JPH10116760A5 - - Google Patents

Info

Publication number
JPH10116760A5
JPH10116760A5 JP1996267023A JP26702396A JPH10116760A5 JP H10116760 A5 JPH10116760 A5 JP H10116760A5 JP 1996267023 A JP1996267023 A JP 1996267023A JP 26702396 A JP26702396 A JP 26702396A JP H10116760 A5 JPH10116760 A5 JP H10116760A5
Authority
JP
Japan
Prior art keywords
substrate
substrate holding
exposure apparatus
holding
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996267023A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10116760A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP26702396A priority Critical patent/JPH10116760A/ja
Priority claimed from JP26702396A external-priority patent/JPH10116760A/ja
Publication of JPH10116760A publication Critical patent/JPH10116760A/ja
Publication of JPH10116760A5 publication Critical patent/JPH10116760A5/ja
Pending legal-status Critical Current

Links

JP26702396A 1996-10-08 1996-10-08 露光装置及び基板保持装置 Pending JPH10116760A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26702396A JPH10116760A (ja) 1996-10-08 1996-10-08 露光装置及び基板保持装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26702396A JPH10116760A (ja) 1996-10-08 1996-10-08 露光装置及び基板保持装置

Publications (2)

Publication Number Publication Date
JPH10116760A JPH10116760A (ja) 1998-05-06
JPH10116760A5 true JPH10116760A5 (enrdf_load_stackoverflow) 2004-10-14

Family

ID=17438989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26702396A Pending JPH10116760A (ja) 1996-10-08 1996-10-08 露光装置及び基板保持装置

Country Status (1)

Country Link
JP (1) JPH10116760A (enrdf_load_stackoverflow)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001068541A (ja) * 1999-08-26 2001-03-16 Tatsumo Kk 処理基板トレイ
JP4700819B2 (ja) * 2000-03-10 2011-06-15 キヤノン株式会社 基板保持装置、半導体製造装置および半導体デバイス製造方法
KR100840236B1 (ko) * 2001-12-14 2008-06-20 삼성전자주식회사 헐레이션을 방지할 수 있는 노광 장치
CN101852993A (zh) 2002-12-10 2010-10-06 株式会社尼康 曝光装置和器件制造方法
KR100616602B1 (ko) * 2002-12-23 2006-08-25 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치
SG115629A1 (en) 2003-03-11 2005-10-28 Asml Netherlands Bv Method and apparatus for maintaining a machine part
SG115631A1 (en) 2003-03-11 2005-10-28 Asml Netherlands Bv Lithographic projection assembly, load lock and method for transferring objects
KR101124179B1 (ko) 2003-04-09 2012-03-27 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
ATE449982T1 (de) 2003-04-11 2009-12-15 Nikon Corp Reinigungsverfahren für optik in immersionslithographie
TW201806001A (zh) 2003-05-23 2018-02-16 尼康股份有限公司 曝光裝置及元件製造方法
TWI360158B (en) 2003-10-28 2012-03-11 Nikon Corp Projection exposure device,exposure method and dev
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI360837B (en) 2004-02-06 2012-03-21 Nikon Corp Polarization changing device, optical illumination
US7898642B2 (en) 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101433496B1 (ko) 2004-06-09 2014-08-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP4813831B2 (ja) * 2005-07-05 2011-11-09 積水化学工業株式会社 表面処理用ステージ構造
EP1681597B1 (en) 2005-01-14 2010-03-10 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5449672B2 (ja) 2005-05-12 2014-03-19 株式会社ニコン 投影光学系、露光装置、および露光方法
JP4629548B2 (ja) * 2005-10-03 2011-02-09 株式会社目白プレシジョン 投影露光装置
US20090031955A1 (en) * 2007-07-30 2009-02-05 Applied Materials, Inc. Vacuum chucking heater of axisymmetrical and uniform thermal profile
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP5959069B2 (ja) * 2014-07-14 2016-08-02 国立研究開発法人産業技術総合研究所 半導体プロセス用キャリア
CN106707691B (zh) * 2015-07-15 2018-10-16 上海微电子装备（集团）股份有限公司 曝光装置及方法
JP6795903B2 (ja) * 2016-04-20 2020-12-02 日本特殊陶業株式会社 真空吸着装置及びその製造方法
JP6664529B2 (ja) * 2019-03-04 2020-03-13 三菱電機株式会社 真空チャックステージおよび半導体装置の製造方法
KR102261935B1 (ko) * 2019-09-25 2021-06-07 (주)탑나노시스 작업 스테이지 수선 방법

Similar Documents

Publication Publication Date Title
JPH10116760A5 (enrdf_load_stackoverflow)
JPH10116760A (ja) 露光装置及び基板保持装置
JP2006523028A5 (enrdf_load_stackoverflow)
JP2008072139A5 (enrdf_load_stackoverflow)
EP1069477A3 (en) Exposure apparatus and device manufacturing method using the same
US8435703B2 (en) Pellicle
JPS6057216B2 (ja) ジグ
CN1552000B (zh) 可拆下的光学薄膜组件
JP2005223011A5 (enrdf_load_stackoverflow)
EP0947884A3 (en) Lithographic projection apparatus with substrate holder
EP0097380A3 (en) A system for positioning a utilization device
JPH1140657A5 (ja) 試料保持装置、レチクル保持装置および走査型露光装置
JP2750554B2 (ja) 真空吸着装置
JP2005012009A (ja) 基板保持装置、ステージ装置及び露光装置
CN102652349A (zh) 液浸构件、液浸构件的制造方法、曝光装置、及元件制造方法
JPH10218364A (ja) ウエハ保持用ステージ
JP3004045B2 (ja) 露光装置
JPH0641235Y2 (ja) 感光材料露光装置
JPH01181420A (ja) プロキシミテイ露光装置
JP2006080542A5 (enrdf_load_stackoverflow)
JPH1140479A5 (ja) Ｘ線縮小露光装置及びｘ線投影露光方法
JPH0530346Y2 (enrdf_load_stackoverflow)
JPS62100753A (ja) 多点支持レチクルチヤツク
JPS6314427A (ja) マスク装置
JPH0342652A (ja) 乾板の露光装置