JPH10209241A - Substrate transfer device and substrate treatment device provided with it - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate transfer device which allows reduction of a setting-up area by effectively utilizing a space in the up-and-down directions and a substrate treatment device provided with it. SOLUTION: A treatment region B includes an upper treatment regions B1 and a lower treatment region B2. In the upper treatment region B1, a plurality of substrate treatment units 201 are arranged in a plurality of steps and in the lower treatment region, B2 also a plurality of substrate units 202 are arranged in a plurality of steps. In correspondence to the upper treatment region B1 and the lower treatment region B2, an upper transfer region and a lower transfer region are arranged. The upper transfer region is provided with a substrate transfer unit 101 and the lower transfer unit is provided with a substrate transfer unit 102. Respective transfer units 101, 102 include a flexible elevator mechanism 4 each. The interval between the upper transfer region and the lower transfer region is shielded with a partition 25. One end side of the transfer regions is provided with an elevater device 300 transferring the substrate in the up-and-down directions.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a substrate transfer apparatus for transferring a substrate and a substrate processing apparatus having the same.

[0002]

2. Description of the Related Art A substrate processing apparatus is used to perform various processes on substrates such as a semiconductor wafer, a glass substrate for a liquid crystal display, a glass substrate for a photomask, and a glass substrate for an optical disk. For example, in a semiconductor device manufacturing process, a substrate processing apparatus is used in which a series of processes are unitized and a plurality of substrate processing units are integrated in order to increase production efficiency. In such a substrate processing apparatus, generally, a plurality of different processes are continuously performed on one substrate. Therefore, a substrate transport unit that transports a substrate between each substrate processing unit is provided.

FIG. 8 is a plan view showing an example of a conventional substrate processing apparatus provided with a substrate transport unit, and FIG. 9 is a front view of the substrate processing apparatus shown in FIG.

The substrate processing apparatus shown in FIG. 8 has processing areas A and B and a transport area C. A plurality of substrate processing units 200 are arranged in the processing area A, a plurality of substrate processing units 201 are arranged in the processing area B, and the substrate transport unit 100 is provided in the transport area C.

An indexer 400 for loading and unloading substrates is provided at one end of the processing areas A and B and the transport area C, and another substrate processing apparatus is provided at the other end of the transport area C. And a substrate transfer section 500 for transferring the substrate between them. A plurality of substrate support pins 501 are provided in the substrate transfer section 500, and a substrate is mounted on these substrate support pins 501.

As shown in FIG. 9, a plurality of substrate processing units 201 are arranged in a plurality of stages in a processing area B, and each substrate processing unit 201 is provided with an opening 21 for loading and unloading a substrate. ing.

The substrate transfer unit 100 includes a hand 51 for holding a substrate, a moving body 52, an elevating unit 53, and a base member 5.
4 and a ball screw 55. The base member 54 is Y
It is guided by the guide member 56 so as to be movable in the axial direction (the longitudinal direction of the transport area C). The elevating part 53 is moved in the Z-axis direction (vertical axis direction) by a ball screw 55 arranged in the vertical direction.
Is provided on the base member 54 so as to be movable.

The moving body 52 is provided on the elevating section 53 so as to be rotatable in the θ-axis direction (rotational direction about the vertical axis). The hand 51 is provided on the moving body 52 so as to be able to advance and retreat in the X-axis direction (predetermined horizontal direction). The rotation of the moving body 52 also rotates in the X-axis direction.

With the above structure, the substrate transport unit 10
The 0 hand 51 moves in the Y-axis direction, moves up and down in the Z-axis direction, rotates in the θ-axis direction,
Further, it can move forward and backward in the X-axis direction.

In FIG. 8, the transfer robot 402 of the indexer 400 moves in the direction of arrow U,
The substrate W is taken out from the substrate transfer unit 1 and transferred to the substrate transfer unit 100. Conversely, the substrate W subjected to a series of processes is received from the substrate transfer unit 100 and returned to the cassette 401.

The substrate transport unit 100 transports the substrate W in the transport area C in the Y-axis direction, transfers the substrate W to and from the transfer robot 400, and transfers the substrate W to the substrate processing unit 200. Loading and unloading are performed, or transfer of the substrate W to and from the substrate transfer unit 500 is performed.

[0012]

In the above-described conventional substrate transfer unit 100, the hand 5 is provided so that particles (fine particles) generated from the mechanical section do not adhere to the substrate.
1 is provided at the top of the elevating unit 53. The elevating unit 53 is driven in the Z-axis direction by a linear motion mechanism using a motor (not shown) and a ball screw 55. for that reason,
A mechanism such as a ball screw 54 projects below the base member 54 by a length substantially equivalent to the stroke of the elevating unit 53, and a space of a predetermined height is required below the transport path by the hand 51.

FIG. 10 is a view showing a transferable range (accessible range) by a substrate transfer unit of a conventional substrate processing apparatus.

In FIG. 10, R1 indicates a range in which the side of the transfer area C can be accessed (substrate transfer) by the substrate transfer unit 100, and R1a and R1b indicate both ends of the transfer area C by the substrate transfer unit 100, respectively. It shows the accessible range for the unit. FIG.
As shown in (5), the area below the base member 54 cannot be accessed on both sides and both ends of the transport area C.

Therefore, the substrate processing unit cannot be disposed in the space below the substrate processing apparatus, and the space in the vertical direction cannot be effectively used. Therefore,
The installation area of the substrate processing apparatus cannot be reduced.

It is an object of the present invention to provide a substrate transfer apparatus capable of reducing an installation area by effectively utilizing a space in a vertical direction, and a substrate processing apparatus including the same.

[0017]

Means for Solving the Problems and Effects of the Invention In the substrate transfer apparatus according to the first invention, a transfer means is provided in each of a plurality of transfer areas arranged vertically, and each transfer means is provided with:
It includes a substrate holding unit for holding a substrate, and a driving unit for moving the substrate holding unit in a vertical direction, and the driving unit is configured by a telescopic elevating mechanism that expands and contracts up and down.

In the substrate transport apparatus according to the first invention, the substrate is transported by the transport means in each of the vertically disposed transport areas. In particular, since each transport unit includes a drive unit formed of a telescopic elevating mechanism that expands and contracts up and down, a part of the mechanical unit of the transport unit transports the substrate up and down in each transport area without projecting below the transport area. be able to.

Therefore, it is possible to carry in and carry out substrates to and from the processing units arranged in a plurality of stages in each of a plurality of processing regions stacked vertically, thereby reducing the installation area of the substrate processing apparatus. Can be.

According to a second aspect of the present invention, there is provided the substrate transfer apparatus according to the first aspect of the present invention, further comprising a lifting means for moving the substrate between a plurality of transfer areas. In this case, the substrate can be transported in each of the transport areas arranged vertically, and the substrate can be transported between a plurality of transport areas.

According to a third aspect of the present invention, there is provided the substrate transfer apparatus according to the first or second aspect of the present invention, further comprising a shielding means for shielding between a plurality of transfer areas. This prevents the influence of particles such as dust on the plurality of transport areas arranged vertically.

According to a fourth aspect of the present invention, there is provided a substrate transfer apparatus comprising:
In the configuration of the substrate transfer device according to the second or third aspect, the extendable elevating mechanism includes a plurality of members that are foldably connected. In this case, the plurality of members perform the folding operation, so that the substrate holding unit is driven in the vertical direction without a part of the mechanism unit of the transfer unit protruding below the transfer area.

According to a fifth aspect of the present invention, there is provided a substrate processing apparatus comprising: a plurality of processing regions arranged vertically; a plurality of processing units provided in the plurality of processing regions to perform predetermined processing on a substrate;
A plurality of transport areas arranged vertically corresponding to the plurality of processing areas, and a plurality of transport areas provided in the plurality of transport areas, respectively, for transporting the substrate in the transport areas and for processing the substrates in the corresponding processing areas. A plurality of transporting means for carrying in and out.

In the substrate processing apparatus according to the fifth aspect of the present invention, the substrate is transported by the transport means in each of the vertically disposed transport areas, and the transport means transfers the substrate to the processing section of the corresponding processing area. Loading and unloading are performed.

Therefore, the space in the vertical direction of the substrate processing apparatus can be effectively used, and the installation area of the substrate processing apparatus can be reduced.

A substrate processing apparatus according to a sixth aspect of the present invention is the substrate processing apparatus according to the fifth aspect, wherein each of the plurality of transfer means moves the substrate in a vertical direction, and a substrate holding section for holding the substrate. And a drive unit configured to extend and retract the drive unit up and down.

In this case, since each transporting means includes a drive unit composed of a telescopic elevating mechanism which expands and contracts up and down, a part of the mechanism of the transporting means does not protrude below the transporting area, and the substrate is moved in each transporting area. Can be transported up and down.

Therefore, it is possible to carry in and carry out the substrate to and from the processing units arranged in a plurality of stages in each of the plurality of processing regions stacked vertically, thereby further reducing the installation area of the substrate processing apparatus. be able to.

According to a seventh aspect of the present invention, in the substrate processing apparatus according to the fifth or sixth aspect, each of the plurality of transport means can be moved in a horizontal direction along a corresponding processing area. A first movable portion, a second movable portion rotatable around a vertical axis, and a substrate holding device provided on the second movable portion so as to hold a substrate and to be movable in a predetermined horizontal direction. And a drive unit for moving the second movable unit in the vertical direction with respect to the first movable unit, and the drive unit comprises an extendable elevating mechanism that expands and contracts up and down.

In this case, when the first movable portion moves in the horizontal direction along the corresponding processing area, the substrate is transported between any two positions in the transport area, and the second movable section is moved.
The movable portion is driven in the vertical direction by the drive portion, whereby the substrate is transported in the vertical direction in the transport area. In addition, the second movable part rotates around the axis in the vertical direction, and the substrate holding part moves in the horizontal direction with respect to the second movable part. Will be

In particular, since the drive unit is constituted by a telescopic elevating mechanism which expands and contracts up and down, it is possible to convey the substrate vertically in the conveyance area without a part of the mechanism of the conveyance means protruding below the conveyance area. Becomes possible.

According to an eighth aspect of the present invention, there is provided a substrate processing apparatus comprising:
In the configuration of the substrate processing apparatus according to the sixth or seventh aspect, the apparatus further includes an elevating means for moving the substrate up and down in the plurality of transfer areas. Thus, the substrate can be transported in each of the transport areas arranged vertically, and the substrate can be transported between the plurality of transport areas. Therefore, it is possible to transfer a substrate between processing units in different processing regions.

[0033]

FIG. 1 is a plan view of a substrate processing apparatus according to an embodiment of the present invention, FIG. 2 is a front view of the substrate processing apparatus of FIG. 1 as viewed from a transfer area, and FIG. It is a side view of a processing unit.

As shown in FIG. 1, the substrate processing apparatus has processing areas A and B and a transport area C. In the processing area A, a plurality of substrate processing units 200 for performing predetermined processing such as spin coating processing of a processing liquid, development processing, cleaning processing, heating processing, and cooling processing are arranged. An indexer 400 for loading and unloading substrates is provided at one end of the processing areas A and B and the transport area C. On the other end side of the transfer area C, an elevating device 300 for transferring the substrate in the vertical direction is provided.

As shown in FIGS. 2 and 3, the processing area B
Includes an upper processing area B1 and a lower processing area B2. A plurality of substrate processing units 201 for performing predetermined processing on a substrate are arranged in a plurality of stages in the upper processing region B1, and a plurality of substrate processing units 202 for performing predetermined processing on the substrate are arranged in a plurality of stages also in the lower processing region B2. Have been. Each of the substrate processing units 201 and 202 is provided with an opening 21 for loading and unloading a substrate.

As shown in FIG. 3, the transfer area C includes an upper transfer area C1 and a lower transfer area C2 corresponding to the upper processing area B1 and the lower processing area B2. The substrate transfer unit 101 is provided in the upper transfer region C1, and the substrate transfer unit 102 is provided in the lower transfer region C2. A partition 25 shields between the upper transport area C1 and the lower transport area C2. This prevents the upper transport area C1 and the lower transport area C2 from being affected by particles such as dust.

The substrate transfer unit 101 includes two hands 1 a and 1 b, a moving body 2, a support 3, a telescopic elevating mechanism 4, and a base member 5. FIG. 2 shows only one hand 1a of the two hands 1a and 1b.

As shown in FIG. 3, guide rails 7 are fixed on a pair of support members 6 arranged in the longitudinal direction of the upper transport area C1. The base member 5 is provided movably on the guide rail 7 in the Y-axis direction (the longitudinal direction of the transport area C). The telescopic lifting mechanism 4 is configured to be telescopic in the Z-axis direction (vertical axis direction) by an articulated arm mechanism composed of two arms 4a and 4b.

The support table 3 is provided above the base member 5 so as to be movable in the Z-axis direction by a telescopic lifting mechanism 4.
The moving body 2 is provided on the support base 3 so as to be rotatable in the θ-axis direction (a rotation direction about a vertical axis). The two hands 1a and 1b are moved horizontally on the moving body 2 (not shown).
X-axis direction (direction of forward and backward movement in the horizontal plane)
Is provided so as to be movable. Hand 1a is hand 1b
It is arranged so that it may overlap with the upper part of.

The substrate transport unit 102 has the same structure as the substrate transport unit 101.

As shown in FIG. 2, the lifting device 300 includes two arms 33 and 34 of a telescopic lifting mechanism 31 and a lifting member 3.
It includes two and three substrate support pins 35.

The elevating member 32 is fixed to an upper part of the arm 34 of the telescopic elevating mechanism 31, and is guided so as to be able to move up and down by an expansion and contraction action. The substrate W is placed on three substrate support pins 35 provided on the elevating member 32.

In the substrate processing apparatus of this embodiment, as shown in FIG. 1, the transfer robot 402 of the indexer 400 moves in the direction of the arrow U, takes out the substrate W from the cassette 401, and delivers it to the substrate transfer unit 101. Conversely, the substrate W subjected to the series of processes is received from the substrate transport unit 101 and returned to the cassette 401.

The substrate transport unit 101 transports the substrate W in the upper transport area C 1, and
And the substrate W is transferred to and from the substrate processing unit 200 in the processing area A or the substrate processing unit 201 in the upper processing area B1.
Alternatively, the substrate is transferred to and from the lifting device 300.

The substrate transport unit 102 transports the substrate W in the lower transport area C2, and loads and unloads the substrate W from and to the substrate processing unit 202 in the lower processing area B2. Delivery of W is performed.

The lifting / lowering device 300 transports the substrate W received from the substrate transport unit 101 in the upper transport region C1 to the lower transport region C2 and transfers it to the substrate transport unit 102, or receives the substrate W from the substrate transport unit 102 in the lower transport region C2. The transferred substrate W is transferred to the upper transfer area C1 and transferred to the substrate transfer unit 101.

In this embodiment, the substrate transport unit 101,
102 corresponds to a transport means, and the substrate processing unit 201,
202 corresponds to a processing unit, and the lifting device 300 corresponds to a lifting unit. Further, the partition 25 corresponds to a shielding unit.

FIG. 4 is a front view of the substrate transfer unit 101.
FIG. 5 is a side view of the substrate transport unit 101. In addition,
The configuration of the substrate transfer unit 102 is the same as the configuration shown in FIGS.

As shown in FIGS. 4 and 5, guide rails 7 are fixed to the upper surfaces of the pair of support members 6, respectively, and the base member 5 is provided on the guide rails 7 so as to be movable in the Y-axis direction. .

As shown in FIG. 4, a ball screw 8 is provided between the support members 6 along the Y-axis direction. A nut member 9 screwed to the ball screw 8 is provided on the lower surface of the base member 5.
Further, a motor 10 for driving the nut member 9 to rotate forward and backward is provided. When the nut member 9 is driven to rotate by the motor 10, the base member 5 moves horizontally in the Y-axis direction.

On the base member 5, two arms 4a,
A telescopic elevating mechanism 4 comprising 4b is provided. One end of the arm 4 b is rotatably mounted on a support bracket 12 provided on the base member 5 by a horizontal shaft 14. One end of the arm 4a is rotatably attached to the other end of the arm 4b by a horizontal shaft 15. The other end of the arm 4 a is rotatably attached to a support bracket 13 provided on the lower surface of the support base 3 by a horizontal shaft 16.

A pulley 17 is connected and fixed to one end of the horizontal shaft 14, pulleys 18 and 20 are connected and fixed to one end and the other end of the horizontal shaft 15, and a pulley is connected to the other end of the horizontal shaft 16. 21 is connected and fixed. Pulley 1
A wire 19 is bridged between the pulley 7 and the pulley 18, and a wire 22 is bridged between the pulley 20 and the pulley 21. The horizontal shaft 14 is fixed to the support bracket 12, the horizontal shaft 15 is fixed to the arm 4a, and the horizontal shaft 16 is fixed to the support bracket 13. The diameter of the pulley 17 is set to twice the diameter of the pulley 18, and the diameter of the pulley 20 is
The diameter is set to one half of the diameter of one.

As shown in FIG. 5, a driving member 11 extends from the lower end of the arm 4b. This driving member 11
Is driven in the direction of arrow D by a motor 23 and a ball screw 24 provided on the lower surface of the base member 5. When the driving member 11 is driven in the direction of arrow D, the arms 4a,
The telescopic elevating mechanism 4 composed of 4b expands and contracts in the Z-axis direction, and the support 3 moves in the Z-axis direction in a horizontal posture.

The moving body 2 is driven to rotate in the θ-axis direction by a motor built in the support 3. Also, hands 1a,
1b is independently advanced and retracted in the X-axis direction by a slide mechanism (not shown) provided on the moving body 2. Note that the X-axis direction rotates in a horizontal plane as the moving body 2 rotates.

In this embodiment, the hands 1a and 1b correspond to the substrate holding unit, and the base member 5 corresponds to the first movable unit.
The moving body 2 corresponds to a second movable section. The telescopic elevating mechanism 4 constitutes a driving unit.

FIG. 6 is a diagram showing a transferable range (accessible range) by the substrate transfer unit of the substrate processing apparatus of FIG.

In FIG. 6, R1 is the substrate transport unit 1.
01 indicates a range in which the side of the upper transfer area C1 can be accessed (substrate transfer), and R1a and R1a
Reference numeral 1b denotes a range in which the substrate transfer unit 101 can access both ends of the upper transfer area C1. R2 indicates a range in which the substrate transfer unit 102 can access the side of the lower transfer area C2, and R2a and R2b indicate ranges in which the substrate transfer unit 102 can access both ends of the lower transfer area C2. Is shown.

The substrate processing unit 20 in the upper processing area B1
1 is a range R1 accessible by the substrate transport unit 101
And the substrate processing unit 2 in the lower processing area B2.
02 is a range R accessible by the substrate transport unit 102
2.

As described above, in the substrate processing apparatus of this embodiment, the substrates are transported by the substrate transport units 101 and 102 in the upper transport area C1 and the lower transport area C2, respectively. Loading and unloading of substrates are performed to and from the substrate processing unit 201 in the area B1, and the substrate transport unit 102
Thus, the substrate is loaded and unloaded to and from the substrate processing unit 202 in the lower processing area B2. in this way,
Effective use of the space in the vertical direction of the substrate processing apparatus is achieved, and the installation area of the substrate processing apparatus is reduced.

In particular, since the substrate transfer units 101 and 102 have the telescopic elevating mechanism 4 that expands and contracts upward, a part of the mechanism of the substrate transfer units 101 and 102 projects below the upper transfer area C1 and the lower transfer area C2. Without being performed, respectively, in the upper transport area C1 and the lower transport area
The substrate can be conveyed up and down within 2. Therefore, it is possible to carry in and carry out the substrates to and from the substrate processing units 201 arranged in a plurality of stages in the upper processing region B1 and the substrate processing units 202 arranged in a plurality of stages in the lower processing region B2. The space in the vertical direction of the device is more effectively used.

Since the substrate can be transferred between the upper transfer area C1 and the lower transfer area C2 by the lifting device 300, the substrate processing unit 2 in the upper processing area B1 can be transferred.
01 and the substrate processing unit 202 in the lower processing area B2.

FIG. 7 is a perspective view showing another example of the substrate transport unit. The substrate transport unit in FIG. 7 has a telescopic elevating mechanism 40 having a pantograph structure.

The base member 5 can be moved in the Y-axis direction by a ball screw 8, a nut member and a motor (not shown) 2 on a pair of guide rails 7, similarly to the board transfer unit of FIGS. It is provided in. The telescopic elevating mechanism 40 is provided on the base member 5. The telescopic elevating mechanism 40 includes two sets of pantograph links 41a and 41b which are vertically expanded and contracted by a ball screw 42 and a motor 43.
It consists of.

The support 3 is mounted on the upper part of the telescopic elevating mechanism 40, and the movable body 2 is provided on the support 3 so as to be rotatable in the θ-axis direction. Two hands 1 on moving body 2
a, 1b are provided so as to be able to advance and retreat in the X-axis direction.

Also in the substrate transfer unit of FIG. 7, the hands 1a and 1b are moved in the Z-axis direction by the telescopic elevating mechanism 40. Therefore, this substrate transfer unit is shown in FIGS.
Provided in the upper transfer area C1 and the lower transfer area C2 of the substrate processing apparatus, the upper transfer area C1 does not protrude below the upper transfer area C1 and the lower transfer area C2. The substrate can be transferred inside and in the lower transfer area C2.

In the above embodiment, the elevating member 32 of the elevating device 300 supports the substrate W with the substrate support pins 35. However, when the substrate is moved up and down at a high speed, the substrate is moved by vibration or the like. A mechanical chuck mechanism for mechanically holding the substrate so as not to be displaced above, or a suction chuck mechanism for vacuum-sucking the substrate may be used.

In the above embodiment, a plurality of processing regions are stacked, but it is also possible to stack a substrate transfer portion such as the indexer 400 and a cassette holding the substrates in the vertical direction.

[Brief description of the drawings]

FIG. 1 is a plan view of a substrate processing apparatus according to an embodiment of the present invention.

FIG. 2 is a front view of the substrate processing apparatus of FIG. 1 as viewed from a transfer area.

FIG. 3 is a side view of the substrate processing apparatus of FIG. 1;

FIG. 4 is a front view of a substrate transport unit used in the substrate processing apparatus of FIG.

FIG. 5 is a side view of a substrate transport unit used in the substrate processing apparatus of FIG.

FIG. 6 is a view showing a transferable range by a substrate transfer unit of the substrate processing apparatus of FIG. 1;

FIG. 7 is a perspective view showing another example of the substrate transport unit.

FIG. 8 is a plan view showing an example of a conventional substrate processing apparatus.

9 is a front view of the substrate processing apparatus of FIG. 8 as viewed from a transfer area.

FIG. 10 is a diagram showing a transferable range by a substrate transfer unit of the substrate processing apparatus of FIG. 8;

[Explanation of symbols]

 1a, 1b Hand 2 Moving body 3 Support 4 Extension mechanism 4a, 4b Arm 5 Base member 101, 102 Substrate transport unit 200, 201, 202 Substrate processing unit 300 Lifting device A, B Processing area C Transport area B1 Upper processing area B2 Lower processing area C1 Upper transfer area C2 Upper transfer area

Claims (8)

[Claims] A transfer unit is provided in each of a plurality of transfer regions arranged vertically, and each of the transfer units includes a substrate holding unit that holds a substrate and a driving unit that moves the substrate holding unit in a vertical direction. The substrate transport device includes: a drive unit configured to extend and retract vertically. 2. The substrate transfer apparatus according to claim 1, further comprising a lifting means for moving the substrate between the plurality of transfer areas. 3. The substrate transport apparatus according to claim 1, further comprising a shielding unit that shields between the plurality of transport areas. 4. The substrate transport apparatus according to claim 1, wherein the telescopic elevating mechanism comprises a plurality of members that are foldably connected. 5. A plurality of processing regions arranged vertically, a plurality of processing units respectively provided in the plurality of processing regions, and performing a predetermined process on a substrate, and a plurality of processing regions arranged vertically corresponding to the plurality of processing regions. A plurality of transport areas arranged, and a plurality of transport means provided in each of the plurality of transport areas, transporting the substrate in the transport area, and loading and unloading the substrate to and from a processing unit in a corresponding processing area. A substrate processing apparatus comprising: 6. Each of the plurality of transporting means includes a substrate holding unit for holding a substrate, and a driving unit for moving the substrate holding unit in a vertical direction, wherein the driving unit is configured to extend and contract vertically. 6. The substrate processing apparatus according to claim 5, comprising: 7. Each of the plurality of transporting means has a first movable portion movable in a horizontal direction along a corresponding processing area, and a second movable portion rotatable around a vertical axis. When,
A substrate holding portion provided on the second movable portion so as to be movable in a predetermined horizontal direction while holding a substrate, and a drive for moving the second movable portion in a vertical direction with respect to the first movable portion. The substrate processing apparatus according to claim 5, further comprising: a driving unit configured to extend and retract vertically. 8. The substrate processing apparatus according to claim 5, further comprising elevating means for moving the substrate up and down between the plurality of transfer areas.