JPH08139118A - Semiconductor device and production thereof - Google Patents

Semiconductor device and production thereof

Info

Publication number
JPH08139118A
JPH08139118A JP29798694A JP29798694A JPH08139118A JP H08139118 A JPH08139118 A JP H08139118A JP 29798694 A JP29798694 A JP 29798694A JP 29798694 A JP29798694 A JP 29798694A JP H08139118 A JPH08139118 A JP H08139118A
Authority
JP
Japan
Prior art keywords
resin
semiconductor device
resist
hollow
resin package
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29798694A
Other languages
Japanese (ja)
Inventor
Hiroshi Ueno
博 上野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Faurecia Clarion Electronics Co Ltd
Original Assignee
Clarion Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clarion Co Ltd filed Critical Clarion Co Ltd
Priority to JP29798694A priority Critical patent/JPH08139118A/en
Publication of JPH08139118A publication Critical patent/JPH08139118A/en
Pending legal-status Critical Current

Links

Landscapes

  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

PURPOSE: To obtain a semiconductor device, and production method thereof, in which a hollow part can be formed above an element using only a sealing resin. CONSTITUTION: A soluble resist 8 is applied onto an element 2 mounted on a board 1 and then a part thereof is removed. It is then coated with a sealing resin 8 and the soluble resist 8 is dissolved and removed partially from the uncoated part to leave a window 10. Subsequently, the window 10 is covered with a sealing resin 9a thus forming a hollow part 11 above the element 2. Since only a sealing resin is required, the material cost is reduced and since only the surface of the element is made hollow, the size can be reduced easily.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、弾性表面波素子等の素
子を基板に実装する半導体装置およびその製造方法の改
良に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to improvements in a semiconductor device in which an element such as a surface acoustic wave element is mounted on a substrate and a method for manufacturing the same.

【0002】[0002]

【従来の技術】弾性表面波素子は、伝播表面部に異物が
存在すると、表面波の伝播に悪影響を生じ、所望の特性
が損なわれる。そこで、素子の伝播表面を非接触状態と
するために、中空封止用パッケージが用いられている。
前記中空封止用パッケージには、セラミックパッケージ
や金属パッケージが主に使われている。これらは信頼性
は高いが、コストも高いという欠点がある。また、近年
は低価格のものを作ろうと、素子(チップ)に蓋をかぶ
せるという方法や、蓋の回りを樹脂で覆っしまうという
方法も提案されており、セラミックや金属のパッケージ
より安価なものがある。しかし、これらの方法は単純な
樹脂封止パッケージに比べて、蓋の部分のコストが高
く、蓋をかぶせるという工程が増え、生産性が悪くな
る。
2. Description of the Related Art In a surface acoustic wave element, if foreign matter is present on the propagation surface portion, the propagation of the surface wave is adversely affected and desired characteristics are impaired. Therefore, a hollow sealing package is used in order to bring the propagation surface of the element into a non-contact state.
A ceramic package or a metal package is mainly used as the hollow sealing package. Although they are highly reliable, they have the disadvantage of high cost. In addition, in recent years, methods of covering the element (chip) with a lid and methods of covering the area around the lid with resin have been proposed in order to make low-cost ones. is there. However, in these methods, the cost of the lid is higher than that of a simple resin-sealed package, the number of steps of covering the lid is increased, and the productivity is deteriorated.

【0003】[0003]

【発明が解決しようとする課題】近時、セラミックや金
属のパッケージを使用せず、図4に示すような樹脂材料
による中空封止用パッケージが提案されている。これ
は、基板1上に実装したチップ2を、中空部3を残すよ
うにして絶縁性フィルム4で覆い、その上から樹脂5を
接着層6を介して塗布し、樹脂5を硬化させて中空パッ
ケージとするものである。
Recently, there has been proposed a hollow sealing package made of a resin material as shown in FIG. 4 without using a ceramic or metal package. This is because the chip 2 mounted on the substrate 1 is covered with an insulating film 4 so as to leave a hollow portion 3, and a resin 5 is applied from above the adhesive film 6 via an adhesive layer 6, and the resin 5 is cured to form a hollow. It is a package.

【0004】上記方法は、フィルムや樹脂が一般に市場
で大量に販売されている材料で構成することが可能で、
コストを安くすることができ、小型化も実現できるとい
う利点がある。しかし、チップと基板側とを接続するボ
ンディングワイヤ7を覆うようにフィルム4をかぶせな
ければならず、その回りを樹脂5で覆っているので、無
駄な部分がある。
In the above method, the film and the resin can be composed of materials which are generally sold in large quantities on the market.
There are advantages that the cost can be reduced and the size can be reduced. However, since the film 4 must be covered so as to cover the bonding wire 7 that connects the chip and the substrate side, and the surrounding area is covered with the resin 5, there is a wasteful portion.

【0005】[0005]

【発明の目的】本発明の主なる目的は、上記のようなフ
ィルムを用いないで、封止用の樹脂のみにて中空部を形
成することを可能とした半導体装置およびその製造方法
を提供することにあり、さらに低コスト化および小型化
を図ることにある。
SUMMARY OF THE INVENTION The main object of the present invention is to provide a semiconductor device and a method of manufacturing the same, in which a hollow portion can be formed only by a sealing resin without using the above film. In particular, it is to further reduce the cost and downsize.

【0006】[0006]

【課題を解決するための手段】本発明による半導体装置
の製造方法は、半導体装置内で中空構造にすべき場所に
可溶性レジストを塗布する工程と、前記塗布されたレジ
ストをその一部を除いて第1の樹脂パッケージ材料で覆
う工程と、前記樹脂パッケージ材料で覆われなかった一
部から前記可溶性レジストを溶解させる溶剤を供給し
て、可溶性レジストを除去する工程と、前記一部を含む
部分を第2の樹脂パッケージ材料で覆って中空部を完成
させる工程とから成ることを要旨としている。
A method of manufacturing a semiconductor device according to the present invention comprises a step of applying a soluble resist to a place in a semiconductor device where a hollow structure is to be formed, and the applied resist except a part thereof. A step of covering with a first resin package material; a step of supplying a solvent that dissolves the soluble resist from a portion not covered with the resin package material to remove the soluble resist; and a portion including the portion. The gist is that it comprises a step of covering with a second resin package material to complete the hollow portion.

【0007】本発明による半導体装置は、基板上の素子
に塗布された可溶性レジストをその一部を残して覆うよ
うに塗布した第1の樹脂パッケージ材料と、前記可溶性
レジストを前記一部から溶解除去したあとに残された窓
部を覆うように塗布された第2の樹脂パッケージ材料と
から成ることを要旨としている。
In the semiconductor device according to the present invention, the soluble resin applied to the elements on the substrate is applied so as to cover a part of the soluble resist, and the soluble resist is removed by dissolution from the part. The second feature is that the second resin package material is applied so as to cover the window portion left after the above.

【0008】[0008]

【作用】上記半導体装置の製造方法においては、簡易な
工程を適用することで、中空構造を有する半導体装置が
安価に得られる。また、前記製造方法によって構成され
た半導体装置は、素子の表面だけを中空にすることがで
きるので、小型化が可能である。
In the method of manufacturing a semiconductor device described above, a semiconductor device having a hollow structure can be obtained at low cost by applying simple steps. In addition, the semiconductor device configured by the above manufacturing method can be downsized because only the surface of the element can be hollow.

【0009】[0009]

【実施例】図1(a)〜(d)に、本発明による半導体
装置の製造方法の第1実施例を示す。以下、その製造工
程を説明する。まず、基板1上の弾性表面波素子2の上
に硬化後も可溶性であるレジスト8(樹脂)を塗布し、
加熱乾燥して硬化させる(図1(a))。その上にパッ
ケージとなる封止用の樹脂9を塗布する(図1
(b))。この際に、1ヵ所以上レジスト8が露出する
場所を設けておく。封止用樹脂9を加熱硬化した後、ア
セトン、アルコールのような溶剤等を用いて、素子2の
上に塗布したレジスト8を除去する(図1(c))。さ
らに、レジスト8を除去した後に残された窓部10を樹
脂9aで封止すれば、微小な中空部11が形成され、弾
性表面波素子の表面波を阻害することのない中空パッケ
ージが形成できる(図1(d))。なお、窓部10を封
止する樹脂9aは前記樹脂9と異種のものであってもよ
い。
1A to 1D show a first embodiment of a method for manufacturing a semiconductor device according to the present invention. The manufacturing process will be described below. First, a resist 8 (resin) that is soluble even after curing is applied onto the surface acoustic wave element 2 on the substrate 1,
It is dried by heating and cured (FIG. 1 (a)). A sealing resin 9 to be a package is applied thereon (FIG. 1).
(B)). At this time, at least one place where the resist 8 is exposed is provided. After the sealing resin 9 is cured by heating, the resist 8 applied on the element 2 is removed using a solvent such as acetone or alcohol (FIG. 1C). Further, by sealing the window portion 10 left after removing the resist 8 with the resin 9a, a minute hollow portion 11 is formed, and a hollow package that does not hinder the surface wave of the surface acoustic wave element can be formed. (FIG. 1 (d)). The resin 9a for sealing the window 10 may be different from the resin 9.

【0010】図2に、本発明の第2実施例を示す。ま
ず、素子2の上に硬化後も可溶性であるレジスト8(樹
脂)を塗り、加熱乾燥して硬化させる(図2(a))。
その上に仮封止用の紫外線硬化型(光硬化型)樹脂12
を塗布する(図2(d))。この際に、1ヵ所以上レジ
ストが露出する場所を設けておく。紫外線硬化型樹脂1
2を紫外線により硬化した後、アセトン、アルコールの
ような溶剤等を用いて、素子2の上に塗布したレジスト
8を除去する(図2(c))。紫外線硬化型樹脂12
は、一般的に、耐湿性に劣っていたり、耐熱性が劣って
いるため、この上にさらに耐湿性や耐熱性に優れた樹脂
13を塗布し、レジスト除去した後の窓部10をふさい
で、加熱硬化して、封止する(図2(d))。
FIG. 2 shows a second embodiment of the present invention. First, the element 2 is coated with a resist 8 (resin) that is soluble even after curing, and is heated and dried to cure (FIG. 2A).
On top of that, an ultraviolet curable (photocurable) resin 12 for temporary sealing
Is applied (FIG. 2 (d)). At this time, at least one place where the resist is exposed is provided. UV curable resin 1
After 2 is cured by ultraviolet rays, the resist 8 coated on the element 2 is removed using a solvent such as acetone or alcohol (FIG. 2C). UV curable resin 12
Is generally inferior in moisture resistance and inferior in heat resistance. Therefore, a resin 13 which is superior in moisture resistance and heat resistance is applied thereon, and the window portion 10 after removing the resist is covered. Then, it is cured by heating and sealed (FIG. 2D).

【0011】図3に、本発明の第3実施例を示す。ま
ず、素子2の上に樹脂8を塗り、加熱しないで、液状の
ままにしておく(図3(a))。その上に仮封止用の紫
外線硬化型(光硬化型)樹脂12を塗布する(図3
(b))。この場合、2つの樹脂は性質の違う樹脂なの
で、容易に混ざり合うことはない。また、この際に、1
ヵ所以上レジストが露出する場所を設けておく。紫外線
硬化型樹脂12を紫外線により硬化した後、アセトン、
アルコールのような溶剤等を用いて、素子の上に塗布し
た樹脂8を除去する(図3(c))。紫外線硬化型樹脂
は、一般的に、耐湿性に劣っていたり、耐熱性が劣って
いるため、この上にさらに耐湿性や耐熱性に優れた樹脂
14を塗布し、レジスト除去した窓部10をふさいで、
加熱硬化して封止する(図3(d))。
FIG. 3 shows a third embodiment of the present invention. First, the resin 8 is applied onto the element 2 and left in a liquid state without being heated (FIG. 3A). An ultraviolet curable (photocurable) resin 12 for temporary sealing is applied thereon (FIG. 3).
(B)). In this case, since the two resins have different properties, they do not mix easily. At this time, 1
Provide more than one place where the resist is exposed. After curing the ultraviolet curable resin 12 with ultraviolet rays, acetone,
The resin 8 applied on the element is removed using a solvent such as alcohol (FIG. 3C). Since the ultraviolet curable resin is generally inferior in moisture resistance or inferior in heat resistance, a resin 14 having further excellent moisture resistance or heat resistance is applied onto the ultraviolet curable resin to remove the resist-removed window portion 10. By blocking
It is heat-cured and sealed (FIG. 3D).

【0012】[0012]

【発明の効果】以上、詳述したように、本発明の半導体
装置およびその製造方法によれば、下記のような効果が
得られる。 (1)パッケージは封止樹脂のみで構成されているの
で、材料コストが安い。 (2)素子上の表面波伝播路だけを中空にできる構造な
ので、小型化が容易である。 (3)封止樹脂の塗布方法を少し変更するだけで、いろ
いろなサイズの素子に対応できるので、少量多品種生産
に効果がある。
As described above in detail, according to the semiconductor device and the method of manufacturing the same of the present invention, the following effects can be obtained. (1) Since the package is composed only of the sealing resin, the material cost is low. (2) Since only the surface wave propagation path on the element can be made hollow, size reduction is easy. (3) Since devices of various sizes can be dealt with by slightly changing the method of applying the sealing resin, it is effective for high-mix low-volume production.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例による半導体装置の製造工
程図である。
FIG. 1 is a manufacturing process diagram of a semiconductor device according to a first embodiment of the invention.

【図2】本発明の第2実施例による半導体装置の製造工
程図である。
FIG. 2 is a manufacturing process diagram of a semiconductor device according to a second embodiment of the present invention.

【図3】本発明の第3実施例による半導体装置の製造工
程図である。
FIG. 3 is a manufacturing process diagram of a semiconductor device according to a third embodiment of the present invention.

【図4】従来の半導体装置の断面図である。FIG. 4 is a sectional view of a conventional semiconductor device.

【符号の説明】[Explanation of symbols]

1 基板 2 素子 3 中空部 4 絶縁性フィルム 5 封止用樹脂 6 接着層 7 ボンディングワイヤ 8 可溶性レジスト 9,9a 封止用樹脂 10 窓部 11 中空部 12 封止用の紫外線硬化型樹脂 13,14 封止用樹脂 DESCRIPTION OF SYMBOLS 1 Substrate 2 Element 3 Hollow part 4 Insulating film 5 Sealing resin 6 Adhesive layer 7 Bonding wire 8 Soluble resist 9,9a Sealing resin 10 Window part 11 Hollow part 12 UV curable resin for sealing 13,14 Sealing resin

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 半導体装置内で中空構造にすべき場所に
可溶性レジストを塗布する工程と、前記塗布されたレジ
ストをその一部を除いて第1の樹脂パッケージ材料で覆
う工程と、前記樹脂パッケージ材料で覆われなかった一
部から前記可溶性レジストを溶解させる溶剤を供給し
て、可溶性レジストを除去する工程と、前記一部を含む
部分を第2の樹脂パッケージ材料で覆って中空部を完成
させる工程とから成ることを特徴とする半導体装置およ
びその製造方法。
1. A step of applying a soluble resist to a place where a hollow structure is to be formed in a semiconductor device, a step of covering the applied resist except a part thereof with a first resin package material, and the resin package. A step of supplying a solvent that dissolves the soluble resist from a portion not covered with the material to remove the soluble resist, and a portion including the portion is covered with a second resin package material to complete a hollow portion. And a method of manufacturing the same.
【請求項2】 第2の樹脂パッケージ材料は第1の樹脂
パッケージ材料の全体を覆うことを特徴とする請求項1
に記載の半導体装置の製造方法。
2. The second resin package material covers the entire first resin package material.
A method of manufacturing a semiconductor device according to item 1.
【請求項3】 基板上の素子に塗布された可溶性レジス
トをその一部を残して覆うように塗布した第1の樹脂パ
ッケージ材料と、前記可溶性レジストを前記一部から溶
解除去したあとに残された窓部を覆うように塗布された
第2の樹脂パッケージ材料とから成ることを特徴とする
半導体装置。
3. A first resin package material applied so as to cover a part of the soluble resist applied to the element on the substrate, and the soluble resist left after the soluble resist is removed from the part. And a second resin package material applied so as to cover the window portion.
JP29798694A 1994-11-07 1994-11-07 Semiconductor device and production thereof Pending JPH08139118A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29798694A JPH08139118A (en) 1994-11-07 1994-11-07 Semiconductor device and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29798694A JPH08139118A (en) 1994-11-07 1994-11-07 Semiconductor device and production thereof

Publications (1)

Publication Number Publication Date
JPH08139118A true JPH08139118A (en) 1996-05-31

Family

ID=17853659

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29798694A Pending JPH08139118A (en) 1994-11-07 1994-11-07 Semiconductor device and production thereof

Country Status (1)

Country Link
JP (1) JPH08139118A (en)

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