JPH10284377A5 - - Google Patents

Info

Publication number
JPH10284377A5
JPH10284377A5 JP1997087873A JP8787397A JPH10284377A5 JP H10284377 A5 JPH10284377 A5 JP H10284377A5 JP 1997087873 A JP1997087873 A JP 1997087873A JP 8787397 A JP8787397 A JP 8787397A JP H10284377 A5 JPH10284377 A5 JP H10284377A5
Authority
JP
Japan
Prior art keywords
pattern
image
onto
exposure
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997087873A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10284377A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9087873A priority Critical patent/JPH10284377A/ja
Priority claimed from JP9087873A external-priority patent/JPH10284377A/ja
Priority to US09/055,949 priority patent/US6265137B1/en
Priority to TW087105202A priority patent/TW368684B/zh
Publication of JPH10284377A publication Critical patent/JPH10284377A/ja
Publication of JPH10284377A5 publication Critical patent/JPH10284377A5/ja
Pending legal-status Critical Current

Links

JP9087873A 1997-04-07 1997-04-07 露光方法及び該方法を用いたデバイスの製造方法 Pending JPH10284377A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP9087873A JPH10284377A (ja) 1997-04-07 1997-04-07 露光方法及び該方法を用いたデバイスの製造方法
US09/055,949 US6265137B1 (en) 1997-04-07 1998-04-07 Exposure method and device producing method using the same
TW087105202A TW368684B (en) 1997-04-07 1998-04-07 Exposure method and manufacturing method of components using the exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9087873A JPH10284377A (ja) 1997-04-07 1997-04-07 露光方法及び該方法を用いたデバイスの製造方法

Publications (2)

Publication Number Publication Date
JPH10284377A JPH10284377A (ja) 1998-10-23
JPH10284377A5 true JPH10284377A5 (enExample) 2005-03-10

Family

ID=13926997

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9087873A Pending JPH10284377A (ja) 1997-04-07 1997-04-07 露光方法及び該方法を用いたデバイスの製造方法

Country Status (3)

Country Link
US (1) US6265137B1 (enExample)
JP (1) JPH10284377A (enExample)
TW (1) TW368684B (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6511791B1 (en) * 2000-04-28 2003-01-28 International Business Machines Corporation Multiple exposure process for formation of dense rectangular arrays
US20030087205A1 (en) * 2001-11-06 2003-05-08 Dennis Warner System and method for forming features on a semiconductor substrate
WO2004077163A2 (en) * 2003-02-26 2004-09-10 Koninklijke Philips Electronics N.V. Method for creating a pattern on a wafer using a single photomask
DE10344645B4 (de) * 2003-09-25 2008-08-07 Qimonda Ag Verfahren zur Durchführung einer Doppel- oder Mehrfachbelichtung
US20070218627A1 (en) * 2006-03-15 2007-09-20 Ludovic Lattard Device and a method and mask for forming a device
DE102006024741A1 (de) * 2006-05-26 2007-12-06 Qimonda Ag Verfahren zur Herstellung einer Vorrichtung, Masken zur Herstellung einer Vorrichtung und Vorrichtung
US20080299499A1 (en) * 2007-05-30 2008-12-04 Naomasa Shiraishi Exposure method, method of manufacturing plate for flat panel display, and exposure apparatus
JP5264116B2 (ja) * 2007-07-26 2013-08-14 キヤノン株式会社 結像特性変動予測方法、露光装置、並びにデバイス製造方法
JP5326806B2 (ja) * 2009-05-21 2013-10-30 住友電気工業株式会社 半導体光素子を作製する方法
JP5988537B2 (ja) * 2010-06-10 2016-09-07 株式会社ニコン 荷電粒子線露光装置及びデバイス製造方法
JP5744564B2 (ja) * 2011-02-25 2015-07-08 キヤノン株式会社 描画装置、描画方法、および、物品の製造方法
JP6087506B2 (ja) * 2012-01-31 2017-03-01 キヤノン株式会社 描画方法及び物品の製造方法
JP5684168B2 (ja) * 2012-02-15 2015-03-11 株式会社東芝 フレア計測方法、反射型マスクおよび露光装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3094439B2 (ja) 1990-11-21 2000-10-03 株式会社ニコン 露光方法
JP3084760B2 (ja) 1991-02-28 2000-09-04 株式会社ニコン 露光方法及び露光装置
JP3084761B2 (ja) 1991-02-28 2000-09-04 株式会社ニコン 露光方法及びマスク
US5811222A (en) * 1996-06-24 1998-09-22 Advanced Micro Devices, Inc. Method of selectively exposing a material using a photosensitive layer and multiple image patterns

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