JP2006080542A5 - - Google Patents

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Publication number
JP2006080542A5
JP2006080542A5 JP2005291807A JP2005291807A JP2006080542A5 JP 2006080542 A5 JP2006080542 A5 JP 2006080542A5 JP 2005291807 A JP2005291807 A JP 2005291807A JP 2005291807 A JP2005291807 A JP 2005291807A JP 2006080542 A5 JP2006080542 A5 JP 2006080542A5
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JP
Japan
Prior art keywords
substrate
exposure apparatus
port
gap
liquid
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Application number
JP2005291807A
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English (en)
Japanese (ja)
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JP2006080542A (ja
JP3997243B2 (ja
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Priority to JP2005291807A priority Critical patent/JP3997243B2/ja
Priority claimed from JP2005291807A external-priority patent/JP3997243B2/ja
Publication of JP2006080542A publication Critical patent/JP2006080542A/ja
Publication of JP2006080542A5 publication Critical patent/JP2006080542A5/ja
Application granted granted Critical
Publication of JP3997243B2 publication Critical patent/JP3997243B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005291807A 2005-10-04 2005-10-04 露光装置及びデバイス製造方法 Expired - Fee Related JP3997243B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005291807A JP3997243B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005291807A JP3997243B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2003185389A Division JP3862678B2 (ja) 2003-06-27 2003-06-27 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006080542A JP2006080542A (ja) 2006-03-23
JP2006080542A5 true JP2006080542A5 (enrdf_load_stackoverflow) 2007-08-23
JP3997243B2 JP3997243B2 (ja) 2007-10-24

Family

ID=36159691

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005291807A Expired - Fee Related JP3997243B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP3997243B2 (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1681597B1 (en) * 2005-01-14 2010-03-10 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008034801A (ja) 2006-06-30 2008-02-14 Canon Inc 露光装置およびデバイス製造方法

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