JP2006080542A5 - - Google Patents

Claims (12)

Includes a projection optical system for projecting a pattern of an original onto a substrate, with the gap filled with liquid between a final surface and the substrate of the projection optical system, an exposure apparatus for exposing a substrate,
Supply means for supplying the liquid to the gap from a supply port ;
A recovery means for recovering the liquid in the gap from a recovery port ;
Blowing means for blowing out gas from a blower outlet outside the liquid filled in the gap ;
A suction means for sucking the gas from a suction port outside the liquid in the gap; and
The exposure apparatus , wherein the suction port is provided outside the blower outlet . An exposure apparatus that has a projection optical system that projects an original pattern onto a substrate, and that exposes the substrate in a state where a liquid is filled in a gap between the final surface of the projection optical system and the substrate,
Supply means for supplying the liquid to the gap from a supply port arranged so as to surround the final surface over the entire circumference;
Recovery means for recovering the liquid in the gap from a recovery port;
Blowing means for blowing out gas from a blowout port disposed outside the recovery port;
A suction means for sucking the gas from a suction port disposed outside the recovery port;
The exposure apparatus, wherein the suction port is provided outside the blower outlet. The exposure apparatus according to claim 2, wherein the supply port includes a plurality of supply ports arranged so as to surround the final surface over the entire circumference. The exposure apparatus according to claim 1, wherein the gas is an inert gas. The exposure apparatus according to claim 1, wherein a perforated plate or a porous body is provided at the outlet . The exposure apparatus according to claim 1, wherein a shape of the air outlet is a slit shape. The exposure apparatus according to claim 1, wherein the air outlet and the air inlet are disposed so as to surround the final surface. The supply port is provided inside the recovery port,
The exposure apparatus according to claim 1, wherein the recovery port is provided inside the air outlet . Further comprising a facing member having a facing surface facing the exposed surface of the substrate,
The supply port and the recovery port are provided on the facing surface,
The exposure apparatus according to claim 1, wherein the air outlet is provided closer to the exposed surface than the facing surface. Further comprising a facing member having a facing surface facing the exposed surface of the substrate,
The exposure apparatus according to claim 1, wherein the supply port, the recovery port, and the air outlet are provided on the facing surface. An original stage that moves while holding the original;
A substrate stage that holds and moves the substrate, and
11. The substrate according to claim 1, wherein the substrate is exposed through a pattern of the original while the original and the substrate are scanned and moved with respect to the projection optical system. Exposure device. A step of exposing a substrate using the exposure apparatus according to any one of claims 1 to 11,
And developing the substrate exposed in the step.