JPH10289853A5 - - Google Patents
Info
- Publication number
- JPH10289853A5 JPH10289853A5 JP1997097227A JP9722797A JPH10289853A5 JP H10289853 A5 JPH10289853 A5 JP H10289853A5 JP 1997097227 A JP1997097227 A JP 1997097227A JP 9722797 A JP9722797 A JP 9722797A JP H10289853 A5 JPH10289853 A5 JP H10289853A5
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- optical system
- light source
- exposure method
- ultraviolet light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP09722797A JP4181647B2 (ja) | 1997-04-15 | 1997-04-15 | 露光方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP09722797A JP4181647B2 (ja) | 1997-04-15 | 1997-04-15 | 露光方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10289853A JPH10289853A (ja) | 1998-10-27 |
| JPH10289853A5 true JPH10289853A5 (enrdf_load_html_response) | 2005-03-17 |
| JP4181647B2 JP4181647B2 (ja) | 2008-11-19 |
Family
ID=14186753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP09722797A Expired - Fee Related JP4181647B2 (ja) | 1997-04-15 | 1997-04-15 | 露光方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4181647B2 (enrdf_load_html_response) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001148340A (ja) * | 1999-11-19 | 2001-05-29 | Advantest Corp | 荷電粒子ビーム露光方法及び装置 |
| JP4585702B2 (ja) * | 2001-02-14 | 2010-11-24 | キヤノン株式会社 | 露光装置 |
| US6847430B2 (en) * | 2002-02-01 | 2005-01-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| AU2003246243A1 (en) * | 2002-07-03 | 2004-01-23 | Nikon Corporation | Method of exposure and aligner |
| JP2004186614A (ja) * | 2002-12-06 | 2004-07-02 | Nikon Corp | 露光装置 |
| US8317929B2 (en) * | 2005-09-16 | 2012-11-27 | Asml Netherlands B.V. | Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus |
| US9341951B2 (en) * | 2012-12-21 | 2016-05-17 | Ultratech, Inc. | Wynn-dyson imaging system with reduced thermal distortion |
-
1997
- 1997-04-15 JP JP09722797A patent/JP4181647B2/ja not_active Expired - Fee Related
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