JPH10116760A - 露光装置及び基板保持装置 - Google Patents

露光装置及び基板保持装置

Info

Publication number
JPH10116760A
JPH10116760A JP26702396A JP26702396A JPH10116760A JP H10116760 A JPH10116760 A JP H10116760A JP 26702396 A JP26702396 A JP 26702396A JP 26702396 A JP26702396 A JP 26702396A JP H10116760 A JPH10116760 A JP H10116760A
Authority
JP
Japan
Prior art keywords
substrate
holding
photosensitive
adapter
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26702396A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10116760A5 (enrdf_load_stackoverflow
Inventor
Akimitsu Ebihara
明光 蛯原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP26702396A priority Critical patent/JPH10116760A/ja
Publication of JPH10116760A publication Critical patent/JPH10116760A/ja
Publication of JPH10116760A5 publication Critical patent/JPH10116760A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP26702396A 1996-10-08 1996-10-08 露光装置及び基板保持装置 Pending JPH10116760A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26702396A JPH10116760A (ja) 1996-10-08 1996-10-08 露光装置及び基板保持装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26702396A JPH10116760A (ja) 1996-10-08 1996-10-08 露光装置及び基板保持装置

Publications (2)

Publication Number Publication Date
JPH10116760A true JPH10116760A (ja) 1998-05-06
JPH10116760A5 JPH10116760A5 (enrdf_load_stackoverflow) 2004-10-14

Family

ID=17438989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26702396A Pending JPH10116760A (ja) 1996-10-08 1996-10-08 露光装置及び基板保持装置

Country Status (1)

Country Link
JP (1) JPH10116760A (enrdf_load_stackoverflow)

Cited By (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001068541A (ja) * 1999-08-26 2001-03-16 Tatsumo Kk 処理基板トレイ
JP2001326270A (ja) * 2000-03-10 2001-11-22 Canon Inc 基板保持装置、半導体製造装置および半導体デバイス製造方法
JP2004207734A (ja) * 2002-12-23 2004-07-22 Asml Netherlands Bv リソグラフィ装置
JP2004343069A (ja) * 2003-03-11 2004-12-02 Asml Netherlands Bv 機械部品を整備する方法および装置
JP2007019067A (ja) * 2005-07-05 2007-01-25 Sekisui Chem Co Ltd 表面処理用ステージ構造
JP2007103609A (ja) * 2005-10-03 2007-04-19 Mejiro Precision:Kk 投影露光装置
KR100840236B1 (ko) * 2001-12-14 2008-06-20 삼성전자주식회사 헐레이션을 방지할 수 있는 노광 장치
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009033178A (ja) * 2007-07-30 2009-02-12 Applied Materials Inc 軸対称及び均一熱プロファイルの真空チャック型ヒーター
US7589820B2 (en) 2002-12-10 2009-09-15 Nikon Corporation Exposure apparatus and method for producing device
US7878755B2 (en) 2003-03-11 2011-02-01 Asml Netherlands B.V. Load lock and method for transferring objects
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
JP2016021465A (ja) * 2014-07-14 2016-02-04 国立研究開発法人産業技術総合研究所 半導体プロセス用キャリア
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9645505B2 (en) 2004-06-09 2017-05-09 Nikon Corporation Immersion exposure apparatus and device manufacturing method with measuring device to measure specific resistance of liquid
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9684250B2 (en) 2003-12-23 2017-06-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2017195274A (ja) * 2016-04-20 2017-10-26 日本特殊陶業株式会社 真空吸着装置及びその製造方法
US9829799B2 (en) 2004-04-14 2017-11-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9939739B2 (en) 2003-05-23 2018-04-10 Nikon Corporation Exposure apparatus and method for producing device
US9958786B2 (en) 2003-04-11 2018-05-01 Nikon Corporation Cleanup method for optics in immersion lithography using object on wafer holder in place of wafer
JP2018520386A (ja) * 2015-07-15 2018-07-26 シャンハイ マイクロ エレクトロニクス イクイプメント（グループ）カンパニー リミティド 露光装置および方法
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
JP2019096907A (ja) * 2019-03-04 2019-06-20 三菱電機株式会社 真空チャックステージおよび半導体装置の製造方法
KR20210035991A (ko) * 2019-09-25 2021-04-02 (주)탑나노시스 작업 스테이지 수선 방법

Cited By (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001068541A (ja) * 1999-08-26 2001-03-16 Tatsumo Kk 処理基板トレイ
JP2001326270A (ja) * 2000-03-10 2001-11-22 Canon Inc 基板保持装置、半導体製造装置および半導体デバイス製造方法
KR100840236B1 (ko) * 2001-12-14 2008-06-20 삼성전자주식회사 헐레이션을 방지할 수 있는 노광 장치
US8089611B2 (en) 2002-12-10 2012-01-03 Nikon Corporation Exposure apparatus and method for producing device
US7589820B2 (en) 2002-12-10 2009-09-15 Nikon Corporation Exposure apparatus and method for producing device
JP2004207734A (ja) * 2002-12-23 2004-07-22 Asml Netherlands Bv リソグラフィ装置
JP2004343069A (ja) * 2003-03-11 2004-12-02 Asml Netherlands Bv 機械部品を整備する方法および装置
US7576831B2 (en) 2003-03-11 2009-08-18 Asml Netherlands B.V. Method and apparatus for maintaining a machine part
US7878755B2 (en) 2003-03-11 2011-02-01 Asml Netherlands B.V. Load lock and method for transferring objects
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9958786B2 (en) 2003-04-11 2018-05-01 Nikon Corporation Cleanup method for optics in immersion lithography using object on wafer holder in place of wafer
US9939739B2 (en) 2003-05-23 2018-04-10 Nikon Corporation Exposure apparatus and method for producing device
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10768538B2 (en) 2003-12-23 2020-09-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9684250B2 (en) 2003-12-23 2017-06-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10613447B2 (en) 2003-12-23 2020-04-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9817321B2 (en) 2003-12-23 2017-11-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234768B2 (en) 2004-04-14 2019-03-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9989861B2 (en) 2004-04-14 2018-06-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10705432B2 (en) 2004-04-14 2020-07-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9829799B2 (en) 2004-04-14 2017-11-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9645505B2 (en) 2004-06-09 2017-05-09 Nikon Corporation Immersion exposure apparatus and device manufacturing method with measuring device to measure specific resistance of liquid
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2007019067A (ja) * 2005-07-05 2007-01-25 Sekisui Chem Co Ltd 表面処理用ステージ構造
JP2007103609A (ja) * 2005-10-03 2007-04-19 Mejiro Precision:Kk 投影露光装置
JP2014053645A (ja) * 2007-07-30 2014-03-20 Applied Materials Inc 軸対称及び均一熱プロファイルの真空チャック型ヒーター
JP2009033178A (ja) * 2007-07-30 2009-02-12 Applied Materials Inc 軸対称及び均一熱プロファイルの真空チャック型ヒーター
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP2016021465A (ja) * 2014-07-14 2016-02-04 国立研究開発法人産業技術総合研究所 半導体プロセス用キャリア
JP2018520386A (ja) * 2015-07-15 2018-07-26 シャンハイ マイクロ エレクトロニクス イクイプメント（グループ）カンパニー リミティド 露光装置および方法
JP2017195274A (ja) * 2016-04-20 2017-10-26 日本特殊陶業株式会社 真空吸着装置及びその製造方法
JP2019096907A (ja) * 2019-03-04 2019-06-20 三菱電機株式会社 真空チャックステージおよび半導体装置の製造方法
KR20210035991A (ko) * 2019-09-25 2021-04-02 (주)탑나노시스 작업 스테이지 수선 방법

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