JPH09326362A5 - - Google Patents

Info

Publication number
JPH09326362A5
JPH09326362A5 JP1997074590A JP7459097A JPH09326362A5 JP H09326362 A5 JPH09326362 A5 JP H09326362A5 JP 1997074590 A JP1997074590 A JP 1997074590A JP 7459097 A JP7459097 A JP 7459097A JP H09326362 A5 JPH09326362 A5 JP H09326362A5
Authority
JP
Japan
Prior art keywords
vibration isolation
vibration
isolation table
pads
control system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997074590A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09326362A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9074590A priority Critical patent/JPH09326362A/ja
Priority claimed from JP9074590A external-priority patent/JPH09326362A/ja
Publication of JPH09326362A publication Critical patent/JPH09326362A/ja
Priority to US09/427,185 priority patent/US6202492B1/en
Publication of JPH09326362A5 publication Critical patent/JPH09326362A5/ja
Pending legal-status Critical Current

Links

JP9074590A 1996-04-05 1997-03-11 除振装置及び露光装置 Pending JPH09326362A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP9074590A JPH09326362A (ja) 1996-04-05 1997-03-11 除振装置及び露光装置
US09/427,185 US6202492B1 (en) 1996-04-05 1999-10-26 Anti-vibration apparatus and exposure apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11028096 1996-04-05
JP8-110280 1996-04-05
JP9074590A JPH09326362A (ja) 1996-04-05 1997-03-11 除振装置及び露光装置

Publications (2)

Publication Number Publication Date
JPH09326362A JPH09326362A (ja) 1997-12-16
JPH09326362A5 true JPH09326362A5 (enExample) 2005-05-12

Family

ID=26415754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9074590A Pending JPH09326362A (ja) 1996-04-05 1997-03-11 除振装置及び露光装置

Country Status (2)

Country Link
US (1) US6202492B1 (enExample)
JP (1) JPH09326362A (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6511035B1 (en) * 1999-08-03 2003-01-28 Newport Corporation Active vibration isolation systems with nonlinear compensation to account for actuator saturation
JP4416250B2 (ja) * 2000-02-09 2010-02-17 キヤノン株式会社 アクティブ除振装置及び露光装置
US6621556B2 (en) * 2000-02-28 2003-09-16 Nikon Corporation Projection exposure apparatus and manufacturing and adjusting methods thereof
JP3870002B2 (ja) * 2000-04-07 2007-01-17 キヤノン株式会社 露光装置
US6547225B1 (en) 2001-04-17 2003-04-15 Technical Manufacturing Corporation Pneumatic isolator with barometric insensitivity
US6926263B1 (en) 2001-04-17 2005-08-09 Technical Manufacturing Corporation High center of gravity stable pneumatic isolator
DE50115862D1 (de) * 2001-09-12 2011-06-01 Siemens Ag Schwingungen eines mechatronischen systems
US7345559B2 (en) * 2001-09-13 2008-03-18 General Electric Company High field open MRI magnet isolation system and method
US20030097205A1 (en) * 2001-11-20 2003-05-22 Bausan Yuan Control scheme and system for active vibration isolation
JP2004343075A (ja) 2003-04-14 2004-12-02 Asml Netherlands Bv 投影システム及びその使用方法
US7320455B2 (en) * 2003-10-24 2008-01-22 Newport Corporation Instrumented platform for vibration-sensitive equipment
US8276873B2 (en) * 2004-10-22 2012-10-02 Newport Corporation Instrumented platform for vibration-sensitive equipment
US8231098B2 (en) 2004-12-07 2012-07-31 Newport Corporation Methods and devices for active vibration damping of an optical structure
JP4697424B2 (ja) * 2005-10-27 2011-06-08 株式会社安川電機 精密位置決め装置
EP1843206B1 (en) * 2006-04-06 2012-09-05 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1857878B1 (de) * 2006-05-20 2010-01-20 Integrated Dynamics Engineering GmbH Aktives Schwingungsisolationssystem mit einem kombinierten Positionsaktor
CN100465794C (zh) * 2006-10-09 2009-03-04 中南大学 一种步进扫描光刻机隔振系统模拟试验装置
US20080150204A1 (en) * 2006-12-22 2008-06-26 Coherix, Inc Stabilizer for vibration isolation platform
US7782446B2 (en) * 2007-03-01 2010-08-24 Asml Netherlands B.V. Stage system and lithographic apparatus comprising such stage system
JP5505871B2 (ja) * 2008-03-07 2014-05-28 株式会社ニコン 移動体装置及び露光装置
JP4922338B2 (ja) * 2008-04-25 2012-04-25 エーエスエムエル ネザーランズ ビー．ブイ． 位置制御システム、リソグラフィ装置、および可動オブジェクトの位置を制御する方法
EP2119938A1 (en) * 2008-05-15 2009-11-18 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO A vibration sensor and a system to isolate vibrations.
US8805556B2 (en) * 2008-07-03 2014-08-12 Nikon Corporation Damping apparatus and exposure apparatus
KR101910215B1 (ko) 2010-12-29 2018-12-19 뉴포트 코포레이션 동조 가능한 진동 댐퍼，및 제조 및 동조 방법
DE102012004808A1 (de) * 2012-03-09 2013-09-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Beeinflussung der Schwingungsübertragung zwischen zwei Einheiten
CN103365108B (zh) * 2012-04-11 2015-04-15 上海微电子装备有限公司 基于重力补偿器的控制方法
US11685303B2 (en) 2018-08-31 2023-06-27 Daniel R. Brettschneider Berth apparatus and methods using physiological parameters for controlling berth motion to promote relaxation and to induce sleep
US11820275B2 (en) 2020-10-30 2023-11-21 Daniel R. Brettschneider Carrier platform with suspension mechanism for supporting a vibration-sensitive load on a vehicle

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3578278A (en) * 1969-06-16 1971-05-11 Robintech Inc Vibration-isolated self-leveling platform and method
IL77057A (en) 1985-03-26 1990-03-19 Wright Barry Corp Active vibration isolation system
US4821205A (en) 1986-05-30 1989-04-11 Eaton Corporation Seismic isolation system with reaction mass
US4730541A (en) * 1986-06-03 1988-03-15 Technical Manufacturing Corporation Non contacting electro-pneumatic servo for vibration isolation
US5060519A (en) * 1988-02-18 1991-10-29 Tokkyo Kiki Kabushiki Kaisha Active control precision damping table
DE69014750T2 (de) * 1989-07-24 1995-07-06 Tokkyo Kiki K K Verfahren zur Positions- und Vibrationssteuerung und eine aktive Vibrationssteuervorrichtung.
GB2249189B (en) * 1990-10-05 1994-07-27 Canon Kk Exposure apparatus
US5285995A (en) * 1992-05-14 1994-02-15 Aura Systems, Inc. Optical table active leveling and vibration cancellation system
US5356110A (en) * 1993-06-08 1994-10-18 Newport Corporation Pneumatic isolation systems for damping vertical, horizontal and rotational vibrations
US5374025A (en) * 1993-06-28 1994-12-20 Alliedsignal Inc. Fluidic vibration cancellation actuator and method
US5693990A (en) * 1994-09-06 1997-12-02 Bridgestone Corporation Vibration isolating apparatus and vibration isolating table
US5812420A (en) * 1995-09-05 1998-09-22 Nikon Corporation Vibration-preventive apparatus and exposure apparatus
US5811821A (en) * 1996-08-09 1998-09-22 Park Scientific Instruments Single axis vibration reducing system

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