JPH11274270A - Substrate transferring device and substrate treating device - Google Patents

Substrate transferring device and substrate treating device

Info

Publication number
JPH11274270A
JPH11274270A JP7553998A JP7553998A JPH11274270A JP H11274270 A JPH11274270 A JP H11274270A JP 7553998 A JP7553998 A JP 7553998A JP 7553998 A JP7553998 A JP 7553998A JP H11274270 A JPH11274270 A JP H11274270A
Authority
JP
Japan
Prior art keywords
carrier
substrate
substrates
mounting table
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP7553998A
Other languages
Japanese (ja)
Inventor
Koji Hasegawa
公二 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP7553998A priority Critical patent/JPH11274270A/en
Publication of JPH11274270A publication Critical patent/JPH11274270A/en
Withdrawn legal-status Critical Current

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Landscapes

  • Liquid Crystal (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PROBLEM TO BE SOLVED: To simplify configuration, to reduce weight and installation space, and to achieve high positioning accuracy. SOLUTION: Only by performing rotation treatment of first and second carrier placement rests 5 and 8 due to first and second carrier rotation means 7 and 10 without performing horizontal movement treatment of a carrier 53 due to a former carrier horizontal movement means, the first and second carrier placement rests 5 and 8 can be positioned in substrate thrust-up positions 4a and 4b while being shifted by a half substrate pitch (half substrate arrangement pitch) each other, thus eliminating the need for a former carrier horizontal movement means, and hence simplifying a configuration, reducing the weight and installation space, and increasing operation speed and positioning accuracy for a substrate transfer device 1.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体ウエハや液
晶表示パネル用ガラス基板などの薄板状の基板を収容し
た複数のキャリアから複数の基板を基板搬送手段に受け
渡すための基板移載装置および、このような基板移載装
置が用いられ、基板移載装置から受け渡された複数の基
板が基板搬送手段で搬送されて所定の処理を施す基板処
理装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate transfer apparatus for transferring a plurality of substrates from a plurality of carriers accommodating thin substrates such as a semiconductor wafer and a glass substrate for a liquid crystal display panel to substrate transport means. The present invention also relates to a substrate processing apparatus using such a substrate transfer device, wherein a plurality of substrates transferred from the substrate transfer device are transferred by a substrate transfer means and perform a predetermined process.

【0002】[0002]

【従来の技術】従来、半導体ウエハや液晶表示パネル用
ガラス基板などを用いた精密電子基板の製造プロセスに
おいては、キャリア内に所定枚数が収容された複数の基
板を一括して処理する枚数に基板搬送手段で持ち代えて
各処理部に搬送し、その各処理部において複数の基板に
洗浄やエッティングなどの所定の表面処理を施す基板処
理装置が用いられている。このような所定の基板処理を
行う基板処理装置について以下に説明をする。
2. Description of the Related Art Conventionally, in a manufacturing process of a precision electronic substrate using a semiconductor wafer, a glass substrate for a liquid crystal display panel, or the like, a predetermined number of substrates accommodated in a carrier are processed into a number of substrates to be processed at once. 2. Description of the Related Art A substrate processing apparatus is used in which a plurality of substrates are transported to respective processing units while being held by a transporting unit, and a predetermined surface treatment such as cleaning or etching is performed on a plurality of substrates in each processing unit. A substrate processing apparatus that performs such a predetermined substrate processing will be described below.

【0003】図7は従来の基板処理装置の概略要部構成
を示す斜視図である。
FIG. 7 is a perspective view showing a schematic structure of a main part of a conventional substrate processing apparatus.

【0004】図7において、基板処理装置51は、ウエ
ハなどの複数の基板52を一括して処理する装置であっ
て、キャリア53に所定枚数が収容された複数の基板5
2を受渡しをする搬出入部54と、この搬出入部54か
ら処理前の基板52を受け取って各処理部に搬送し、各
処理部において複数の基板52に所定の処理を順次施す
と共に、処理済みの複数の基板52を搬送して搬出入部
54に受渡す基板処理ユニット55とを有している。
[0004] In FIG. 7, a substrate processing apparatus 51 is an apparatus for processing a plurality of substrates 52 such as wafers at a time.
2 and a loading / unloading unit 54 for receiving and receiving the unprocessed substrate 52 from the loading / unloading unit 54, transporting the unprocessed substrate 52 to each processing unit, and sequentially performing a predetermined process on the plurality of substrates 52 in each processing unit. A substrate processing unit 55 that transports the plurality of substrates 52 and transfers the substrates 52 to the loading / unloading unit 54.

【0005】この搬出入部54は、キャリア載置台56
と、移載ロボット58と、基板移載装置60と、キャリ
ア洗浄部61とを有している。キャリア載置台56は、
複数の基板52を収容したキャリア53を一時的に並べ
て載置しておく。移載ロボット58は、キャリア53の
両上端つば部分53aを下方からそれぞれ受けて保持す
る片持ち状に2本突き出たキャリア保持アーム57を有
しており、キャリア載置台56のキャリア53の並んで
いる方向に移動自在であると共に、キャリア保持アーム
57でキャリア53を取り込んで保持したりキャリア5
3を載置したりするために上下方向に昇降自在で、かつ
その上下方向に平行な軸(キャリア保持アーム57の取
付部材を支持する支持軸)を中心に回動自在に構成され
ている。基板移載装置60は、移載ロボット58によっ
てキャリア載置台56から載置されたキャリア53内の
複数の基板52だけをその底部開口部を介して突き上げ
て基板搬送手段59の一対の保持板59aに受け渡す。
キャリア洗浄部61は、基板移載装置60から移載ロボ
ット58によって載置され複数の基板52が抜かれた空
のキャリア53を洗浄する。
The loading / unloading section 54 includes a carrier mounting table 56
, A transfer robot 58, a substrate transfer device 60, and a carrier cleaning unit 61. The carrier mounting table 56 is
Carriers 53 containing a plurality of substrates 52 are temporarily arranged and placed. The transfer robot 58 has two cantilevered carrier holding arms 57 that receive and hold the upper end brim portions 53 a of the carrier 53 from below, respectively, and are arranged side by side with the carriers 53 on the carrier mounting table 56. The carrier 53 is movable in the direction in which the
The carrier 3 is configured to be movable up and down in a vertical direction so as to be placed thereon, and to be rotatable around an axis parallel to the vertical direction (a support shaft for supporting a mounting member of the carrier holding arm 57). The substrate transfer device 60 pushes up only a plurality of substrates 52 in the carrier 53 placed from the carrier mounting table 56 by the transfer robot 58 through the bottom opening thereof, and a pair of holding plates 59a of the substrate transfer means 59. Hand over to
The carrier cleaning unit 61 cleans an empty carrier 53 that has been placed from the substrate transfer device 60 by the transfer robot 58 and from which the plurality of substrates 52 have been removed.

【0006】また、この移載ロボット58は、キャリア
載置台56から基板移載装置60の位置決めされた所定
位置にキャリア53を搬送して載置し、複数の基板52
を受け渡した後の空のキャリア53をキャリア洗浄部6
1に移送すると共に、キャリア洗浄部61で洗浄処理さ
れた空のキャリア53内に、基板処理ユニット55から
処理済みの複数の基板52を回収するべく、再び基板移
載装置60の所定位置上に移送して待機させる。
The transfer robot 58 transports the carrier 53 from the carrier mounting table 56 to a predetermined position of the substrate transfer device 60 and mounts the carrier 53 thereon.
The empty carrier 53 after the delivery is transferred to the carrier cleaning unit 6.
1 and again on a predetermined position of the substrate transfer device 60 in order to collect a plurality of processed substrates 52 from the substrate processing unit 55 into the empty carrier 53 cleaned by the carrier cleaning unit 61. Transfer and wait.

【0007】さらに、キャリア53に所定枚数(例えば
25枚)が収容された基板52を一括して処理する枚数
(例えば50枚)に基板搬送手段59の一対の保持板5
9aで持ち代える処理は、基板搬送手段59の一対の保
持板59aの上方位置に図示しない一対の上側保持板が
配設されている。このように、キャリア53内の複数の
基板52の倍の枚数の基板52を基板搬送手段59の一
対の保持板59aに持ち代える処理について、以下に詳
しく説明する。
Further, the pair of holding plates 5 of the substrate transfer means 59 is reduced to a number (for example, 50) for processing a plurality of (for example, 50) substrates 52 in which a predetermined number (for example, 25) of carriers 52 are accommodated in the carrier 53.
In the process of switching at 9a, a pair of upper holding plates (not shown) is provided at a position above the pair of holding plates 59a of the substrate transfer means 59. The process of switching the number of the substrates 52 in the carrier 53 to twice the number of the substrates 52 in the carrier 53 with the pair of holding plates 59a of the substrate transporting means 59 will be described in detail below.

【0008】つまり、基板移載装置60の各回転テーブ
ル(図示せず)の所定位置上にそれぞれ載置され、25
枚の基板52が収容された2つのキャリア53はそれぞ
れ角度90度だけ、例えばアームおよびシリンダなどの
キャリア回動手段(図示せず)による水平面内の回動処
理が為されて基板方向が基板搬送および基板処理する方
向に方向転換されるようになっている。また、それらの
2つのキャリア53のうち一方のキャリア53につい
て、そのキャリア53内の25枚の基板52が矢印Aの
方向(垂直方向)に突き上げられて上記一対の上側保持
板にて両側から挟持することで一旦保持されるようにな
っている。さらに、それらの2つのキャリア53は、各
回転テーブル(図示せず)と共に矢印Bの方向に、例え
ばシリンダやボールねじおよびモータなどのキャリア水
平移動手段(図示せず)による水平移動処理が為される
ようになっている。この水平移動処理による移動距離
は、前に突き上げられた25枚の基板52の保持ピッチ
寸法の半ピッチ分だけずれた距離に設定されている。こ
の状態で、上記と同様に、他方のキャリア53内の25
枚の基板52も矢印Aの方向(垂直方向)に突き上げら
れて、上記一対の上側保持板に保持された各基板の間
に、その基板保持ピッチと同様の所定ピッチで形成され
た、基板通過寸法および基板厚さ寸法よりも若干大きい
上下方向に貫通した各貫通溝(図示せず)をそれぞれ通
過させ、前の工程で既に保持している25枚の基板52
の各間隔内に挿入されるようになっている。このよう
に、これらの各基板間隔内にそれぞれ挿入された25枚
の基板52と共に、前の工程で既に保持している25枚
の基板52を矢印Aの方向(垂直方向)に一緒に突き上
げるようになっている。このとき、突き上げて保持して
いる合計50枚の基板52は当初のピッチ寸法の半ピッ
チと基板間隔が狭くなっている。その後、上記一対の上
側保持板を共に垂直方向として基板52に対する保持位
置を解除すると共に、突き上げて保持している合計50
枚の基板52を下降させて、一対の上側保持板の下方の
基板搬送手段59の一対の保持板59aによる50枚の
基板52を半ピッチで両側から挟持して保持すること
で、上記基板持ち代え処理が完了し、基板搬送手段59
による合計50枚(一括基板処理枚数)の基板52の基
板処理ユニット55への搬送処理が為されるようになっ
ている。
[0008] That is, they are placed on predetermined positions of respective rotary tables (not shown) of the substrate transfer device 60,
The two carriers 53 accommodating the two substrates 52 are each rotated by an angle of 90 degrees in a horizontal plane by carrier rotating means (not shown) such as an arm and a cylinder, so that the substrate direction is transferred to the substrate. And the direction is changed to the direction of substrate processing. Further, with respect to one carrier 53 of the two carriers 53, 25 substrates 52 in the carrier 53 are pushed up in the direction of the arrow A (vertical direction) and sandwiched from both sides by the pair of upper holding plates. By doing so, it is once held. Further, the two carriers 53 are subjected to horizontal movement processing by carrier horizontal movement means (not shown) such as a cylinder, a ball screw and a motor in the direction of arrow B together with each rotary table (not shown). It has become so. The moving distance by this horizontal moving process is set to a distance shifted by a half pitch of the holding pitch dimension of the 25 substrates 52 pushed up before. In this state, as described above, 25
The two substrates 52 are also pushed up in the direction of the arrow A (vertical direction), and are formed between the substrates held by the pair of upper holding plates at a predetermined pitch similar to the substrate holding pitch. Each of the 25 substrates 52 already passed through the through-grooves (not shown), which are slightly larger than the dimensions and the thickness of the substrate, penetrate in the vertical direction, and are already held in the previous process.
Is inserted within each interval. In this way, the 25 substrates 52 already held in the previous step are pushed up in the direction of arrow A (vertical direction) together with the 25 substrates 52 inserted in the respective substrate intervals. It has become. At this time, a total of 50 substrates 52 being pushed up and held have a half pitch of the initial pitch dimension and a narrower substrate interval. Thereafter, the pair of upper holding plates are both set in the vertical direction to release the holding position with respect to the substrate 52, and a total of 50
By lowering the two substrates 52 and holding the 50 substrates 52 by a pair of holding plates 59a of the substrate transporting means 59 below the pair of upper holding plates at a half pitch from both sides, the substrate holding When the replacement process is completed, the substrate transfer means 59
, A total of 50 (the number of batch-processed substrates) substrates 52 are transported to the substrate processing unit 55.

【0009】さらに、基板処理ユニット55では、例え
ばエッチング液などの薬液を貯留した薬液槽62とリン
ス液である純水を貯留した水洗槽63とを2組み直列に
順次並べた状態で配設しており、基板搬送手段59で保
持した複数の基板52を搬送して、これらの2組みの薬
液槽62および水洗槽63の槽毎に配設されたリフタ装
置(図示せず)に基板52を受け渡して順次浸漬させ、
薬液槽62にて基板52に薬液処理を施した後に、水洗
槽63にて基板52に付着した薬液やパーティクルを洗
い流すリンス処理を施すことを繰り返し、最終の処理部
である乾燥槽64による乾燥処理を基板52に施すよう
にしている。
Further, in the substrate processing unit 55, two sets of a chemical tank 62 for storing a chemical such as an etching liquid and a washing tank 63 for storing pure water as a rinsing liquid are arranged in series. The substrate 52 is transported by the substrate transporting means 59 and transferred to a lifter device (not shown) provided for each of the two sets of the chemical solution tank 62 and the washing tank 63. Hand over and soak sequentially
After performing a chemical treatment on the substrate 52 in the chemical solution tank 62, a rinsing process of washing out the chemical solution and particles attached to the substrate 52 in the washing tank 63 is repeated, and the drying process is performed by the drying tank 64 as a final processing unit. Is applied to the substrate 52.

【0010】[0010]

【発明が解決しようとする課題】ところが、上記従来の
構成では、移載ロボット58による基板52のキャリア
載置台56から基板移載装置60の回転テーブル上への
移載時に基板方向と基板搬送および基板処理する方向と
が角度90度異なるために、2つのキャリア53に対す
る各回動処理が必要となる。また、それらの2つのキャ
リア53を順次突き上げ位置に移動させるべく、2つの
キャリア53に対する水平移動処理が必要となる。この
ように、基板移載装置60では、キャリア回動手段(図
示せず)による各回動処理と、キャリア水平移動手段
(図示せず)による水平移動処理とを行わなければなら
ず、部品点数も多く、このことは、更なる構成の簡素化
やその省重量および省設置スペースさらには高位置決め
精度などの要求に逆行している。
However, in the above-mentioned conventional configuration, when the transfer robot 58 transfers the substrate 52 from the carrier mounting table 56 onto the rotary table of the substrate transfer device 60, the direction of the substrate and the transfer of the substrate are reduced. Since the direction in which the substrate is processed is different by 90 degrees, each rotation process for the two carriers 53 is required. In addition, in order to sequentially move the two carriers 53 to the push-up position, horizontal movement processing for the two carriers 53 is required. As described above, in the substrate transfer device 60, each rotation process by the carrier rotation unit (not shown) and the horizontal movement process by the carrier horizontal movement unit (not shown) must be performed, and the number of parts is also reduced. In many cases, this goes against demands for further simplification of the configuration, weight saving and installation space, and high positioning accuracy.

【0011】本発明は、上記従来の問題を解決するもの
で、更なる構成の簡素化や省重量および省設置スペース
さらに高位置決め精度を実現することができる基板移載
装置および、これを用いた基板処理装置を提供すること
を目的とする。
SUMMARY OF THE INVENTION The present invention solves the above-mentioned conventional problems, and a substrate transfer apparatus capable of further simplifying the structure, saving weight and space, and realizing high positioning accuracy, and using the same. It is an object to provide a substrate processing apparatus.

【0012】[0012]

【課題を解決するための手段】本発明の基板移載装置
は、複数の基板を収容したキャリアから複数の基板を基
板搬送手段へ受け渡すための基板移載装置において、第
1キャリアを載置可能であって、第1キャリアを載置さ
せた際に第1キャリアの底部開口部に対応した位置が開
口された第1キャリア載置台と、第2キャリアを載置可
能であって、第2キャリアを載置させた際に第2キャリ
アの底部開口部に対応した位置が開口された第2キャリ
ア載置台と、第1キャリアおよび第2キャリアから基板
搬送手段へ基板を受け渡すために、第1キャリアに収納
された複数の基板を第1キャリア載置台の下方から第1
キャリアの底部開口部を通して突き上げて保持するとと
もに、第2キャリアに収納された複数の基板を第2キャ
リア載置台の下方から第2キャリアの底部開口部を通し
て突き上げて保持する突き上げ手段と、突き上げ手段の
上方の位置と第1キャリア載置台の待機位置との間で、
第1キャリア載置台を回動させる第1回動手段と、突き
上げ手段の上方の位置と第2キャリア載置台の待機位置
との間で、第2キャリア載置台を回動させる第2回動手
段とを有し、第1キャリアに収容された基板を突き上げ
る際の突き上げ手段に対する第1キャリア載置台に載置
された第1キャリアの位置と第2キャリアに収容された
基板を突き上げる際の突き上げ手段に対する第2キャリ
ア載置台に載置された第2キャリアの位置とは、複数の
基板の基板配列ピッチに対して半ピッチ分ずれているこ
とを特徴とするものである。
According to the present invention, there is provided a substrate transfer apparatus for transferring a plurality of substrates from a carrier accommodating a plurality of substrates to a substrate transfer means. A first carrier mounting table having a position corresponding to the bottom opening of the first carrier opened when the first carrier is mounted, and a second carrier capable of mounting the second carrier; A second carrier mounting table having an opening at a position corresponding to the bottom opening of the second carrier when the carrier is mounted; and a second carrier mounting table for transferring the substrate from the first carrier and the second carrier to the substrate transfer means. The plurality of substrates accommodated in one carrier are moved from the bottom of the first carrier mounting table to the first
Push-up means for pushing up and holding through the bottom opening of the carrier, and pushing up and holding a plurality of substrates accommodated in the second carrier from below the second carrier mounting table through the bottom opening of the second carrier; Between the upper position and the standby position of the first carrier mounting table,
First rotating means for rotating the first carrier mounting table, and second rotating means for rotating the second carrier mounting table between a position above the push-up means and a standby position of the second carrier mounting table. A position of the first carrier mounted on the first carrier mounting table with respect to a thrusting means for thrusting a substrate accommodated in the first carrier and a thrusting means for thrusting the substrate accommodated in the second carrier The position of the second carrier mounted on the second carrier mounting table with respect to is shifted by a half pitch with respect to the substrate arrangement pitch of the plurality of substrates.

【0013】この構成により、従来のようなキャリア水
平移動手段によるキャリアの水平移動処理を行わずに、
第1キャリア回動手段および第2キャリア回動手段によ
るキャリア載置台の回動処理だけで、第1キャリアの位
置と第2キャリアの位置とを互いに基板配列ピッチに対
して半ピッチ分ずらせた状態で位置させることが可能で
あるので、従来のキャリア水平移動手段を不要とした分
だけ部品点数が少なくなって、更なる構成の簡素化や省
重量および省設置スペースだけではなく、しかもより受
渡し動作が速く高位置決め精度が実現可能となる。
With this configuration, the carrier horizontal movement processing by the conventional carrier horizontal movement means is not performed,
A state in which the position of the first carrier and the position of the second carrier are shifted from each other by a half pitch with respect to the substrate arrangement pitch only by the rotation processing of the carrier mounting table by the first carrier rotation means and the second carrier rotation means. , The number of parts is reduced by the amount that the conventional carrier horizontal moving means is not required, which not only simplifies the configuration, saves weight and saves space, but also improves the delivery operation And high positioning accuracy can be realized.

【0014】また、本発明の基板処理装置は、複数の基
板に基板処理を行うべく、複数の基板を収容したキャリ
アから複数の基板を基板搬送手段に受け渡すための請求
項1に記載の基板移載装置と、この基板移載装置で基板
搬送手段に受け渡された複数の基板を基板処理部に搬送
して所定の処理を行う基板処理ユニットとを有したこと
を特徴とするものである。
The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus transfers a plurality of substrates from a carrier accommodating the plurality of substrates to the substrate transport means in order to perform the substrate processing on the plurality of substrates. A transfer apparatus and a substrate processing unit that transfers a plurality of substrates transferred to the substrate transfer unit by the substrate transfer apparatus to a substrate processing unit and performs a predetermined process. .

【0015】この構成により、部品点数削減による更な
る構成の簡素化や省重量および省設置スペースだけでは
なく、基板移載装置による基板の受渡し動作が速くしか
も高位置決め精度を実現した基板移載装置が、この基板
処理装置に容易に適応可能となる。
With this configuration, not only the structure can be further simplified by reducing the number of components and the weight and installation space can be reduced, but also the substrate transfer device that achieves high-speed positioning and high-speed transfer of the substrate by the substrate transfer device. However, it is easily adaptable to this substrate processing apparatus.

【0016】[0016]

【発明の実施の形態】以下、本発明に係る基板処理装置
の実施形態について図面を参照して説明するが、本発明
は以下に示す実施形態に限定されるものではない。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the substrate processing apparatus according to the present invention will be described with reference to the drawings, but the present invention is not limited to the embodiments described below.

【0017】図1は本発明の一実施形態の基板移載装置
の概略要部構成を示す平面図、図2は最初のキャリアか
ら基板を受け渡した状態の基板突き上げ手段および基板
搬送手段の概略要部構成を示す側面図、図3は次のキャ
リアからの基板も含めて突き上げた状態の基板突き上げ
手段および基板搬送手段の概略要部構成を示す側面図、
図7の上記従来の基板処理装置の各構成部材と同様の作
用効果を奏する部材には同一の符号を付してその説明を
省略する。
FIG. 1 is a plan view showing a schematic configuration of a main part of a substrate transfer apparatus according to an embodiment of the present invention. FIG. 2 is a schematic view showing a substrate push-up means and a substrate transfer means in a state where a substrate is delivered from a first carrier. FIG. 3 is a side view showing a schematic configuration of a main part of a substrate push-up unit and a substrate transfer unit in a state of being pushed up including a substrate from the next carrier;
Members having the same functions and effects as those of the components of the conventional substrate processing apparatus shown in FIG. 7 are denoted by the same reference numerals, and description thereof will be omitted.

【0018】図1〜図3において、基板移載装置1は、
基板突き上げ手段4と、第1キャリア載置台5と、第1
キャリア回動手段7と、第2キャリア載置台8と、第2
キャリア回動手段10とを有している。基板突き上げ手
段4は、キャリア53内に収容した複数の基板52をキ
ャリア53の底部の開口部分から基板保持部材2を突き
上げて、基板保持部材2の複数の溝2a内に複数の基板
52の下端部分を嵌合させて保持すると共に、その突き
上げた複数の基板52を基板搬送手段3の一対の保持板
3aに両側から挾み込ませて受け渡す。第1キャリア載
置台5は、キャリア53を載置可能でキャリア53の底
部に対応したキャリア載置位置に開口部5bが形成され
ている。第1キャリア回動手段7は、この第1キャリア
載置台5を基板突き上げ手段4による基板突上げ位置
(図2の紙面に垂直な方向に対する位置であって、キャ
リア53内の複数の基板52が突き上げられる位置)4
aと第1キャリア待機位置5aの間において、ベアリン
グなどの軸支部材(図示せず)で第1キャリア載置台5
の支持部材6を回動自在に軸支してキャリア53を移送
する。第2キャリア載置台8は、キャリア53を載置可
能でキャリア53の底部に対応したキャリア載置位置に
開口部8bが形成されている。第2キャリア回動手段1
0は、この第2キャリア載置台8を基板突き上げ手段4
による基板突上げ位置(図3の紙面に垂直な方向に対す
る位置であって、キャリア53内の複数の基板52が突
き上げられる位置)4bと第2キャリア待機位置8aの
間において、ベアリングなどの軸支部材(図示せず)で
第2キャリア載置台8の支持部材9を回動自在に軸支し
てキャリア53を移送する。なお、第1キャリア載置台
5に対する基板突き上げ位置4aと第2キャリア載置台
8に対する基板突き上げ位置4bとは複数の基板52の
並べ方向(基板52の面に直角な方向)に半基板ピッチ
分だけずれるように構成している。つまり、第1キャリ
ア載置台5の中心位置である第1キャリア待機位置5a
を反時計回りに回動させた基板突き上げ位置4aと第2
キャリア載置台8の中心位置である第2キャリア待機位
置8aを時計回りに回動させた基板突き上げ位置4bと
は、キャリア53内の基板配列ピッチに対する半ピッチ
分だけずれた位置である。なお、cは基板突き上げ位置
4a,4b、第1キャリア待機位置5aおよび第2キャ
リア待機位置8aに対する中心位置を示している。
1 to 3, a substrate transfer apparatus 1 includes:
A substrate push-up means 4, a first carrier mounting table 5,
The carrier rotating means 7, the second carrier mounting table 8, and the second
And carrier rotating means 10. The substrate push-up means 4 pushes up the plurality of substrates 52 housed in the carrier 53 from the opening at the bottom of the carrier 53 to the plurality of grooves 2 a of the substrate holding member 2, and lowers the lower ends of the plurality of substrates 52. The portions are fitted and held, and the plurality of boards 52 pushed up are sandwiched from both sides to a pair of holding plates 3a of the board transfer means 3 and delivered. The first carrier mounting table 5 is capable of mounting the carrier 53, and has an opening 5b at a carrier mounting position corresponding to the bottom of the carrier 53. The first carrier rotating means 7 moves the first carrier mounting table 5 to a substrate push-up position by the substrate push-up means 4 (a position in a direction perpendicular to the paper surface of FIG. 2). Position to be pushed up) 4
a between the first carrier mounting table 5 and a first carrier standby position 5a by a bearing member (not shown) such as a bearing.
The carrier 53 is transferred by rotatably supporting the supporting member 6 of FIG. An opening 8b is formed in the second carrier mounting table 8 at a carrier mounting position corresponding to the bottom of the carrier 53 on which the carrier 53 can be mounted. Second carrier rotating means 1
0 means that the second carrier mounting table 8 is
(A position in a direction perpendicular to the plane of FIG. 3 where the plurality of substrates 52 in the carrier 53 are pushed up) 4b and a second carrier standby position 8a. The carrier 53 is transferred by rotatably supporting the support member 9 of the second carrier mounting table 8 with a material (not shown). It should be noted that the substrate push-up position 4a with respect to the first carrier mounting table 5 and the substrate push-up position 4b with respect to the second carrier mounting table 8 are defined by a half substrate pitch in the direction in which the plurality of substrates 52 are arranged (direction perpendicular to the surface of the substrate 52). It is configured to shift. That is, the first carrier standby position 5a which is the center position of the first carrier mounting table 5
The substrate pushing-up position 4a is rotated counterclockwise and the second
The substrate push-up position 4b obtained by rotating the second carrier standby position 8a, which is the center position of the carrier mounting table 8, clockwise is a position shifted by a half pitch with respect to the substrate arrangement pitch in the carrier 53. Here, c indicates a center position with respect to the substrate pushing-up positions 4a and 4b, the first carrier standby position 5a, and the second carrier standby position 8a.

【0019】基板搬送手段3は、基板突き上げ手段4の
基板保持部材2で突き上げられた複数の基板52を両側
(基板52の並び方向とは直交する両方向)から挾み込
んで保持する一対の保持板3aと、突き上げられた基板
保持部材2と各基板処理部(薬液槽62や水洗槽63な
ど)毎に配設された各リフタ装置(図示せず)との間、
または各リフタ装置(図示せず)間で一対の保持板3a
を移送する水平駆動部材(図示せず)とを有しており、
処理済みの複数の基板52は洗浄処理した空のキャリア
53内に回収される構成となっている。
The substrate transfer means 3 holds a plurality of substrates 52 pushed up by the substrate holding member 2 of the substrate push-up means 4 by sandwiching and holding the substrates 52 from both sides (in both directions orthogonal to the direction in which the substrates 52 are arranged). Between the plate 3a, the pushed-up substrate holding member 2 and each lifter device (not shown) provided for each substrate processing section (chemical solution tank 62, washing tank 63, etc.);
Alternatively, a pair of holding plates 3a may be provided between each lifter device (not shown).
And a horizontal drive member (not shown) for transferring the
The plurality of processed substrates 52 are collected in an empty carrier 53 that has been cleaned.

【0020】この一対の保持板3aはそれぞれ、その中
央部分に固定された回動軸の軸心を回動中心として互い
に逆方向に回動させることで、一対の保持板3aの保持
先端側を接近させる基板保持位置かまたは、その保持先
端側を離間させて一対の保持板3aを垂直方向とする基
板保持解除位置になる。つまり、一対の保持板3aの保
持先端側の接近処理で複数の基板52を両側から受けて
保持したり、保持先端側の離間処理で一対の保持板3a
を垂直方向とすることで複数の基板52の保持を解除し
たりするようになっている。また、図3のEE線一部断
面図の図5に示すように、一対の保持板3aの一方端1
2にはそれぞれ、例えば50枚の基板52を保持可能な
各溝12aが基板52の並び方向に上記半基板ピッチで
順次形成されている。また、図2のFF線一部断面図の
図6に示すように、その他方端13にはそれぞれ、例え
ば25枚の基板52を両側から受けて保持可能な各溝1
3aが基板52の並び方向に上記基板ピッチで順次形成
され、かつそれらの溝13aの間の中間位置に基板52
が通過可能な大きい各貫通孔13bが形成されている。
Each of the pair of holding plates 3a is rotated in opposite directions about the axis of a rotation shaft fixed to the central portion thereof, so that the holding front ends of the pair of holding plates 3a are rotated. The position is a substrate holding position to be approached, or a substrate holding release position in which a pair of holding plates 3a are vertically oriented by separating the holding front end side. That is, the plurality of substrates 52 are received and held from both sides in the approaching process on the holding tip side of the pair of holding plates 3a, or the pair of holding plates 3a are held in the separating process on the holding tip side.
Is set in the vertical direction, the holding of the plurality of substrates 52 is released. As shown in FIG. 5 which is a partial cross-sectional view taken along the line EE in FIG. 3, one end 1 of the pair of holding plates 3a is formed.
2, grooves 12a capable of holding, for example, 50 substrates 52 are sequentially formed at the half substrate pitch in the direction in which the substrates 52 are arranged. Further, as shown in FIG. 6 which is a partial sectional view taken along the line FF in FIG. 2, each of the other ends 13 has a groove 1 capable of receiving and holding, for example, 25 substrates 52 from both sides.
3a are sequentially formed at the substrate pitch in the direction in which the substrates 52 are arranged, and the substrate 52 is located at an intermediate position between the grooves 13a.
Each of the large through holes 13b through which the holes can pass is formed.

【0021】基板搬送手段3の水平駆動部材(図示せ
ず)としては、例えばワイヤやベルトに一対の保持板3
aを固定し、これらのワイヤやベルトが巻回されたプー
リおよびそれを回転させるモータなどで構成されていて
もよく、ボールねじおよびモータや、ラックとピニオン
およびモータなどで構成されていてもよい。
As a horizontal driving member (not shown) of the substrate transfer means 3, for example, a pair of holding plates 3 is attached to a wire or a belt.
a may be configured by a pulley around which these wires or belts are wound and a motor for rotating the pulley, or may be configured by a ball screw and a motor, or a rack and a pinion and a motor. .

【0022】また、基板突き上げ手段4は、キャリア5
3内に収容された複数の基板52の並び方向の基板配列
ピッチ(基板ピッチ)と同一のピッチで複数形成され複
数の基板52の下端部分を受け入れて保持する基板保持
用の各溝2aをその上面に有した基板保持部材2と、こ
の基板保持部材2の下面中央部分にその先端部分が固定
された垂直方向に伸びる支持部材11と、この支持部材
11の下端部分を上下動可能な垂直駆動部材(図示せ
ず)とを有している。この垂直駆動部材(図示せず)と
しては、例えばシリンダであってもよく、ボールねじお
よびモータや、ラックとピニオンおよびモータなどであ
ってもよい。
The substrate push-up means 4 includes a carrier 5
A plurality of substrate holding grooves 2a are formed at the same pitch as the substrate arrangement pitch (substrate pitch) in the direction in which the plurality of substrates 52 housed in the substrate 3 are arranged and receive and hold the lower end portions of the plurality of substrates 52. A substrate holding member 2 provided on the upper surface, a vertically extending supporting member 11 having a front end fixed to a central portion of the lower surface of the substrate holding member 2, and a vertical drive capable of vertically moving the lower end of the supporting member 11; (Not shown). The vertical drive member (not shown) may be, for example, a cylinder, a ball screw and a motor, or a rack and a pinion and a motor.

【0023】さらに、第1キャリア回動手段7は、図4
に示すように、キャリア53の四角をそれぞれ案内する
テーパが形成されたL字状の各キャリア位置決め部材1
4がその上面にそれぞれ配設されたキャリア載置部15
を有する第1キャリア載置台5と、このキャリア載置部
15に連設されたアーム部16の先端下面側にその先端
上面側が固定された円柱状の支持部材6と、この支持部
材6の下端面側が一方端に固定されたアーム部材17
と、このアーム部材17の他端側にそのロッド先端が連
結されたシリンダなどの回動駆動部材18とを有してい
る。シリンダのロッド先端の伸縮によってアーム部材1
7を介して支持部材6の中心軸芯を回動中心として第1
キャリア載置台5を角度90度だけ水平面内で回動させ
るようになっている。また、第2キャリア回動手段10
についても第1キャリア回動手段7と同様であり、キャ
リア53の四角をそれぞれ案内するテーパが形成された
各キャリア位置決め部材14がその上面にそれぞれ配設
されたキャリア載置部15を有する第1キャリア載置台
8と、このキャリア載置部15に連設されたアーム部1
6の先端下面側にその先端上面側が固定された円柱状の
支持部材9と、この支持部材9の下端面側が一方端に固
定されたアーム部材17と、このアーム部材17の他端
側にそのロッド先端が連結されたシリンダなどの回動駆
動部材18とを有している。このシリンダのロッド先端
の伸縮によってアーム部材17を介して支持部材9の中
心軸芯を回動中心として、第1キャリア載置台5の回動
方向とは反対側に第2キャリア載置台8を角度90度だ
け水平面内で回動させるようになっている。このよう
に、第1キャリア載置台5と第2キャリア載置台8とは
回動方向が逆方向であるので、基板52の表面はその裏
面に比べて清浄であるために、その裏面から表面へのパ
ーティクルの転写を防止するべく、基板52の表面同士
および裏面同士がそれぞれ対向して配列されるようにな
っている。
Further, the first carrier rotating means 7 is provided in
As shown in the figure, each of the L-shaped carrier positioning members 1 formed with a taper for guiding the square of the carrier 53 respectively.
4 are carrier mounting portions 15 respectively disposed on the upper surface thereof
A first carrier mounting table 5 having: a columnar support member 6 having an upper end fixed to a lower surface of a distal end of an arm 16 connected to the carrier mounting portion 15; Arm member 17 having an end face fixed to one end
And a rotation drive member 18 such as a cylinder having a rod end connected to the other end of the arm member 17. Arm member 1 due to expansion and contraction of the rod end of the cylinder
7, the first axis about the center axis of the support member 6 as the center of rotation.
The carrier mounting table 5 is rotated in a horizontal plane by an angle of 90 degrees. Also, the second carrier rotating means 10
Is the same as that of the first carrier rotating means 7, and each carrier positioning member 14 having a taper for guiding a square of the carrier 53 has a carrier mounting portion 15 provided on the upper surface thereof. The carrier mounting table 8 and the arm 1 connected to the carrier mounting section 15
6, a columnar support member 9 having a top surface fixed to the top surface, an arm member 17 having a bottom surface fixed to one end, and an arm member 17 having the bottom surface fixed to one end. A rotation drive member 18 such as a cylinder to which the rod tip is connected. By the extension and contraction of the rod tip of this cylinder, the second carrier mounting table 8 is angled to the side opposite to the rotation direction of the first carrier mounting table 5 about the center axis of the support member 9 via the arm member 17 as the rotation center. It is designed to rotate by 90 degrees in a horizontal plane. As described above, since the rotation directions of the first carrier mounting table 5 and the second carrier mounting table 8 are opposite to each other, the front surface of the substrate 52 is cleaner than the back surface thereof, so that the back surface moves from the back surface to the front surface. In order to prevent the transfer of the particles, the front surface and the back surface of the substrate 52 are arranged to face each other.

【0024】上記構成により、まず、キャリア載置台5
6上に載置され処理前の基板52が収容された各キャリ
ア53を、移載ロボット58によって、キャリア載置台
56から基板移載装置60の第1キャリア待機位置5a
および第2キャリア待機位置8aにおける第1キャリア
載置台5と第2キャリア載置台8上に順次搬送して載置
する。
With the above configuration, first, the carrier mounting table 5
Each carrier 53 containing the unprocessed substrate 52 placed thereon is transferred from the carrier mounting table 56 to the first carrier standby position 5 a of the substrate transfer device 60 by the transfer robot 58.
And, they are sequentially conveyed and placed on the first carrier mounting table 5 and the second carrier mounting table 8 at the second carrier standby position 8a.

【0025】次に、第1キャリア載置台5をその上のキ
ャリア53と共に、反時計回りに角度90度だけ回動駆
動部材18で回動させて基板突き上げ位置4aに移送さ
せる。さらに、この基板突き上げ位置4aにおいて、最
初のキャリア53内に収容した25枚の基板52をキャ
リア53の底部開口部分から基板保持部材2を突き上げ
て、基板保持部材2の複数の溝2a内に複数の基板52
の下端部分を嵌合させて保持する。そして、その突き上
げた25枚の基板52を基板搬送手段3の一対の保持板
3aにおける他方端13側の各溝13aで両側から受け
て保持することで25枚の基板52をキャリア53内か
ら基板保持部材2を介して基板搬送手段3の一対の保持
板3aに受け渡す。この状態を図2に示している。
Next, the first carrier mounting table 5, together with the carrier 53 thereon, is rotated counterclockwise by an angle of 90 degrees by the rotation driving member 18 and transferred to the substrate push-up position 4a. Further, at the substrate pushing-up position 4a, the 25 substrates 52 accommodated in the first carrier 53 are pushed up from the bottom opening portion of the carrier 53 into the plurality of grooves 2a of the substrate holding member 2. Substrate 52
Is fitted and held. The twenty-five substrates 52 are received from both sides by the grooves 13a on the other end 13 side of the pair of holding plates 3a of the substrate transporting means 3 and held, thereby holding the twenty-five substrates 52 from within the carrier 53. The substrate is transferred to a pair of holding plates 3a of the substrate transfer means 3 via the holding member 2. This state is shown in FIG.

【0026】その後、基板保持部材2を下降させ、第1
キャリア載置台5をその上に空のキャリア53を載置し
た状態で、時計回りに角度90度だけ回動駆動部材18
で回動させて元の第1キャリア待機位置5aに移送させ
る。次に、第2キャリア載置台8をその上のキャリア5
3と共に、時計回りに角度90度だけ回動駆動部材18
で回動させて基板突き上げ位置4aとは半基板ピッチだ
けずれた基板突き上げ位置4bに移送させる。
Thereafter, the substrate holding member 2 is lowered, and the first
In a state where the empty carrier 53 is mounted on the carrier mounting table 5, the rotation driving member 18 is rotated clockwise by 90 degrees.
To transfer to the original first carrier standby position 5a. Next, the second carrier mounting table 8 is placed on the carrier 5 thereon.
3 and the rotation driving member 18 by 90 degrees clockwise.
To transfer the substrate to the substrate push-up position 4b which is shifted from the substrate push-up position 4a by a half substrate pitch.

【0027】さらに、この基板突き上げ位置4bにおい
て、次のキャリア53内に収容した25枚の基板52を
キャリア53の底部開口部分から基板保持部材2を突き
上げて、基板保持部材2の複数の溝2a内に複数の基板
52の下端部分を嵌合させて保持する。そして、その突
き上げた25枚の基板52を基板搬送手段3の一対の保
持板3aにおける他方端13側の各溝13a間の各貫通
孔13bを上方に通過させると共に、前工程の各溝13
aで保持している25枚の基板52も一緒に突き上げて
基板保持部材2の各溝2a内に一括処理単位の合計50
枚の基板52を保持する。この状態を図3に示してい
る。
Further, at the substrate pushing-up position 4b, the 25 substrates 52 accommodated in the next carrier 53 are pushed up from the bottom opening of the carrier 53 by the substrate holding member 2, and the plurality of grooves 2a of the substrate holding member 2 are moved. The lower end portions of the plurality of substrates 52 are fitted and held therein. Then, the raised 25 substrates 52 are allowed to pass upward through the through holes 13b between the grooves 13a on the other end 13 side of the pair of holding plates 3a of the substrate transporting means 3, and the respective grooves 13
The 25 substrates 52 held by a are also pushed up together and into each groove 2a of the substrate holding member 2, a total of 50
The two substrates 52 are held. This state is shown in FIG.

【0028】次に、基板搬送手段3の一対の保持板3a
をそれぞれ角度180度回動させて、一対の保持板3a
の各一方端12を内側に接近させると共に、合計50枚
の基板52を保持した基板保持部材2を下降させて、合
計50枚の基板52を基板保持部材2の複数の溝2aか
ら基板搬送手段3の一対の保持板3aにおける各溝12
aに受け渡す。このとき、基板52の表面同士および裏
面同士がそれぞれ順次対向して配列されている。
Next, a pair of holding plates 3a of the substrate transfer means 3
Are rotated by 180 degrees to form a pair of holding plates 3a.
Of the substrate holding member 2 holding a total of 50 substrates 52 is lowered, and a total of 50 substrates 52 are transferred from the plurality of grooves 2a of the substrate holding member 2 to the substrate transfer means. 3. Each groove 12 in the pair of holding plates 3a
hand over to a. At this time, the front surface and the back surface of the substrate 52 are arranged so as to sequentially face each other.

【0029】さらに、基板保持部材2を下降させ、第2
キャリア載置台8をその上に空のキャリア53とを載置
したままで、反時計回りに角度90度だけ回動駆動部材
18で回動させて元の第2キャリア待機位置8aに移送
させる。その後、複数の基板52を受け渡した後の空の
各キャリア53は、移載ロボット58によって、キャリ
ア洗浄部61に順次移送され、このキャリア洗浄部61
で洗浄処理された空の各キャリア53内に、基板搬送手
段3で搬送され基板処理ユニット55から処理済みの合
計50枚の基板52を25枚の基板52に分けて回収す
るべく、再び基板移載装置60の第1キャリア待機位置
5aおよび第2キャリア待機位置8aにそれぞれ各キャ
リア53をそれぞれ移送して待機させる。このように、
処理済みの合計50枚の基板52を25枚の基板52に
分けて回収する場合には、上記動作を逆に繰り返せばよ
いことになる。
Further, the substrate holding member 2 is lowered, and the second
The carrier mounting table 8 is rotated counterclockwise by an angle of 90 degrees by the rotation drive member 18 while the empty carrier 53 is mounted thereon, and transferred to the original second carrier standby position 8a. Thereafter, the empty carriers 53 after the transfer of the plurality of substrates 52 are sequentially transferred to the carrier cleaning unit 61 by the transfer robot 58, and the carrier cleaning unit 61
In each of the empty carriers 53 that have been subjected to the cleaning process, a total of 50 substrates 52 transported by the substrate transporting unit 3 and processed from the substrate processing unit 55 are divided into 25 substrates 52 and collected again. Each carrier 53 is transferred to the first carrier standby position 5a and the second carrier standby position 8a of the loading device 60, respectively, and made to stand by. in this way,
To collect and collect a total of 50 processed substrates 52 into 25 substrates 52, the above operation may be repeated in reverse.

【0030】したがって、従来のようなキャリア水平移
動手段によるキャリア53の水平移動処理をせずに、第
1キャリア回動手段7および第2キャリア回動手段10
による第1キャリア載置台5と第2キャリア載置台8の
回動処理だけで、第1キャリア載置台5と第2キャリア
載置台8とを基板突き上げ位置4a,4bに互いに半基
板ピッチ(半基板配列ピッチ)分ずらせた状態で位置さ
せることが可能であるため、従来のキャリア水平移動手
段を不要とした分だけ、基板移載装置1の更なる構成の
簡素化や省重量および省設置スペースさらにはその高動
作速度や高位置決め精度をも実現することができる。ま
た、このような基板移載装置1を上記基板処理装置に容
易に適応させることができる。
Therefore, the first carrier rotating means 7 and the second carrier rotating means 10 are not required to perform the horizontal moving process of the carrier 53 by the conventional carrier horizontal moving means.
The first carrier mounting table 5 and the second carrier mounting table 8 are only rotated by the first carrier mounting table 5 and the second carrier mounting table 8 to move the first carrier mounting table 5 and the second carrier mounting table 8 to the substrate pushing-up positions 4a and 4b. Since it is possible to position the substrate transfer apparatus in a manner shifted by (array pitch), the structure of the substrate transfer apparatus 1 can be further simplified and the weight and installation space can be further reduced by the amount that the conventional carrier horizontal moving means is unnecessary. Can realize high operation speed and high positioning accuracy. Further, such a substrate transfer apparatus 1 can be easily adapted to the above-described substrate processing apparatus.

【0031】[0031]

【発明の効果】以上のように本発明の請求項1によれ
ば、従来のようなキャリア水平移動手段によるキャリア
の水平移動処理をせずに、第1キャリア回動手段および
第2キャリア回動手段によるキャリア載置台の回動処理
だけで、第1キャリア載置台と第2キャリア載置台とを
基板配列ピッチに対して半ピッチ分ずらせた状態で位置
させることが可能であるため、キャリア水平移動手段を
不要とした分だけ、更なる構成の簡素化や省重量および
省設置スペースさらには高位置決め精度を実現すること
ができる。
As described above, according to the first aspect of the present invention, the first carrier rotating means and the second carrier rotating means can be used without performing the carrier horizontal movement processing by the conventional carrier horizontal moving means. It is possible to position the first carrier mounting table and the second carrier mounting table in a state shifted by a half pitch with respect to the substrate arrangement pitch only by the rotation processing of the carrier mounting table by the means, so that the carrier is horizontally moved. Since the means is not required, further simplification of the configuration, weight saving and installation space, and high positioning accuracy can be realized.

【0032】また、本発明の請求項2によれば、更なる
構成の簡素化や省重量および省設置スペースさらには高
位置決め精度を有する基板移載装置を、この基板処理装
置に容易に効率よく適応させることができる。
According to the second aspect of the present invention, a substrate transfer apparatus having a further simplified structure, a reduced weight and a reduced installation space, and a high positioning accuracy can be easily and efficiently applied to the substrate processing apparatus. Can be adapted.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施形態の基板移載装置の概略要部
構成を示す平面図である。
FIG. 1 is a plan view illustrating a schematic main configuration of a substrate transfer apparatus according to an embodiment of the present invention.

【図2】図1の基板移載装置において、最初のキャリア
から基板を受け渡した状態の基板突き上げ手段および基
板搬送手段の概略要部構成を示す側面図である。
FIG. 2 is a side view showing a schematic configuration of a main part of a substrate push-up unit and a substrate transfer unit in a state where a substrate is delivered from a first carrier in the substrate transfer device of FIG. 1;

【図3】図1の基板移載装置において、次のキャリアか
らの基板も含めて突き上げた状態の基板突き上げ手段お
よび基板搬送手段の概略要部構成を示す側面図である。
FIG. 3 is a side view showing a schematic configuration of a main part of a substrate push-up unit and a substrate transfer unit in a state where a substrate including a substrate from a next carrier is pushed up in the substrate transfer device of FIG. 1;

【図4】図1の第1キャリア回動手段の概略要部構成を
示す正面図である。
FIG. 4 is a front view showing a schematic configuration of a main part of a first carrier rotating unit of FIG. 1;

【図5】図3のEE線一部断面図である。FIG. 5 is a partial sectional view taken along the line EE of FIG. 3;

【図6】図2のFF線一部断面図である。FIG. 6 is a partial sectional view taken along line FF of FIG. 2;

【図7】従来の基板処理装置の概略要部構成を示す斜視
図である。
FIG. 7 is a perspective view illustrating a schematic main configuration of a conventional substrate processing apparatus.

【符号の説明】[Explanation of symbols]

1 基板移載装置 53 キャリア 52 基板 2 基板保持部材 2a 溝 3 基板搬送手段 3a 保持板 4 基板突き上げ手段 4a,4b 基板突き上げ位置 5b,8b 開口部 5 第1キャリア載置台 5a 第1キャリア待機位置 6 支持部材 7 第1キャリア回動手段 8 第2キャリア載置台 8a 第2キャリア待機位置 8b 開口部 9,11 支持部材 10 第2キャリア回動手段 12 一方端 12a,13a 溝 13 他方端 13b 貫通孔 14 キャリア位置決め部材 15 キャリア載置部 16 アーム部 17 アーム部材 18 回動駆動部材 DESCRIPTION OF SYMBOLS 1 Substrate transfer apparatus 53 Carrier 52 Substrate 2 Substrate holding member 2a Groove 3 Substrate conveying means 3a Holding plate 4 Substrate pushing-up means 4a, 4b Substrate pushing-up position 5b, 8b Opening 5 First carrier mounting table 5a First carrier standby position 6 Supporting member 7 First carrier rotating means 8 Second carrier mounting table 8a Second carrier standby position 8b Opening 9,11 Supporting member 10 Second carrier rotating means 12 One end 12a, 13a Groove 13 Other end 13b Through hole 14 Carrier positioning member 15 Carrier mounting part 16 Arm part 17 Arm member 18 Rotation drive member

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 複数の基板を収容したキャリアから複数
の基板を基板搬送手段へ受け渡すための基板移載装置に
おいて、 第1キャリアを載置可能であって、前記第1キャリアを
載置させた際に前記第1キャリアの底部開口部に対応し
た位置が開口された第1キャリア載置台と、 第2キャリアを載置可能であって、前記第2キャリアを
載置させた際に前記第2キャリアの底部開口部に対応し
た位置が開口された第2キャリア載置台と、 前記第1キャリアおよび前記第2キャリアから前記基板
搬送手段へ基板を受け渡すために、前記第1キャリアに
収納された複数の基板を前記第1キャリア載置台の下方
から前記第1キャリアの底部開口部を通して突き上げて
保持するとともに、前記第2キャリアに収納された複数
の基板を前記第2キャリア載置台の下方から前記第2キ
ャリアの底部開口部を通して突き上げて保持する突き上
げ手段と、 前記突き上げ手段の上方の位置と前記第1キャリア載置
台の待機位置との間で、前記第1キャリア載置台を回動
させる第1回動手段と、 前記突き上げ手段の上方の位置と前記第2キャリア載置
台の待機位置との間で、前記第2キャリア載置台を回動
させる第2回動手段とを有し、 前記第1キャリアに収容された基板を突き上げる際の前
記突き上げ手段に対する前記第1キャリア載置台に載置
された前記第1キャリアの位置と前記第2キャリアに収
容された基板を突き上げる際の前記突き上げ手段に対す
る前記第2キャリア載置台に載置された前記第2キャリ
アの位置とは、複数の基板の基板配列ピッチに対して半
ピッチ分ずれていることを特徴とする基板移載装置。
1. A substrate transfer apparatus for transferring a plurality of substrates from a carrier accommodating a plurality of substrates to a substrate transfer means, wherein a first carrier can be placed, and the first carrier is placed on the first carrier. A first carrier mounting table having an opening at a position corresponding to the bottom opening of the first carrier, and a second carrier capable of being mounted, wherein the second carrier is mounted when the second carrier is mounted. A second carrier mounting table having an opening at a position corresponding to the bottom opening of the two carriers; and a second carrier mounting table accommodated in the first carrier for transferring a substrate from the first carrier and the second carrier to the substrate transport means. The plurality of substrates are pushed up from below the first carrier mounting table through the bottom opening of the first carrier and held, and the plurality of substrates accommodated in the second carrier are mounted on the second carrier mounting table. A push-up means for pushing up and holding the bottom of the second carrier through a bottom opening of the second carrier; and a first carrier mounting table between a position above the push-up means and a standby position of the first carrier mounting table. First rotating means for rotating, and second rotating means for rotating the second carrier mounting table between a position above the push-up means and a standby position of the second carrier mounting table. The position of the first carrier placed on the first carrier mounting table with respect to the pushing means when pushing up the substrate accommodated in the first carrier and the time of pushing up the substrate accommodated in the second carrier A position of the second carrier mounted on the second carrier mounting table with respect to the push-up means is shifted by a half pitch with respect to a substrate arrangement pitch of a plurality of substrates. The substrate transfer apparatus.
【請求項2】 複数の基板に基板処理を行うべく、複数
の基板を収容したキャリアから複数の基板を基板搬送手
段に受け渡すための請求項1に記載の基板移載装置と、 この基板移載装置で前記基板搬送手段に受け渡された複
数の基板を基板処理部に搬送して所定の処理を行う基板
処理ユニットとを有したことを特徴とする基板処理装
置。
2. A substrate transfer apparatus according to claim 1, wherein said substrate transfer device transfers the plurality of substrates from a carrier accommodating the plurality of substrates to a substrate transfer means in order to perform the substrate processing on the plurality of substrates. A substrate processing unit for transporting the plurality of substrates transferred to the substrate transporting means by the mounting device to a substrate processing unit and performing a predetermined process.
JP7553998A 1998-03-24 1998-03-24 Substrate transferring device and substrate treating device Withdrawn JPH11274270A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7553998A JPH11274270A (en) 1998-03-24 1998-03-24 Substrate transferring device and substrate treating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7553998A JPH11274270A (en) 1998-03-24 1998-03-24 Substrate transferring device and substrate treating device

Publications (1)

Publication Number Publication Date
JPH11274270A true JPH11274270A (en) 1999-10-08

Family

ID=13579121

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7553998A Withdrawn JPH11274270A (en) 1998-03-24 1998-03-24 Substrate transferring device and substrate treating device

Country Status (1)

Country Link
JP (1) JPH11274270A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100374911C (en) * 2002-12-31 2008-03-12 Lg.菲利浦Lcd株式会社 Base plate transmission system
CN100429561C (en) * 2005-12-29 2008-10-29 乐金显示有限公司 Cassette for containing liquid crystal display device
CN108760242A (en) * 2018-07-27 2018-11-06 苏州精濑光电有限公司 A kind of pre- alignment device of panel
TWI711115B (en) * 2019-06-26 2020-11-21 弘塑科技股份有限公司 Substrate transferring apparatus, semiconductor process machine and substrate transferring method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100374911C (en) * 2002-12-31 2008-03-12 Lg.菲利浦Lcd株式会社 Base plate transmission system
CN100429561C (en) * 2005-12-29 2008-10-29 乐金显示有限公司 Cassette for containing liquid crystal display device
CN108760242A (en) * 2018-07-27 2018-11-06 苏州精濑光电有限公司 A kind of pre- alignment device of panel
CN108760242B (en) * 2018-07-27 2024-04-16 苏州精濑光电有限公司 Panel pre-alignment device
TWI711115B (en) * 2019-06-26 2020-11-21 弘塑科技股份有限公司 Substrate transferring apparatus, semiconductor process machine and substrate transferring method

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