JPH09506669A - 硬質物質層の製造方法 - Google Patents
硬質物質層の製造方法Info
- Publication number
- JPH09506669A JPH09506669A JP7516469A JP51646995A JPH09506669A JP H09506669 A JPH09506669 A JP H09506669A JP 7516469 A JP7516469 A JP 7516469A JP 51646995 A JP51646995 A JP 51646995A JP H09506669 A JPH09506669 A JP H09506669A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- deposition
- coating
- gas
- hard material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0664—Carbonitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/067—Borides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. 硬質物質層内に、付着層(14)、耐摩耗性の機能層(16)及び摩擦の 少ない表面層(18)を、組み合わせた低温−PVD−及びCVD−被覆方法に より製造することを特徴とする、部品上に硬質物質層を製造する方法。 2. 層(14,16,18)の間に境界のない移行部(30)を製造する、請 求項1記載の方法。 3. 蒸着材料としてチタン又はホウ化チタンを使用し、被覆の間に窒素ガス、 炭素ガス及び/又は窒素−及び炭素ガスと反応させる、請求項1又は2記載の方 法。 4. 層の析出が、可変のパラメーター、特に析出時間及びプロセスガス組成を 用いて実施する、請求項1から3までのいずれか1項記載の方法。 5. 付着層(14)の製造のために、蒸着材料を反応ガスの存在で析出させな い、請求項1から4までのいずれか1項記載の方法。 6. 耐摩耗性の機能層(16)の製造のために、蒸着材料を、反応性ガスとほ ぼ同じ程度で析出させる、請求項1から5までのいずれか1項記載の方法。 7. 窒素ガスだけを、機能層(16)の延性の領域(24)の製造のために使 用する、請求項6記載の方法。 8. ほぼ同じ割合の窒素ガス及び炭素ガスの混合物を、機能層(16)の硬質 の領域(26)の製造のために使用する、請求項6記載の方法。 9. 機能層(16)から表面層(18)への移行領域(28)の製造のために 、主に炭素ガスだけを、場合により窒素ガスを僅かに混合して使用する、請求項 6記載の方法。 10. 摩擦の少ない表面層(18)の製造のために、主に炭素ガス、場合によ り窒素ガスを僅かに混合して使用する、請求項1から9までのいずれか1項記載 の方法。 11. 表面層(18)の領域(32)では金属成分を僅かに含有する、請求項 10記載の方法。 12. 表面層(18)の領域(34)では金属成分を含有しない、請求項10 又は11記載の方法。 13. 約200℃の被覆温度を保持するために、選択的に、1keVを下回る イオンエネルギーを有する低エネルギーイオン照射(38)及び/又は10ke Vを上回るイオンエネルギーを有する高エネルギーイオン照射(36)を実施す る、請求項1から12までのいずれか1項記載の方法。 14. 部品表面(22)の前洗浄のために層の析出の前に重いイオンを用いた 処理を使用する、請求項13記載の方法。 15. 最小の電力だけで運転される被覆源の著しく イオン化されたプラズマから、イオンを用いて低エネルギー照射を行う、請求項 13又は14記載の方法。 16. 別のイオン源から指向性のイオンを用いて高エネルギー照射を行う、請 求項13又は14記載の方法。 17. 層の付着の向上のために、領域(20,24)の間の層の析出の開始時 に、別のイオン源から高エネルギーイオン注入を実施する、請求項1から16ま でのいずれか1項記載の方法。 18. 層構造の細密化のために、層(14,16,18)の間の層の析出と平 行して、存在する被覆プラズマからイオンを用いて低エネルギー照射を行う、請 求項1から17までのいずれか1項記載の方法。 19. 表面層の水素含有量の減少のために、硬質物質層(12)の層析出の完 了後に、別のイオン源から軽いイオンを用いて高エネルギーの照射を行う、請求 項1から18までのいずれか1項記載の方法。 20. 全体の被覆パラメータ及びイオン照射パラメータを連続して変化させる 請求項1から19までのいずれか1項記載の方法。 21. 請求項1から20までのいずれか1項記載の方法により製造される硬質 物質層。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19934343354 DE4343354C2 (de) | 1993-12-18 | 1993-12-18 | Verfahren zur Herstellung einer Hartstoffschicht |
DE4343354.5 | 1993-12-18 | ||
PCT/DE1994/001491 WO1995016799A1 (de) | 1993-12-18 | 1994-12-15 | Verfahren zur herstellung einer hartstoffschicht |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH09506669A true JPH09506669A (ja) | 1997-06-30 |
JP3980053B2 JP3980053B2 (ja) | 2007-09-19 |
Family
ID=6505448
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51646995A Expired - Fee Related JP3980053B2 (ja) | 1993-12-18 | 1994-12-15 | 硬質物質層の製造方法 |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0734460B1 (ja) |
JP (1) | JP3980053B2 (ja) |
DE (2) | DE4343354C2 (ja) |
WO (1) | WO1995016799A1 (ja) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19545050C2 (de) * | 1994-12-07 | 1999-10-21 | Inovap Vakuum Und Plasmatechni | Verfahren und Einrichtung zur Abscheidung von Funktionsschichten auf einem Substrat mittels plasmagestützter Schichtabscheidung |
FR2743089B1 (fr) * | 1995-12-28 | 1998-04-17 | Commissariat Energie Atomique | Procede de depot d'un revetement par couplage des techniques de depot physique en phase vapeur et de depot chimique en phase vapeur assiste par plasma, revetement ainsi obtenu et substrat recouvert de ce revetement |
DE19609804C1 (de) | 1996-03-13 | 1997-07-31 | Bosch Gmbh Robert | Einrichtung, ihre Verwendung und ihr Betrieb zum Vakuumbeschichten von Schüttgut |
DE19808180A1 (de) | 1998-02-26 | 1999-09-09 | Bosch Gmbh Robert | Kombinierte Verschleißschutzschicht, Verfahren zur Erzeugung derselben, die damit beschichteten Objekte und deren Verwendung |
CZ293777B6 (cs) * | 1999-03-24 | 2004-07-14 | Shm, S. R. O. | Otěruvzdorný povlak |
DE10005614A1 (de) | 2000-02-09 | 2001-08-16 | Hauzer Techno Coating Europ B | Verfahren zur Herstellung von Beschichtungen sowie Gegenstand |
DE10018143C5 (de) * | 2000-04-12 | 2012-09-06 | Oerlikon Trading Ag, Trübbach | DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems |
DE10222347C2 (de) * | 2002-05-21 | 2003-11-27 | Walter Ag | TiBN-Beschichtung für einen Schneideinsatz oder ein Schneidwerkzeug |
DE102005020143A1 (de) * | 2005-04-29 | 2006-11-02 | Siemens Ag | Verfahren zum Herstellen eines Düsenkörpers für ein Einspritzventil und Einspritzventil |
EP1862239B1 (de) | 2006-06-02 | 2016-06-29 | Erich F. Baurmann Pneumatik Hydraulik Industrieausrüstungen | Sprühkopf zum Auftragen von Trennmittel auf eine Gussform |
DE102008037871A1 (de) * | 2008-08-15 | 2010-02-25 | Amg Coating Technologies Gmbh | Gleitelement mit Mehrfachschicht |
DE102010052971A1 (de) | 2010-11-30 | 2012-05-31 | Amg Coating Technologies Gmbh | Werkstück mit Si-DLC Beschichtung und Verfahren zur Herstellung von Beschichtungen |
AT13091U1 (de) * | 2012-02-27 | 2013-06-15 | Ceratizit Austria Gmbh | Verfahren zur Herstellung einer Hartstoffschicht auf einem Substrat, Hartstoffschicht sowie Zerspanwerkzeug |
DE102012007763A1 (de) | 2012-04-20 | 2013-10-24 | Ulrich Schmidt | Modularer Rahmen für Steckdosen und Schalter |
DE102012007796A1 (de) | 2012-04-20 | 2013-10-24 | Amg Coating Technologies Gmbh | Beschichtung enthaltend Si-DLC, DLC und Me-DLC und Verfahren zur Herstellung von Beschichtungen |
CN105734527B (zh) * | 2016-03-08 | 2019-01-18 | 仪征亚新科双环活塞环有限公司 | 一种用于活塞环表面的类金刚石镀层、活塞环及制备工艺 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58221271A (ja) * | 1982-06-18 | 1983-12-22 | Citizen Watch Co Ltd | イオンプレ−テイング法による被膜形成方法 |
JPS6115967A (ja) * | 1984-06-29 | 1986-01-24 | Sumitomo Electric Ind Ltd | 表面処理方法 |
DD255446A3 (de) * | 1985-12-23 | 1988-04-06 | Hochvakuum Dresden Veb | Hartstoffschicht mit hoher verschleissfestigkeit und dekorativ schwarzer eigenfarbe |
GB8600829D0 (en) * | 1986-01-23 | 1986-02-19 | Gillette Co | Formation of hard coatings on cutting edges |
FR2596775B1 (fr) * | 1986-04-07 | 1992-11-13 | Univ Limoges | Revetement dur multicouches elabore par depot ionique de nitrure de titane, carbonitrure de titane et i-carbone |
JPH0784642B2 (ja) * | 1988-11-01 | 1995-09-13 | 神港精機株式会社 | 被処理物の表面に被膜を形成する方法 |
JP2877385B2 (ja) * | 1989-10-20 | 1999-03-31 | 三洋電機株式会社 | 刃物の製造方法 |
US5064682A (en) * | 1989-10-26 | 1991-11-12 | Sanyo Electric Co., Ltd. | Method of forming a pseudo-diamond film on a base body |
US5249554A (en) * | 1993-01-08 | 1993-10-05 | Ford Motor Company | Powertrain component with adherent film having a graded composition |
-
1993
- 1993-12-18 DE DE19934343354 patent/DE4343354C2/de not_active Expired - Fee Related
-
1994
- 1994-12-15 EP EP95903234A patent/EP0734460B1/de not_active Expired - Lifetime
- 1994-12-15 WO PCT/DE1994/001491 patent/WO1995016799A1/de active IP Right Grant
- 1994-12-15 DE DE59408258T patent/DE59408258D1/de not_active Expired - Lifetime
- 1994-12-15 JP JP51646995A patent/JP3980053B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE4343354A1 (de) | 1995-06-22 |
EP0734460A1 (de) | 1996-10-02 |
WO1995016799A1 (de) | 1995-06-22 |
DE4343354C2 (de) | 2002-11-14 |
JP3980053B2 (ja) | 2007-09-19 |
DE59408258D1 (de) | 1999-06-17 |
EP0734460B1 (de) | 1999-05-12 |
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