JP2008010893A5 - - Google Patents
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- Publication number
- JP2008010893A5 JP2008010893A5 JP2007248076A JP2007248076A JP2008010893A5 JP 2008010893 A5 JP2008010893 A5 JP 2008010893A5 JP 2007248076 A JP2007248076 A JP 2007248076A JP 2007248076 A JP2007248076 A JP 2007248076A JP 2008010893 A5 JP2008010893 A5 JP 2008010893A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- exposure apparatus
- optical system
- projection optical
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 12
- 230000003287 optical Effects 0.000 claims 8
- 239000007788 liquid Substances 0.000 claims 6
- 238000004519 manufacturing process Methods 0.000 claims 1
- OZAIFHULBGXAKX-UHFFFAOYSA-N precursor Substances N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 claims 1
Claims (7)
前記基板を保持して移動するステージと、
前記投影光学系の最終面の周囲に配置され、前記ステージに保持された前記基板の表面に対向する第１の面と、前記ステージに保持された前記基板の表面に対向し且つ前記第１の面より外側に配置されて前記第１の面の前記表面からの距離とは異なる前記表面からの距離を有する第２の面と、前記間隙に液体を供給する供給口と、前記第２の面に且つ前記供給口の外側に配置されて前記間隙から液体を回収する回収口とを含む部材と、
を有することを特徴とする露光装置。 It has a projecting projection optical system, an exposure apparatus that exposes a substrate through a final surface and gaps filled liquid and the projection optical system and the precursor of the substrate of the projection optical system,
A stage that moves while holding the substrate,
A first surface disposed around the final surface of the projection optical system, facing the surface of the substrate held on the stage, facing the surface of the substrate held on the stage, and the first surface A second surface disposed outside the surface and having a distance from the surface different from a distance from the surface of the first surface; a supply port for supplying a liquid to the gap; and the second surface And a member that is disposed outside the supply port and collects the liquid from the gap, and
An exposure apparatus comprising:
前記基板を保持して移動するステージと、 A stage that holds and moves the substrate;
前記投影光学系の最終面の周囲に配置され、前記ステージに保持された前記基板の表面に対向する第１の面と、前記ステージに保持された前記基板の表面に対向し且つ前記第１の面より外側に配置されて前記第１の面の前記表面からの距離とは異なる前記表面からの距離を有する第２の面と、前記間隙に液体を供給する供給口と、前記第１の面に且つ前記供給口の外側に配置されて前記間隙から液体を回収する回収口とを含む部材と、 A first surface disposed around the final surface of the projection optical system, facing the surface of the substrate held on the stage, facing the surface of the substrate held on the stage and the first surface A second surface disposed outside the surface and having a distance from the surface that is different from a distance from the surface of the first surface; a supply port for supplying liquid to the gap; and the first surface And a member that is disposed outside the supply port and collects the liquid from the gap, and
を有することを特徴とする露光装置。An exposure apparatus comprising:
前記工程で露光された基板を現像する工程と、 Developing the substrate exposed in the step;
を有することを特徴とするデバイス製造方法。A device manufacturing method comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007248076A JP4533416B2 (en) | 2007-09-25 | 2007-09-25 | Exposure apparatus and device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007248076A JP4533416B2 (en) | 2007-09-25 | 2007-09-25 | Exposure apparatus and device manufacturing method |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005291809A Division JP4164508B2 (en) | 2005-10-04 | 2005-10-04 | Exposure apparatus and device manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008010893A JP2008010893A (en) | 2008-01-17 |
| JP2008010893A5 true JP2008010893A5 (en) | 2009-11-19 |
| JP4533416B2 JP4533416B2 (en) | 2010-09-01 |
Family
ID=39068748
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007248076A Expired - Fee Related JP4533416B2 (en) | 2007-09-25 | 2007-09-25 | Exposure apparatus and device manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4533416B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2005951A (en) | 2010-02-02 | 2011-08-03 | Asml Netherlands Bv | Lithographic apparatus and a device manufacturing method. |
| WO2013100114A1 (en) * | 2011-12-28 | 2013-07-04 | 株式会社ニコン | Exposure device, exposure method, device manufacturing method, liquid collection method, program and recording medium |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI232357B (en) * | 2002-11-12 | 2005-05-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| KR20130010039A (en) * | 2002-12-10 | 2013-01-24 | 가부시키가이샤 니콘 | Exposure system and device producing method |
| JP4184346B2 (en) * | 2002-12-13 | 2008-11-19 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Liquid removal in a method and apparatus for irradiating a spot on a layer |
| JP4352930B2 (en) * | 2003-02-26 | 2009-10-28 | 株式会社ニコン | Exposure apparatus, exposure method, and device manufacturing method |
| KR101177331B1 (en) * | 2003-04-09 | 2012-08-30 | 가부시키가이샤 니콘 | Immersion lithography fluid control system |
| SG10201604762UA (en) * | 2003-04-10 | 2016-08-30 | Nikon Corp | Environmental system including vacuum scavange for an immersion lithography apparatus |
| KR101409565B1 (en) * | 2003-04-10 | 2014-06-19 | 가부시키가이샤 니콘 | Environmental system including a transport region for an immersion lithography apparatus |
| JP2004320016A (en) * | 2003-04-11 | 2004-11-11 | Nikon Corp | Liquid immersion lithography system |
| US7213963B2 (en) * | 2003-06-09 | 2007-05-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| KR101520591B1 (en) * | 2003-06-13 | 2015-05-14 | 가부시키가이샤 니콘 | Exposure method, substrate stage, exposure apparatus and method for manufacturing device |
| CN101436003B (en) * | 2003-06-19 | 2011-08-17 | 株式会社尼康 | Exposure apparatus and device manufacturing method |
| US6867844B2 (en) * | 2003-06-19 | 2005-03-15 | Asml Holding N.V. | Immersion photolithography system and method using microchannel nozzles |
-
2007
- 2007-09-25 JP JP2007248076A patent/JP4533416B2/en not_active Expired - Fee Related
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