JPH10142555A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPH10142555A
JPH10142555A JP8309975A JP30997596A JPH10142555A JP H10142555 A JPH10142555 A JP H10142555A JP 8309975 A JP8309975 A JP 8309975A JP 30997596 A JP30997596 A JP 30997596A JP H10142555 A JPH10142555 A JP H10142555A
Authority
JP
Japan
Prior art keywords
optical member
optical
projection
object side
distortion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8309975A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10142555A5 (enExample
Inventor
Hiroshi Chiba
洋 千葉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8309975A priority Critical patent/JPH10142555A/ja
Publication of JPH10142555A publication Critical patent/JPH10142555A/ja
Publication of JPH10142555A5 publication Critical patent/JPH10142555A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8309975A 1996-11-06 1996-11-06 投影露光装置 Pending JPH10142555A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8309975A JPH10142555A (ja) 1996-11-06 1996-11-06 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8309975A JPH10142555A (ja) 1996-11-06 1996-11-06 投影露光装置

Publications (2)

Publication Number Publication Date
JPH10142555A true JPH10142555A (ja) 1998-05-29
JPH10142555A5 JPH10142555A5 (enExample) 2004-12-24

Family

ID=17999630

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8309975A Pending JPH10142555A (ja) 1996-11-06 1996-11-06 投影露光装置

Country Status (1)

Country Link
JP (1) JPH10142555A (enExample)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6522386B1 (en) 1997-07-24 2003-02-18 Nikon Corporation Exposure apparatus having projection optical system with aberration correction element
US6639651B2 (en) 2000-12-14 2003-10-28 Nikon Corporation Fabrication method for correcting member, fabrication method for projection optical system, and exposure apparatus
JP2008028388A (ja) * 2006-07-18 2008-02-07 Asml Netherlands Bv リソグラフィック装置、収差補正デバイス、およびデバイス製造方法
WO2008040494A1 (en) * 2006-10-02 2008-04-10 Carl Zeiss Smt Ag Method for improving the imaging properties of an optical system, and such an optical system
DE102008043243A1 (de) 2008-10-28 2009-10-29 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie sowie Verfahren zum Verbessern der Abbildungseigenschaften eines Projektionsobjektivs
DE102008001892A1 (de) 2008-05-21 2009-11-26 Carl Zeiss Smt Ag Optisches System für die Mikrolithographie
JP2010166007A (ja) * 2009-01-19 2010-07-29 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP2012182479A (ja) * 2005-11-10 2012-09-20 Nikon Corp 照明光学装置、露光装置、および露光方法
US8542346B2 (en) 2006-12-01 2013-09-24 Carl Zeiss Smt Gmbh Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
US8605253B2 (en) 2006-07-03 2013-12-10 Carl Zeiss Smt Gmbh Lithographic projection objective
JP2014103171A (ja) * 2012-11-16 2014-06-05 Canon Inc 投影光学系、露光装置および物品の製造方法
DE102015211699A1 (de) 2014-08-13 2016-02-18 Carl Zeiss Smt Gmbh Abbildendes optisches System sowie Verfahren zum optischen Design
WO2017050565A1 (de) * 2015-09-24 2017-03-30 Carl Zeiss Smt Gmbh Optische korrekturanordnung, projektionsobjektiv mit einer solchen optischen korrekturanordnung sowie mikrolithografische apparatur mit einem solchen projektionsobjektiv
JP2017534918A (ja) * 2014-10-29 2017-11-24 シャンハイ マイクロ エレクトロニクス イクイプメント（グループ）カンパニー リミティド 露光装置の調整装置及び調整方法
JP2020148865A (ja) * 2019-03-12 2020-09-17 キヤノン株式会社 露光装置、および物品製造方法

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6522386B1 (en) 1997-07-24 2003-02-18 Nikon Corporation Exposure apparatus having projection optical system with aberration correction element
US6639651B2 (en) 2000-12-14 2003-10-28 Nikon Corporation Fabrication method for correcting member, fabrication method for projection optical system, and exposure apparatus
JP2012182479A (ja) * 2005-11-10 2012-09-20 Nikon Corp 照明光学装置、露光装置、および露光方法
US8605253B2 (en) 2006-07-03 2013-12-10 Carl Zeiss Smt Gmbh Lithographic projection objective
US10042265B2 (en) 2006-07-03 2018-08-07 Carl Zeiss Smt Gmbh Lithographic projection objective
US9494868B2 (en) 2006-07-03 2016-11-15 Carl Zeiss Smt Gmbh Lithographic projection objective
JP2008028388A (ja) * 2006-07-18 2008-02-07 Asml Netherlands Bv リソグラフィック装置、収差補正デバイス、およびデバイス製造方法
WO2008040494A1 (en) * 2006-10-02 2008-04-10 Carl Zeiss Smt Ag Method for improving the imaging properties of an optical system, and such an optical system
JP2010506388A (ja) * 2006-10-02 2010-02-25 カール・ツァイス・エスエムティー・アーゲー 光学システムの結像特性を改善する方法及びその光学システム
US8659745B2 (en) 2006-12-01 2014-02-25 Carl Zeiss Smt Gmbh Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
US8542346B2 (en) 2006-12-01 2013-09-24 Carl Zeiss Smt Gmbh Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
DE102008001892A1 (de) 2008-05-21 2009-11-26 Carl Zeiss Smt Ag Optisches System für die Mikrolithographie
US8456616B2 (en) 2008-05-21 2013-06-04 Carl Zeiss Smt Gmbh Optical system for microlithography
DE102008043243A1 (de) 2008-10-28 2009-10-29 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie sowie Verfahren zum Verbessern der Abbildungseigenschaften eines Projektionsobjektivs
JP2010166007A (ja) * 2009-01-19 2010-07-29 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP2014103171A (ja) * 2012-11-16 2014-06-05 Canon Inc 投影光学系、露光装置および物品の製造方法
DE102015211699A1 (de) 2014-08-13 2016-02-18 Carl Zeiss Smt Gmbh Abbildendes optisches System sowie Verfahren zum optischen Design
JP2017534918A (ja) * 2014-10-29 2017-11-24 シャンハイ マイクロ エレクトロニクス イクイプメント（グループ）カンパニー リミティド 露光装置の調整装置及び調整方法
WO2017050565A1 (de) * 2015-09-24 2017-03-30 Carl Zeiss Smt Gmbh Optische korrekturanordnung, projektionsobjektiv mit einer solchen optischen korrekturanordnung sowie mikrolithografische apparatur mit einem solchen projektionsobjektiv
CN108027502A (zh) * 2015-09-24 2018-05-11 卡尔蔡司Smt有限责任公司 光学校正装置，具有这样的光学校正装置的投射物镜，以及具有这样的投射物镜的微光刻设备
JP2018534612A (ja) * 2015-09-24 2018-11-22 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学補正構成、そのような光学補正構成を有する投影対物部、およびそのような投影対物部を有するマイクロリソグラフィ装置
US10859815B2 (en) 2015-09-24 2020-12-08 Carl Zeiss Smt Gmbh Optical correction arrangement, projection objective having such an optical correction arrangement and microlithographic apparatus having such a projection objective
CN108027502B (zh) * 2015-09-24 2021-07-06 卡尔蔡司Smt有限责任公司 光学校正装置，投射物镜，以及微光刻设备
JP2020148865A (ja) * 2019-03-12 2020-09-17 キヤノン株式会社 露光装置、および物品製造方法

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