the substrate W on the stage 34 is received by the movable member 16 (FIG. 5C).

【0051】この際、例えば、生産ロットの変更等によ
り搬送すべき基板Wのサイズが生産途中で変更になるよ
うな場合には、搬送すべき基板Wのサイズに応じて適
宜、アーム22の間隔を変更させて基板Wを支持させる
ようにする。
At this time, for example, when the size of the substrate W to be transferred is changed during the production due to a change in the production lot or the like, the interval between the arms 22 is appropriately determined according to the size of the substrate W to be transferred. Is changed to support the substrate W.

【0052】基板Wを受け取ったら、次いで可動部材1
6を処理部Ebの上方へと移動させ、その後、上記受取
り時の動作と逆の動作を行わせることにより処理部Eb
のステージ34へと基板Wを受渡すようにする。
After receiving the substrate W, the movable member 1
6 is moved above the processing unit Eb, and then the operation reverse to the above-described operation at the time of receiving is performed, thereby processing the processing unit Eb.
The substrate W is delivered to the stage 34 of FIG.

【0053】処理部Eaから処理部Ebへと基板Wを搬
送した後は、図5(d)に示すように、アーム22の間
隔を最も狭くし、両処理部Ea,Ebの間の待機スペー
スへと可動部材16を移動させて待機させるようにす
る。
After the transfer of the substrate W from the processing section Ea to the processing section Eb, as shown in FIG. 5D, the interval between the arms 22 is minimized, and the standby space between the processing sections Ea and Eb is reduced. The movable member 16 is moved to a standby state.

【0054】このような基板搬送装置2によれば、アー
ム22をボールねじ機構を用いて移動させるようにして
いるため、可動ブロック36の移動可能な範囲内で、ア
ーム22の間隔を任意の間隔に設定することができる。
従って、上記第1の実施の形態の装置にストッパ部材を
設けた装置に比べると、より多くのサイズの基板Wを搬
送することができるという利点がある。
According to such a substrate transfer device 2, since the arm 22 is moved using the ball screw mechanism, the distance between the arms 22 can be set to an arbitrary value within the movable range of the movable block 36. Can be set to
Therefore, there is an advantage that a substrate W of a larger size can be transferred as compared with the apparatus in which the stopper member is provided in the apparatus of the first embodiment.

【0055】しかも、この装置のアーム22は支持体4
4を介して基板Wを下方から支持するだけ、つまり、第
1の実施の形態のアーム22のように基板Wの搬送中の
ずれを防止するような部分(支持爪32の当り面33
b)が設けられていないため、基板Wを支持する位置
は、基板Wの端縁部に限られず、基板Wの中心(X軸方
向中心)に近い場所を支持することもできる。従って、
例えば、X軸方向の寸法が大きく、端縁部を支持すると
基板Wの撓みが大きくなって破損の虞れがあるような大
型の基板については、基板Wの撓みが小さくなるように
アーム22の間隔を狭く設定して搬送することが可能で
あり、これにより当該大型の基板を適切に搬送するがで
きるという特徴もある。
In addition, the arm 22 of this device is
4 only supports the substrate W from below, that is, a portion that prevents the substrate W from being displaced during conveyance as in the arm 22 of the first embodiment (the contact surface 33 of the support claw 32).
Since b) is not provided, the position for supporting the substrate W is not limited to the edge of the substrate W, and a position near the center of the substrate W (the center in the X-axis direction) can also be supported. Therefore,
For example, for a large-sized substrate having a large dimension in the X-axis direction and supporting the edge portion, the bending of the substrate W is likely to be large and the substrate W may be damaged. It is possible to transfer the substrate at a narrow interval, and thus, there is a feature that the large substrate can be appropriately transferred.

【0056】なお、この装置において基板Wの搬送中の
ずれを防止する必要がある場合には、例えば、可動部材
16において、アーム22による基板Wの支持位置の下
方に、図6に示すような補助支持機構45を設けるよう
にすればよい。すなわち、ロッド先端にゴム製の支持体
47を取付けたエアシリンダ46をブラケット48等を
介してフレーム20に取り付け、エアシリンダ46のロ
ッド突出駆動状態(同図の一点鎖線に示す状態)で支持
体47を基板Wの裏面に当接させるように構成した補助
支持機構45を可動部材16に設けるようにすればよ
い。このような補助支持機構45を設ければ、基板Wの
搬送中には、エアシリンダ46をロッド突出駆動状態と
して支持体47を基板Wに当接させることによって基板
Wのずれを効果的に防止することができる。なお、支持
体47として吸盤を用いるようにすれば、より効果的に
基板Wのずれを防止することができる。
When it is necessary to prevent the displacement of the substrate W during the transfer in this apparatus, for example, the movable member 16 is placed below the position where the arm 22 supports the substrate W as shown in FIG. What is necessary is just to provide the auxiliary support mechanism 45. That is, the air cylinder 46 having the rubber support 47 attached to the rod tip is attached to the frame 20 via the bracket 48 or the like, and the support is carried out in the rod protruding drive state of the air cylinder 46 (the state shown by the one-dot chain line in the figure). What is necessary is just to provide the auxiliary | assistant support mechanism 45 comprised so that 47 may contact the back surface of the board | substrate W in the movable member 16. FIG. If such an auxiliary support mechanism 45 is provided, the displacement of the substrate W is effectively prevented by bringing the air cylinder 46 into a rod protruding drive state and bringing the support 47 into contact with the substrate W during the transport of the substrate W. can do. If a suction cup is used as the support 47, the displacement of the substrate W can be more effectively prevented.

【0057】次に、本発明の第3の実施の形態について
図面を用いて説明する。
Next, a third embodiment of the present invention will be described with reference to the drawings.

【0058】図7は、第3の実施の形態に係る基板搬送
装置を示す斜視図である。この基板搬送装置3の構成
は、大部分が第2の実施の形態の基板搬送装置2と共通
しており、アーム22がベアリングを介して可動ブロッ
ク36に回転自在に支持されている点、および上記支持
体44に代えて図9に示すようなそろばん玉形状の支持
体50がアーム22に装着されている点で上記基板搬送
装置2と構成が相違している。すなわち、この基板搬送
装置3では、基板Wを支持した状態でサーボモータ40
を作動させて可動ブロック36を移動させると、基板W
と支持体50との摩擦によりアーム22が可動ブロック
36に対して回転するように構成されており、これによ
って搬送中であってもアーム22による基板Wの支持位
置を変更できるようになっている。
FIG. 7 is a perspective view showing a substrate transfer device according to the third embodiment. The configuration of the substrate transfer device 3 is substantially the same as that of the substrate transfer device 2 of the second embodiment, and the arm 22 is rotatably supported by a movable block 36 via a bearing. The configuration is different from that of the substrate transfer device 2 in that an abacus ball-shaped support 50 as shown in FIG. 9 is mounted on the arm 22 instead of the support 44. That is, in the substrate transfer device 3, the servo motor 40
Is operated to move the movable block 36, the substrate W
The arm 22 is configured to rotate with respect to the movable block 36 due to friction between the arm 22 and the support 50, so that the support position of the substrate W by the arm 22 can be changed even during conveyance. .

【0059】このような第3の実施の形態の基板搬送装
置3によれば、上記のような処理部Ea,Eb間での基
板Wの搬送を以下のようにして行うことができる。な
お、以下の説明では、ステージ34において基板Wを吸
着した状態で保持するように各処理部Ea,Ebが構成
されているものとする。
According to the substrate transfer apparatus 3 of the third embodiment, the transfer of the substrate W between the processing units Ea and Eb as described above can be performed as follows. In the following description, it is assumed that the processing units Ea and Eb are configured to hold the substrate W in a state of being sucked on the stage 34.

【0060】まず、処理部Eaから基板Wを受け取る際
には、第2の実施の形態の基板搬送装置2と同様に、各
アーム22を少なくとも基板Wの幅(X軸方向の寸法)
よりも広い間隔に保持した状態で可動部材16を処理部
Eaの上方に配置し、その後、処理部Eaのステージ3
4を上昇させて、基板Wを両アーム22の間を介して可
動部材16の上方に持ち上げる(図5(a),(b)参
照)。
First, when the substrate W is received from the processing unit Ea, each arm 22 is at least the width of the substrate W (dimension in the X-axis direction), as in the substrate transfer device 2 of the second embodiment.
The movable member 16 is disposed above the processing unit Ea while holding the movable member 16 at a wider interval, and then the stage 3 of the processing unit Ea
4 is lifted, and the substrate W is lifted above the movable member 16 via between the arms 22 (see FIGS. 5A and 5B).

【0061】そして、アーム22の間隔を基板Wの幅よ
りも狭くした後(図8(a))、ステージ34を下降さ
せることにより基板Wの端縁部をアーム22の支持体5
0によって支持させるとともに、ステージ34の下降に
伴いアーム22の間隔を徐々に狭める(図8(b),
(c))。こうすることでステージ34に吸着されてい
る基板Wをその端部から徐々に剥ぎ取るようにする。
After the interval between the arms 22 is made smaller than the width of the substrate W (FIG. 8A), the stage 34 is lowered to move the edge of the substrate W to the support 5 of the arm 22.
0, and the distance between the arms 22 is gradually narrowed as the stage 34 is lowered (FIG. 8B,
(C)). By doing so, the substrate W adsorbed on the stage 34 is gradually peeled off from its end.

【0062】処理部Eaのステージ34から基板Wを剥
ぎ取ったら、可動部材16を処理部Ebの上方へと移動
させるとともに、この搬送中に、例えば、基板Wの撓み
が大きくならないようにアーム22の間隔を調整して基
板Wをそのサイズや材質に応じた最適な位置で支持する
ようにする(図8(d))。
After the substrate W is peeled off from the stage 34 of the processing section Ea, the movable member 16 is moved above the processing section Eb, and the arm 22 is moved during the transfer so that, for example, the bending of the substrate W does not increase. Is adjusted so that the substrate W is supported at an optimal position according to its size and material (FIG. 8D).

【0063】そして、処理部Ebへ基板Wを受け渡す際
には、上記の動作と逆の動作を行わせることにより処理
部Ebのステージ34へと基板Wを受渡すようにする。
When the substrate W is transferred to the processing unit Eb, the substrate W is transferred to the stage 34 of the processing unit Eb by performing an operation reverse to the above operation.

【0064】このような基板搬送装置3によれば、基板
Wの撓みによる損傷等を回避して適切に基板Wをステー
ジ34から取上げて搬送することができる。
According to such a substrate transfer apparatus 3, the substrate W can be properly picked up from the stage 34 and transferred while avoiding damage or the like due to bending of the substrate W.

【0065】すなわち、ステージ34に吸着されている
基板Wを可動部材16により取上げる場合、例えば、第
2の実施の形態の基板搬送装置2のように、基板Wの両
端部をアーム22で固定的に支持し、ステージ34の下
降に伴い基板Wをステージ34から取上げることも可能
である。しかし、この場合にはアーム22の間隔が一定
であるため、例えば、X軸方向の寸法が大きい基板Wに
ついてはステージ34の下降に伴い基板Wの中央部分が
下方に引っ張れて基板Wが大きく撓み、これによって基
板Wが破損に至る事が考えられる。しかし、上述のよう
な基板搬送装置2の動作によれば、ステージ34の下降
に伴い、基板Wとステージ34との間でアーム22が基
板Wの中心部分に向かって移動するため、基板Wを大き
く撓ませることなく基板Wをステージ34から良好に剥
離させることができる。従って、X軸方向の寸法が大き
な大型の基板Wを搬送する場合であっても、撓みによる
損傷等の発生を招くことなく適切に基板Wをステージ3
4から取上げることができる。
That is, when the substrate W adsorbed on the stage 34 is picked up by the movable member 16, for example, both ends of the substrate W are fixed by the arm 22 as in the substrate transfer device 2 of the second embodiment. , And the substrate W can be picked up from the stage 34 as the stage 34 moves down. However, in this case, since the interval between the arms 22 is constant, for example, with respect to the substrate W having a large dimension in the X-axis direction, the center portion of the substrate W is pulled downward as the stage 34 is lowered, and the substrate W is largely bent. This may cause the substrate W to be damaged. However, according to the operation of the substrate transfer device 2 as described above, the arm 22 moves toward the center of the substrate W between the substrate W and the stage 34 as the stage 34 descends. The substrate W can be satisfactorily separated from the stage 34 without being greatly bent. Therefore, even when a large substrate W having a large dimension in the X-axis direction is transported, the substrate W can be appropriately placed on the stage 3 without causing damage or the like due to bending.
You can pick up from 4.

【0066】また、基板Wの両端部を支持して搬送する
場合、基板Wが大型化すると、搬送中の撓みが大きくな
り、これに起因して基板Wが破損し易くなることが考え
られるが、基板搬送装置3によれば、上述のように搬送
中にアーム22の間隔を調整しながら基板Wをそのサイ
ズ等に応じた最適な位置で支持して搬送することができ
るため、大型の基板Wを搬送する場合であっても基板W
を大きく撓ませることなく搬送することができる。その
ため、撓みによる損傷等の発生を招くことなく適切に基
板Wを搬送することができる。
When the substrate W is transported while supporting both ends thereof, if the substrate W is enlarged, the bending during the transportation is increased, and the substrate W may be easily damaged due to this. According to the substrate transport apparatus 3, the substrate W can be supported and transported at an optimum position according to the size and the like while adjusting the interval between the arms 22 during the transport as described above, so that the large substrate Even when transporting W, substrate W
Can be transported without significantly bending. Therefore, the substrate W can be appropriately transported without causing damage or the like due to bending.

【0067】なお、この基板搬送装置3では、上記のよ
うに支持体50を介して基板Wにアーム22を接触させ
た状態のままで、アーム22の位置を移動させるため、
例えば軽量の基板W等については、アーム22の移動に
伴い基板Wの位置が正規の支持位置からずれてしまうこ
とが考えられる。従って、この基板搬送装置3について
も、図4に示したような補助支持機構45を設けて基板
Wのずれを防止するようにするのが望ましい。
In the substrate transfer apparatus 3, since the position of the arm 22 is moved while the arm 22 is in contact with the substrate W via the support 50 as described above,
For example, for a lightweight substrate W or the like, the position of the substrate W may deviate from the normal support position as the arm 22 moves. Therefore, it is preferable that the substrate transfer device 3 is also provided with the auxiliary support mechanism 45 as shown in FIG.

【0068】また、この基板搬送装置3では、アーム2
2の基端部をベアリングを介して可動ブロック36で回
転可能に支持しているが、アーム22の軸方向寸法が長
い場合には、アーム22の曲げモーメントが大きくなっ
て回転をスムーズに行わせることが難しくなるので、こ
のような場合には、例えば、アーム22を可動ブロック
36に対して固定し、支持体50をアーム22に対して
回転可能に装着するようにすればよい。
In this substrate transfer device 3, the arm 2
2 is rotatably supported by a movable block 36 via a bearing, but when the axial dimension of the arm 22 is long, the bending moment of the arm 22 is increased to allow smooth rotation. In such a case, for example, the arm 22 may be fixed to the movable block 36 and the support 50 may be rotatably mounted on the arm 22.

【0069】また、アーム22に装着される支持部材と
しては、上記支持体50のようなそろばん玉形状のもの
以外に、例えば、図10に示すようなねじ状の支持体5
1や、Oリング等のゴム製の支持体52を採用するよう
にしてもよい。
The supporting member mounted on the arm 22 may be, for example, a screw-shaped supporting member 5 as shown in FIG.
1, or a rubber support 52 such as an O-ring may be employed.

【0070】次に、本発明の第4の実施の形態について
図面を用いて説明する。
Next, a fourth embodiment of the present invention will be described with reference to the drawings.

【0071】図12は、第4の実施の形態に係る基板搬
送装置を示す斜視図である。同図に示す基板搬送装置4
は、処理部Ecに一体に組み込まれる基板の取外し機構
60と、基板Wをこの処理部Ecと他の処理部等との間
で移送する移送機構61(移送手段)とから構成されて
いる。
FIG. 12 is a perspective view showing a substrate transfer apparatus according to the fourth embodiment. Substrate transfer device 4 shown in FIG.
Is composed of a substrate removal mechanism 60 integrated into the processing unit Ec, and a transfer mechanism 61 (transfer means) for transferring the substrate W between the processing unit Ec and another processing unit.

【0072】同図に示すように、処理部Ecには基台8
0が設けられ、この基台80の上面に、基板Wを保持す
る昇降可能な四角形のステージ81と、上記取外し機構
60とが配設されている。ステージ81は、基板Wより
若干小さく形成されており、基板Wの中央部分を吸着し
た状態で略水平に保持するように構成されている。
As shown in the figure, the processing unit Ec includes a base 8
On the upper surface of the base 80, a vertically movable square stage 81 for holding the substrate W and the above-mentioned removal mechanism 60 are provided. The stage 81 is formed slightly smaller than the substrate W, and is configured to hold the central portion of the substrate W substantially horizontally while adsorbing the central portion.

【0073】取外し機構60は、下降端位置にセットさ
れたステージ81の上方に、ステージ81から基板Wを
取上げるための互いに平行な一対の支持軸64(支持部
材)を備えており、これら支持軸64の間隔を変化させ
得るように構成されている。
The detaching mechanism 60 has a pair of parallel support shafts 64 (support members) for picking up the substrate W from the stage 81 above the stage 81 set at the lower end position. It is configured such that the intervals of 64 can be changed.

【0074】すなわち、基台80上には、同図に示すよ
うにステージ81を挟んで支持軸64の軸方向(Y軸方
向という)と水平面上で直交する方向(X軸方向とい
う)に延びる一対の固定レール62と、プーリ67、6
8及び伝動ベルト69を介してサーボモータ66により
回転駆動されるボールねじ軸70とが設けられ、各支持
軸64の両端にそれぞれ装着された可動ブロック63
a,63bが各固定レール62に移動可能に装着されて
いるとともに、一方の固定レール62に装着されている
各可動ブロック63a,63bの各ナット部分が上記ボ
ールねじ軸70にそれぞれ螺合している。ボールねじ軸
70には軸方向中心を境にその両側にそれぞれ反対方向
のねじが形成されており(ねじ部70a,70bとい
う)、一方の可動ブロック63aがねじ部70aに、他
方の可動ブロック63bがねじ部70bにそれぞれ螺合
している。そして、サーボモータ66の作動によりボー
ルねじ軸14が正逆回転すると、各可動ブロック63
a,63bが各固定レール62に沿って互いに反対の方
向に向かって均等に移動し、これによって支持軸64の
間隔が変化させられるように構成されている。
That is, on the base 80, as shown in the figure, the support 81 extends in the direction orthogonal to the axial direction (Y-axis direction) of the support shaft 64 on the horizontal plane (X-axis direction) with the stage 81 interposed therebetween. A pair of fixed rails 62 and pulleys 67 and 6
8 and a ball screw shaft 70 driven to rotate by a servo motor 66 via a transmission belt 69, and movable blocks 63 mounted on both ends of each support shaft 64.
a and 63b are movably mounted on the fixed rails 62, and nut portions of the movable blocks 63a and 63b mounted on one of the fixed rails 62 are screwed to the ball screw shaft 70, respectively. I have. In the ball screw shaft 70, screws in opposite directions are formed on both sides of the center of the axial direction (referred to as screw portions 70a and 70b), and one movable block 63a is provided in the screw portion 70a and the other movable block 63b is provided. Are screwed into the screw portions 70b, respectively. When the ball screw shaft 14 rotates forward and reverse by the operation of the servo motor 66, each movable block 63
The a and 63b are configured to move evenly in opposite directions along each fixed rail 62, thereby changing the distance between the support shafts 64.

【0075】なお、各支持軸64には、基板Wを支持す
る支持体65が軸方向に一定の間隔で装着されており、
図示の例では、3つの支持体65が等間隔で各支持軸6
4に装着されている。支持体65は、上記第3の実施の
形態のアーム22に採用されていた支持体50と同一の
そろばん玉形状のもので(図9参照)、支持軸64に対
して回転自在に装着されている。
A support 65 for supporting the substrate W is mounted on each support shaft 64 at regular intervals in the axial direction.
In the illustrated example, three support members 65 are provided at equal intervals on each support shaft 6.
4 is attached. The support 65 has the same abacus ball shape as the support 50 employed in the arm 22 of the third embodiment (see FIG. 9), and is rotatably mounted on the support shaft 64. I have.

【0076】一方、移送機構61は、図外の移動機構に
よりX軸方向及びZ軸方向(鉛直方向)に移動可能な可
動部材72を有しており、この可動部材72に一定間隔
で配設される一対のアーム73(受取部材)を備えた構
成となっている。
On the other hand, the transfer mechanism 61 has a movable member 72 which can be moved in the X-axis direction and the Z-axis direction (vertical direction) by a movement mechanism (not shown). And a pair of arms 73 (receiving members).

【0077】アーム73は、基板サイズよりも若干広い
間隔で可動部材72に回転可能に支持されており、図外
の駆動機構により回転させられるようになっている。ま
た、アーム73には、基板Wを支持する複数の支持爪7
4が軸方向に一定の間隔で装着されており、図示の例で
は、3つの支持爪74が等間隔で各アーム73に装着さ
れている。
The arm 73 is rotatably supported by the movable member 72 at an interval slightly wider than the substrate size, and is rotated by a driving mechanism (not shown). The arm 73 has a plurality of support claws 7 for supporting the substrate W.
4 are mounted at regular intervals in the axial direction, and in the illustrated example, three support claws 74 are mounted on each arm 73 at regular intervals.

【0078】支持爪74は、上記第1の実施の形態のア
ーム73に採用されていた支持爪32(図2参照)と同
様に、基板Wを支持する支持部75を有したL字型のも
のとされており、駆動機構の作動によるアーム73の回
転に応じて、支持部75がアーム73の間に介在させら
れる支持位置と、支持部75がアーム73の外側に退避
させられる退避位置とに保持されるようになっている。
The support claw 74 is, like the support claw 32 (see FIG. 2) employed in the arm 73 of the first embodiment, an L-shaped support claw having a support portion 75 for supporting the substrate W. The support position is such that the support portion 75 is interposed between the arms 73 in accordance with the rotation of the arm 73 by the operation of the drive mechanism, and the retracted position is where the support portion 75 is retracted outside the arm 73. Is to be held.

【0079】以上のような基板搬送装置4によれば、処
理部Ecのステージ81に吸着、保持されている基板W
を、以下に説明するようにしてステージ81から取上げ
て他の処理部へと搬送することができる。
According to the substrate transport apparatus 4 described above, the substrate W held by the stage 81 of the processing unit Ec is held.
Can be picked up from the stage 81 and transported to another processing section as described below.

【0080】まず、処理部Ecから基板Wを受け取るべ
く移動機構61の可動部材72を処理部Ecの上方に配
置する。この際、支持爪74を退避位置に保持してお
く。また、ステージ81は下降端位置にセットしてお
く。さらに、取外し機構60の各支持軸64を基板Wの
幅よりも充分に広く離間した位置に配置しておく。
First, the movable member 72 of the moving mechanism 61 is arranged above the processing unit Ec to receive the substrate W from the processing unit Ec. At this time, the support claws 74 are held at the retracted position. The stage 81 is set at the lower end position. Further, the respective support shafts 64 of the detaching mechanism 60 are arranged at positions sufficiently separated from the width of the substrate W.

【0081】可動部材72を処理部Ecの上方に配置し
たら、図13(a)に示すようにステージ81を上昇さ
せて基板Wを各支持軸64よりも上方に配置するととも
に、支持軸64の間隔を狭めて各支持軸64を基板Wの
端部下方に配置する。
When the movable member 72 is arranged above the processing section Ec, the stage 81 is raised to arrange the substrate W above each support shaft 64 as shown in FIG. The support shafts 64 are arranged below the end of the substrate W with a reduced interval.

【0082】その後、ステージ81を下降させて基板W
の端縁部を支持体65を介して支持軸64により支持さ
せるとともに、このステージ81の下降に伴い支持軸6
4の間隔を徐々に狭めるようにする。これによりステー
ジ81に吸着されている基板Wをその端部から徐々に剥
ぎ取って両支持軸64上に支持するようにする(図13
(b)〜(d))。
Thereafter, the stage 81 is lowered to move the substrate W
Is supported by a support shaft 64 via a support body 65, and the support shaft 6
4 gradually narrow the interval. As a result, the substrate W adsorbed on the stage 81 is gradually peeled off from its end and is supported on both support shafts 64 (FIG. 13).
(B)-(d)).

【0083】こうして基板Wを支持軸64上に支持した
ら、次いで、可動部材72を下降させて基板Wを両アー
ム73の間に介在させるとともに、アーム73を回転さ
せて各支持爪74を支持位置に保持する(図13
(e))。そして、その後、可動部材72を上方に移動
させることにより、基板Wを各支持爪32を介してアー
ム73により支持した状態で、別の処理部へと搬送する
ようにする。
After the substrate W is thus supported on the support shaft 64, the movable member 72 is lowered to interpose the substrate W between the two arms 73, and the arms 73 are rotated to place the respective support claws 74 in the supporting position. (FIG. 13)
(E)). After that, by moving the movable member 72 upward, the substrate W is transported to another processing unit while being supported by the arm 73 via the support claws 32.

【0084】このような基板搬送装置4によれば、ステ
ージ81の下降に伴って支持軸64の間隔を徐々に狭め
ながら基板Wをステージ81から剥ぎ取ることができる
ので、上記第3の実施の形態の基板搬送装置3と同様
に、基板Wを大きく撓ませることなく基板Wをステージ
81から取上げることができる。従って、X軸方向の寸
法が大きな大型の基板Wを搬送する場合であっても、撓
みによる損傷等の発生を招くことなく適切に基板Wをス
テージ81から剥ぎ取って搬送することができる。
According to such a substrate transfer apparatus 4, the substrate W can be peeled off from the stage 81 while gradually narrowing the interval between the support shafts 64 as the stage 81 moves down. The substrate W can be picked up from the stage 81 without significantly bending the substrate W, similarly to the substrate transfer device 3 of the embodiment. Therefore, even when a large substrate W having a large dimension in the X-axis direction is transported, the substrate W can be appropriately peeled off from the stage 81 and transported without causing damage or the like due to bending.

【0085】なお、上記第1〜第4の実施の形態に係る
基板搬送装置1〜4は、本発明に係る基板搬送装置の一
例であって、その具体的な構成は、本発明の要旨を逸脱
しない範囲で適宜変更可能である。
The substrate transfer devices 1 to 4 according to the first to fourth embodiments are examples of the substrate transfer device according to the present invention. It can be changed as appropriate without departing from the scope.

【0086】例えば、サイズの異なる基板を共通の可動
部材16で搬送することができる上記基板搬送装置2,
3においては、各アーム22に装着される支持体44,
50をアーム22の軸方向に移動させることができるよ
うに構成してもよい。すなわち、アーム22の支持体4
4,50による基板の支持位置は、通常、図14(a)
に示すように、基板Wの端縁部や、あるいは一枚の基板
から複数枚の基板を切り取る場合の割線C(切取り境界
線)の部分等、基板Wに接触しても特に影響のない、い
わゆる基板Wの非有効な部分に設定されているが、支持
体44,50を固定的に設けていると、サイズの異なる
基板を搬送する場合等に、例えば、同図(b)に示すよ
うに、非有効部分を支持することができず、これが基板
に悪影響を与える場合もある。従って、支持体44,5
0をアーム22の軸方向に移動させ得るように構成し、
サイズの異なる基板を搬送する場合等でも、同図(c)
に示すように支持体44,50を移動させて非有効部分
を支持できるようにすれば、上記のような有効部分への
悪影響を有効に回避するとができる。なお、支持体50
の移動は、手動で行うようにしてもよいし、アクチュエ
ータを用いて自動的に行えるようにしてもよい。
For example, the above-described substrate transfer device 2 which can transfer substrates of different sizes by a common movable member 16.
3, the support bodies 44 attached to each arm 22,
The configuration may be such that the arm 50 can be moved in the axial direction of the arm 22. That is, the support 4 of the arm 22
The supporting position of the substrate by 4, 50 is usually the position shown in FIG.
As shown in FIG. 5, there is no particular effect even when the substrate W is in contact with the edge portion of the substrate W, or a part of a dividing line C (cutting boundary line) when a plurality of substrates are cut from one substrate. Although it is set in an ineffective portion of the substrate W, if the supports 44 and 50 are fixedly provided, for example, as shown in FIG. In addition, the ineffective portion cannot be supported, which may adversely affect the substrate. Therefore, the supports 44,5
0 can be moved in the axial direction of the arm 22;
The same figure (c) when transferring substrates of different sizes.
By moving the supports 44 and 50 so as to be able to support the ineffective portion as shown in (1), the adverse effect on the effective portion as described above can be effectively avoided. The support 50
May be manually performed, or may be automatically performed using an actuator.

【0087】また、基板搬送装置2,3に設けられた一
対のアーム22同士の間隔を、生産(処理)工程に応じ
て変更してもよい。具体的に説明すると、基板搬送装置
2,3によって、例えば、図15に示されるような処理
液塗布部102から減圧乾燥部103に基板Wを搬送す
るときは、一対のアーム22に設けられた支持体44,
50を基板Wの端縁付近の非有効部分に当接するよう
に、一対の支持アーム22同士の間隔を設定することが
好ましい。これは、処理液塗布部102から減圧乾燥部
103に搬送される基板Wの上面に塗布されたレジスト
などの処理液はまだ十分に乾燥していないので、基板W
の下面に当接する支持体44,50の跡が基板Wの上面
の有効部分に塗布された処理液に発生するのを防止する
ためである。このように、基板Wに塗布された処理液に
発生する支持体44,50の跡は、基板Wの周囲の空気
と支持体44,50との熱伝導率が異なることに起因し
て発生し、後工程に悪影響を与えるものである。これに
対し、基板Wの上面にレジストなどの処理液が塗布され
る前の生産(処理)工程間において、例えば、図15に
示されるような投入部101から処理液塗布部102に
基板搬送装置2,3によって基板Wを搬送するときに
は、基板Wの上面に処理液が塗布されていないので、塗
布された処理液に支持体44,50の跡が発生すること
を考慮する必要がない。従って、一対の支持アーム22
同士の間隔を、処理液が塗布された基板Wを搬送すると
きよりも小さくし、基板Wの下面の有効部分に支持体4
4,50を当接させて、より安定に基板Wを搬送しても
よい。上述のように、生産(処理)工程毎に、支持体4
4,50が当接することができる基板Wの位置が異なる
場合であっても、基板搬送装置2,3によって基板を搬
送することができる。
The interval between the pair of arms 22 provided in the substrate transfer devices 2 and 3 may be changed according to the production (processing) process. More specifically, for example, when the substrate W is transferred from the processing liquid application unit 102 to the reduced-pressure drying unit 103 as shown in FIG. Support 44,
It is preferable to set the interval between the pair of support arms 22 so that 50 contacts the ineffective portion near the edge of the substrate W. This is because the processing liquid such as the resist applied to the upper surface of the substrate W transferred from the processing liquid coating unit 102 to the reduced-pressure drying unit 103 has not been sufficiently dried.
This is to prevent traces of the supports 44 and 50 contacting the lower surface of the substrate W from being generated in the processing liquid applied to the effective portion of the upper surface of the substrate W. As described above, the traces of the supports 44 and 50 generated in the processing liquid applied to the substrate W are generated due to the difference in the thermal conductivity between the air around the substrate W and the supports 44 and 50. , Adversely affecting the subsequent steps. On the other hand, during a production (processing) process before a processing liquid such as a resist is applied to the upper surface of the substrate W, for example, the substrate transfer device is transferred from the input unit 101 to the processing liquid application unit 102 as shown in FIG. When the substrate W is transported by the substrates 2 and 3, since the processing liquid is not applied to the upper surface of the substrate W, it is not necessary to consider that traces of the supports 44 and 50 are generated in the applied processing liquid. Therefore, the pair of support arms 22
The distance between the substrates W is made smaller than when the substrate W coated with the processing liquid is transported, and the support 4
The substrate W may be transported more stably by bringing the substrates 4 and 50 into contact with each other. As described above, the support 4
Even when the positions of the substrates W with which the substrates 4 and 50 can abut are different, the substrates can be transported by the substrate transport devices 2 and 3.

【0088】さらに、上記第1〜第3の実施形態に係る
基板搬送装置1〜3は、それぞれ基板Wの一辺に沿った
方向に基板を搬送するものであるが、基板搬送装置によ
る基板Wの搬送方向はこれに限定されるものではなく、
基板搬送装置によって基板Wを、例えば、水平面内にお
ける任意の方向に搬送してもよいし、水平面に直交する
方向に基板を昇降させるように搬送してもよい。
Further, the substrate transfer devices 1 to 3 according to the first to third embodiments transfer a substrate in a direction along one side of the substrate W, respectively. The transport direction is not limited to this,
The substrate W may be transported by the substrate transport device in, for example, an arbitrary direction in a horizontal plane, or may be transported so as to move the substrate up and down in a direction perpendicular to the horizontal plane.

【0089】また、さらに上記第1〜第3の実施形態に
記載される基板搬送装置1〜3及び第4の実施形態に記
載される移送機構61は、それぞれ基板Wの下面をその
支持面で支持するステージ34,81に対して基板Wを
授受する構成であるが、これらステージ34,81に代
えて、基板Wの下面の複数箇所、例えば、基板Wの四隅
付近の4箇所に当接して基板Wを保持する昇降自在な複
数のリフトピンを設けて、このリフトピンに対して基板
Wの授受を行うようにしてもよい。
Further, the substrate transfer devices 1 to 3 described in the above-described first to third embodiments and the transfer mechanism 61 described in the fourth embodiment are arranged such that the lower surface of the substrate W is supported by its support surface. The configuration is such that the substrate W is transferred to and from the supporting stages 34 and 81. Instead of these stages 34 and 81, the substrate W contacts a plurality of locations on the lower surface of the substrate W, for example, four locations near the four corners of the substrate W. It is also possible to provide a plurality of lift pins that can move up and down to hold the substrate W, and transfer the substrate W to and from the lift pins.

【0090】[0090]

【発明の効果】以上説明したように、本発明の基板搬送
装置は、基板を一対の支持部材によって支持して搬送す
るようにしながらも、間隔可変手段を設けて支持部材の
間隔を変更できるようにしたので、共通の装置でサイズ
の異なる複数種類の基板の搬送を行うことができ、ま
た、基板のサイズや材質等に応じて支持部材の間隔を調
整することで、基板の最適な場所を支持して搬送するこ
とができ、搬送途中において、基板が割れることを防止
することができる。さらに、基板搬送装置が待機位置に
あるときに、一対の支持部材同士の間隔を小さくするこ
とによって、待機位置における基板搬送装置の占有スペ
ースを小さくすることができ基板搬送装置をコンパクト
にすることができる。
As described above, the substrate transfer apparatus of the present invention can change the distance between the support members by providing the variable distance means, while supporting and conveying the substrate by the pair of support members. Therefore, it is possible to transfer a plurality of types of substrates having different sizes with a common device, and by adjusting the interval between the support members according to the size, material, etc. of the substrate, an optimal location of the substrate can be obtained. The substrate can be supported and transported, and the substrate can be prevented from being broken during the transport. Further, when the substrate transfer device is at the standby position, the space between the pair of support members is reduced, so that the space occupied by the substrate transfer device at the standby position can be reduced, and the substrate transfer device can be made compact. it can.

【0091】特に、基板よりも小さい支持部によって基
板をその下方から保持する基板保持手段に対して基板を
授受するような場合には、前記支持部材と基板保持手段
とを上下方向に相対的に変位させる変位手段をさらに設
けるのが好ましい。このようにすれば、基板保持手段と
支持部材との間での基板の受渡しを簡単な動作で行わせ
ることができる。
In particular, when the substrate is transferred to and from the substrate holding means for holding the substrate from below by a support portion smaller than the substrate, the support member and the substrate holding means are relatively moved in the vertical direction. It is preferable to further provide a displacing means for displacing. In this case, the transfer of the substrate between the substrate holding means and the support member can be performed by a simple operation.

【0092】また、四角形の基板の対向する2辺に沿っ
て基板を支持するように支持部材を構成すれば、四角形
の基板を確実に支持して搬送することができる。
Further, if the supporting member is configured to support the substrate along two opposing sides of the rectangular substrate, the rectangular substrate can be reliably supported and transported.

【0093】さらに、基板保持手段が吸着面を介して基
板を吸着保持する場合には、基板保持手段に保持されて
いる基板を取上げる際に、支持部材の間隔を基板の間隔
よりも大きくした状態で両支持部材を基板の下方に配置
した後、各支持部材を基板保持手段に対して相対的に上
方に移動させながら支持部材の間隔を漸減させることに
より、前記支持部材により基板を支持するとともにその
支持位置を基板の周縁部から中心部分に向かって変位さ
せるように前記支持部材、間隔可変手段及び変位手段を
構成するようにすれば、撓みによる基板の損傷等を招く
ことなく、吸着面から適切に基板を剥ぎ取って搬送する
ことができる。
Further, when the substrate holding means sucks and holds the substrate via the suction surface, when the substrate held by the substrate holding means is picked up, the distance between the support members is made larger than the distance between the substrates. After disposing both support members below the substrate, the distance between the support members is gradually reduced while moving each support member relatively upward with respect to the substrate holding means, thereby supporting the substrate with the support members. If the supporting member, the variable interval means and the displacing means are configured so that the supporting position is displaced from the peripheral portion of the substrate toward the central portion, the substrate may be displaced from the suction surface without causing damage to the substrate due to bending. The substrate can be appropriately peeled off and transported.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る基板搬送装置の第1の実施の形態
を示す斜視図である。
FIG. 1 is a perspective view showing a first embodiment of a substrate transfer device according to the present invention.

【図2】可動部材の構成を説明する図1のA矢視概略図
である。
FIG. 2 is a schematic diagram viewed from an arrow A in FIG. 1 illustrating a configuration of a movable member.

【図3】(a)〜(d)は、基板搬送装置による搬送動
作を説明する模式図である。
FIGS. 3A to 3D are schematic diagrams illustrating a transfer operation by a substrate transfer device.

【図4】本発明に係る基板搬送装置の第2の実施の形態
を示す斜視図である。
FIG. 4 is a perspective view showing a second embodiment of the substrate transfer device according to the present invention.

【図5】(a)〜(d)は、基板搬送装置による搬送動
作を説明する模式図である。
FIGS. 5A to 5D are schematic diagrams illustrating a transfer operation by the substrate transfer device.

【図6】補助支持機構の一例を示す断面略図である。FIG. 6 is a schematic sectional view showing an example of an auxiliary support mechanism.

【図7】本発明に係る基板搬送装置の第3の実施の形態
を示す斜視図である。
FIG. 7 is a perspective view showing a third embodiment of the substrate transfer device according to the present invention.

【図8】(a)〜(d)は、基板搬送装置による搬送動
作を説明する模式図である。
FIGS. 8A to 8D are schematic diagrams illustrating a transfer operation by the substrate transfer device.

【図9】アームに装着される支持体を示す概略図であ
る。
FIG. 9 is a schematic view showing a support mounted on the arm.

【図10】アームに装着される支持体の変形例を示す概
略図である。
FIG. 10 is a schematic diagram showing a modification of the support mounted on the arm.

【図11】アームに装着される支持体の変形例を示す概
略図である。
FIG. 11 is a schematic view showing a modification of the support mounted on the arm.

【図12】本発明に係る基板搬送装置の第4の実施の形
態を示す斜視図である。
FIG. 12 is a perspective view showing a fourth embodiment of the substrate transfer device according to the present invention.

【図13】(a)〜(e)は、基板搬送装置による搬送
動作を説明する模式図である。
FIGS. 13A to 13E are schematic diagrams illustrating a transfer operation by the substrate transfer device.

【図14】(a)〜(c)は、支持体を移動可能に設け
ることの利点を説明する模式図である。
FIGS. 14A to 14C are schematic diagrams illustrating advantages of providing a support so as to be movable.

【図15】従来の基板処理装置を示す平面模式図であ
る。
FIG. 15 is a schematic plan view showing a conventional substrate processing apparatus.

【符号の説明】[Explanation of symbols]

1,2,3,4 基板搬送装置 12 ガイド板 13 固定レール 14 ボールねじ軸 16 可動部材 20 フレーム 22 アーム 36 可動ブロック 37 ナット部分 38 固定レール 40 サーボモータ W 基板 1, 2, 3, 4 Board transfer device 12 Guide plate 13 Fixed rail 14 Ball screw shaft 16 Movable member 20 Frame 22 Arm 36 Movable block 37 Nut portion 38 Fixed rail 40 Servo motor W Board

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 基板を水平に支持して搬送する基板搬送
装置において、基板を支持する一対の支持部材と、これ
ら支持部材の間隔を変更する間隔可変手段と、一対の支
持部材を一体に移動させる移動手段とを備えていること
を特徴とする基板搬送装置。
In a substrate transfer apparatus for horizontally supporting and transferring a substrate, a pair of support members for supporting the substrate, an interval variable means for changing an interval between the support members, and a pair of support members are integrally moved. And a moving means for moving the substrate.
【請求項2】 基板よりも小さい支持部によって基板を
その下方から保持する基板保持手段に対して基板を授受
する装置であって、前記支持部材と前記基板保持手段と
を上下方向に相対的に変位させる変位手段をさらに備え
ていることを特徴とする請求項1記載の基板搬送装置。
2. An apparatus for transferring a substrate to and from a substrate holding means for holding the substrate from below by a supporting portion smaller than the substrate, wherein the supporting member and the substrate holding means are relatively moved in a vertical direction. 2. The substrate transfer device according to claim 1, further comprising a displacement unit that displaces the substrate.
【請求項3】 四角形の基板を搬送するものであって、
前記支持部材は、基板の対向する2辺に沿って基板を支
持するように構成されていることを特徴とする請求項1
又は2記載の基板搬送装置。
3. A method for transporting a square substrate, comprising:
The said support member is comprised so that a board | substrate may be supported along two opposing sides of a board | substrate, The Claim 1 characterized by the above-mentioned.
Or the substrate transfer device according to 2.
【請求項4】 基板よりも小さい支持部によって基板を
その下方から保持する基板保持手段から基板を取上げて
搬送する装置において、基板を前記基板保持手段から取
上げる取上げ機構と、取上げた基板を移送する移送手段
とを備え、前記取上げ機構は、基板を水平に支持する一
対の支持部材と、これら支持部材の間隔を変更する間隔
可変手段と、前記基板保持手段と支持部材とを上下方向
に相対的に変位させる変位手段とを有する一方、前記移
送手段は、前記支持部材により支持された基板を受け取
る受取部材と、この受取部材を移動させる移動手段とを
備えていることを特徴とする基板搬送装置。
4. An apparatus for picking up and transporting a substrate from substrate holding means for holding the substrate from below by a support portion smaller than the substrate, and a pick-up mechanism for picking up the substrate from the substrate holding means, and transferring the picked-up substrate. Transfer means, the pick-up mechanism comprises a pair of support members for horizontally supporting the substrate, a distance variable means for changing the distance between these support members, and the substrate holding means and the support member are vertically moved relative to each other. Wherein the transfer means includes a receiving member for receiving the substrate supported by the support member, and a moving means for moving the receiving member. .
【請求項5】 前記基板保持手段は、前記支持部として
基板を吸着保持する吸着面を有するものであって、上記
支持部材、間隔可変手段及び変位手段は、基板保持手段
に保持されている基板を取上げる際に、支持部材の間隔
を基板の間隔よりも大きくした状態で一対の支持部材を
基板の下方に配置した後、一対の支持部材を基板保持手
段に対して相対的に上方に移動させながら支持部材同士
の間隔を漸減させることにより、前記支持部材により基
板を支持するとともにその支持位置を基板の周縁部から
中心部分に向かって変位させるように構成されているこ
とを特徴とする請求項2乃至4のいずれかに記載の基板
搬送装置。
5. The substrate holding means has a suction surface for sucking and holding a substrate as the support portion, and the support member, the interval variable means and the displacement means are provided on the substrate holding means. When picking up, after disposing the pair of support members below the substrate in a state where the interval between the support members is larger than the interval between the substrates, the pair of support members are moved upward relative to the substrate holding means. The distance between the supporting members is gradually reduced while supporting the substrate by the supporting member and displacing the supporting position from the peripheral portion of the substrate toward the central portion. 5. The substrate transfer device according to any one of 2 to 4.
JP13375997A 1997-05-23 1997-05-23 Substrate transfer device Expired - Fee Related JP3711189B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP13375997A JP3711189B2 (en) 1997-05-23 1997-05-23 Substrate transfer device
KR1019980018707A KR100332546B1 (en) 1997-05-23 1998-05-23 Board Carrier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13375997A JP3711189B2 (en) 1997-05-23 1997-05-23 Substrate transfer device

Publications (2)

Publication Number Publication Date
JPH10326820A true JPH10326820A (en) 1998-12-08
JP3711189B2 JP3711189B2 (en) 2005-10-26

Family

ID=15112293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13375997A Expired - Fee Related JP3711189B2 (en) 1997-05-23 1997-05-23 Substrate transfer device

Country Status (2)

Country Link
JP (1) JP3711189B2 (en)
KR (1) KR100332546B1 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002217274A (en) * 2001-01-18 2002-08-02 Semiconductor Energy Lab Co Ltd Method for manufacturing semiconductor device
KR100860522B1 (en) * 2002-03-23 2008-09-26 엘지디스플레이 주식회사 Conveying apparatus of liquid crystal display panel
JP2010062461A (en) * 2008-09-05 2010-03-18 Tokyo Electron Ltd Substrate placing mechanism, substrate processing device, method of controlling substrate placing mechanism, and storage medium
JP2010177270A (en) * 2009-01-27 2010-08-12 Shibaura Mechatronics Corp Substrate loading/unloading unit
CN101964318A (en) * 2009-07-23 2011-02-02 显示器生产服务株式会社 Apparatus for processing substrate
CN102214606A (en) * 2010-04-08 2011-10-12 株式会社迪思科 Cutting device
CN102437077A (en) * 2011-10-19 2012-05-02 东莞宏威数码机械有限公司 Equipment for linearly transmitting organic light-emitting diode (OLED) substrate
KR101188257B1 (en) 2010-01-29 2012-10-15 주식회사 테라세미콘 Arm for transfering a substrate and the method for loading and unloading a substrate using the same
KR101456783B1 (en) * 2012-07-27 2014-10-31 가부시키가이샤 스크린 홀딩스 Substrate processing apparatus and substrate processing system

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3756402B2 (en) * 2000-12-08 2006-03-15 富士写真フイルム株式会社 Substrate transfer apparatus and method
JP4043029B2 (en) * 2003-02-18 2008-02-06 東京エレクトロン株式会社 Substrate transport apparatus and substrate processing apparatus
KR101033121B1 (en) * 2004-06-07 2011-05-11 엘지디스플레이 주식회사 Transfer device including robot arm for substrate and tranfer method for substrate using the same
KR100780718B1 (en) 2004-12-28 2007-12-26 엘지.필립스 엘시디 주식회사 Slit coater having apparatus of supplying coating fluid
KR100700181B1 (en) 2004-12-31 2007-03-27 엘지.필립스 엘시디 주식회사 Slit coater having standby unit of nozzle and method of coating using thereof
KR100675643B1 (en) 2004-12-31 2007-02-02 엘지.필립스 엘시디 주식회사 Slit coater
KR100719689B1 (en) * 2005-07-28 2007-05-17 삼성에스디아이 주식회사 End effector For Flat Panel Display Device Fabrication
KR100857060B1 (en) * 2007-04-23 2008-09-05 주식회사 디엠에스 Moving unit for transferring glass plate
JP2011131229A (en) * 2009-12-24 2011-07-07 Hitachi High-Technologies Corp Laser beam machining method, laser beam machining apparatus, and solar panel manufacturing method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3083366B2 (en) * 1991-09-18 2000-09-04 アピックヤマダ株式会社 Lead frame transfer device
US5263569A (en) * 1992-09-08 1993-11-23 Matsushita Electric Industrial Co., Ltd. Substrate supply apparatus
KR950005220U (en) * 1993-07-28 1995-02-18 Printed Circuit Board Carrier Width Adjuster
KR0131066Y1 (en) * 1995-02-28 1999-04-15 어강택 Printed board sending device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002217274A (en) * 2001-01-18 2002-08-02 Semiconductor Energy Lab Co Ltd Method for manufacturing semiconductor device
KR100860522B1 (en) * 2002-03-23 2008-09-26 엘지디스플레이 주식회사 Conveying apparatus of liquid crystal display panel
JP2010062461A (en) * 2008-09-05 2010-03-18 Tokyo Electron Ltd Substrate placing mechanism, substrate processing device, method of controlling substrate placing mechanism, and storage medium
TWI512881B (en) * 2008-09-05 2015-12-11 Tokyo Electron Ltd Substrate placement mechanism, substrate processing device, control method of substrate placement mechanism, and memory medium
JP2010177270A (en) * 2009-01-27 2010-08-12 Shibaura Mechatronics Corp Substrate loading/unloading unit
CN101964318A (en) * 2009-07-23 2011-02-02 显示器生产服务株式会社 Apparatus for processing substrate
KR101105416B1 (en) * 2009-07-23 2012-01-17 주식회사 디엠에스 Apparatus for processing substrate
KR101188257B1 (en) 2010-01-29 2012-10-15 주식회사 테라세미콘 Arm for transfering a substrate and the method for loading and unloading a substrate using the same
CN102214606A (en) * 2010-04-08 2011-10-12 株式会社迪思科 Cutting device
CN102437077A (en) * 2011-10-19 2012-05-02 东莞宏威数码机械有限公司 Equipment for linearly transmitting organic light-emitting diode (OLED) substrate
KR101456783B1 (en) * 2012-07-27 2014-10-31 가부시키가이샤 스크린 홀딩스 Substrate processing apparatus and substrate processing system

Also Published As

Publication number Publication date
JP3711189B2 (en) 2005-10-26
KR19980087322A (en) 1998-12-05
KR100332546B1 (en) 2002-08-09

Similar Documents

Publication Publication Date Title
JPH10326820A (en) Substrate transporting device
JP4939376B2 (en) Substrate processing equipment
KR970000698B1 (en) Transfering apparatus of semiconductor substrate
JP4999487B2 (en) Substrate processing equipment
KR100917304B1 (en) Substrate processing apparatus
KR102157427B1 (en) Substrate transfer robot and substrate processing system
JP2599571B2 (en) Substrate transfer robot
JP4969138B2 (en) Substrate processing equipment
JP4313284B2 (en) Substrate processing equipment
JP2010045214A (en) Substrate carrying device and substrate treatment device having the same
JP2009065165A (en) End effector and substrate transfer robot having it
JP3957419B2 (en) Substrate processing equipment
JP4298188B2 (en) Substrate transport apparatus and substrate transport method
JPH10209241A (en) Substrate transfer device and substrate treatment device provided with it
JPH1187456A (en) Apparatus for treating substrate
JP6407629B2 (en) Conveying apparatus and substrate processing apparatus
JP5385965B2 (en) Substrate processing equipment
JP4152087B2 (en) Substrate cooling apparatus and substrate cooling method
JP3892327B2 (en) Substrate processing equipment
JP2008198883A (en) Substrate-treating device
KR100968315B1 (en) Substrate transfer apparatus and substrate processing apparatus
JP2001168167A (en) Treating system and method
JPH11274270A (en) Substrate transferring device and substrate treating device
JP2002252272A (en) Glass substrate conveyance device and aligner
JP4474672B2 (en) Substrate transfer device

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050301

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050412

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050607

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20050809

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20050812

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080819

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090819

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090819

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090819

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100819

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100819

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110819

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110819

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120819

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120819

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120819

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130819

Year of fee payment: 8

LAPS Cancellation because of no payment of annual fees