AU2003246243A1 - Method of exposure and aligner - Google Patents

Method of exposure and aligner

Info

Publication number
AU2003246243A1
AU2003246243A1 AU2003246243A AU2003246243A AU2003246243A1 AU 2003246243 A1 AU2003246243 A1 AU 2003246243A1 AU 2003246243 A AU2003246243 A AU 2003246243A AU 2003246243 A AU2003246243 A AU 2003246243A AU 2003246243 A1 AU2003246243 A1 AU 2003246243A1
Authority
AU
Australia
Prior art keywords
aligner
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003246243A
Inventor
Shunsuke Niisaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003246243A1 publication Critical patent/AU2003246243A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2003246243A 2002-07-03 2003-07-02 Method of exposure and aligner Abandoned AU2003246243A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-194108 2002-07-03
JP2002194108 2002-07-03
PCT/JP2003/008415 WO2004006309A1 (en) 2002-07-03 2003-07-02 Method of exposure and aligner

Publications (1)

Publication Number Publication Date
AU2003246243A1 true AU2003246243A1 (en) 2004-01-23

Family

ID=30112296

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003246243A Abandoned AU2003246243A1 (en) 2002-07-03 2003-07-02 Method of exposure and aligner

Country Status (3)

Country Link
JP (1) JPWO2004006309A1 (en)
AU (1) AU2003246243A1 (en)
WO (1) WO2004006309A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7446849B2 (en) * 2004-07-22 2008-11-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP7231560B2 (en) * 2017-12-07 2023-03-01 ギガフォトン株式会社 Optical element moving device, band narrowing laser device, and electronic device manufacturing method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4181647B2 (en) * 1997-04-15 2008-11-19 キヤノン株式会社 Exposure method
KR20010085194A (en) * 1998-12-28 2001-09-07 시마무라 기로 Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device
JP2001223148A (en) * 2000-02-08 2001-08-17 Nikon Corp Cleaning method, method and device for exposure, and method of manufacturing device
US6571057B2 (en) * 2000-03-27 2003-05-27 Nikon Corporation Optical instrument, gas replacement method and cleaning method of optical instrument, exposure apparatus, exposure method and manufacturing method for devices
JP2002075839A (en) * 2000-08-30 2002-03-15 Canon Inc Exposure system, mask structure used therefor, exposure method, semiconductor device manufactured by using the same, and method of manufacturing semiconductor device
US6724460B2 (en) * 2001-11-19 2004-04-20 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects

Also Published As

Publication number Publication date
WO2004006309A1 (en) 2004-01-15
JPWO2004006309A1 (en) 2005-11-10

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase