JPH1027743A - 投影露光装置、デバイス製造方法及び収差補正光学系 - Google Patents

投影露光装置、デバイス製造方法及び収差補正光学系

Info

Publication number
JPH1027743A
JPH1027743A JP8182044A JP18204496A JPH1027743A JP H1027743 A JPH1027743 A JP H1027743A JP 8182044 A JP8182044 A JP 8182044A JP 18204496 A JP18204496 A JP 18204496A JP H1027743 A JPH1027743 A JP H1027743A
Authority
JP
Japan
Prior art keywords
optical system
pattern
exposure apparatus
projection
vertical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8182044A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1027743A5 (enExample
Inventor
Kazuhiro Takahashi
和弘 高橋
Hirohiko Shinonaga
浩彦 篠永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP8182044A priority Critical patent/JPH1027743A/ja
Priority to US08/887,902 priority patent/US5864433A/en
Publication of JPH1027743A publication Critical patent/JPH1027743A/ja
Publication of JPH1027743A5 publication Critical patent/JPH1027743A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8182044A 1996-07-11 1996-07-11 投影露光装置、デバイス製造方法及び収差補正光学系 Pending JPH1027743A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8182044A JPH1027743A (ja) 1996-07-11 1996-07-11 投影露光装置、デバイス製造方法及び収差補正光学系
US08/887,902 US5864433A (en) 1996-07-11 1997-07-08 Astigmatism-correcting optical system, projection exposure apparatus using the optical system and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8182044A JPH1027743A (ja) 1996-07-11 1996-07-11 投影露光装置、デバイス製造方法及び収差補正光学系

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2005135015A Division JP4137087B2 (ja) 2005-05-06 2005-05-06 露光装置、及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JPH1027743A true JPH1027743A (ja) 1998-01-27
JPH1027743A5 JPH1027743A5 (enExample) 2004-07-29

Family

ID=16111368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8182044A Pending JPH1027743A (ja) 1996-07-11 1996-07-11 投影露光装置、デバイス製造方法及び収差補正光学系

Country Status (2)

Country Link
US (1) US5864433A (enExample)
JP (1) JPH1027743A (enExample)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999005709A1 (en) * 1997-07-24 1999-02-04 Nikon Corporation Exposure method and aligner
WO1999018604A1 (en) * 1997-10-07 1999-04-15 Nikon Corporation Projection exposure method and apparatus
JP2000214382A (ja) * 1998-11-16 2000-08-04 Canon Inc 光学系及びそれを用いた投影装置
JP2000340488A (ja) * 1999-05-28 2000-12-08 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
US6522386B1 (en) 1997-07-24 2003-02-18 Nikon Corporation Exposure apparatus having projection optical system with aberration correction element
US6646713B2 (en) 1998-02-12 2003-11-11 Canon Kabushiki Kaisha Projection exposure apparatus and device manufacturing method
JP2004020868A (ja) * 2002-06-14 2004-01-22 Canon Inc 投影光学系における光学要素の保持装置、該保持装置による光学調整方法、該保持装置を有する露光装置、露光方法、デバイス製造方法
JP2004226956A (ja) * 2002-11-28 2004-08-12 Pentax Corp 像シフト装置
JP2005191278A (ja) * 2003-12-25 2005-07-14 Semiconductor Leading Edge Technologies Inc 投影露光装置及び投影露光方法
US6924937B2 (en) 1998-11-16 2005-08-02 Canon Kabushiki Kaisha Aberration correcting optical system
JP2010062263A (ja) * 2008-09-02 2010-03-18 Canon Inc 露光装置およびデバイス製造方法
JP2016530576A (ja) * 2013-09-10 2016-09-29 ケーエルエー−テンカー コーポレイション 低ノイズ高安定性の深紫外線連続波レーザー
KR20180062370A (ko) * 2016-11-30 2018-06-08 캐논 가부시끼가이샤 노광 장치 및 물품의 제조 방법
KR20200066183A (ko) * 2018-11-30 2020-06-09 캐논 가부시끼가이샤 리소그래피 장치, 판정 방법, 및 물품 제조 방법
JP2020095244A (ja) * 2018-11-30 2020-06-18 キヤノン株式会社 リソグラフィ装置、判定方法、および物品の製造方法
JP2023142214A (ja) * 2022-03-24 2023-10-05 株式会社Ｓｃｒｅｅｎホールディングス 光学装置、露光装置および露光方法

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6235438B1 (en) 1997-10-07 2001-05-22 Nikon Corporation Projection exposure method and apparatus
JP2001110710A (ja) * 1999-10-08 2001-04-20 Nikon Corp 露光装置、露光方法、および半導体デバイスの製造方法
JP2001267239A (ja) 2000-01-14 2001-09-28 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
RU2193790C2 (ru) * 2000-06-19 2002-11-27 Открытое Акционерное Общество "Пеленг" Система ввода информации в окуляр
US6278515B1 (en) 2000-08-29 2001-08-21 International Business Machines Corporation Method and apparatus for adjusting a tilt of a lithography tool
US7061577B2 (en) * 2002-03-26 2006-06-13 Nikon Corporation Image adjustor including damping assembly
JP3833209B2 (ja) * 2003-10-24 2006-10-11 キヤノン株式会社 露光装置及びデバイス製造方法
DE102005053651A1 (de) * 2005-11-10 2007-05-16 Zeiss Carl Smt Ag Mikrolithographische Projektionsbelichtungsanlage sowie Verfahren zur Herstellung mikrostrukturierter Bauelemente
NL2003818A (en) * 2008-12-18 2010-06-21 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP6474655B2 (ja) * 2014-09-30 2019-02-27 エイブリック株式会社 レチクル透過率測定方法、投影露光装置および投影露光方法
US9733567B2 (en) 2014-09-30 2017-08-15 Sii Semiconductor Corporation Reticle transmittance measurement method, and projection exposure method using the same
JP2019079029A (ja) * 2017-10-24 2019-05-23 キヤノン株式会社 露光装置および物品の製造方法
DE102024109473A1 (de) * 2024-04-04 2025-10-09 TRUMPF Laser SE Verfahren zur Beeinflussung eines Astigmatismus in einem Laserstrahl

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2792740A (en) * 1952-06-28 1957-05-21 Rca Corp Multi-path optical systems
US4666273A (en) * 1983-10-05 1987-05-19 Nippon Kogaku K. K. Automatic magnification correcting system in a projection optical apparatus
JPH0721586B2 (ja) * 1985-09-30 1995-03-08 株式会社ニコン 像形成光学装置
US4888614A (en) * 1986-05-30 1989-12-19 Canon Kabushiki Kaisha Observation system for a projection exposure apparatus
US5117254A (en) * 1988-05-13 1992-05-26 Canon Kabushiki Kaisha Projection exposure apparatus
US5424552A (en) * 1991-07-09 1995-06-13 Nikon Corporation Projection exposing apparatus
JP3085481B2 (ja) * 1991-09-28 2000-09-11 株式会社ニコン 反射屈折縮小投影光学系、及び該光学系を備えた露光装置
US5251070A (en) * 1991-09-28 1993-10-05 Nikon Corporation Catadioptric reduction projection optical system
US5228051A (en) * 1991-12-16 1993-07-13 Hughes Aircraft Company Tilted lens imager in a laser amplifier/oscillator and method utilizing same
JP2750062B2 (ja) * 1992-12-14 1998-05-13 キヤノン株式会社 反射屈折型光学系及び該光学系を備える投影露光装置
JP3359123B2 (ja) * 1993-09-20 2002-12-24 キヤノン株式会社 収差補正光学系
US5671091A (en) * 1994-04-15 1997-09-23 The Walt Disney Company Virtual easel
JP3368091B2 (ja) * 1994-04-22 2003-01-20 キヤノン株式会社 投影露光装置及びデバイスの製造方法

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6522386B1 (en) 1997-07-24 2003-02-18 Nikon Corporation Exposure apparatus having projection optical system with aberration correction element
WO1999005709A1 (en) * 1997-07-24 1999-02-04 Nikon Corporation Exposure method and aligner
WO1999018604A1 (en) * 1997-10-07 1999-04-15 Nikon Corporation Projection exposure method and apparatus
US6646713B2 (en) 1998-02-12 2003-11-11 Canon Kabushiki Kaisha Projection exposure apparatus and device manufacturing method
JP2000214382A (ja) * 1998-11-16 2000-08-04 Canon Inc 光学系及びそれを用いた投影装置
US6924937B2 (en) 1998-11-16 2005-08-02 Canon Kabushiki Kaisha Aberration correcting optical system
US6987621B2 (en) 1998-11-16 2006-01-17 Canon Kabushiki Kaisha Aberration correction optical system
JP2000340488A (ja) * 1999-05-28 2000-12-08 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
US7016126B2 (en) 2002-06-14 2006-03-21 Canon Kabushiki Kaisha Optical element holding system in projection optical system
JP2004020868A (ja) * 2002-06-14 2004-01-22 Canon Inc 投影光学系における光学要素の保持装置、該保持装置による光学調整方法、該保持装置を有する露光装置、露光方法、デバイス製造方法
JP2004226956A (ja) * 2002-11-28 2004-08-12 Pentax Corp 像シフト装置
JP2005191278A (ja) * 2003-12-25 2005-07-14 Semiconductor Leading Edge Technologies Inc 投影露光装置及び投影露光方法
JP2010062263A (ja) * 2008-09-02 2010-03-18 Canon Inc 露光装置およびデバイス製造方法
JP2016530576A (ja) * 2013-09-10 2016-09-29 ケーエルエー−テンカー コーポレイション 低ノイズ高安定性の深紫外線連続波レーザー
JP2019133176A (ja) * 2013-09-10 2019-08-08 ケーエルエー−テンカー コーポレイション 深紫外線連続波レーザー、システム、及び方法
KR20180062370A (ko) * 2016-11-30 2018-06-08 캐논 가부시끼가이샤 노광 장치 및 물품의 제조 방법
KR20200066183A (ko) * 2018-11-30 2020-06-09 캐논 가부시끼가이샤 리소그래피 장치, 판정 방법, 및 물품 제조 방법
JP2020095244A (ja) * 2018-11-30 2020-06-18 キヤノン株式会社 リソグラフィ装置、判定方法、および物品の製造方法
JP2023142214A (ja) * 2022-03-24 2023-10-05 株式会社Ｓｃｒｅｅｎホールディングス 光学装置、露光装置および露光方法

Also Published As

Publication number Publication date
US5864433A (en) 1999-01-26

Similar Documents

Publication Publication Date Title
JPH1027743A (ja) 投影露光装置、デバイス製造方法及び収差補正光学系
JP3395280B2 (ja) 投影露光装置及び方法
JP3093528B2 (ja) 走査型露光装置
JP3412981B2 (ja) 投影露光装置および投影露光方法
JP3186011B2 (ja) 投影露光装置及びデバイス製造方法
US7123346B2 (en) Projection exposure apparatus with line width calculator controlled diaphragm unit
JP3254916B2 (ja) 投影光学系のコマ収差を検出する方法
KR100870306B1 (ko) 노광장치, 상면검출방법 및 디바이스의 제조방법
JP4692862B2 (ja) 検査装置、該検査装置を備えた露光装置、およびマイクロデバイスの製造方法
JP2001274080A (ja) 走査型投影露光装置及びその位置合わせ方法
JP2000195782A (ja) 投影装置および露光装置
KR20020041395A (ko) 투영노광장치와 이것을 사용한 디바이스제조방법
US8345221B2 (en) Aberration measurement method, exposure apparatus, and device manufacturing method
JP3624048B2 (ja) 照度測定方法
EP1840658A1 (en) Measurement method
JP2000114164A (ja) 走査型投影露光装置及びそれを用いたデバイスの製造方法
JP2000232049A (ja) 露光装置およびデバイス製造方法
US20040135981A1 (en) Exposure apparatus and method
WO1999034416A1 (en) Projection exposure apparatus and exposure method
JP4137087B2 (ja) 露光装置、及びデバイス製造方法
JP3854734B2 (ja) 面位置検出装置及びそれを用いたデバイスの製造方法
EP1544682A2 (en) Exposure apparatus, alignment method and device manufacturing method
TWI295577B (en) Exposure apparatus and method
JPH08179513A (ja) 露光装置
JPH10284414A (ja) 結像位置検出装置及び半導体デバイスの製造方法

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050216

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050308

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050506

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060328

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060509

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20060614