JPH09326362A - 除振装置及び露光装置 - Google Patents

除振装置及び露光装置

Info

Publication number
JPH09326362A
JPH09326362A JP9074590A JP7459097A JPH09326362A JP H09326362 A JPH09326362 A JP H09326362A JP 9074590 A JP9074590 A JP 9074590A JP 7459097 A JP7459097 A JP 7459097A JP H09326362 A JPH09326362 A JP H09326362A
Authority
JP
Japan
Prior art keywords
vibration
vibration isolation
stage
control circuit
actuator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9074590A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09326362A5 (enExample
Inventor
Tatsuya Osaki
達哉 大崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9074590A priority Critical patent/JPH09326362A/ja
Publication of JPH09326362A publication Critical patent/JPH09326362A/ja
Priority to US09/427,185 priority patent/US6202492B1/en
Publication of JPH09326362A5 publication Critical patent/JPH09326362A5/ja
Pending legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F2224/00—Materials; Material properties
    • F16F2224/04—Fluids
    • F16F2224/046—Fluids pneumatic

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • General Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Acoustics & Sound (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Toxicology (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vibration Prevention Devices (AREA)
JP9074590A 1996-04-05 1997-03-11 除振装置及び露光装置 Pending JPH09326362A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP9074590A JPH09326362A (ja) 1996-04-05 1997-03-11 除振装置及び露光装置
US09/427,185 US6202492B1 (en) 1996-04-05 1999-10-26 Anti-vibration apparatus and exposure apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11028096 1996-04-05
JP8-110280 1996-04-05
JP9074590A JPH09326362A (ja) 1996-04-05 1997-03-11 除振装置及び露光装置

Publications (2)

Publication Number Publication Date
JPH09326362A true JPH09326362A (ja) 1997-12-16
JPH09326362A5 JPH09326362A5 (enExample) 2005-05-12

Family

ID=26415754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9074590A Pending JPH09326362A (ja) 1996-04-05 1997-03-11 除振装置及び露光装置

Country Status (2)

Country Link
US (1) US6202492B1 (enExample)
JP (1) JPH09326362A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1124078A3 (en) * 2000-02-09 2003-06-18 Canon Kabushiki Kaisha Active anti-vibration apparatus and exposure apparatus
US7170580B2 (en) 2003-04-14 2007-01-30 Asml Netherlands B.V. Lithographic apparatus, projection system, method of projecting and device manufacturing method
JP2007123502A (ja) * 2005-10-27 2007-05-17 Yaskawa Electric Corp 精密位置決め装置

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6511035B1 (en) * 1999-08-03 2003-01-28 Newport Corporation Active vibration isolation systems with nonlinear compensation to account for actuator saturation
US6621556B2 (en) * 2000-02-28 2003-09-16 Nikon Corporation Projection exposure apparatus and manufacturing and adjusting methods thereof
JP3870002B2 (ja) * 2000-04-07 2007-01-17 キヤノン株式会社 露光装置
US6547225B1 (en) 2001-04-17 2003-04-15 Technical Manufacturing Corporation Pneumatic isolator with barometric insensitivity
US6926263B1 (en) 2001-04-17 2005-08-09 Technical Manufacturing Corporation High center of gravity stable pneumatic isolator
DE50115862D1 (de) * 2001-09-12 2011-06-01 Siemens Ag Schwingungen eines mechatronischen systems
US7345559B2 (en) * 2001-09-13 2008-03-18 General Electric Company High field open MRI magnet isolation system and method
US20030097205A1 (en) * 2001-11-20 2003-05-22 Bausan Yuan Control scheme and system for active vibration isolation
US7320455B2 (en) * 2003-10-24 2008-01-22 Newport Corporation Instrumented platform for vibration-sensitive equipment
US8276873B2 (en) * 2004-10-22 2012-10-02 Newport Corporation Instrumented platform for vibration-sensitive equipment
US8231098B2 (en) 2004-12-07 2012-07-31 Newport Corporation Methods and devices for active vibration damping of an optical structure
EP1843206B1 (en) * 2006-04-06 2012-09-05 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1857878B1 (de) * 2006-05-20 2010-01-20 Integrated Dynamics Engineering GmbH Aktives Schwingungsisolationssystem mit einem kombinierten Positionsaktor
CN100465794C (zh) * 2006-10-09 2009-03-04 中南大学 一种步进扫描光刻机隔振系统模拟试验装置
US20080150204A1 (en) * 2006-12-22 2008-06-26 Coherix, Inc Stabilizer for vibration isolation platform
US7782446B2 (en) * 2007-03-01 2010-08-24 Asml Netherlands B.V. Stage system and lithographic apparatus comprising such stage system
JP5505871B2 (ja) * 2008-03-07 2014-05-28 株式会社ニコン 移動体装置及び露光装置
JP4922338B2 (ja) * 2008-04-25 2012-04-25 エーエスエムエル ネザーランズ ビー．ブイ． 位置制御システム、リソグラフィ装置、および可動オブジェクトの位置を制御する方法
EP2119938A1 (en) * 2008-05-15 2009-11-18 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO A vibration sensor and a system to isolate vibrations.
US8805556B2 (en) * 2008-07-03 2014-08-12 Nikon Corporation Damping apparatus and exposure apparatus
KR101910215B1 (ko) 2010-12-29 2018-12-19 뉴포트 코포레이션 동조 가능한 진동 댐퍼，및 제조 및 동조 방법
DE102012004808A1 (de) * 2012-03-09 2013-09-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Beeinflussung der Schwingungsübertragung zwischen zwei Einheiten
CN103365108B (zh) * 2012-04-11 2015-04-15 上海微电子装备有限公司 基于重力补偿器的控制方法
US11685303B2 (en) 2018-08-31 2023-06-27 Daniel R. Brettschneider Berth apparatus and methods using physiological parameters for controlling berth motion to promote relaxation and to induce sleep
US11820275B2 (en) 2020-10-30 2023-11-21 Daniel R. Brettschneider Carrier platform with suspension mechanism for supporting a vibration-sensitive load on a vehicle

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3578278A (en) * 1969-06-16 1971-05-11 Robintech Inc Vibration-isolated self-leveling platform and method
IL77057A (en) 1985-03-26 1990-03-19 Wright Barry Corp Active vibration isolation system
US4821205A (en) 1986-05-30 1989-04-11 Eaton Corporation Seismic isolation system with reaction mass
US4730541A (en) * 1986-06-03 1988-03-15 Technical Manufacturing Corporation Non contacting electro-pneumatic servo for vibration isolation
US5060519A (en) * 1988-02-18 1991-10-29 Tokkyo Kiki Kabushiki Kaisha Active control precision damping table
DE69014750T2 (de) * 1989-07-24 1995-07-06 Tokkyo Kiki K K Verfahren zur Positions- und Vibrationssteuerung und eine aktive Vibrationssteuervorrichtung.
GB2249189B (en) * 1990-10-05 1994-07-27 Canon Kk Exposure apparatus
US5285995A (en) * 1992-05-14 1994-02-15 Aura Systems, Inc. Optical table active leveling and vibration cancellation system
US5356110A (en) * 1993-06-08 1994-10-18 Newport Corporation Pneumatic isolation systems for damping vertical, horizontal and rotational vibrations
US5374025A (en) * 1993-06-28 1994-12-20 Alliedsignal Inc. Fluidic vibration cancellation actuator and method
US5693990A (en) * 1994-09-06 1997-12-02 Bridgestone Corporation Vibration isolating apparatus and vibration isolating table
US5812420A (en) * 1995-09-05 1998-09-22 Nikon Corporation Vibration-preventive apparatus and exposure apparatus
US5811821A (en) * 1996-08-09 1998-09-22 Park Scientific Instruments Single axis vibration reducing system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1124078A3 (en) * 2000-02-09 2003-06-18 Canon Kabushiki Kaisha Active anti-vibration apparatus and exposure apparatus
US6684132B2 (en) 2000-02-09 2004-01-27 Canon Kabushiki Kaisha Active anti-vibration apparatus and exposure apparatus
US7170580B2 (en) 2003-04-14 2007-01-30 Asml Netherlands B.V. Lithographic apparatus, projection system, method of projecting and device manufacturing method
JP2007123502A (ja) * 2005-10-27 2007-05-17 Yaskawa Electric Corp 精密位置決め装置

Also Published As

Publication number Publication date
US6202492B1 (en) 2001-03-20

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